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    • 33. 发明授权
    • MEMS coupler and method to form the same
    • MEMS耦合器和方法形成相同
    • US07858422B1
    • 2010-12-28
    • US11716227
    • 2007-03-09
    • Emmanuel P. QuevyRoger T. Howe
    • Emmanuel P. QuevyRoger T. Howe
    • H01L21/00
    • B81C1/00039B81B2201/0271
    • A MEMS coupler and a method to form a MEMS structure having such a coupler are described. In an embodiment, a MEMS structure comprises a member and a substrate. A coupler extends through a portion of the member and connects the member with the substrate. The member is comprised of a first material and the coupler is comprised of a second material. In one embodiment, the first and second materials are substantially the same. In one embodiment, the second material is conductive and is different than the first material. In another embodiment, a method for fabricating a MEMS structure comprises first forming a member above a substrate. A coupler comprised of a conductive material is then formed to connect the member with the substrate.
    • 描述了MEMS耦合器和形成具有这种耦合器的MEMS结构的方法。 在一个实施例中,MEMS结构包括构件和衬底。 耦合器延伸穿过构件的一部分并将构件与衬底连接。 该构件由第一材料构成,并且该耦合器由第二材料构成。 在一个实施例中,第一和第二材料基本相同。 在一个实施例中,第二材料是导电的并且不同于第一材料。 在另一个实施例中,一种用于制造MEMS结构的方法包括首先在衬底上形成构件。 然后形成由导电材料构成的耦合器,以将该构件与衬底连接。
    • 35. 发明授权
    • Technique for forming a MEMS device using island structures
    • 使用岛结构形成MEMS器件的技术
    • US08877536B1
    • 2014-11-04
    • US13075806
    • 2011-03-30
    • Emmanuel P. QuevyCarrie W. Low
    • Emmanuel P. QuevyCarrie W. Low
    • H01L21/00
    • B81B3/0072
    • A method of manufacturing an integrated circuit including a MEMS device includes forming a structural layer above a substrate including at least one semiconductor device. The method includes forming an attachment to a first portion of the structural layer, the attachment having a thickness substantially greater than a thickness of the structural layer. In at least one embodiment of the method, the attachment is conjoined with the first portion of the structural layer and the first portion of the structural layer and the attachment are operative to mechanically move in unison. In at least one embodiment of the method, forming the attachment includes forming a patterned filler layer of a first material above the structural layer and forming a patterned conformal layer of a second material on the patterned filler layer. The filler layer has a thickness substantially greater than the thickness of the structural layer.
    • 制造包括MEMS器件的集成电路的方法包括在包括至少一个半导体器件的衬底上形成结构层。 该方法包括形成与结构层的第一部分的附件,附件具有基本上大于结构层厚度的厚度。 在该方法的至少一个实施例中,附件与结构层的第一部分结合,并且结构层的第一部分和附件可操作以一致地机械移动。 在该方法的至少一个实施例中,形成附件包括在结构层上方形成第一材料的图案填充层,并在图案化的填料层上形成第二材料的图案化保形层。 填料层的厚度基本上大于结构层的厚度。