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31. 发明授权

US5686997A Scanning projection exposure method and projection exposure apparatus 失效
标题翻译：扫描投影曝光方法和投影曝光装置
公开(公告)号：US5686997A
公开(公告)日：1997-11-11
申请号：US720179
申请日：1996-09-25
申请人： Hiroshi Shirasu
发明人： Hiroshi Shirasu
IPC分类号： G03F7/20 , H01L21/027 , G01B11/00 , G01B9/02
CPC分类号： G03F7/70358 , G03F7/70475
摘要： After a mask (12) and a substrate (16) have been scanned as one unit relative to exposure light (32) to expose a predetermined area on the substrate (16), the mask (12) is stepped in a direction parallel but opposite to the scanning direction. Thereafter, the mask (12) and the substrate (16) are scanned as one unit again to expose another area on the substrate (16). Thus, throughput is improved when a large-sized substrate is divisionally exposed.
摘要翻译：在掩模（12）和基板（16）相对于曝光光（32）被扫描为一个单元以暴露基板（16）上的预定区域之后，掩模（12）沿平行但相反的方向到扫描方向。此后，再次将掩模（12）和基板（16）作为一个单元进行扫描，以露出基板（16）上的另一个区域。因此，当大尺寸基板分开暴露时，吞吐量得到改善。

32. 发明授权

US5617181A Exposure apparatus and exposure method 失效
标题翻译：曝光装置和曝光方法
公开(公告)号：US5617181A
公开(公告)日：1997-04-01
申请号：US618735
申请日：1996-03-15
申请人： Masamitsu Yanagihara , Hiroshi Shirasu , Tetsuo Kikuchi
发明人： Masamitsu Yanagihara , Hiroshi Shirasu , Tetsuo Kikuchi
IPC分类号： G03B27/54 , G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70275 , G03F7/70358 , G03F7/70558
摘要： An exposure apparatus and an exposure method for fabricating semiconductor devices or liquid crystal display boards. The scanning means synchronously moves the mask and the photosensitive substrate with respect to the plurality of projection optical systems, and patterns formed on the mask are projected onto the photosensitive substrate while images of mask formed by adjacent illumination optical systems are made overlapping with each other. On this occasion, the controlling means controls the light intensity changing means, and the light intensity changing means changes the intensity of a light beam of each illumination optical system, so that two intensities of overlapping parts in adjacent illumination areas become substantially equal to each other. The control by the controlling means is carried out based on the light intensities of the overlapping illumination areas as detected by the light intensity detecting means.
摘要翻译：一种用于制造半导体器件或液晶显示板的曝光装置和曝光方法。扫描装置相对于多个投影光学系统同步移动掩模和感光基板，并且将形成在掩模上的图案投影到感光基板上，同时使由相邻照明光学系统形成的掩模的图像彼此重叠。在这种情况下，控制装置控制光强度改变装置，并且光强度改变装置改变每个照明光学系统的光束的强度，使得相邻照明区域中的两个重叠部分彼此大致相等。基于由光强检测装置检测的重叠照明区域的光强度，进行控制装置的控制。

