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31. 发明授权

US5811208A Phase shift mask and method of producing the same 失效
公开(公告)号：US5811208A
公开(公告)日：1998-09-22
申请号：US691369
申请日：1996-08-02
申请人： Toshifumi Yokoyama , Koichi Mikami , Chiaki Hatsuda , Hiroshi Mohri
发明人： Toshifumi Yokoyama , Koichi Mikami , Chiaki Hatsuda , Hiroshi Mohri
IPC分类号： H01L21/027 , G03F1/32 , G03F9/00
CPC分类号： G03F1/32
摘要： A phase shift mask, e.g. a halftone phase shift mask, which need not to form an ultra-fine pattern and is capable of suppressing during exposure the occurrence of a sub-peak of light intensity, which has an adverse effect on the image formation, and which has a light-blocking pattern with a reduced transmittance at a region outside a device pattern area which corresponds to a region subjected to multiple exposure during transfer effected by using the mask. The halftone phase shift mask has on a transparent substrate (101) a halftone phase shift film (102) comprising a single layer or a plurality of layers. The composition of the halftone phase shift film (102) is changed in a region (107) outside a device pattern area on the transparent substrate (101) which corresponds to a multiple-exposure region by a method wherein the region (107) is irradiated with an electromagnetic wave, a particle beam, heat rays, etc., or a method wherein after a region in which the composition is not desired to change has been masked, the whole blank is exposed to an active atmosphere, thereby reducing the transmittance for exposure light at the region (107).

32. 发明申请

US20100220299A1 IMAGE DISPLAY DEVICE 审中-公开
标题翻译：图像显示设备
公开(公告)号：US20100220299A1
公开(公告)日：2010-09-02
申请号：US12301896
申请日：2007-05-18
申请人： Tetsuro Mizushima , Tatsuo Itoh , Toshifumi Yokoyama , Akira Kurozuka
发明人： Tetsuro Mizushima , Tatsuo Itoh , Toshifumi Yokoyama , Akira Kurozuka
IPC分类号： G02B27/48 , G03B21/14
CPC分类号： G03B21/006
摘要： An image display device is provided with an image display unit for displaying an image visually recognizable by a viewer. The image display unit includes a sub-diffusion layer for diffusing laser light, a vibrator for vibrating the sub-diffusion layer, a primary diffusion layer for diffusing the laser light diffused by the sub-diffusion layer and a light shielding layer for cutting off outside light from a viewer side, wherein the primary diffusion layer and the light shielding layer are arranged at the viewer side of the sub-diffusion layer.
摘要翻译：图像显示装置具有图像显示单元，用于显示由观看者可视地识别的图像。图像显示单元包括用于漫射激光的子扩散层，用于振动子扩散层的振动器，用于扩散由副扩散层扩散的激光的主扩散层和用于切断外部的遮光层来自观察者侧的光，其中所述主扩散层和所述遮光层设置在所述副扩散层的观察者侧。

33. 发明申请

US20100008388A1 INTERNAL RESONATOR TYPE SHG LIGHT SOURCE 有权
标题翻译：内部谐振器类型SHG光源
公开(公告)号：US20100008388A1
公开(公告)日：2010-01-14
申请号：US12438930
申请日：2007-10-19
申请人： Toshifumi Yokoyama , Kiminori Mizuuchi
发明人： Toshifumi Yokoyama , Kiminori Mizuuchi
IPC分类号： H01S3/13 , H01S3/109
CPC分类号： H01S3/109 , G02F1/3558 , G02F1/37 , G02F2203/60 , H01S3/0404 , H01S3/09415 , H01S3/10069 , H01S3/1305 , H01S3/136
摘要： An internal resonator type SHG light source includes a pump light source which emits a pump light; a solid-state laser which absorbs the pump light and which emits a fundamental wave; an output mirror provided so as to face the solid-state laser, which forms a resonator together with the solid-state laser; a wavelength conversion element provided in the resonator, which converts the fundamental wave into a harmonic wave; a detector which detects a temperature of the wavelength conversion element; and a rotating unit which changes an incident angle of the fundamental wave on the wavelength conversion element by rotating the wavelength conversion element, wherein the rotating unit rotates the wavelength conversion element according to the temperature of the wavelength conversion element as detected by the detector.
摘要翻译：内部谐振器型SHG光源包括发射泵浦光的泵浦光源; 吸收泵浦光并发射基波的固态激光器; 输出反射镜，其设置成与固态激光器一起形成谐振器; 设置在谐振器中的波长转换元件，其将基波转换成谐波; 检测器，其检测所述波长转换元件的温度; 以及旋转单元，其通过旋转所述波长转换元件来改变所述波长转换元件上的所述基波的入射角，其中所述旋转单元根据由所述检测器检测到的所述波长转换元件的温度来旋转所述波长转换元件。

