专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明申请

US20050276027A1 Electronic device for shielding EMI 审中-公开
标题翻译：用于屏蔽EMI的电子设备
公开(公告)号：US20050276027A1
公开(公告)日：2005-12-15
申请号：US11142529
申请日：2005-06-01
申请人： Ling-Ling Shen , Yu-Xiang Wang , Hui Chen
发明人： Ling-Ling Shen , Yu-Xiang Wang , Hui Chen
IPC分类号： G12B17/02 , H05K1/02 , H05K9/00
CPC分类号： H05K9/0037 , H05K1/0218 , H05K2201/09354 , H05K2201/10371
摘要： A electronic device for shielding electromagnetic interference (EMI) including a metal shield, a printed circuit board (PCB) having a ground layer, and a number of ground pads arranged at edges of the PCB and in electrical conductivity with the ground layer. The ground pads lies close to edges of the metal shield. During solder reflowing process, solder is laid on the ground pads, and a height of the solder is adjusted to meet spaces or gaps of the shield. When the PCB is placed into the shield, the solder on the ground pads is in electrical conductivity with the metal shield to eliminate spaces or gaps thereof. So the EMI coupling which causes EMI signals interfering with sensitive components is avoided.
摘要翻译：一种用于屏蔽包括金属屏蔽的电磁干扰（EMI）的电子设备，具有接地层的印刷电路板（PCB）和布置在PCB的边缘处并与接地层导电的多个接地焊盘。接地垫靠近金属屏蔽层的边缘。在焊锡回流过程中，将焊料铺设在接地焊盘上，并调整焊料的高度以满足屏蔽层的空间或间隙。当PCB被放置在屏蔽层中时，接地焊盘上的焊料与金属屏蔽层导电，以消除其间隙或间隙。因此避免了导致EMI信号干扰敏感元件的EMI耦合。

32. 发明申请

US20050211276A1 Lid for a semiconductor device processing apparatus and methods for using the same 审中-公开
标题翻译：用于半导体器件处理装置的盖子及其使用方法
公开(公告)号：US20050211276A1
公开(公告)日：2005-09-29
申请号：US11080361
申请日：2005-03-15
申请人： Joseph Yudovsky , Hui Chen , Gary Ettinger
发明人： Joseph Yudovsky , Hui Chen , Gary Ettinger
IPC分类号： B08B3/02 , B08B3/12 , B08B3/14 , B08B13/00 , H01L21/00
CPC分类号： H01L21/67126 , B08B3/02 , B08B3/12 , B08B13/00 , H01L21/67051
摘要： A lid for a semiconductor device processing apparatus is provided. The lid includes a cover having an opening and may include (1) a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening; (2) an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover; (3) an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover; and/or (4) a rinsing mechanism adapted to rinse a top surface of the cover. Numerous other aspects are provided.
摘要翻译：提供了一种用于半导体器件处理设备的盖子。盖子包括具有开口的盖，并且可以包括（1）围绕开口形成的壁，所述壁适于防止存在于盖上的流体通过开口进入处理装置的主体; （2）外门，其适于防止流体通过盖的打开进入加工设备的主体; （3）内门，其联接到所述外门并且适于防止流体通过所述盖的打开而离开所述处理设备的主体; 和/或（4）适于冲洗所述盖的顶表面的冲洗机构。提供了许多其他方面。

