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31. 发明申请

US20100123192A1 SEMICONDUCTOR COMPONENT AND METHOD OF MANUFACTURE 有权
公开(公告)号：US20100123192A1
公开(公告)日：2010-05-20
申请号：US12271083
申请日：2008-11-14
申请人： Peter A. Burke , Duane B. Barber , Brian Pratt
发明人： Peter A. Burke , Duane B. Barber , Brian Pratt
IPC分类号： H01L29/78 , H01L21/28
CPC分类号： H01L29/66727 , H01L29/407 , H01L29/41766 , H01L29/42376 , H01L29/456 , H01L29/4933 , H01L29/66734 , H01L29/7809 , H01L29/7811 , H01L29/7813
摘要： A semiconductor component that includes gate electrodes and shield electrodes and a method of manufacturing the semiconductor component. A semiconductor material has a device region, a gate contact region, a termination region, and a drain contact region. One or more device trenches is formed in the device region and one or more termination trenches is formed in the edge termination region. Shielding electrodes are formed in portions of the device trenches that are adjacent their floors. A gate dielectric material is formed on the sidewalls of the trenches in the device region and gate electrodes are formed over and electrically isolated from the shielding electrodes. The gate electrodes in the trenches in the device region are connected to the gate electrodes in the trenches in the gate contact region. The shielding electrodes in the trenches in the device region are connected to the shielding electrodes in the termination region.

32. 发明申请

US20090315142A1 Semiconductor component and method of manufacture 有权
标题翻译：半导体元件及制造方法
公开(公告)号：US20090315142A1
公开(公告)日：2009-12-24
申请号：US12549100
申请日：2009-08-27
申请人： Peter A. Burke , Sallie Hose , Sudhama C. Shastri
发明人： Peter A. Burke , Sallie Hose , Sudhama C. Shastri
IPC分类号： H01L29/86 , H01L21/02
CPC分类号： H01L23/5223 , H01L21/76801 , H01L21/76807 , H01L21/76846 , H01L23/5227 , H01L23/5228 , H01L23/53238 , H01L28/20 , H01L28/40 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor component that includes an integrated passive device and method for manufacturing the semiconductor component. Vertically integrated passive devices are manufactured above a substrate. In accordance with one embodiment, a resistor is manufactured in a first level above a substrate, a capacitor is manufactured in a second level that is vertically above the first level, and a copper inductor is manufactured in a third level that is vertically above the second level. The capacitor has aluminum plates. In accordance with another embodiment, a resistor is manufactured in a first level above a substrate, a copper inductor is manufactured in a second level that is vertically above the first level, and a capacitor is manufactured in a third level that is vertically above the second level. The capacitor may have aluminum plates or a portion of the copper inductor may serve as one of its plates.
摘要翻译：一种包括集成无源器件的半导体部件和用于制造半导体部件的方法。在衬底上方制造垂直集成的无源器件。根据一个实施例，在基板上方的第一电平中制造电阻器，在垂直于第一电平的第二电平上制造电容器，并且在垂直于第二电平的第三电平上制造铜电感器水平。电容器有铝板。根据另一个实施例，在基板上方的第一电平中制造电阻器，在垂直于第一电平的第二电平上制造铜电感器，并且制造在垂直于第二电平的第三电平的电容器水平。电容器可以具有铝板，或者铜电感器的一部分可以用作其板之一。