34. 发明申请

US20080304494A1 COMMUNICATION DEVICE 审中-公开
标题翻译：通信设备
公开(公告)号：US20080304494A1
公开(公告)日：2008-12-11
申请号：US12191499
申请日：2008-08-14
申请人： Toshifumi Yokoyama
发明人： Toshifumi Yokoyama
IPC分类号： H04Q11/00
CPC分类号： H04W48/02 , H04W8/06 , H04W36/10 , H04W60/04 , H04W84/105 , H04W84/16 , H04W92/12 , H04W92/14
摘要： A communication device comprising: a checking unit checking whether a bandwidth from the ingress of first path down to the egress thereof and a bandwidth from the ingress of second path down to the egress thereof as a standby of a partial zone of first path, are established or not; a route information management unit generating, when the checking unit confirms that the bandwidth from the ingress of first path down to the egress thereof and the bandwidth from the ingress of second path down to the egress thereof as the standby of the partial zone of first path are established, route maintaining information for maintaining the bandwidth of the partial zone of first path; and a transmission unit transmitting the route maintaining information generated by the route information management unit to the neighboring communication device on the side of the egress of first path.
摘要翻译：一种通信装置，包括：检查单元，检查从第一路径的入口到其出口的带宽以及从第二路径的入口到其出口的带宽是否为第一路径的部分区域的待机; 或不; 路由信息管理单元，当检查单元确认从第一路径的入口到其出口的带宽和从第二路径的入口到其出口的带宽作为第一路径的部分区域的备用建立用于维持第一路径的部分区带宽的路由维护信息; 以及发送单元，在所述第一路径的出口侧向所述相邻通信装置发送由所述路径信息管理单元生成的路线维护信息。

35. 发明授权

US06869736B2 Halftone phase shift photomask and blank for halftone phase shift photomask 失效
标题翻译：半色调相移光掩模和半色调相移光掩模的空白
公开(公告)号：US06869736B2
公开(公告)日：2005-03-22
申请号：US10363604
申请日：2001-09-03
申请人： Hiro-o Nakagawa , Toshiaki Motonaga , Yoshinori Kinase , Satoshi Yusa , Shigeki Sumida , Toshifumi Yokoyama , Chiaki Hatsuta , Junji Fujikawa , Masashi Ohtsuki
发明人： Hiro-o Nakagawa , Toshiaki Motonaga , Yoshinori Kinase , Satoshi Yusa , Shigeki Sumida , Toshifumi Yokoyama , Chiaki Hatsuta , Junji Fujikawa , Masashi Ohtsuki
IPC分类号： G03F1/32 , G03F1/68 , H01L21/027 , G03C5/00
CPC分类号： G03F1/32 , G03F1/58
摘要： Disclosed is a blank for a halftone phase shift photomask comprising a transparent substrate and a halftone phase shift layer formed thereon, the halftone phase shift layer being provided with a layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen and being formed of a multilayer film with two or more layers, wherein the multilayer film contains a layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy and the layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy is laminated on the side closer to the transparent substrate than the layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen.
摘要翻译：公开了一种用于半色调相移光掩模的空白，其包括透明基板和形成在其上的半色调相移层，所述半色调相移层设置有含有硅化钼作为其主要成分的层和氧和氮中的一个或两个，由具有两层或更多层的多层膜形成，其中多层膜含有主要成分为铬和钽之一或铬钽合金的层，其主要成分为铬和钽之一或铬钽合金层叠在比含有硅化钼作为其主要成分的层和氧和氮中的任一个或两者更靠近透明基板的一侧。

36. 发明授权

US06599667B2 Halftone phase shift photomask and blank for halftone phase shift photomask 失效
公开(公告)号：US06599667B2
公开(公告)日：2003-07-29
申请号：US09843309
申请日：2001-04-26
申请人： Satoshi Yusa , Toshifumi Yokoyama , Shigeki Sumida , Toshiaki Motonaga , Yoshinori Kinase , Hiro-o Nakagawa , Chiaki Hatsuta , Junji Fujikawa , Masashi Ohtsuki
发明人： Satoshi Yusa , Toshifumi Yokoyama , Shigeki Sumida , Toshiaki Motonaga , Yoshinori Kinase , Hiro-o Nakagawa , Chiaki Hatsuta , Junji Fujikawa , Masashi Ohtsuki
IPC分类号： G03F900
CPC分类号： G03F1/32
摘要： A blank for halftone phase shift photomask is disclosed. The blank has a transparent substrate, a halftone phase shift layer and a light shielding film, the halftone phase shift layer and the light shielding film being layered in this order on the transparent substrate, and the l light shielding film is a single layered or multiple layered film which has a layer of tantalum.