33. 发明申请

US20050066778A1 WRENCH CAPABLE OF CLAMPING A SCREWED MEMBER AND PREVENTING THE SCREWED MEMBER FROM SLIPPING OUT OF A SOCKET OF THE WRENCH AND PERMITTING THE SCREWED MEMBER TO PASS THROUGH THE SOCKET 有权
标题翻译：扳手能够夹紧一个螺丝的会员，并防止螺丝的会员从扳手的插座中滑出并允许螺丝的会员通过插座
公开(公告)号：US20050066778A1
公开(公告)日：2005-03-31
申请号：US10673274
申请日：2003-09-30
申请人： Hui Chen
发明人： Hui Chen
IPC分类号： B25B13/04 , B25B23/10 , B25B13/02
CPC分类号： B25B23/101 , B25B13/04
摘要： A wrench including a stem having a head section at one end of the stem and a polygonal socket formed in the head section for fitting onto a screwed member. A resilient ring is disposed at the head section and pivotally connected with a controlling switch pivotally disposed at the head section. By means of operating the controlling switch, the resilient ring is driven to expand or close. In the closed position, the resilient ring obstructs at least one inner angle of the socket to prevent the screwed member from detaching out of the socket and clamp the screwed member in the socket. In the expanded position, the resilient ring frees the inner angle, permitting the screwed member to freely pass through the socket.
摘要翻译：一种扳手，其包括在杆的一端具有头部部分的杆，以及形成在头部中用于装配到螺纹部件上的多边形插座。弹性环设置在头部，并与枢转地设置在头部的控制开关枢转连接。通过操作控制开关，弹性环被驱动以膨胀或关闭。在关闭位置，弹性环阻挡插座的至少一个内角，以防止螺纹部件脱离插座并将螺纹部件夹紧在插座中。在扩展位置，弹性环释放内角，允许螺纹构件自由地穿过插座。

34. 发明申请

US20050009342A1 Method for etching an organic anti-reflective coating (OARC) 审中-公开
标题翻译：蚀刻有机抗反射涂层（OARC）的方法
公开(公告)号：US20050009342A1
公开(公告)日：2005-01-13
申请号：US10616098
申请日：2003-07-08
申请人： Hui Chen , Chun Yan
发明人： Hui Chen , Chun Yan
IPC分类号： H01L21/302 , H01L21/311 , H01L21/461
CPC分类号： H01L21/31138 , H01L21/31144
摘要： A method for etching an organic anti-reflective coating (OARC) using a halogen-free gas chemistry is disclosed. The organic anti-reflective coating (OARC) is etched using a gas mixture comprising at least one of a hydrocarbon-containing gas and an oxygen-containing gas. The method provides high etch selectivity for the organic anti-reflective coating (OARC) over metal layers (e.g., copper (Cu), aluminum (Al), and the like) or dielectric layers (silicon dioxide (SiO2), and the like).
摘要翻译：公开了一种使用无卤素气体化学蚀刻有机抗反射涂层（OARC）的方法。使用包含含烃气体和含氧气体中的至少一种的气体混合物来蚀刻有机抗反射涂层（OARC）。该方法对金属层（例如铜（Cu），铝（Al）等）或电介质层（二氧化硅（SiO 2）等）上的有机抗反射涂层（OARC）提供高蚀刻选择性，。

35. 发明授权

US06762127B2 Etch process for dielectric materials comprising oxidized organo silane materials 失效
标题翻译：包括氧化有机硅烷材料的电介质材料的蚀刻工艺
公开(公告)号：US06762127B2
公开(公告)日：2004-07-13
申请号：US09938432
申请日：2001-08-23
申请人： Yves Pierre Boiteux , Hui Chen , Ivano Gregoratto , Chang-Lin Hsieh , Hoiman Hung , Sum-Yee Betty Tang
发明人： Yves Pierre Boiteux , Hui Chen , Ivano Gregoratto , Chang-Lin Hsieh , Hoiman Hung , Sum-Yee Betty Tang
IPC分类号： H01L21304
CPC分类号： H01L21/76808 , H01L21/02126 , H01L21/02164 , H01L21/022 , H01L21/02211 , H01L21/02274 , H01L21/31116 , H01L21/31633 , H01L21/76802 , H01L21/76807 , H01L2221/1036
摘要： The present invention provides a novel etching technique for etching a layer of C-doped silicon oxide, such as a partially oxidized organo silane material. This technique, employing CH2F2/Ar chemistry at low bias and low to intermediate pressure, provides high etch selectivity to silicon oxide and improved selectivity to organic photoresist. Structures including a layer of partially oxidized organo silane material (1004) deposited on a layer of silicon oxide (1002) were etched according to the novel technique, forming relatively narrow trenches (1010, 1012, 1014, 1016, 1030, 1032, 1034 and 1036) and wider trenches (1020, 1022, 1040 and 1042). The technique is also suitable for forming dual damascene structures (1152, 1154 and 1156). In additional embodiments, manufacturing systems (1410) are provided for fabricating IC structures of the present invention. These systems include a controller (1400) that is adapted for interacting with a plurality of fabricating stations (1420, 1422, 1424, 1426 and 1428).
摘要翻译：本发明提供一种用于蚀刻C掺杂氧化硅层的新颖蚀刻技术，例如部分氧化的有机硅烷材料。这种在低偏压和低至中压下使用CH2F2 / Ar化学的技术为氧化硅提供了高蚀刻选择性，并提高了对有机光致抗蚀剂的选择性。根据新技术蚀刻包括沉积在氧化硅层（1002）上的部分氧化的有机硅烷材料层（1004）的结构，形成相对窄的沟槽（1010,1012,1014,1016,1030,1032,1034和 1036）和较宽的沟槽（1020,1022,1040和1042）。该技术也适用于形成双镶嵌结构（1152,1154和1156）。在另外的实施例中，提供制造系统（1410）用于制造本发明的IC结构。这些系统包括适于与多个制造站（1420,1422,1424,1426和1428）相互作用的控制器（1400）。