33. 发明授权

US07115425B2 Integrated circuit process monitoring and metrology system 有权
标题翻译：集成电路过程监控与计量系统
公开(公告)号：US07115425B2
公开(公告)日：2006-10-03
申请号：US11072127
申请日：2005-03-04
申请人： Peter A. Burke , Eric J. Kirchner , James R. B. Elmer
发明人： Peter A. Burke , Eric J. Kirchner , James R. B. Elmer
IPC分类号： H01L21/66
CPC分类号： H01L22/34 , H01L21/31053
摘要： A method for monitoring polishing process parameters for an integrated circuit structure on a substrate. A first metrology site is constructed on the substrate. The first metrology site represents a design extreme of a high density integrated circuit structure. The first metrology site is formed by placing a relatively small horizontal surface area trench within a relatively large surface area field of a polish stop material. A second metrology site is also constructed on the substrate. The second metrology site represents a design extreme of a low density integrated circuit structure. The second metrology site is formed by placing a relatively large horizontal surface area trench within a relatively small surface area field of a polish stop material. The substrate is covered with a layer of an insulating material, thereby at least filling the trenches. A target thickness of the insulating material necessary to leave the trenches substantially filled to a top surface of the field of polish stop material is calculated. The substrate is polished until a first thickness of the insulating material in the trench of the first metrology site is no more than the target thickness. A second thickness of the insulating material in the trench of the second metrology site is measured, and values based on the first thickness and the second thickness are monitored as the polishing process parameters for the integrated circuit structure.
摘要翻译：一种用于监测基板上的集成电路结构的抛光工艺参数的方法。第一个计量站点被构建在基板上。第一个测量站点代表了高密度集成电路结构的设计极限。第一计量站点是通过在抛光停止材料的相对大的表面区域内放置相对较小的水平表面区域沟槽而形成的。第二个计量站点也在基板上构建。第二个测量站点是低密度集成电路结构的设计极限。第二计量站点通过在抛光停止材料的相对小的表面区域内放置相对较大的水平表面区域沟槽而形成。衬底被绝缘材料层覆盖，从而至少填充沟槽。计算出将沟槽基本上填充到抛光停止材料领域的顶表面所需的绝缘材料的目标厚度。抛光衬底直到第一测量点的沟槽中的绝缘材料的第一厚度不超过目标厚度。测量第二测量位置的沟槽中的绝缘材料的第二厚度，并且监测基于第一厚度和第二厚度的值作为用于集成电路结构的抛光工艺参数。

34. 发明授权

US06168640A Chemical-mechanical polishing slurry that reduces wafer defects 有权
公开(公告)号：US06168640A
公开(公告)日：2001-01-02
申请号：US09280391
申请日：1999-03-29
申请人： Peter A. Burke , Peter J. Beckage
发明人： Peter A. Burke , Peter J. Beckage
IPC分类号： C09K314
CPC分类号： C09K3/1463 , C09G1/02
摘要： A method of making a chemical-mechanical polishing slurry includes mixing a ferric salt oxidizer with a solution to produce a mixture with a dissolved ferric salt oxidizer, filtering the mixture to remove most preexisting particles therein that exceed a selected particle size, adding a suspension agent to the mixture, and adding abrasive particles to the mixture after filtering the mixture. Advantageously, when polishing occurs, scratching by the preexisting particles is dramatically reduced.

35. 发明授权

US6110294A Apparatus and method for cleaning semiconductor wafer 失效
标题翻译：用于清洁半导体晶片的装置和方法
公开(公告)号：US6110294A
公开(公告)日：2000-08-29
申请号：US60521
申请日：1998-04-14
申请人： Kevin D. Shipley , Peter A. Burke
发明人： Kevin D. Shipley , Peter A. Burke
IPC分类号： B08B1/04 , B24B37/04 , B24D13/14 , H01L21/00 , B08B11/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A method and apparatus for cleaning a semiconductor wafer. The apparatus preferably includes a brush holder that may include a base and a connection stud extending from the base. The base preferably includes a receiving lip for receiving a brush that is disposed on its lower surface. The brush preferably includes a substantially flexible material and a plurality of protrusions for contacting a semiconductor wafer. A backing plate preferably is attached to one side of the brush for connecting the brush to the brush holder. The backing plate preferably further includes an outer edge capable of forming a snap-fit engagement within the receiving lip of the brush holder to: (a) facilitate periodic replacement of the brush and (b) form a mechanical connection between the brush and brush holder that can withstand the presence of relatively basic or acidic cleaning agents. A rotatable shaft is connected to the connection stud. The rotatable shaft includes a conduit running through the shaft for flowing cleaning fluid through a borehole in the connection stud and brush holder and through an opening in the backing plate and brush so that cleaning fluid may be directly dispensed through the shaft conduit to the wafer. This cleaning fluid disbursement technique improves cleaning and prevents particles from being left behind as the brush is removed from the wafer.
摘要翻译：一种用于清洁半导体晶片的方法和装置。该装置优选地包括可以包括基部的电刷架和从底座延伸的连接柱。基部优选地包括用于接收设置在其下表面上的刷子的接收唇缘。刷子优选地包括基本上柔性的材料和用于接触半导体晶片的多个突起。背板优选地附接到刷子的一侧以将刷子连接到刷子保持器。背板优选还包括外边缘，其能够在电刷架的接收唇缘内形成卡扣配合接合，以便：（a）促进电刷的定期更换，和（b）在电刷和电刷架之间形成机械连接可以承受相对碱性或酸性清洁剂的存在。可旋转轴连接到连接柱。旋转轴包括一个穿过轴的导管，用于使清洁流体流过连接螺柱和电刷架中的钻孔，并穿过背板和刷子中的开口，使清洗流体可以通过轴导管直接分配到晶片。这种清洁液支付技术改进了清洁，并且防止当刷子从晶片上移除时颗粒被留下。