37. 发明授权

US06999668B2 Method for manufacturing optical waveguide device, optical waveguide device, and coherent light source and optical apparatus using the optical waveguide device 有权
标题翻译：使用该光波导装置的光波导装置，光波导装置以及相干光源及光学装置的制造方法
公开(公告)号：US06999668B2
公开(公告)日：2006-02-14
申请号：US10336416
申请日：2003-01-02
申请人： Toshifumi Yokoyama , Kiminori Mizuuchi
发明人： Toshifumi Yokoyama , Kiminori Mizuuchi
IPC分类号： G02B6/10
CPC分类号： G02B6/122 , G02B6/13 , G02B2006/12097 , G02B2006/12173
摘要： The invention provides a method for manufacturing an optical waveguide device, with which the thickness of an optical substrate can be controlled with high precision. The surface of a substrate is masked by applying a resist to all regions of the substrate except where stopper portions are to be formed (i.e. to the left and right in width direction of the substrate). Then, the stopper portions are formed on the surface of the substrate by sputtering/vapor deposition of Cr, and then the resist is removed. Using a UV curing resin, an Mg-doped LiNbO3 optical substrate is laminated between the pair of stopper portions to the left and right of the surface of the substrate. After laminating the optical substrate, which is made of a non-linear optical material, the optical substrate is abraded.
摘要翻译：本发明提供一种制造光波导器件的方法，通过该方法可以高精度地控制光学基片的厚度。通过向基板的所有区域施加抗蚀剂（除了要形成阻挡部分（即，在基板的宽度方向的左右方向））之外，掩模基板的表面。然后，通过溅射/气相沉积Cr在基板的表面上形成止动部，然后除去抗蚀剂。使用UV固化树脂，将Mg掺杂的LiNbO 3/3光学基板层叠在基板表面的左右两侧的一对止动部之间。在层压由非线性光学材料制成的光学基板之后，光学基板被磨损。

38. 发明授权

US06458496B2 Blank for halftone phase shift photomask and halftone phase shift photomask 有权
标题翻译：用于半色调相移光掩模和半色调相移光掩模的空白
公开(公告)号：US06458496B2
公开(公告)日：2002-10-01
申请号：US09736805
申请日：2000-12-14
申请人： Toshiaki Motonaga , Toshifumi Yokoyama , Takafumi Okamura , Yoshinori Kinase , Hiroshi Mohri , Junji Fujikawa , Hiro-o Nakagawa , Shigeki Sumida , Satoshi Yusa , Masashi Ohtsuki
发明人： Toshiaki Motonaga , Toshifumi Yokoyama , Takafumi Okamura , Yoshinori Kinase , Hiroshi Mohri , Junji Fujikawa , Hiro-o Nakagawa , Shigeki Sumida , Satoshi Yusa , Masashi Ohtsuki
IPC分类号： G03S900
CPC分类号： G03F1/32 , B32B17/06
摘要： A blank for a halftone phase shift photomask in the present invention comprises a transparent substrate and a halftone phase shift film provided thereon, and said halftone phase shift film has a multilayer construction in which at least a first layer capable of being etched with a chlorinated gas and a second layer capable of being etched with a fluorinated gas are disposed in this order from the side near said transparent substrate. A film made of tantalum silicides is suitable to use as the second layer of the halftone phase shift film. When such a blank is first etched with a fluorinated gas and then etched with chlorinated gas, because an etching selective ratio to a transparent substrate made of synthetic quartz and the like can be taken sufficiently while maintaining the applicability to the exposure light with a short wavelength that is characteristic of silicide materials in addition to good chemical stability and good processing properties that are characteristic of tantalum materials, patterning in high precision will be made possible. As a result, it is possible to obtain an ideal halftone phase shift photomask excellent in stability after mask processing and in the applicability to the short wavelength.
摘要翻译：本发明中的半色调相移光掩模的空白包括透明基板和设置在其上的半色调相移膜，所述半色调相移膜具有多层结构，其中至少可以用氯化气体蚀刻的第一层并且能够用氟化气体蚀刻的第二层从靠近所述透明基板的一侧依次设置。由硅化钽制成的薄膜适用于半色调相移薄膜的第二层。当首先用氟化气体蚀刻这样的坯料，然后用氯化气体蚀刻时，由于可以充分利用由合成石英等制成的透明基板的蚀刻选择比，同时保持对短波长的曝光光的适用性这是硅化物材料的特征，除了钽材料的特征的良好的化学稳定性和良好的加工性能之外，将能够高精度地进行图案化。结果，可以获得在掩模处理之后和在短波长的适用性方面优异的理想半色调相移光掩模。

