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    • 31. 发明授权
    • Solid state image pickup device, method for producing the same, and image pickup system comprising the solid state image pickup device
    • 固体摄像装置及其制造方法以及包括固体摄像装置的摄像系统
    • US07283305B2
    • 2007-10-16
    • US10991396
    • 2004-11-19
    • Akira OkitaHiroki HiyamaHideaki Takada
    • Akira OkitaHiroki HiyamaHideaki Takada
    • G02B27/10
    • H01L27/14627H01L27/14623H01L31/02327
    • The present invention inhibits variations in sensitivity of an image pickup element formed in a jointed area in the image pickup element produced using exposure in a joined fashion.The image pickup element 11 has a light receiving area 102 formed on a substrate 101, an insulation layer 104 deposited on a light receiving area 102, and a microlens 106 formed on the insulation layer 104 and collecting incident light onto the light receiving area 102. A pattern 103L and a pattern 103R with an optical axis of the microlens 106 as a divisional line by exposure in a joined fashion in different exposure steps are arranged with an optical path for incident light collected by the microlens 106 held therebetween, and are provided so that a clearance from the optical path equals a distance L. The distance L is set to be larger than the alignment accuracy of an exposure device exposing the patterns 103L and 103R.
    • 本发明抑制了以联合方式使用曝光产生的图像拾取元件中形成在接合区域中的图像拾取元件的灵敏度变化。 图像拾取元件11具有形成在基板101上的光接收区域102,沉积在光接收区域102上的绝缘层104和形成在绝缘层104上的微透镜106,并将入射光收集到光接收区域102上。 在不同的曝光步骤中以连接方式曝光的微透镜106的光轴作为分割线的图案103L和图案103R被布置有用于由保持在其间的微透镜106收集的入射光的光路,并且是 被设置为使得从光路的间隙等于距离L.距离L被设定为大于曝光图案103L和103R的曝光装置的对准精度。
    • 32. 发明申请
    • Solid state image pick-up device and image pick-up system
    • 固态图像拾取装置和图像拾取系统
    • US20050168618A1
    • 2005-08-04
    • US11041728
    • 2005-01-25
    • Akira OkitaHiroki HiyamaHideaki Takada
    • Akira OkitaHiroki HiyamaHideaki Takada
    • H01L27/146H04N5/225H04N5/335H04N5/359H04N5/361H04N5/365H04N5/374
    • H01L27/14603
    • A solid state image pick-up device has shields for suppressing deterioration in a ratio of an output signal to output noises caused by crosstalks, suppressing deterioration in a ratio of the output signal to output noises caused by a coupling capacity, and suppressing deterioration in a ratio of the output signal to output noises caused by imbalance is provided. Shielding lines 301, 302, and 303 are arranged in a layer to which output lines 210 and 220 belong. Shielding lines 304, 305, and 306 are arranged over the shielding lines 301, 302, and 303, respectively. Further, shielding pins 307, 308, and 309 are arranged between the shielding lines 301 and 304, between the shielding lines 302 and 305, and between the shielding lines 303 and 306, respectively. No shielding line is arranged over output lines 210 and 220. A structure is made to be plane-symmetrical with respect to a plane including a center line of the shielding line 301 and a plane including a center line of the shielding line 304.