36. 发明授权

US5932328A Coating composition for hard surfaces 失效
标题翻译：硬表面涂层组成
公开(公告)号：US5932328A
公开(公告)日：1999-08-03
申请号：US626633
申请日：1996-04-01
申请人： Peter A. Burke , Kenneth J. Flanagan , Abul Mansur
发明人： Peter A. Burke , Kenneth J. Flanagan , Abul Mansur
IPC分类号： B05D5/08 , B32B7/02 , B32B27/06 , B32B27/32 , B32B27/34
CPC分类号： B05D5/083 , Y10T428/24942 , Y10T428/3154 , Y10T428/31544 , Y10T428/31663
摘要： A furniture surface having a coating consisting of a bottom layer comprising a silicone oil adjacent to the furniture surface and a top layer comprising an oil having a specific gravity less than the silicone oil in the bottom layer and a water repelling film-forming fluorinated polymer. The coating may consist of a bottom layer comprising a silicone oil adjacent to the furniture surface, an intermediate layer comprising a water repelling film-forming fluorinated polymer, and a top layer comprising an oil having a specific gravity less than the silicone oil in the bottom layer. The coating may also consist of a bottom layer comprising a silicone oil adjacent to the furniture surface, an intermediate layer comprising an oil having a specific gravity less than the silicone oil in the bottom layer, and a top layer comprising a water repelling film-forming fluorinated polymer.
摘要翻译：一种家具表面，其具有包括邻近家具表面的硅油的底层的涂层和包含比重小于底层中的硅油的油的顶层和防水膜形成氟化聚合物。该涂层可以由包含与家具表面相邻的硅油的底层组成，中间层包括形成防水膜的氟化聚合物，以及包含比重小于底部硅油的油的顶层层。该涂层还可以由包含与家具表面相邻的硅油的底层构成，包含比重小于底层中的硅油的油的中间层和包含防水成膜剂的顶层氟化聚合物。

37. 发明授权

US5386832A Liver function breath test using aromatic amino acids 失效
标题翻译：肝功能呼气试验采用芳香族氨基酸
公开(公告)号：US5386832A
公开(公告)日：1995-02-07
申请号：US75662
申请日：1993-06-11
申请人： David A. Wagner , Martin A. Baker , Peter A. Burke , R. Amour Forse , John D. Palombo , Bruce R. Bistrian
发明人： David A. Wagner , Martin A. Baker , Peter A. Burke , R. Amour Forse , John D. Palombo , Bruce R. Bistrian
IPC分类号： A61K51/04 , A61K51/12 , A61B5/08 , A61B6/00
CPC分类号： A61K51/1206 , A61K51/0406
摘要： A test for determining hepatic function has been developed. This test uses oral administration of isotope labeled phenylalanine or tyrosine, particularly .sup.13 C-phenylalanine, in a rapid breath test. In the preferred mode, the breath sample is analyzed using a mass spectrometer and compared with a standard. The breath test provides a dynamic rather than static determination of hepatic function and can be used for both early and late stage liver problems.
摘要翻译：已经开发了一种测定肝功能的试验。该测试在快速呼吸试验中使用同位素标记的苯丙氨酸或酪氨酸，特别是13 C-苯丙氨酸的口服给药。在优选模式中，使用质谱仪分析呼吸样本并与标准进行比较。呼吸试验提供肝功能的动态而非静态测定，可用于早期和晚期肝脏问题。

