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31. 发明授权

US07994872B2 Apparatus for multiple frequency power application 有权
标题翻译：多频电源设备
公开(公告)号：US07994872B2
公开(公告)日：2011-08-09
申请号：US12506658
申请日：2009-07-21
申请人： Steven C. Shannon , Jang Gyoo Yang , Matthew L. Miller , Kartik Ramaswamy , James P. Cruse
发明人： Steven C. Shannon , Jang Gyoo Yang , Matthew L. Miller , Kartik Ramaswamy , James P. Cruse
IPC分类号： H03H7/40
CPC分类号： H03H7/38
摘要： Apparatus and methods are provided for a power matching apparatus for use with a processing chamber. In one aspect of the invention, a power matching apparatus is provided including a first RF power input coupled to a first adjustable capacitor, a second RF power input coupled to a second adjustable capacitor, a power junction coupled to the first adjustable capacitor and the second adjustable capacitor, a receiver circuit coupled to the power junction, a high voltage filter coupled to the power junction and the high voltage filter has a high voltage output, a voltage/current detector coupled to the power junction and a RF power output connected to the voltage/current detector.
摘要翻译：提供了用于与处理室一起使用的功率匹配装置的装置和方法。在本发明的一个方面，提供了一种功率匹配装置，其包括耦合到第一可调电容器的第一RF功率输入端，耦合到第二可调电容器的第二RF功率输入端，耦合到第一可调电容器的功率端，耦合到功率结的接收器电路，耦合到功率结的高电压滤波器和高压滤波器具有高电压输出，耦合到功率结的电压/电流检测器和连接到功率结的RF功率输出电压/电流检测器。

32. 发明申请

US20110291771A1 APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION 有权
标题翻译：多种频率功率应用的设备
公开(公告)号：US20110291771A1
公开(公告)日：2011-12-01
申请号：US13205933
申请日：2011-08-09
申请人： Steven C. Shannon , Jang Gyoo Yang , Matthew L. Miller , Kartik Ramaswamy , James P. Cruse
发明人： Steven C. Shannon , Jang Gyoo Yang , Matthew L. Miller , Kartik Ramaswamy , James P. Cruse
IPC分类号： H03H7/40 , H03H7/38
CPC分类号： H03H7/38
摘要： Apparatus and methods are provided for a power matching apparatus for use with a processing chamber. In one aspect of the invention, a power matching apparatus is provided including a first RF power input coupled to a first adjustable capacitor, a second RF power input coupled to a second adjustable capacitor, a power junction coupled to the first adjustable capacitor and the second adjustable capacitor, a receiver circuit coupled to the power junction, a high voltage filter coupled to the power junction and the high voltage filter has a high voltage output, a voltage/current detector coupled to the power junction and a RF power output connected to the voltage/current detector.
摘要翻译：提供了用于与处理室一起使用的功率匹配装置的装置和方法。在本发明的一个方面，提供了一种功率匹配装置，其包括耦合到第一可调电容器的第一RF功率输入端，耦合到第二可调电容器的第二RF功率输入端，耦合到第一可调电容器的功率端，耦合到功率结的接收器电路，耦合到功率结的高电压滤波器和高压滤波器具有高电压输出，耦合到功率结的电压/电流检测器和连接到功率结的RF功率输出电压/电流检测器。

33. 发明授权

US08513889B2 Methods and apparatus for tuning matching networks 有权
标题翻译：调整匹配网络的方法和装置
公开(公告)号：US08513889B2
公开(公告)日：2013-08-20
申请号：US12899048
申请日：2010-10-06
申请人： Chunlei Zhang , Sergio F. Shoji , Andrey Semenin , Kartik Ramaswamy , James P. Cruse , Bryan Liao
发明人： Chunlei Zhang , Sergio F. Shoji , Andrey Semenin , Kartik Ramaswamy , James P. Cruse , Bryan Liao
IPC分类号： H03H7/38
CPC分类号： H03H7/40 , H01J37/32183 , H01J37/32935 , H05H1/46
摘要： Methods and apparatus for tuning matching networks are provided herein. A method of tuning a matching network includes providing a matching network coupling an RF source to a load, the matching network having a tunable element disposed at a first set point; increasing a value of the tunable element by a first step above the first set point; sensing a first adjusted value of a reflected RF power; decreasing the value of the tunable element by the first step below the first set point; sensing a second adjusted value of the reflected RF power; comparing the first and the second adjusted values of the reflected RF power; and moving the tunable element to a second set point that corresponds to a position having a lowest adjusted value of the reflected RF power. The method may be repeated until the reflected RF power falls within an acceptable reflected RF power range.
摘要翻译：本文提供了用于调整匹配网络的方法和装置。调整匹配网络的方法包括提供将RF源耦合到负载的匹配网络，所述匹配网络具有设置在第一设定点处的可调谐元件; 通过在第一设定点之上的第一步增加可调元件的值; 感测反射RF功率的第一调整值; 将可调谐元件的值降低到低于第一设定点的第一步; 感测反射RF功率的第二调整值; 比较反射RF功率的第一和第二调整值; 以及将所述可调元件移动到对应于具有所述反射RF功率的最低调整值的位置的第二设定点。可以重复该方法，直到反射的RF功率落在可接受的反射RF功率范围内。

