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    • 31. 发明申请
    • Manufacturing method of semiconductor device
    • 半导体器件的制造方法
    • US20070128833A1
    • 2007-06-07
    • US11600070
    • 2006-11-16
    • Tomoyuki AokiTomoko TamuraTakuya TsurumeKoji Dairiki
    • Tomoyuki AokiTomoko TamuraTakuya TsurumeKoji Dairiki
    • H01L21/00
    • H01L27/1266H01L21/78H01L27/1214
    • It is an object to provide a manufacturing method of a semiconductor device with high reliability. A plurality of first semiconductor integrated circuits, a plurality of second semiconductor integrated circuits each of which is arranged to be adjacent to one of the first semiconductor integrated circuits, a plurality of third semiconductor integrated circuits each of which is arranged to be adjacent to one of the first semiconductor integrated circuits and one of the second semiconductor integrated circuits, and a plurality of fourth semiconductor integrated circuits each of which is arranged to be adjacent to one of the first semiconductor integrated circuits, one of the second semiconductor integrated circuits, and one of the third semiconductor integrated circuits are formed over a first substrate. The first semiconductor integrated circuits are transferred to a second substrate. A first protective layer is formed to cover the first semiconductor integrated circuits and a surface of the second substrate in the periphery of the first semiconductor integrated circuits. The second substrate and the first protective layer are divided so that the plurality of the first semiconductor integrated circuits is divided into individual pieces and part of the second substrate remains in the periphery of the first semiconductor integrated circuits. Accordingly, a semiconductor device having the first semiconductor integrated circuit is manufactured.
    • 本发明的目的是提供一种具有高可靠性的半导体器件的制造方法。 多个第一半导体集成电路,多个第二半导体集成电路,每个第二半导体集成电路被布置为与第一半导体集成电路中的一个相邻,多个第三半导体集成电路被布置为与 第一半导体集成电路和第二半导体集成电路之一,以及多个第四半导体集成电路,每个第四半导体集成电路被布置为与第一半导体集成电路之一相邻,第二半导体集成电路之一和第二半导体集成电路之一 第三半导体集成电路形成在第一基板上。 第一半导体集成电路被转移到第二衬底。 形成第一保护层以覆盖第一半导体集成电路和第一半导体集成电路的周边中的第二基板的表面。 第二基板和第一保护层被分割成使得多个第一半导体集成电路被分成单独的部分,并且第二基板的一部分保留在第一半导体集成电路的周围。 因此,制造具有第一半导体集成电路的半导体器件。
    • 33. 发明申请
    • Information processing apparatus with a function for low-power operation
    • 具有低功率运行功能的信息处理装置
    • US20050166078A1
    • 2005-07-28
    • US11028072
    • 2005-01-04
    • Hisashi TaniguchiTetsuya EsakiTomoyuki Aoki
    • Hisashi TaniguchiTetsuya EsakiTomoyuki Aoki
    • G06F1/32G06F1/30G06F3/06
    • G06F1/3256G06F1/3203G06F1/3287Y02D10/1542Y02D10/171
    • An information processing apparatus which comprises a recording section for recording information in a removable recording medium, a switch, a computer, a power supply section for supplying power to the recording section and the computer, and an operating system which is software for controlling the computer. In which, the power supply section controls power supply to the recording section and the computer individually, only the power supply to the recording section is controlled ON/OFF corresponding to a state of the switch. The operating system conducts a processing based on a presumption that the recording section is not connected to. Under the above-described configuration, when there is no access made to the recording section, the power supply is disconnected not only to the recording section but also to a constituent part used for making access to the recording section. Thus the advantage of low-power operation is further enhanced.
    • 一种信息处理设备,包括用于在可移动记录介质中记录信息的记录部分,开关,计算机,用于向记录部分和计算机供电的电源部分,以及作为控制计算机的软件的操作系统 。 其中,电源部分分别控制对记录部分和计算机的电源,只有与记录部分的电源相对应地被控制为ON / OFF。 操作系统基于假设记录部分未连接进行处理。 在上述配置下,当不存在对记录部分的访问时,电源不仅与记录部分断开,而且与用于访问记录部分的组成部分断开。 因此,进一步提高了低功率运行的优点。
    • 34. 发明授权
    • Surface-treatment method for tin-plated drawn and ironed cans
    • 镀锡拉丝和熨烫罐的表面处理方法
    • US5520959A
    • 1996-05-28
    • US910081
    • 1992-07-10
    • Shigeo TanakaTomoyuki AokiMasayuki Yoshida
    • Shigeo TanakaTomoyuki AokiMasayuki Yoshida
    • C23C22/08C23C22/23B05D3/02
    • C23C22/08C23C22/23
    • A surface which has excellent adhesivity to paint, good corrosion resistance, and low friction may be obtained on drawn and iron tin plated cans by spraying the can surface for a time between 5 and 60 seconds at a temperature between 40.degree. and 60.degree. C. with an aqueous treating liquid having a pH between 4 and 6 and comprising (i) orthophosphoric acid and/or condensed phosphoric acids and (ii) a concentration of at least 0.1 w/o of a water soluble oligomer according to the general formula: ##STR1## wherein n is a number with a value between 10 and 30 and each of X and Y independently represents hydrogen or a group Z, wherein Z has a chemical composition conforming to the general formula: ##STR2## wherein each of R.sub.1 and R.sub.2 is an alkyl or hydroxyalkyl group having from 1 to 5 carbon atoms, except that at least 25% of the total of all the X and Y groups in the oligomer are Z rather than hydrogen; and drying the surface thus sprayed, optionally after having first rinsed the sprayed surface with water.