38. 发明授权

US5344811A Method for dispensing compositions in an aqueous system 失效
标题翻译：在水性体系中分配组合物的方法
公开(公告)号：US5344811A
公开(公告)日：1994-09-06
申请号：US047780
申请日：1993-04-15
申请人： Charles J. Bunczk , Peter A. Burke
发明人： Charles J. Bunczk , Peter A. Burke
IPC分类号： C11D3/48 , A01N25/30 , A01N25/00 , C05G3/02
CPC分类号： C11D3/485
摘要： A method for dispensing an emulsion or a water soluble composition in an aqueous medium comprising the steps of introducing said water soluble composition and at least one non-ionic or anionic surfactant into water so that the resulting concentration of surfactant or surfactant mixture in the water is less than the critical micelle concentration.
摘要翻译：一种在水性介质中分配乳液或水溶性组合物的方法，包括以下步骤：将水溶性组合物和至少一种非离子或阴离子表面活性剂引入水中，使得所得到的水中表面活性剂或表面活性剂混合物的浓度为小于临界胶束浓度。

39. 发明授权

US4911858A Toilet bowl cleaner 失效
标题翻译：厕所清洁剂
公开(公告)号：US4911858A
公开(公告)日：1990-03-27
申请号：US244736
申请日：1988-09-15
申请人： Charles J. Bunczk , Peter A. Burke , William R. Camp
发明人： Charles J. Bunczk , Peter A. Burke , William R. Camp
IPC分类号： C11D3/22 , C11D3/37 , C11D3/382 , C11D17/00 , C11D17/04
CPC分类号： C11D3/222 , C11D17/0056 , C11D3/3707 , C11D3/382
摘要： Solid cake lavoratory cleansing block compositions comprising polyethylene glycol polymer and guar gum, and optional ingredients which include fragrances, dyes, solid binders, filler material and mixtures thereof.

40. 发明授权

US07988911B2 Method for removal of vaporized hydrogen peroxide from a region 有权
标题翻译：从区域去除蒸发的过氧化氢的方法
公开(公告)号：US07988911B2
公开(公告)日：2011-08-02
申请号：US12939239
申请日：2010-11-04
申请人： Michael A. Centanni , Peter A. Burke
发明人： Michael A. Centanni , Peter A. Burke
IPC分类号： A61L9/00 , A62B7/08
CPC分类号： A61L2/208 , A61L2/202 , A61L2/206 , A61L9/015 , A61L2202/13
摘要： A method and apparatus for aerating a region exposed to a gaseous/vaporous sterilant. A catalytic destroyer and a reactive chemical unit are used to reduce the concentration of the gaseous/vaporous sterilant within the region. The reactive chemical unit includes a chemistry that is chemically reactive with the gaseous/vaporous sterilant. In one embodiment, the gaseous/vaporous sterilant is vaporized hydrogen peroxide and the chemistry of the reactive chemical unit includes thiosulfate and iodide.
摘要翻译：用于对暴露于气体/蒸气灭菌剂的区域进行曝气的方法和装置。催化破坏剂和反应性化学单元用于降低该区域内气态/蒸气灭菌剂的浓度。反应性化学单元包括与气态/蒸气灭菌剂化学反应的化学物质。在一个实施方案中，气态/蒸气灭菌剂是蒸发的过氧化氢，并且反应性化学单元的化学性质包括硫代硫酸盐和碘化物。

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