34. 发明授权

US08237517B2 Apparatus for multiple frequency power application 有权
标题翻译：多频电源设备
公开(公告)号：US08237517B2
公开(公告)日：2012-08-07
申请号：US13205933
申请日：2011-08-09
申请人： Steven C. Shannon , Jang Gyoo Yang , Matthew L. Miller , Kartik Ramaswamy , James P. Cruse
发明人： Steven C. Shannon , Jang Gyoo Yang , Matthew L. Miller , Kartik Ramaswamy , James P. Cruse
IPC分类号： H03H7/38
CPC分类号： H03H7/38
摘要： Apparatus and methods are provided for a power matching apparatus for use with a processing chamber. In one aspect of the invention, a power matching apparatus is provided including a first RF power input coupled to a first adjustable capacitor, a second RF power input coupled to a second adjustable capacitor, a power junction coupled to the first adjustable capacitor and the second adjustable capacitor, a receiver circuit coupled to the power junction, a high voltage filter coupled to the power junction and the high voltage filter has a high voltage output, a voltage/current detector coupled to the power junction and a RF power output connected to the voltage/current detector.
摘要翻译：提供了用于与处理室一起使用的功率匹配装置的装置和方法。在本发明的一个方面，提供了一种功率匹配装置，其包括耦合到第一可调电容器的第一RF功率输入端，耦合到第二可调电容器的第二RF功率输入端，耦合到第一可调电容器的功率端，耦合到功率结的接收器电路，耦合到功率结的高电压滤波器和高压滤波器具有高电压输出，耦合到功率结的电压/电流检测器和连接到功率结的RF功率输出电压/电流检测器。

35. 发明授权

US08992689B2 Method for removing halogen-containing residues from substrate 有权
标题翻译：从底物中除去含卤素残留物的方法
公开(公告)号：US08992689B2
公开(公告)日：2015-03-31
申请号：US13408703
申请日：2012-02-29
申请人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
发明人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
IPC分类号： B08B5/00 , H01J37/32 , H01L21/67
CPC分类号： H01J37/32357 , H01L21/67201
摘要： Methods for removing halogen-containing residues from a substrate are provided. By combining the heat-up and plasma abatement steps, the manufacturing throughput can be improved. Further, by appropriately controlling the pressure in the abatement chamber, the removal efficiency can be improved as well.
摘要翻译：提供从底物中除去含卤素残基的方法。通过结合加热和等离子体消除步骤，可以提高制造产量。此外，通过适当地控制减压室中的压力，也可以提高除去效率。

36. 发明授权

US08845816B2 Method extending the service interval of a gas distribution plate 有权
标题翻译：方法延长气体分配板的使用间隔
公开(公告)号：US08845816B2
公开(公告)日：2014-09-30
申请号：US13408709
申请日：2012-02-29
申请人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
发明人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
IPC分类号： B08B5/00 , C23C16/44
CPC分类号： B08B5/00 , C23C16/44 , C23C16/4408 , H01J37/32449 , H01J37/32724 , H01J37/32862 , Y10T137/0419
摘要： Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.
摘要翻译：提供减少气体分布板污染的方法。在一个实施例中，一种用于处理衬底的方法包括将衬底转移到腔室中，在衬底上执行处理过程，并且在处理过程之前或之后向室中提供净化气体，以相对于处理过程从房间。处理过程包括通过气体分配板将反应气体分配到室中。

37. 发明授权

US08562742B2 Apparatus for radial delivery of gas to a chamber and methods of use thereof 失效
标题翻译：用于将气体径向输送到室的装置及其使用方法
公开(公告)号：US08562742B2
公开(公告)日：2013-10-22
申请号：US12907947
申请日：2010-10-19
申请人： Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
发明人： Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
IPC分类号： C23C16/00 , C23C16/455 , H01L21/3065
CPC分类号： H01L21/67017 , H01L21/67115 , H01L21/6719 , H01L21/67201 , H01L21/68785 , Y10T137/6416 , Y10T137/8593
摘要： Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.
摘要翻译：本文提供了将气体输送到室的装置及其使用方法。在一些实施例中，用于处理室的气体分配系统可以包括主体，其具有构造成将主体连接到处理室的内表面的第一表面，主体具有穿过主体设置的开口; 靠近所述开口的与所述主体的第一表面相对的第一端附近的凸缘，所述凸缘向内延伸到所述开口中并且构造成在其上支撑窗户; 以及多个气体分配通道，其设置在所述主体内并且将设置在所述主体内并且围绕所述开口的通道流体连接到设置在所述凸缘中的多个孔，其中所述多个孔围绕所述凸缘径向设置。

