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    • 34. 发明申请
    • METHODS FOR UNIFORM METAL IMPREGNATION INTO A NANOPOROUS MATERIAL
    • 将金属均匀地纳入纳米材料的方法
    • US20100171950A1
    • 2010-07-08
    • US12575369
    • 2009-10-07
    • Selena CHANSunghoon KwonNarayan Sundararajan
    • Selena CHANSunghoon KwonNarayan Sundararajan
    • G01J3/44
    • G01N21/658B01D67/0062B01D67/0086B01D67/0088B01D71/02B82Y15/00B82Y30/00C12Q1/6825G01J3/44G01N21/65G01N2021/6439G01N2021/655G01N2021/656C12Q2565/632C12Q2563/155
    • The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.
    • 本文公开的方法,系统400和装置涉及金属150浸渍的多孔基材110,210。本发明的某些实施方案涉及用于制造金属涂覆的多孔硅基板110,210的方法,其显示出显着改善金属150沉积物的均匀性和深度的渗透 。 增加的均匀性和深度允许分析物的改进和更可重复的拉曼检测。 在本发明的示例性实施例中,所述方法可以包括多孔硅110的氧化,浸入金属盐溶液130中,干燥和热分解金属盐140以形成金属沉积物150.在本发明的其它示例性实施方案中, 方法可以包括多孔硅衬底210与一种或多种金属盐溶液130的微流体浸渍。本发明的其它实施方案涉及用于分析物的拉曼检测的装置和/或系统400,包括金属涂覆的多孔硅衬底110,210,由 公开的方法。
    • 36. 发明授权
    • Methods for uniform metal impregnation into a nanoporous material
    • 均匀金属浸渍到纳米多孔材料中的方法
    • US07361313B2
    • 2008-04-22
    • US10368976
    • 2003-02-18
    • Selena ChanSunghoon KwonNarayan Sundararajan
    • Selena ChanSunghoon KwonNarayan Sundararajan
    • G01N21/65G01J3/44
    • G01N21/658B01D67/0062B01D67/0086B01D67/0088B01D71/02B82Y15/00B82Y30/00C12Q1/6825G01J3/44G01N21/65G01N2021/6439G01N2021/655G01N2021/656C12Q2565/632C12Q2563/155
    • The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.
    • 本文公开的方法,系统400和装置涉及金属150浸渍的多孔基材110,210。本发明的某些实施方案涉及用于制造金属涂覆的多孔硅基板110,210的方法,其显示出显着改善金属150沉积物的均匀性和深度的渗透 。 增加的均匀性和深度允许分析物的改进和更可重复的拉曼检测。 在本发明的示例性实施例中,所述方法可以包括多孔硅110的氧化,浸入金属盐溶液130中,干燥和热分解金属盐140以形成金属沉积物150.在本发明的其它示例性实施方案中, 方法可以包括多孔硅衬底210与一种或多种金属盐溶液130的微流体浸渍。本发明的其它实施方案涉及用于分析物的拉曼检测的装置和/或系统400,包括金属涂覆的多孔硅衬底110,210,由 公开的方法。
    • 39. 发明申请
    • Methods for uniform metal impregnation into a nanoporous material
    • 均匀金属浸渍到纳米多孔材料中的方法
    • US20070116882A1
    • 2007-05-24
    • US11436489
    • 2006-05-18
    • Selena ChanSunghoon KwonNarayan Sundararajan
    • Selena ChanSunghoon KwonNarayan Sundararajan
    • B05D1/18
    • G01N21/658B01D67/0062B01D67/0086B01D67/0088B01D71/02B82Y15/00B82Y30/00C12Q1/6825G01J3/44G01N21/65G01N2021/6439G01N2021/655G01N2021/656C12Q2565/632C12Q2563/155
    • The methods, systems 400 and apparatus disclosed herein concern metal 150 impregnated porous substrates 110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates 110, 210 that exhibit greatly improved uniformity and depth of penetration of metal 150 deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon 110, immersion in a metal salt solution 130, drying and thermal decomposition of the metal salt 140 to form a metal deposit 150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates 210 with one or more metal salt solutions 130. Other embodiments of the invention concern apparatus and/or systems 400 for Raman detection of analytes, comprising metal-coated porous silicon substrates 110, 210 prepared by the disclosed methods.
    • 本文公开的方法,系统400和装置涉及金属150浸渍的多孔基材110,210。本发明的某些实施方案涉及用于制造金属涂覆的多孔硅基板110,210的方法,其显示出显着改善金属150沉积物的均匀性和深度的渗透 。 增加的均匀性和深度允许分析物的改进和更可重复的拉曼检测。 在本发明的示例性实施例中,所述方法可以包括多孔硅110的氧化,浸入金属盐溶液130中,干燥和热分解金属盐140以形成金属沉积物150.在本发明的其它示例性实施方案中, 方法可以包括多孔硅衬底210与一种或多种金属盐溶液130的微流体浸渍。本发明的其它实施方案涉及用于分析物的拉曼检测的装置和/或系统400,包括金属涂覆的多孔硅衬底110,210,由 公开的方法。