33. 发明授权

US4769523A Laser processing apparatus 失效
标题翻译：激光加工设备
公开(公告)号：US4769523A
公开(公告)日：1988-09-06
申请号：US004265
申请日：1987-01-09
申请人： Akikazu Tanimoto , Keiichiro Sakato , Joji Iwamoto , Hiroshi Shirasu , Kiyoto Mashima
发明人： Akikazu Tanimoto , Keiichiro Sakato , Joji Iwamoto , Hiroshi Shirasu , Kiyoto Mashima
IPC分类号： B23K26/04 , B23K26/06 , B23K26/073 , B23K26/08 , H01L21/68 , H01L23/544 , B23K26/00
CPC分类号： H01L23/544 , B23K26/042 , B23K26/066 , B23K26/0732 , B23K26/082 , B23K26/0853 , B23K26/705 , H01L21/68 , B23K2201/40 , H01L2223/5446 , H01L2924/0002
摘要： A laser processing apparatus for projecting a spot of laser beam onto a portion of a microcircuit pattern on a semiconductor wafer, photographic mask or the like to cut the lead or anneal the limited area. The laser processing apparatus includes a mark detector for detecting the positions of first marks preliminarily provided on a work as the relative positions to the detection centers of the mark detector itself, a controller for controlling a processing energy beam generator so as to form on the work second marks detectable by the mark detector, and an error detector responsive to the results of the position detection of the second marks by the mark detector so as to detect relative positional errors between the focussing centers of the energy beam on the work and the detection centers of the mark detector.
摘要翻译：一种激光处理装置，用于将激光束点投影到半导体晶片上的微电路图案的一部分，照相掩模等上以切割引线或退火有限区域。该激光加工装置包括：标记检测器，用于检测预先设置在工件上的第一标记的位置作为与标记检测器本身的检测中心的相对位置;控制器，用于控制加工能量束发生器，以形成工件标记检测器可检测的第二标记，以及响应于标记检测器对第二标记的位置检测结果的误差检测器，以便检测能量束在工件上的聚焦中心与检测中心之间的相对位置误差的标记检测器。

34. 发明授权

US4710604A Machining apparatus with laser beam 失效
标题翻译：激光加工设备
公开(公告)号：US4710604A
公开(公告)日：1987-12-01
申请号：US942730
申请日：1986-12-17
申请人： Hiroshi Shirasu , Kazuhiro Shimeno , Joji Iwamoto
发明人： Hiroshi Shirasu , Kazuhiro Shimeno , Joji Iwamoto
IPC分类号： B23K26/02 , B23K26/08
CPC分类号： B23K26/0853 , B23K26/042
摘要： Proposed is a machining apparatus with a laser beam, wherein a stage is controlled and driven to cause a target to come close to a beam spot when the target is located far away from the beam spot, and a laser beam radiation system is controlled and driven to cause the beam spot to come closer to the target when the target is located within a predetermined range with respect to the beam spot.
摘要翻译：提出了一种具有激光束的加工装置，其中当靶远离束斑位置时，控制和驱动载物台以使目标靠近波束点，激光束辐射系统被控制和驱动当目标位于相对于光束点的预定范围内时，使光点变得更靠近目标。

35. 发明授权

US4336450A Focus detecting apparatus 失效
标题翻译：对焦检测装置
公开(公告)号：US4336450A
公开(公告)日：1982-06-22
申请号：US112350
申请日：1980-01-15
申请人： Ken Utagawa , Akira Ogasawara , Hiroshi Shirasu , Kunihisa Hoshino
发明人： Ken Utagawa , Akira Ogasawara , Hiroshi Shirasu , Kunihisa Hoshino
IPC分类号： G02B7/34 , G01J1/20
CPC分类号： G02B7/34
摘要： A focus detecting apparatus comprises first means for forming phase outputs from said first and second photosensor arrays of phases respectively corresponding to the relative positions of said first and second photosensor arrays with respect to the light images thereon; second means for comparing the output corresponding to the amount of light entering said first photosensor array with the output corresponding to the amount of light entering said second photosensor array and forming a correlation output corresponding to said comparison; third means for forming outputs corresponding to the sharpness of light images on said photosensor arrays from the outputs from said arrays; and processing means for generating a synthesized output signal representing the focus state of said objective lens with respect to the object from the aforementioned phase outputs, correlation output and sharpness outputs.
摘要翻译：焦点检测装置包括：第一装置，用于从相应于所述第一和第二光电传感器阵列相对于其上的光图像的相对位置的所述第一和第二光电传感器阵列形成相位输出; 第二装置，用于将与进入所述第一光电传感器阵列的光量相对应的输出与对应于进入所述第二光电传感器阵列的光量的输出进行比较，并形成对应于所述比较的相关输出; 第三装置，用于从所述阵列的输出形成对应于所述光传感器阵列上的光图像的清晰度的输出; 以及处理装置，用于根据上述相位输出，相关输出和锐度输出，产生表示所述物镜的聚焦状态的合成输出信号。