38. 发明申请

US20120222699A1 METHOD FOR REMOVING HALOGEN-CONTAINING RESIDUES FROM SUBSTRATE 有权
标题翻译：从基材中除去含有卤素的残留物的方法
公开(公告)号：US20120222699A1
公开(公告)日：2012-09-06
申请号：US13408703
申请日：2012-02-29
申请人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
发明人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
IPC分类号： B08B7/04 , B08B5/00
CPC分类号： H01J37/32357 , H01L21/67201
摘要： Methods for removing halogen-containing residues from a substrate are provided. By combining the heat-up and plasma abatement steps, the manufacturing throughput can be improved. Further, by appropriately controlling the pressure in the abatement chamber, the removal efficiency can be improved as well.
摘要翻译：提供了从底物中除去含卤素残基的方法。通过结合加热和等离子体消除步骤，可以提高制造产量。此外，通过适当地控制减压室中的压力，也可以提高除去效率。

39. 发明授权

US08707754B2 Methods and apparatus for calibrating flow controllers in substrate processing systems 有权
标题翻译：校准基板处理系统中流量控制器的方法和装置
公开(公告)号：US08707754B2
公开(公告)日：2014-04-29
申请号：US12915345
申请日：2010-10-29
申请人： James P. Cruse , John W. Lane , Mariusch Gregor , Duc Buckius , Berrin Daran , Corie Lynn Cobb , Ming Xu , Andrew Nguyen
发明人： James P. Cruse , John W. Lane , Mariusch Gregor , Duc Buckius , Berrin Daran , Corie Lynn Cobb , Ming Xu , Andrew Nguyen
IPC分类号： G01F25/00 , H01L21/66 , F16K37/00 , H01L21/67 , H01L21/306 , H01L21/36
CPC分类号： H01L21/67253 , F16K37/00 , F16K37/0091 , G01F25/00 , Y10T29/53022 , Y10T137/8158 , Y10T137/87153 , Y10T137/87684 , Y10T137/877
摘要： Methods and apparatus for calibrating a plurality of gas flows in a substrate processing system are provided herein. In some embodiments, a substrate processing system may include a cluster tool comprising a first process chamber and a second process chamber coupled to a central vacuum transfer chamber; a first flow controller to provide a process gas to the first process chamber; a second flow controller to provide the process gas to the second process chamber; a mass flow verifier to verify a flow rate from each of the first and second flow controllers; a first conduit to selectively couple the first flow controller to the mass flow verifier; and a second conduit to selectively couple the second flow controller to the mass flow verifier.
摘要翻译：本文提供了用于校准衬底处理系统中的多个气流的方法和装置。在一些实施例中，衬底处理系统可以包括簇工具，其包括耦合到中心真空传送室的第一处理室和第二处理室; 第一流量控制器，用于向第一处理室提供处理气体; 第二流量控制器，用于向第二处理室提供处理气体; 质量流量验证器，用于验证来自所述第一和第二流量控制器中的每一个的流量; 用于选择性地将第一流量控制器耦合到质量流量验证器的第一导管; 以及用于选择性地将第二流量控制器耦合到质量流量验证器的第二导管。

40. 发明申请

US20120222752A1 METHOD EXTENDING THE SERVICE INTERVAL OF A GAS DISTRIBUTION PLATE 有权
标题翻译：方法扩展气体分配板的服务间隔
公开(公告)号：US20120222752A1
公开(公告)日：2012-09-06
申请号：US13408709
申请日：2012-02-29
申请人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
发明人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
IPC分类号： B08B5/00
CPC分类号： B08B5/00 , C23C16/44 , C23C16/4408 , H01J37/32449 , H01J37/32724 , H01J37/32862 , Y10T137/0419
摘要： Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.
摘要翻译：提供减少气体分布板污染的方法。在一个实施例中，一种用于处理衬底的方法包括将衬底转移到腔室中，在衬底上执行处理过程，并且在处理过程之前或之后向室中提供净化气体，以相对于处理过程从房间。处理过程包括通过气体分配板将反应气体分配到室中。

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