会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 31. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US08009217B2
    • 2011-08-30
    • US12427952
    • 2009-04-22
    • Ryohei Miyagawa
    • Ryohei Miyagawa
    • H04N5/335H01L31/113
    • H01L27/14609H01L27/14612H01L27/14689
    • In a solid-state imaging device, provided is a solid-state imaging device in which a first gate insulation film 22 for the readout transistor 12 in a pixel is formed so as to be thicker than a second gate insulation film 23 for an amplification transistor 14 in the pixel, and the second gate insulation film 23 for the amplification transistor 14 in the pixel is formed so as to be thicker than a third gate insulation film 24 for an n-type micro transistor 17 and a p-type micro transistor 18 in a peripheral region outside the pixel, whereby it is possible to suppress a 1/f noise of the amplification transistor 14 and also possible to increase a saturated charge amount.
    • 在固态成像装置中,提供了一种固态成像装置,其中用于像素中的读出晶体管12的第一栅极绝缘膜22形成为比用于放大晶体管的第二栅极绝缘膜23更厚 像素中的放大晶体管14的第二栅极绝缘膜23形成为比n型微晶体管17和p型微晶体管18的第三栅极绝缘膜24厚 在像素外部的周边区域中,由此可以抑制放大晶体管14的1 / f噪声,并且还可以增加饱和电荷量。
    • 34. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US06943389B2
    • 2005-09-13
    • US10669421
    • 2003-09-25
    • Tetsuya YamaguchiRyohei MiyagawaYoshitaka Egawa
    • Tetsuya YamaguchiRyohei MiyagawaYoshitaka Egawa
    • H01L27/146H04N5/225H04N5/335H04N5/361H04N5/369H04N5/374H01L27/148
    • H01L27/14609H01L27/14603H01L27/14643H04N5/2251H04N5/335H04N5/365H04N5/3745H04N5/37457
    • A solid-state imaging device comprises an image pickup unit having unit cells including opto-electrical converter elements, said unit cells being disposed in a two-dimensional array, a selection line made of polysilicon for selectively determining the unit cells in the same row within the image pickup unit, a read-out line made of polysilicon for reading out an electric charge accumulated in the opto-electrical converter elements of the unit cells in the same row within the image pickup unit, a signal line transmitting pixel signals produced from the unit cells in the same row within the image pickup unit, a reset line made of polysilicon for discharging the unit cells in the same row within the image pickup unit down to a desired voltage level, a driver circuit located on one side of the image pickup unit for supplying drive signals to the read-out line, the selection line, and the reset line, respectively, and a read-out auxiliary wiring disposed along at least the read-out line and electrically connected to the read-out line at a plurality of junctions, the read-out auxiliary wiring being of comparatively lower electric resistivity than the read-out line.
    • 固态成像装置包括具有包括光电转换器元件的单位单元的图像拾取单元,所述单位单元以二维阵列布置,由多晶硅制成的选择线,用于选择性地确定在同一行内的单元电池内 图像拾取单元,由多晶硅制成的读出线,用于读出积累在图像拾取单元内的同一行的单位单元的光电转换元件中的电荷;信号线, 在图像拾取单元内的相同行中的单位单元,由多晶硅制成的复位线,用于将图像拾取单元内的同一行中的单位单元放电至期望的电压电平,位于图像拾取器一侧的驱动器电路 分别向读出线,选择线和复位线提供驱动信号的单元,以及至少沿着读出线设置的读出辅助布线,以及 在多个接合处电连接到读出线,读出的辅助布线具有比读出的线更低的电阻率。
    • 38. 发明授权
    • MOS solid-state image pickup device and manufacturing method thereof
    • MOS固体摄像装置及其制造方法
    • US07755150B2
    • 2010-07-13
    • US11808042
    • 2007-06-06
    • Emi OhtsukaMikiya UchidaRyohei Miyagawa
    • Emi OhtsukaMikiya UchidaRyohei Miyagawa
    • H01L27/14
    • H01L27/14609H01L27/1463H01L27/14689
    • An N-type epitaxial layer 115, which is formed above an N-type semiconductor substrate 114 in each of a pixel region and a peripheral circuit region; a first P-type well 1 formed above the N-type epitaxial layer 115 in the pixel region; and light receiving regions 117, which are formed within the first P-type well 1 and each of which is a component of a photodiode, are included. The peripheral circuit region includes: second P-type wells 2, which are formed from a surface 200 of the peripheral circuit region to a desired depth and each of which is a component of an N-Channel MOS transistor; an N-type well 3 which is formed from the surface 200 of the peripheral circuit region to a desired depth and which is a component of a P-Channel MOS transistor; and a third P-type well 4 which is formed so as to have such a shape as to isolate the N-type well 3 from the N-type epitaxial layer 115 and which has a higher impurity concentration than that of the first P-type well 1.
    • 在像素区域和外围电路区域中的每一个中形成在N型半导体衬底114上方的N型外延层115; 形成在像素区域中的N型外延层115的上方的第一P型阱1; 并且包括形成在第一P型阱1内并且其每一个都是光电二极管的分量的光接收区域117。 外围电路区域包括:第二P型阱2,其由外围电路区域的表面200形成为期望的深度,并且每个都是N沟道MOS晶体管的一部分; N型阱3,其由外围电路区域的表面200形成为期望的深度,并且是P沟道MOS晶体管的分量; 以及第三P型阱4,其形成为具有使N型阱3与N型外延层115隔离的杂质浓度比第一P型阱高的杂质浓度 好1。