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31. 发明授权

US06929324B2 Vehicle seat incorporated with an occupant sensor 失效
标题翻译：与乘员传感器结合的车辆座椅
公开(公告)号：US06929324B2
公开(公告)日：2005-08-16
申请号：US10628694
申请日：2003-07-28
申请人： Takayuki Enomoto , Takashi Takeshita , Takuya Nishimoto , Naobumi Kuboki , Katsutoshi Sasaki , Norio Kawashima , Hiroaki Nishiguma , Atsuo Matsumoto , Shinichi Horibata , Ko Masuda , Yuji Niikura , Hiroshi Matsunaga , Yuji Tokiwa
发明人： Takayuki Enomoto , Takashi Takeshita , Takuya Nishimoto , Naobumi Kuboki , Katsutoshi Sasaki , Norio Kawashima , Hiroaki Nishiguma , Atsuo Matsumoto , Shinichi Horibata , Ko Masuda , Yuji Niikura , Hiroshi Matsunaga , Yuji Tokiwa
IPC分类号： B60N2/00 , B60R21/01 , B60R21/015 , A47C7/62
CPC分类号： B60N2/7094 , B60N2/002 , B60R21/01516 , B60R21/0154 , B60R21/01554
摘要： In a vehicle seat, a central support member typically consisting of wire mesh or grid and supports most of the load of the vehicle occupant via spring members, and undergoes a relatively large displacement when the occupant is seated in the seat. Thus, by detecting the displacements of various parts of the central support member, preferably peripheral parts thereof, the magnitude of the total load and distribution of the load can be evaluated both reliably and accurately. Additionally, displacement sensors for measuring such large displacements are relatively inexpensive and easy to handle. Also, such sensors would not interfere with the existing seat designs, and would not be adversely affected by the equipment of the seat such as seat heaters.
摘要翻译：在车辆座椅中，通常由金属丝网或格栅组成的中央支撑构件，并且通过弹簧构件支撑车辆乘员的大部分负载，并且当乘员坐在座椅中时经历相对较大的位移。因此，通过检测中央支撑构件的各部分的位移，优选其周边部分，可以可靠且准确地评估总负载的大小和负载的分布。此外，用于测量这种大的位移的位移传感器相对便宜并且易于处理。此外，这种传感器不会干扰现有的座椅设计，并且不会受到诸如座椅加热器的座椅的设备的不利影响。

32. 发明授权

US06875288B2 Cleaning agent and cleaning method 失效
标题翻译：清洁剂和清洁方法
公开(公告)号：US06875288B2
公开(公告)日：2005-04-05
申请号：US09971589
申请日：2001-10-09
申请人： Hideto Gotoh , Takayuki Niuya , Hiroyuki Mori , Hiroshi Matsunaga , Fukusaburo Ishihara , Yoshiya Kimura , Ryuji Sotoaka , Takuya Goto , Tetsuo Aoyama , Kojiro Abe
发明人： Hideto Gotoh , Takayuki Niuya , Hiroyuki Mori , Hiroshi Matsunaga , Fukusaburo Ishihara , Yoshiya Kimura , Ryuji Sotoaka , Takuya Goto , Tetsuo Aoyama , Kojiro Abe
IPC分类号： B08B3/08 , B08B3/00 , C11D1/00 , C11D3/32 , C11D3/34 , C11D3/43 , C11D11/00 , C11D17/08 , H01L21/02 , H01L21/304 , H01L21/311 , H01L21/461
CPC分类号： B08B3/08 , B08B3/048 , C11D3/43 , C11D11/0064 , H01L21/02063 , H01L21/31133
摘要： The cleaning agent described above comprises a surfactant and an organic solvent, and the cleaning method described above is characterized by allowing the cleaning agent described above to flow on the surface of the material to be treated at a high speed to thereby clean the above surface. According to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.
摘要翻译：上述清洗剂包括表面活性剂和有机溶剂，上述清洗方法的特征在于允许上述清洗剂以高速流动在待处理材料的表面上，从而清洁上述表面。根据本发明，能够容易地除去附着在待处理材料的表面上的沉积物，而不损害被处理材料。