36. 发明授权

US4297571A Focus detecting device 失效
标题翻译：对焦检测装置
公开(公告)号：US4297571A
公开(公告)日：1981-10-27
申请号：US109282
申请日：1980-01-03
申请人： Ken Utagawa , Kunihisa Hoshino , Hiroshi Shirasu , Akira Ogasawara
发明人： Ken Utagawa , Kunihisa Hoshino , Hiroshi Shirasu , Akira Ogasawara
IPC分类号： G03B13/36 , G02B7/34 , G01J1/20
CPC分类号： G02B7/34
摘要： In a focus detecting device having a first and second photoelectric element arrays each including a plurality of photo-electric elements disposed so as to mutually correspond in position and optical means for forming a first image and a second image of an object on the first and second arrays, respectively, there is provided first means for calculating the differences between electrical outputs related to the outputs of the mutually corresponding ones of the photoelectric elements of the first and second arrays and adding together the quantities based on said differences, second means for calculating the difference between each electrical output related to the output of each of the photoelectric elements and each electrical output related to the output of the photoelectric element spaced apart from each photoelectric element with a predetermined number of photoelectric elements interposed therebetween in the direction of arrangement of the elements of the arrays and adding together the quantities based on said differences, and third means for detecting the focused condition of the objective lens on the basis of the outputs of said first means and said second means.
摘要翻译：在具有第一和第二光电元件阵列的焦点检测装置中，每个光电元件阵列包括设置成在位置上相互对应的多个光电元件，以及用于形成第一和第二图像上的物体的第一图像和第二图像的光学装置阵列分别提供了用于计算与第一和第二阵列的相互对应的光电元件的输出相关的电输出之间的差异的第一装置，并且基于所述差值将所述量相加在一起，第二装置用于计算与每个光电元件的输出相关的每个电输出和与每个光电元件间隔开的光电元件的输出相关的每个电输出之间的差异与在其间插入的预定数量的光电元件沿元件的排列方向的数组并加在一起基于所述差异的量，以及用于基于所述第一装置和所述第二装置的输出来检测物镜的聚焦状态的第三装置。

37. 发明授权

US09366974B2 Movable body apparatus, pattern forming apparatus and pattern forming method, device manufacturing method, manufacturing method of movable body apparatus, and movable body drive method 有权
标题翻译：移动体装置，图案形成装置和图案形成方法，装置制造方法，移动体装置的制造方法和移动体驱动方法
公开(公告)号：US09366974B2
公开(公告)日：2016-06-14
申请号：US12553549
申请日：2009-09-03
申请人： Yasuo Aoki , Hiroshi Shirasu , Yoshihiko Kudo
发明人： Yasuo Aoki , Hiroshi Shirasu , Yoshihiko Kudo
IPC分类号： G03B27/58 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70758 , G03F7/70716 , G03F7/70791 , H01L21/682
摘要： A substrate stage and an empty-weight canceling mechanism that supports an empty weight of the substrate stage are made up of separate bodies. Accordingly, the size and weight of the substrate stage (a structure including the substrate stage) can be reduced, compared with the case where the substrate stage and the empty-weight canceling mechanism are integrally configured. Further, due to movement of an X coarse movement stage and a Y coarse movement stage by an X drive mechanism and a Y drive mechanism, the substrate stage is driven in an XY plane and also the empty-weight canceling mechanism that supports the empty weight of the substrate stage is driven. With this operation, the substrate stage can be driven without difficulty even when the substrate stage and the empty-weight canceling mechanism are configured of separate bodies.
摘要翻译：支撑衬底台的空重量的衬底台和空重量消除机构由分离的主体构成。因此，与基板台和空重重量抵消机构一体构成的情况相比，能够减小基板台（包括基板载台的结构）的尺寸和重量。此外，由于通过X驱动机构和Y驱动机构的X粗移动台和Y粗移动台的移动，基板台在XY平面中被驱动，并且还支撑空重量的空重量抵消机构的衬底台被驱动。通过该操作，即使基板台和空重量抵消机构由分离的主体构成，也能够无困难地驱动基板台。