39. 发明授权

US5965301A Method for repairing photomask by removing residual defect in said photomask 失效
标题翻译：通过去除所述光掩模中的残留缺陷来修复光掩模的方法
公开(公告)号：US5965301A
公开(公告)日：1999-10-12
申请号：US976453
申请日：1997-11-25
申请人： Masami Nara , Toshifumi Yokoyama , Tsukasa Abe
发明人： Masami Nara , Toshifumi Yokoyama , Tsukasa Abe
IPC分类号： G03F1/00 , G03F1/30 , G03F1/32 , H01L21/302 , H01L21/306 , H01L21/3065 , G03F9/00
CPC分类号： G03F1/74
摘要： A method for repairing a photomask by removing a residual defect in the photomask is provided which can solve problems, involved in repair of the photomask by the conventional laser beam irradiation, such as various types of maladjustments, limitation of focusing of a laser beam, creation of roughening in the repaired area, and problems, involved in repair of the photomask by focused ion beam irradiation, such as damage to a transparent substrate and a gallium stain. The method comprises the steps of: (a) applying actinic radiation to the residual defect area to remove the residual defect except for a defect edge region having a predetermined width from the periphery of the residual defect area over the whole periphery of the residual defect area; and (b) removing the defect edge region, remaining unremoved by the physical means, having a predetermined width from the periphery of the residual defect area over the whole periphery of the residual defect area by chemical etching with a chemical, the predetermined width being such that the influence of the actinic radiation does not extend over the outside of the residual defect area and, at the same time, the etching time can be set so that the region having a predetermined width from the periphery is removed by the chemical etching without any substantial influence on other layers including a light-shielding layer.
摘要翻译：提供了通过去除光掩模中的残余缺陷来修复光掩模的方法，其可以解决通过常规激光束照射来修复光掩模的问题，诸如各种不正确的调整，激光束的聚焦限制，创建在修复区域中的粗糙化，以及涉及通过聚焦离子束照射修复光掩模的问题，例如对透明基板的损坏和镓污染。该方法包括以下步骤：（a）将光化辐射施加到残余缺陷区域，以除去残留缺陷区域的整个周边之外的残留缺陷区域周围具有预定宽度的缺陷边缘区域的残余缺陷 ; 和（b）通过化学蚀刻从残余缺陷区域的整个周边除去具有预定宽度的残留缺陷区域的预定宽度的物理装置保留的缺陷边缘区域，预定宽度为光化辐射的影响不会延伸到残余缺陷区域的外部，并且同时可以设定蚀刻时间，使得通过化学蚀刻除去具有来自周边的预定宽度的区域，而没有任何对包括遮光层的其它层的显着影响。

40. 发明申请

US20100238959A1 SOLID-STATE LASER DEVICE AND IMAGE DISPLAY DEVICE 有权
标题翻译：固体激光器件和图像显示器件
公开(公告)号：US20100238959A1
公开(公告)日：2010-09-23
申请号：US12682378
申请日：2008-10-03
申请人： Toshifumi Yokoyama , Kiminori Mizuuchi , Tetsuro Mizushima , Tatsuo Itoh
发明人： Toshifumi Yokoyama , Kiminori Mizuuchi , Tetsuro Mizushima , Tatsuo Itoh
IPC分类号： H01S3/109
CPC分类号： H01S3/109 , G02B6/0026 , G02B6/0028 , G02B6/003 , G02B6/0066 , G02B6/0068 , G02B6/0076 , G02F1/133621 , H01S3/0619 , H01S3/08059 , H01S3/08086 , H01S3/09415 , H01S3/101 , H04N9/3158 , H04N9/3161
摘要： A semiconductor laser light source 10 emits a laser beam for pumping. An optical resonator 2 includes a solid laser crystal 15 to be excited by the incident of a laser beam to oscillate a fundamental wave 20 and a pair of fundamental wave reflective coats 14, 16 arranged at the opposite sides of the solid laser crystal 15. A wavelength conversion element 18 converts the fundamental wave 20 into a plurality of harmonics 21, 22. The wavelength conversion element 18 is so arranged in the optical resonator 2 that the optical axis of at least one of the plurality of harmonics 21, 22 generated in the optical resonator 2 is made different from that of the fundamental wave 20 and the at least one harmonic 22 whose optical axis is made different is output substantially in the same direction as the other harmonic 21. By this construction, it is possible to stabilize a harmonic output and utilize a plurality of harmonics without increasing the number of parts.
摘要翻译：半导体激光光源10发射用于泵浦的激光束。光学谐振器2包括通过激光束的入射而激发的固体激光晶体15，以振荡基波20和布置在固体激光晶体15的相对侧的一对基波反射涂层14,16。波长转换元件18将基波20转换成多个谐波21,22。波长转换元件18被布置在光学谐振器2中，使得在该谐振器2中产生的多个谐波21,22中的至少一个的光轴光谐振器2与基波20的不同，并且使光轴不同的至少一个谐波22基本上与其他谐波21相同的方向输出。通过这种结构，可以稳定谐波输出并利用多个谐波而不增加部件的数量。

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