33. 发明授权

US06222065B1 Process for the production of 1,5-naphtylenediisocyanate 失效
标题翻译： 1,5-萘二异氰酸酯的制备方法
公开(公告)号：US06222065B1
公开(公告)日：2001-04-24
申请号：US09614177
申请日：2000-07-11
申请人： Yutaka Okawa , Tomoo Tsujimoto , Yutaka Kanbara , Hiroshi Matsunaga
发明人： Yutaka Okawa , Tomoo Tsujimoto , Yutaka Kanbara , Hiroshi Matsunaga
IPC分类号： C07C26300
CPC分类号： C07C263/12 , C07C263/04 , C07C265/14
摘要： 1,5-naphthylenediisocyanate is industrially advantageously produced at high yields by pyrolyzing methyl 1,5-naphthylenecarbamate synthesized by providing 1,5-naphthylenedinitrile as a raw material and carrying out amidation, chlorination and Hofmann rearrangement.
摘要翻译：通过以1,5-萘二腈作原料合成并进行酰胺化，氯化和霍夫曼重排而合成的1,5-萘基癸氨酸甲酯，工业上有利于高产率制备1,5-萘二异氰酸酯。

34. 发明授权

US6080755A 1,9-diazabicyclo[4.3.0]nona-3,8-diene derivatives 失效
标题翻译： 1,9-二氮杂双环[4.3.0]壬-3,8-二烯衍生物
公开(公告)号：US6080755A
公开(公告)日：2000-06-27
申请号：US415
申请日：1998-02-03
申请人： Hiroshi Matsunaga , Souiti Kaneda , Hisashi Shimidzu , Yoshiyuki Shikata , Toshio Kumagai
发明人： Hiroshi Matsunaga , Souiti Kaneda , Hisashi Shimidzu , Yoshiyuki Shikata , Toshio Kumagai
IPC分类号： A61K31/00 , A61K31/4355 , A61P5/24 , A61P9/10 , C07D471/04 , A61K31/437 , A61K31/496 , C07D221/00
CPC分类号： C07D471/04
摘要： Disclosed are diazabicyclo compounds of formula (I) ##STR1## in which R.sup.1 is a substituted or unsubstituted lower alkyl, lower alkenyl or lower alkynyl; R.sup.2 is a hydroxy; R.sup.3 is a lower alkoxycarbonyl; R.sup.4 and R.sup.7 are hydrogens or substituted or unsubstituted phenyl groups; R.sup.5 and R.sup.6 are hydrogens or lower alkyl groups; or pharmaceutically acceptable salts thereof, having cardioprotective activity. Also disclosed are methods of treating cardiovascular disease using a compound of formula (I) or pharmaceutically acceptable compositions comprising the compound of formula (I).
摘要翻译： PCT No.PCT / JP96 / 02192 Sec。 371日期1998年2月3日 102（e）1998年2月3日PCT PCT 1996年8月5日PCT公布。出版物WO97 / 06168 日期1997年2月20日公开是式（I）的二氮杂双环化合物，其中R 1是取代或未取代的低级烷基，低级链烯基或低级炔基; R2是羟基; R3是低级烷氧基羰基; R4和R7是氢或取代或未取代的苯基; R5和R6是氢或低级烷基; 或其药学上可接受的盐，具有心脏保护活性。还公开了使用式（I）化合物或包含式（I）化合物的药学上可接受的组合物治疗心血管疾病的方法。

35. 发明授权

US09630237B2 Face spline molding device, face spline molding method, outer joint member, and constant velocity universal joint 有权
公开(公告)号：US09630237B2
公开(公告)日：2017-04-25
申请号：US14124838
申请日：2012-05-23
申请人： Takahiro Kimura , Hiroshi Matsunaga
发明人： Takahiro Kimura , Hiroshi Matsunaga
IPC分类号： B21J9/02 , B21H5/02 , B21K1/30 , B21K1/76 , F16D3/223 , F16D3/18 , B21H5/00 , B60B27/00 , F16D1/076
CPC分类号： B21H5/02 , B21H5/00 , B21J9/025 , B21K1/30 , B21K1/762 , B21K1/765 , B60B27/0005 , B60B27/0026 , B60B27/0042 , F16D1/076 , F16D3/18 , F16D3/223 , F16D2003/22326 , F16D2250/0023
摘要： An outer joint member for a constant velocity universal joint is formed by a face spline forming apparatus and a face spline forming method. The face spline forming apparatus includes a punch member having a tooth portion for forming a face spline, a pedestal having an end-surface receiving surface for receiving an opening end surface of a cup section, and a shaft member having an inner-surface receiving surface for receiving a bottom-wall inner surface of the cup section. The opening end surface and the bottom-wall inner surface are brought into a simultaneous pressure receiving state. In this state, the punch member performs a rocking motion to form the face spline in a bottom-wall back surface due to plastic deformation caused by the tooth portion of the punch member.

