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1. 发明授权

US08035903B2 Positioning unit and alignment device for an optical element 有权
标题翻译：光学元件的定位单元和对准装置
公开(公告)号：US08035903B2
公开(公告)日：2011-10-11
申请号：US12768286
申请日：2010-04-27
申请人： Ulrich Weber , Jens Kugler
发明人： Ulrich Weber , Jens Kugler
IPC分类号： G02B7/02
CPC分类号： G02B7/005 , G02B7/003 , G02B7/004 , G02B7/02 , G02B7/023 , G02B7/1822 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： The invention relates to a positioning unit for an optical element in a microlithographic projection exposure installation. Said unit comprises a first connection region (A, 22) for connecting to the optical elements, and a second connection region (B, 20) for connecting to an object in the vicinity of the optical elements. At least two levers are connected to the second connection region by means of the respective lever bearing thereof, and the respective load arm thereof is connected to the first connection region by an articulation by means of an intermediate element (31, 33, 36) applied to said articulations. Regulating devices (28, 29) or actuators are arranged on the respective power arms of the levers. In a first position, the first connection region and the second connection region are arranged in relation to each other in such a way that the lever bearings of at least two levers and the articulations associated with said levers have approximately parallel rotational axes that are located approximately in a plane in the first position.
摘要翻译：本发明涉及一种用于微光刻投影曝光装置中的光学元件的定位单元。所述单元包括用于连接到光学元件的第一连接区域（A，22）和用于连接到光学元件附近的物体的第二连接区域（B，20）。至少两个杠杆通过其相应的杠杆轴承连接到第二连接区域，并且其相应的负载臂通过借助于施加的中间元件（31,33,36）的铰接而连接到第一连接区域到所说的关节。调节装置（28,29）或致动器布置在杠杆的相应动力臂上。在第一位置，第一连接区域和第二连接区域彼此相对布置，使得至少两个杠杆的杠杆轴承和与所述杠杆相关联的铰接件具有近似平行的旋转轴线，其大致位于在一架飞机中处于第一位。

2. 发明授权

US08988654B2 Support elements for an optical element 有权
标题翻译：用于光学元件的支撑元件
公开(公告)号：US08988654B2
公开(公告)日：2015-03-24
申请号：US13071165
申请日：2011-03-24
申请人： Jens Kugler , Ulrich Weber , Nicolai Wengert
发明人： Jens Kugler , Ulrich Weber , Nicolai Wengert
IPC分类号： G02B7/00 , G03F7/20
CPC分类号： G03F7/7015 , G02B7/003 , G02B7/02 , G03F7/70825
摘要： Support elements for an optical element and a method for supporting an optical element are disclosed. The disclosure can be used in connection with arbitrary optical apparatuses or optical imaging methods. In particular, the disclosure can be used in connection with the microlithography employed in the manufacture of microelectronic circuits.
摘要翻译：公开了用于光学元件的支撑元件和用于支撑光学元件的方法。本公开可以与任意光学装置或光学成像方法结合使用。特别地，本公开可以结合用于制造微电子电路的微光刻来使用。

3. 发明授权

US08416515B2 Positioning unit and alignment device for an optical element 有权
公开(公告)号：US08416515B2
公开(公告)日：2013-04-09
申请号：US13230398
申请日：2011-09-12
申请人： Ulrich Weber , Jens Kugler
发明人： Ulrich Weber , Jens Kugler
IPC分类号： G02B7/02
CPC分类号： G02B7/005 , G02B7/003 , G02B7/004 , G02B7/02 , G02B7/023 , G02B7/1822 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： The disclosure provides a positioning unit for an optical element in a microlithographic projection exposure installation having a first connecting area for connection to the optical element, and having a second connecting area for connection to an object in the vicinity of the optical element.

4. 发明申请

US20090244509A1 OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS 有权
标题翻译：光学系统具有可交换的可操作的校正装置，用于减少图像抖动
公开(公告)号：US20090244509A1
公开(公告)日：2009-10-01
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/54
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译：本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。操纵器可以与致动器一起以可变的方式形成。

5. 发明授权

US08351139B2 Optical element module with minimized parasitic loads 有权
标题翻译：具有最小化寄生负载的光学元件模块
公开(公告)号：US08351139B2
公开(公告)日：2013-01-08
申请号：US12708034
申请日：2010-02-18
申请人： Jens Kugler , Ulrich Weber , Dirk Schaffer
发明人： Jens Kugler , Ulrich Weber , Dirk Schaffer
IPC分类号： G02B7/02
CPC分类号： G02B7/02 , G02B7/021 , G03F7/70825
摘要： An optical element module is provided. The optical module includes an optical element unit that includes an optical element and a support structure that supports the optical element unit. The support structure includes a support device and a contact device mounted to the support device. The contact device exerts a force on the optical element unit in a first direction via a first contact surface of the contact device. The first contact surface contacts a second contact surface of the optical element unit. The contact device includes a first linking section and a second linking section extending along a second direction running transverse to the first direction and arranged kinematically in series between the first contact surface and the support device. The first linking section and the second linking section are elastically deformed in response to a bending moment resulting from the force. The first linking section and the second linking section are arranged on opposite sides of a reference plane. The reference plane includes the force and runs transverse to the second direction.
摘要翻译：提供了一种光学元件模块。光学模块包括光学元件单元，其包括光学元件和支撑光学元件单元的支撑结构。支撑结构包括支撑装置和安装到支撑装置的接触装置。接触装置经由接触装置的第一接触面沿第一方向在光学元件单元上施加力。第一接触表面接触光学元件单元的第二接触表面。接触装置包括第一连接部分和第二连接部分，该第二连接部分沿着横向于第一方向的第二方向延伸并且在运动学上串联布置在第一接触表面和支撑装置之间。第一连接部分和第二连接部分响应于由力产生的弯矩而弹性变形。第一连接部分和第二连接部分布置在参考平面的相对侧上。参考平面包括力并横向于第二方向延伸。