    • 固态摄像装置具有用于抑制输出信号与输出由串扰引起的噪声的比例的劣化的屏蔽,抑制输出信号的比例与输出由耦合电容引起的噪声的比例的劣化,并且抑制 提供了由不平衡引起的输出信号与输出噪声的比率。 屏蔽线301,302和303被布置在输出线210和220所属的层中。 屏蔽线304,305和306分别设置在屏蔽线301,302和303上。 此外,屏蔽引脚307,308和309分别布置在屏蔽线301和304之间,屏蔽线302和305之间以及屏蔽线303和306之间。 没有屏蔽线布置在输出线210和220上。 将结构相对于包括屏蔽线301的中心线的平面和包括屏蔽线304的中心线的平面进行平面对称。
    • 33. 发明申请
    • Photoelectric conversion device and image pickup system using the photoelectric conversion device
    • 光电转换装置及摄像系统采用光电转换装置
    • US20050168605A1
    • 2005-08-04
    • US11030074
    • 2005-01-07
    • Hiroki HiyamaAkira OkitaHideaki Takada
    • Hiroki HiyamaAkira OkitaHideaki Takada
    • H01L27/146H04N5/335H04N5/359H04N5/374
    • H04N5/378
    • It is a principle object of the present invention to reduce a voltage drop of a common power supply wiring in a plurality of amplification circuits to suppress crosstalk generated in other signal output lines. A photoelectric conversion device includes: a plurality of pixels each having a photoelectric conversion area; a plurality of signal output lines through which electrical signals are to be read out from the plurality of pixels; and a plurality of amplification circuits provided in correspondence to the plurality of signal output lines for amplifying the electrical signals, respectively, the plurality of amplification circuits, including at least one constant current circuit portion and being disposed in a predetermined direction of repetitive dispersion, in which a constant current circuit portion includes at least a source grounded field effect transistor (the gate electrode is designated by reference symbol 124G), and a direction (X-axis direction) of a channel length of the source grounded field effect transistor is different from the direction of repetitive disposition of the amplification circuits.
    • 本发明的主要目的是减少多个放大电路中的公共电源布线的电压降,以抑制在其它信号输出线中产生的串扰。 光电转换装置包括:具有光电转换区域的多个像素; 多个信号输出线,通过该信号输出线从多个像素读出电信号; 以及多个对应于多个信号输出线设置的放大电路,用于分别放大多个放大电路,所述多个放大电路包括至少一个恒流电路部分,并且以预定的重复分散方向设置在 恒定电流电路部分至少包括源极接地场效应晶体管(栅电极由附图标记124G表示),源极接地场效应晶体管的沟道长度的方向(X轴方向)不同 从放大电路的重复配置的方向。
    • 37. 发明授权
    • Solid state image pickup device and manufacturing method therefor
    • 固态摄像装置及其制造方法
    • US07274394B2
    • 2007-09-25
    • US10622540
    • 2003-07-21
    • Toru KoizumiShigetoshi SugawaIsamu UenoTetsunobu KochiKatsuhito SakuraiHiroki Hiyama
    • Toru KoizumiShigetoshi SugawaIsamu UenoTetsunobu KochiKatsuhito SakuraiHiroki Hiyama
    • H04N3/14H01L21/336H01L31/062H01L27/00
    • H01L27/14806H01L27/14609H01L27/14643H01L27/14689H01L31/035281Y02E10/50
    • A method of manufacturing a MOS-type solid-state image pickup device having a photoelectric conversion unit, a transfer MOS transistor, a gate electrode disposed on an insulating film and a semiconductor substrate on which the photoelectric conversion unit and the transfer MOS transistor are disposed, includes a first step of forming a second semiconductor region by ion implanting an impurity of a second conductivity type at a first angle with a first energy using the gate electrode as a mask, and a second step of forming a fifth semiconductor region by ion implanting an impurity of the second conductivity type at a second angle with a second energy using the gate electrode as a mask. A fourth semiconductor region is formed by ion implanting an impurity of the second conductivity type. The second energy is smaller than the first energy, and the first and second angles are respectively angles to a direction normal to a surface of the semiconductor substrate, with the second angle being larger than the first angle, and the first and third steps being performed separately.
    • 一种制造具有光电转换单元,转移MOS晶体管,设置在绝缘膜上的栅极电极和设置有光电转换单元和转移MOS晶体管的半导体衬底的MOS型固体摄像器件的方法 包括通过使用栅电极作为掩模以第一角度以第一角度离子注入第二导电类型的杂质形成第二半导体区域的第一步骤,以及通过离子注入形成第五半导体区域的第二步骤 使用栅电极作为掩模,以第二能量以第二角度的第二导电类型的杂质。 通过离子注入第二导电类型的杂质形成第四半导体区域。 第二能量小于第一能量,并且第一和第二角度分别是与垂直于半导体衬底的表面的方向的角度,其中第二角度大于第一角度,并且执行第一和第三步骤 分别。