36. 发明授权

US09334161B2 Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same 有权
标题翻译：用于抑制细金属结构的图案塌陷的处理液和使用其制造精细金属结构的方法
公开(公告)号：US09334161B2
公开(公告)日：2016-05-10
申请号：US13499462
申请日：2010-09-29
申请人： Masaru Ohto , Hiroshi Matsunaga , Kenji Yamada
发明人： Masaru Ohto , Hiroshi Matsunaga , Kenji Yamada
IPC分类号： H01B13/00 , B44C1/22 , B81C1/00 , C09K13/00 , C23G1/26 , H01L21/02
CPC分类号： B81C1/0092 , C09K13/00 , C23G1/26 , H01L21/02057
摘要： There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing at least one member selected from an imidazolium halide having an alkyl group containing 12, 14 or 16 carbon atoms, a pyridinium halide having an alkyl group containing 14 or 16 carbon atoms, an ammonium halide having an alkyl group containing 14, 16 or 18 carbon atoms, a betaine compound having an alkyl group containing 12, 14 or 16 carbon atoms, and an amine oxide compound having an alkyl group containing 14, 16 or 18 carbon atoms, and a method for producing a fine metal structure using the same.
摘要翻译：提供了一种用于抑制精细金属结构的图案塌陷的处理液，其含有至少一种选自具有12,14或16个碳原子的烷基的咪唑卤化物，具有14或16个烷基的吡啶鎓卤化物碳原子，具有14,16或18个碳原子的烷基的卤化铵，具有12,14或16个碳原子的烷基的甜菜碱化合物和具有14,16或18个烷基的氧化胺化合物碳原子，以及使用其制造精细金属结构体的方法。

37. 发明申请

US20130196497A1 METHOD FOR PRODUCING TRANSISTOR 有权
标题翻译：生产晶体管的方法
公开(公告)号：US20130196497A1
公开(公告)日：2013-08-01
申请号：US13817699
申请日：2011-07-26
申请人： Kenji Shimada , Hiroshi Matsunaga , Kojiro Abe , Kenji Yamada
发明人： Kenji Shimada , Hiroshi Matsunaga , Kojiro Abe , Kenji Yamada
IPC分类号： H01L29/40
CPC分类号： H01L29/401 , C09K13/06 , C09K13/08 , H01L21/02068 , H01L21/28079 , H01L21/31111 , H01L21/32134 , H01L21/82345 , H01L21/823842 , H01L29/66545
摘要： According to the present invention, there is provided a process for producing a transistor having a high precision and a high quality with a high yield by selectively etching a natural silicon oxide film, and further by selectively etching a dummy gate made of silicon. The present invention relates to a process for producing a transistor using a structural body which includes a substrate, and a dummy gate laminate formed by laminating at least a high dielectric material film and a dummy gate made of silicon having a natural silicon oxide film on a surface thereof, a side wall disposed to cover a side surface of the laminate and an interlayer insulating film disposed to cover the side wall which are provided on the substrate, said process including an etching step using a specific etching solution and thereby replacing the dummy gate with an aluminum metal gate.
摘要翻译：根据本发明，通过选择性地蚀刻天然氧化硅膜，并且进一步通过选择性地蚀刻由硅制成的虚拟栅极，提供了以高产率制造具有高精度和高质量的晶体管的方法。本发明涉及一种使用包括基板的结构体制造晶体管的方法，以及通过将至少具有高介电材料膜和由硅制成的具有天然氧化硅膜的虚拟栅极层叠在一起而形成的虚拟栅极叠层表面，设置成覆盖层压体的侧表面的侧壁和设置成覆盖设置在基板上的侧壁的层间绝缘膜，所述工艺包括使用特定蚀刻溶液的蚀刻步骤，从而替换伪栅极与铝金属门。

38. 发明申请

US20130165365A1 TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID 有权
标题翻译：用于抑制微结构中的图案皱纹的处理液和使用合适处理液的微结构制造方法
公开(公告)号：US20130165365A1
公开(公告)日：2013-06-27
申请号：US13820899
申请日：2011-07-14
申请人： Hiroshi Matsunaga , Masaru Ohto
发明人： Hiroshi Matsunaga , Masaru Ohto
IPC分类号： C11D7/32
CPC分类号： H01L21/0206 , B81C1/00825 , C11D7/3209 , C11D7/3281
摘要： There are provided a processing liquid for suppressing pattern collapse of a microstructure which includes at least one compound selected from the group consisting of an imidazolium halide containing an alkyl group having 12, 14 or 16 carbon atoms, a pyridinium halide containing an alkyl group having 14 or 16 carbon atoms and an ammonium halide containing an alkyl group having 16 or 18 carbon atoms, and water; and a method for producing a microstructure formed of silicon oxide using the processing liquid.
摘要翻译：提供了一种用于抑制显微组织的图案塌陷的处理液体，其包括至少一种选自包含具有12,14或16个碳原子的烷基的咪唑鎓卤化物的化合物，含有14个或16个碳原子和含有16或18个碳原子的烷基的卤化铵和水; 以及使用该处理液制造由氧化硅形成的微观结构的方法。