6. 发明授权

US07986472B2 Optical element module 有权
标题翻译：光学元件模块
公开(公告)号：US07986472B2
公开(公告)日：2011-07-26
申请号：US11444191
申请日：2006-05-31
申请人： Jens Kugler , Ulrich Weber , Bernhard Gellrich , Yim-Bun Patrick Kwan , Peter Deufel
发明人： Jens Kugler , Ulrich Weber , Bernhard Gellrich , Yim-Bun Patrick Kwan , Peter Deufel
IPC分类号： G02B7/02
CPC分类号： G02B7/028 , G02B7/008 , G03F7/70825 , G03F7/70891
摘要： There is provided an optical element module comprising a first optical element and an optical element holder. The first optical element has a first coefficient of thermal expansion. The optical element holder holds the first optical element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being adapted to the first coefficient of thermal expansion. The optical element is directly contacting the optical element holder in a wide contact area. The contact area is defined by a first contact surface of the first optical element and a second contact surface of the optical element holder, wherein the second contact surface matches the first contact surface. Thus, favorable rigidity and deformation behavior is provided.
摘要翻译：提供了一种包括第一光学元件和光学元件保持器的光学元件模块。第一光学元件具有第一热膨胀系数。光学元件保持器保持第一光学元件并具有第二热膨胀系数，第二热膨胀系数适应于第一热膨胀系数。光学元件在宽接触区域中直接接触光学元件保持器。接触区域由第一光学元件的第一接触表面和光学元件保持器的第二接触表面限定，其中第二接触表面与第一接触表面匹配。因此，提供了良好的刚性和变形行为。

7. 发明授权

US06744574B2 Mount for an optical element in an optical imaging device 失效
标题翻译：安装在光学成像设备中的光学元件
公开(公告)号：US06744574B2
公开(公告)日：2004-06-01
申请号：US10247964
申请日：2002-09-20
申请人： Ulrich Weber , Jochen Becker , Hubert Holderer , Bernhard Gellrich , Jens Kugler
发明人： Ulrich Weber , Jochen Becker , Hubert Holderer , Bernhard Gellrich , Jens Kugler
IPC分类号： G02B702
CPC分类号： G02B7/02
摘要： A mount for an optical element in an optical imaging device, in particular in a lens system (4) for semiconductor lithography, has at least one mounting ring (2) which bears the optical element (6). The mounting ring (2) is of at least partially hollow design in cross section.
摘要翻译：用于光学成像装置中的光学元件的安装件，特别是在用于半导体光刻的透镜系统（4）中，具有至少一个承载光学元件（6）的安装环（2）。安装环（2）的截面至少部分为中空设计。

8. 发明授权

US08542346B2 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations 有权
标题翻译：光学系统，具有可更换的可操作的校正装置，用于减少图像像差
公开(公告)号：US08542346B2
公开(公告)日：2013-09-24
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/52
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译：本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。操纵器可以与致动器一起以可变的方式形成。

9. 发明申请

US20120067833A1 SUPPORT ELEMENTS FOR AN OPTICAL ELEMENT 有权
标题翻译：支持光学元件的元素
公开(公告)号：US20120067833A1
公开(公告)日：2012-03-22
申请号：US13071165
申请日：2011-03-24
申请人： Jens Kugler , Ulrich Weber , Nicolai Wengert
发明人： Jens Kugler , Ulrich Weber , Nicolai Wengert
IPC分类号： H05K7/18
CPC分类号： G03F7/7015 , G02B7/003 , G02B7/02 , G03F7/70825
摘要： Support elements for an optical element and a method for supporting an optical element are disclosed. The disclosure can be used in connection with arbitrary optical apparatuses or optical imaging methods. In particular, the disclosure can be used in connection with the microlithography employed in the manufacture of microelectronic circuits.
摘要翻译：公开了用于光学元件的支撑元件和用于支撑光学元件的方法。本公开可以与任意光学装置或光学成像方法结合使用。特别地，本公开可以结合用于制造微电子电路的微光刻来使用。

10. 发明申请

US20120019798A1 POSITIONING UNIT AND ALIGNMENT DEVICE FOR AN OPTICAL ELEMENT 有权
标题翻译：光学元件的定位单元和对准装置
公开(公告)号：US20120019798A1
公开(公告)日：2012-01-26
申请号：US13230398
申请日：2011-09-12
申请人： Ulrich Weber , Jens Kugler
发明人： Ulrich Weber , Jens Kugler
IPC分类号： G03B27/54 , G02B7/02
CPC分类号： G02B7/005 , G02B7/003 , G02B7/004 , G02B7/02 , G02B7/023 , G02B7/1822 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： The disclosure provides a positioning unit for an optical element in a microlithographic projection exposure installation having a first connecting area for connection to the optical element, and having a second connecting area for connection to an object in the vicinity of the optical element.
摘要翻译：本公开提供了一种用于在微光刻投影曝光装置中的光学元件的定位单元，其具有用于连接到光学元件的第一连接区域，并且具有用于连接到光学元件附近的物体的第二连接区域。

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