36. 发明授权

US06400116B1 Motor drive control apparatus 有权
标题翻译：电机驱动控制装置
公开(公告)号：US06400116B1
公开(公告)日：2002-06-04
申请号：US09485394
申请日：2000-02-09
申请人： Hui Chen , Kouji Matsuda
发明人： Hui Chen , Kouji Matsuda
IPC分类号： G05B1128
CPC分类号： H02P6/006 , H02P6/10 , H02P2209/07
摘要： A motor drive control system suitable for control of a drive of a motor, such as a brushless motor or a linear motor, having a plurality of excitation phases, through the use of rectangular waves. A drive means is provided for producing an excitation signal to be supplied to each of the excitation phases of the motor and a control means for determining a direction of the excitation signal for each of the excitation phases and for conducting ON/OFF switching. The control means controls the rate of change of the excitation signal to be switched at the switching operation.
摘要翻译：一种适用于通过使用矩形波来控制具有多个激励相位的诸如无刷电动机或线性电动机的电动机的驱动的电动机驱动控制系统。提供驱动装置，用于产生要提供给电动机的每个励磁相的激励信号;以及控制装置，用于确定每个激励相的激励信号的方向和用于进行ON / OFF切换。控制装置控制在切换操作时切换的激励信号的变化率。

37. 发明授权

US5789427A Methods and compositions for inhibiting cell proliferative disorders 失效
公开(公告)号：US5789427A
公开(公告)日：1998-08-04
申请号：US399967
申请日：1995-03-07
申请人： Hui Chen , Aviv Gazit , Klaus Peter Hirth , Elaina Mann , Laura K. Shawver , Jianming Tsai , Peng Cho Tang
发明人： Hui Chen , Aviv Gazit , Klaus Peter Hirth , Elaina Mann , Laura K. Shawver , Jianming Tsai , Peng Cho Tang
IPC分类号： A61K31/245 , A61K31/277 , A61K31/415 , A61K31/4184 , A61K31/4402 , A61K31/498 , A61K31/517 , C07C229/60 , C07C255/36 , C07C255/37 , C07C255/41 , C07C255/42 , C07C255/66 , C07C311/27 , C07C317/46 , C07C327/44 , C07D241/52 , A01N43/40 , C07D211/72
CPC分类号： C07D241/52 , A61K31/245 , A61K31/277 , A61K31/415 , A61K31/4184 , A61K31/4402 , A61K31/498 , A61K31/517 , C07C229/60 , C07C255/36 , C07C255/37 , C07C255/41 , C07C255/42 , C07C255/66 , C07C311/27 , C07C317/46 , C07C327/44
摘要： The present invention concerns compounds and their use to inhibit the activity of a receptor tyrosine kinase. The invention is preferably used to treat cell proliferative disorders such as cancers characterized by over-activity or inappropriate activity HER2 or EGFR.