39. 发明申请

US20120216407A1 METHOD OF MANUFACTURING WHEEL SUPPORT BEARING ASSEMBLY 有权
标题翻译：制造车轮支撑轴承组件的方法
公开(公告)号：US20120216407A1
公开(公告)日：2012-08-30
申请号：US13467524
申请日：2012-05-09
申请人： Kazunori KUBOTA , Kazuo Komori , Hiroshi Matsunaga , Akira Fujimura , Tetsuya Hashimoto , Masahiro Kiuchi
发明人： Kazunori KUBOTA , Kazuo Komori , Hiroshi Matsunaga , Akira Fujimura , Tetsuya Hashimoto , Masahiro Kiuchi
IPC分类号： B21D53/10
CPC分类号： F16C19/186 , B60B27/00 , B60B27/0005 , B60B27/0084 , B60B27/0094 , F16C33/586 , F16C43/04 , F16C2326/02 , Y10T29/49647 , Y10T29/49686
摘要： A method of manufacturing a wheel support bearing assembly having a plastically deformed portion engageable with an inclined surface portion of an annular stepped area in the inner race segment. The method includes that the plastically deformed portion, which is of a cylindrical configuration before it is deformed, is formed by pressing a crimping punch, of which front end portion outer peripheral surface is a tapered shape, axially into an inner peripheral surface of the inboard end portion of the hub axle to allow the cylindrical plastically deformed portion to be crimped in the diameter expanded condition.
摘要翻译：一种制造车轮支撑轴承组件的方法，其具有可与内圈段中的环形阶梯区域的倾斜表面部分接合的塑性变形部分。该方法包括通过将前端部外周面成锥形的压接冲头按压到内侧的内周面而形成在其变形之前为圆筒状的塑性变形部轮毂轴的端部，以允许圆柱形塑性变形部分在直径扩大状态下卷曲。

40. 发明申请

US20110212617A1 LIQUID FOR PROTECTING COPPER WIRING SURFACE AND METHOD FOR MANUFACTURING SEMICONDUCTOR CIRCUIT ELEMENT 有权
标题翻译：用于保护铜线表面的液体和制造半导体电路元件的方法
公开(公告)号：US20110212617A1
公开(公告)日：2011-09-01
申请号：US13062365
申请日：2009-09-02
申请人： Kenji Yamada , Kenji Shimada , Hiroshi Matsunaga
发明人： Kenji Yamada , Kenji Shimada , Hiroshi Matsunaga
IPC分类号： H01L21/28 , C09D7/00
CPC分类号： H01L21/321 , H01L21/02074
摘要： A copper wiring material surface protective liquid is provided that is used in production of a semiconductor circuit device containing copper wiring, and consists of an aqueous solvent and an acetylene alcohol compound containing at least 3-phenyl-2-propyn-1-ol. A method for producing a semiconductor circuit device is provided that contains: forming an insulating film and/or a diffusion preventing film on a silicon substrate; then forming a copper film by a sputtering; then forming a copper film or a copper alloy film containing 80% by mass or more of copper thereon by a plating method; and flattening the film by a chemical mechanical polishing (CMP) method, thereby providing a semiconductor substrate containing a flattened copper wiring, in which the semiconductor substrate having an exposed surface of a copper wiring material is treated by making in contact with the copper wiring material surface protective liquid.
摘要翻译：提供铜线材料表面保护液，其用于生产含有铜布线的半导体电路器件，并由含水溶剂和至少含有3-苯基-2-丙炔-1-醇的乙炔醇化合物组成。提供一种制造半导体电路器件的方法，其包括：在硅衬底上形成绝缘膜和/或防扩散膜; 然后通过溅射形成铜膜; 然后通过电镀法形成含有80质量％以上的铜的铜膜或铜合金膜; 并通过化学机械抛光（CMP）方法使膜平坦化，从而提供含有扁平铜布线的半导体基板，其中通过与铜布线材料接触来处理具有铜布线材料的暴露表面的半导体基板表面保护液。

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