38. 发明授权

US08531093B2 Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method 有权
标题翻译：放电灯，光源装置，曝光装置和曝光装置的制造方法
公开(公告)号：US08531093B2
公开(公告)日：2013-09-10
申请号：US11896416
申请日：2007-08-31
申请人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
发明人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
IPC分类号： H01J7/26 , H01J1/02 , H01J61/52 , F21V29/00 , H01R13/00
CPC分类号： F21V19/006 , G03F7/70016 , H01J5/56 , H01J61/523 , H01J61/822
摘要： A light source apparatus is equipped with a discharge lamp, which has a glass tube that forms a light emitting part and a base member that is coupled thereto, and a mounting apparatus that holds the discharge lamp via the base member. Therein, the base member has a flange part that contacts positioning plate of the mounting apparatus, and a fixed part that is urged with a pressing force that presses the flange part to the positioning plate. Furthermore, the mounting apparatus has a fixing arm that urges the fixed part by a compression coil spring.
摘要翻译：光源装置配备有放电灯，其具有形成发光部的玻璃管和与其连接的基座部件，以及通过基座部件保持放电灯的安装装置。其特征在于，所述基座部件具有与所述安装装置的定位板接触的凸缘部以及将所述凸缘部压向所述定位板的按压力而被推压的固定部。此外，安装装置具有通过压缩螺旋弹簧推压固定部的固定臂。

39. 发明申请

US20080218049A1 Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method 有权
标题翻译：放电灯，光源装置，曝光装置和曝光装置的制造方法
公开(公告)号：US20080218049A1
公开(公告)日：2008-09-11
申请号：US11896416
申请日：2007-08-31
申请人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
发明人： Hiroshi Shirasu , Yasuo Aoki , Motoo Koyama , Takayuki Kikuchi
IPC分类号： H01J7/26 , H01J61/52 , H01J9/46
CPC分类号： F21V19/006 , G03F7/70016 , H01J5/56 , H01J61/523 , H01J61/822
摘要： A light source apparatus is equipped with a discharge lamp, which has a glass tube that forms a light emitting part and a base member that is coupled thereto, and a mounting apparatus that holds the discharge lamp via the base member. Therein, the base member has a flange part that contacts positioning plate of the mounting apparatus, and a fixed part that is urged with a pressing force that presses the flange part to the positioning plate. Furthermore, the mounting apparatus has a fixing arm that urges the fixed part by a compression coil spring.
摘要翻译：光源装置配备有放电灯，其具有形成发光部的玻璃管和与其连接的基座部件，以及通过基座部件保持放电灯的安装装置。其特征在于，所述基座部件具有与所述安装装置的定位板接触的凸缘部以及将所述凸缘部压向所述定位板的按压力而被推压的固定部。此外，安装装置具有通过压缩螺旋弹簧推压固定部的固定臂。

40. 发明申请

US20080192216A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 有权
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20080192216A1
公开(公告)日：2008-08-14
申请号：US12078863
申请日：2008-04-07
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/44
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.
摘要翻译：一种装置包括多个投影光学系统，每个投影光学系统包括布置在第一平面和第二平面之间的光路中的光学元件，并且通过光学元件将第一平面的辐射图形形成在第二平面上的曝光场上。可移动部分相对于投影光学系统设置在第二平面的侧面，该投影光学系统在扫描曝光期间在第二平面中沿第一方向相对于曝光场移动物体，其中辐射当物体沿第一方向移动时，在物体上形成图案。投影光学系统可以包括可调楔形棱镜。投影光学系统可以包括第一和第二光学单元，第一和第二光学单元的光轴彼此偏心。

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