38. 发明授权

US5773476A Methods and compositions for inhibiting cell proliferative disorders 失效
公开(公告)号：US5773476A
公开(公告)日：1998-06-30
申请号：US486775
申请日：1995-06-07
申请人： Hui Chen , Aviv Gazit , Alexander Levitzki , Klaus Peter Hirth , Elaina Mann , Laura K. Shawver , Jianming Tsai , Peng Cho Tang
发明人： Hui Chen , Aviv Gazit , Alexander Levitzki , Klaus Peter Hirth , Elaina Mann , Laura K. Shawver , Jianming Tsai , Peng Cho Tang
IPC分类号： A61K31/245 , A61K31/277 , A61K31/415 , A61K31/4184 , A61K31/4402 , A61K31/498 , A61K31/517 , C07C229/60 , C07C255/36 , C07C255/37 , C07C255/41 , C07C255/42 , C07C255/66 , C07C311/27 , C07C317/46 , C07C327/44 , C07D241/52 , A01N37/18
CPC分类号： C07D241/52 , A61K31/245 , A61K31/277 , A61K31/415 , A61K31/4184 , A61K31/4402 , A61K31/498 , A61K31/517 , C07C229/60 , C07C255/36 , C07C255/37 , C07C255/41 , C07C255/42 , C07C255/66 , C07C311/27 , C07C317/46 , C07C327/44
摘要： The present invention concerns compounds and their use to inhibit the activity of a receptor tyrosine kinase. The invention is preferably used to treat cell proliferative disorders such as cancers charcterized by over-activity or inappropriate activity HER2 or EGFR.

39. 发明授权

US5226747A Adaptive control artificial wavemaking device 失效
标题翻译：自适应控制人造波制造装置
公开(公告)号：US5226747A
公开(公告)日：1993-07-13
申请号：US934408
申请日：1992-08-24
申请人： Yichang Wang , Shaohong Chen , Chengdong Mu , Hong Shi , Hui Chen , Jianping Yuan
发明人： Yichang Wang , Shaohong Chen , Chengdong Mu , Hong Shi , Hui Chen , Jianping Yuan
IPC分类号： A47K3/10 , E04H4/00
CPC分类号： A47K3/10 , E04H4/0006
摘要： An adaptive control artificial wavemaking device comprises an air blower as shock wave source. According to the invention, the device further comprises a control system consisted of a float, a sensor, a control circuit and electromagnetic actuators; butterfly valves; and air chamber for generating shock wave. When the sensor receives signals from the flaot, the signals are transferred through the control circuit to actuate the electromagnetic actuators to control opening and closing of said butterfly valves to enable the air chamber to generate a shock wave which is in resonance with the water wave. The device may further comprises an oscillator for generating shock wave of a given frequence during starting. The device according to the invention has the advantage of similified structure, low mangufacture cost and low energy consumption, thus it may be widely used for aquatic breeding, sport, recreation and medical facilities.
摘要翻译：一种自适应控制人造波浪装置，包括作为冲击波源的鼓风机。根据本发明，该装置还包括由浮子，传感器，控制电路和电磁致动器组成的控制系统; 蝶阀; 和产生冲击波的气室。当传感器接收到来自火焰的信号时，信号通过控制电路传送，以启动电磁致动器来控制所述蝶阀的打开和关闭，以使空气室产生与水波共振的冲击波。该装置还可以包括用于在启动期间产生给定频率的冲击波的振荡器。根据本发明的装置具有结构相似，制造成本低，能耗低的优点，因此可广泛用于水产养殖，运动，娱乐和医疗设施。

40. 外观设计

USD861137S1 Faucet 有权
公开(公告)号：USD861137S1
公开(公告)日：2019-09-24
申请号：US29643387
申请日：2018-04-08
申请人： Hui Chen
设计人： Hui Chen
摘要： FIG. 1 is a perspective view of the faucet showing my new design;
FIG. 2 is a right view thereof;
FIG. 3 is a left view thereof;
FIG. 4 is a front view thereof;
FIG. 5 is a rear view thereof;
FIG. 6 is a top perspective view thereof; and,
FIG. 7 is a bottom perspective view thereof.
The dashed broken lines depict portions of the faucet that form no part of the claim.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式