    • PCT No.PCT / US91 / 00202 Sec。 371日期:1992年7月10日 102(e)日期1992年7月10日PCT 1991年1月1日PCT PCT。 公开号WO91 / 10756 日期:1991年7月25日。通过在5和60秒之间的温度下,在拉伸和镀锡的罐上获得具有优异的涂料粘附性,良好的耐腐蚀性和低摩擦力的表面, 40℃和60℃,pH为4至6,并包含(i)正磷酸和/或缩合磷酸的水性处理液,和(ii)至少0.1w / o的水溶性低聚物的浓度 根据通式:其中n是数值在10和30之间,X和Y各自独立地表示氢或基团Z,其中Z具有符合以下通式的化学组成: 其中R 1和R 2各自为具有1至5个碳原子的烷基或羟烷基,除了低聚物中所有X和Y基团的总和中的至少25%为Z而不是氢; 并且任选地在首先用水冲洗喷射表面之后干燥所喷射的表面。
    • 36. 发明授权
    • Method for cleaning aluminum and aluminum alloys
    • 铝和铝合金清洗方法
    • US5382295A
    • 1995-01-17
    • US64082
    • 1993-05-20
    • Tomoyuki AokiYoji Ono
    • Tomoyuki AokiYoji Ono
    • F28F13/18C23G1/22F28F19/02C11D7/06C23G1/14
    • C23G1/22
    • An aqueous alkaline cleaner for aluminum has a pH in the range from 10.0-12.0 and contains:(A) from 0.5 to 10.0 g/L of an alkali builder component;(B) from 0.5 to 10.0 g/L of aminoalkyl- and/or hydroxyalkyldi-phosphonic acids and/or their water soluble salts;(C) from 0.1 to 3.0 g/L of an aluminum ion sequestering agent component; and(D) from 0.5 to 5.0 g/L of a surfactant component.Cleaning aluminum and aluminum alloy with such a cleaner generates an excellent surface condition with respect to de-smutting performance, water wettability, avoidance of black smut production, blackening, and paint adherence at least as good as that achieved with conventional acid cleaners, without requiring any acid wash.
    • PCT No.PCT / US91 / 08250 Sec。 371日期:1993年5月20日 102(e)日期1993年5月20日PCT 1991年11月12日PCT。用于铝的碱性水性碱性清洁剂的pH为10.0-12.0,含有:(A)0.5至10.0g / L的碱助洗剂 零件; (B)0.5至10.0g / L氨基烷基 - 和/或羟烷基二膦酸和/或其水溶性盐; (C)为0.1〜3.0g / L的铝离子螯合剂成分; 和(D)0.5-5.0g / L表面活性剂组分。 使用这种清洁剂清洁铝和铝合金,在去除斑点性能,水润湿性,避免黑色黑点生成,黑化和涂料粘附性方面产生极好的表面状况,至少与常规酸性清洁剂相同,不需要 任何酸洗。
    • 38. 发明授权
    • Fluoride and chromium free acid etchant rinse for aluminum
    • 氟化物和无铬铬酸蚀刻剂冲洗铝
    • US4980076A
    • 1990-12-25
    • US403625
    • 1989-09-06
    • Shigeo TanakaTomoyuki AokiYasuo IinoYoji Ono
    • Shigeo TanakaTomoyuki AokiYasuo IinoYoji Ono
    • C23G1/12
    • C23G1/125
    • Problems with previously known aqueous acidic rinsing solutions for aluminum after shaping while using surface lubricants are avoided by use of a solution which contains water and (A) orthophosphoric acid in an amount to give a stoichiometric equivalent of 3.0 to 50 g/L as PO.sub.4.sup.-3, (B) an aluminum ion sequestrant component in an amount of 0.01 to 10.0 g/L; and (C) 20 to 170 ppm of ferric ion. The ferric ions act to inhibit corrosion of the stainless steel process equipment. Preferably the solution also contains 0.1 to 1.0 g/L of H.sub.2 O.sub.2, NO.sub.2.sup.-1 ions, or a mixture thereof to reoxidize ferrous ions formed by reduction of ferric ions during use of the solution and thus maintain the concentration of ferric ions above 20 ppm at all times. The solution may also contain surfactant and up to 10 g/L of dissolved aluminum ions.
    • 使用含有水的溶液和(A)正磷酸的量,通过使用表面润滑剂成型后的铝的先前已知的水性酸性漂洗溶液的问题可以避免,其量为化学计量当量为3.0〜50g / L,PO4- 3,(B)0.01〜10.0g / L的铝离子螯合剂成分; 和(C)20〜170ppm的铁离子。 铁离子用于抑制不锈钢工艺设备的腐蚀。 优选地,溶液还含有0.1至1.0g / L的H 2 O 2,NO 2 -1离子或其混合物,以在溶液的使用期间再氧化由铁离子还原形成的亚铁离子,并且因此将铁离子的浓度保持在20ppm以上 一直。 该溶液还可以含有表面活性剂和高达10g / L的溶解的铝离子。