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31. 发明授权

US08671875B2 Liquid processing apparatus, liquid processing method and storage medium 有权
标题翻译：液体处理装置，液体处理方法和储存介质
公开(公告)号：US08671875B2
公开(公告)日：2014-03-18
申请号：US12540219
申请日：2009-08-12
申请人： Shuichi Nagamine , Naofumi Kishita , Satoshi Biwa , Kouji Fujimura
发明人： Shuichi Nagamine , Naofumi Kishita , Satoshi Biwa , Kouji Fujimura
IPC分类号： B05B13/04 , B05C11/00
CPC分类号： H01L21/67051 , G03F7/162 , G03F7/3021 , H01L21/6715 , H01L21/67178
摘要： Disclosed is a liquid processing apparatus capable of increasing the number of arranged substrate retainers without increasing the total exhaust amount of the liquid processing apparatus. A N-number (N is an integer identical to or greater than three) of cup bodies are inhaled and exhausted in total exhaust amount E through a plurality of separate exhaustion passage each having a first damper, and through a common exhaustion passage connected in common downstream of the separate exhaustion passages. The first dampers are configured such that an external air is received from the cup body in a first intake amount of external air E1 for one of the cup bodies where a chemical liquid nozzle is placed at a setting location facing a wafer, and an external air is received from each of the other cup bodies in a second intake amount of external air E2 less than the first amount E1 and the intake amount of external air from both each of the other cup bodies and each of branched passages equals (E−E1)/(n−1).
摘要翻译：公开了一种液体处理装置，其能够增加布置的基板保持件的数量，而不增加液体处理装置的总排气量。通过具有第一阻尼器的多个分开的排气通道，并且通过共同连接的共同的排气通道吸入并排出具有总排气量E的杯体的N数（N是等于或大于3的整数）在分开的排气通道的下游。第一阻尼器构造成使得外部空气从杯体中以第一吸入量的外部空气E1接收，用于杯形体之一，其中化学液体喷嘴位于面向晶片的设置位置处，并且外部空气从每个其他杯体的第二吸入量小于第一量E1的外部空气E2和来自两个其他杯体和每个分支通道的外部空气的吸入量等于（E-E1） /（n-1）。

32. 发明申请

US20130008872A1 SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD 有权
标题翻译：基板液体处理装置和底板液体处理方法
公开(公告)号：US20130008872A1
公开(公告)日：2013-01-10
申请号：US13541831
申请日：2012-07-05
申请人： Jiro Higashuima , Norihiro Itoh , Nobuhiro Ogata , Shuichi Nagamine
发明人： Jiro Higashuima , Norihiro Itoh , Nobuhiro Ogata , Shuichi Nagamine
IPC分类号： B05C13/02 , B08B3/04 , B44C1/22
CPC分类号： H01L21/67017 , B05B14/00 , B05C11/08 , B08B3/04 , B08B3/08 , B08B15/02 , G03F7/40 , H01L21/67051 , H01L21/6708 , H01L21/6715
摘要： A substrate liquid processing apparatus includes a substrate rotation unit configured to hold and rotate a substrate within a processing space; a processing solution supply unit configured to selectively supply multiple kinds of processing solutions; a collection cup configured to collect the processing solutions; liquid collection regions formed at the collection cup and configured to collect the processing solutions; a liquid drain opening formed at a bottom portion of the collection cup and configured to discharge the processing solutions; an exhaust opening formed above the liquid drain opening; a fixed cover configured to cover an upper portion of the exhaust opening with a space therebetween; an elevating cup provided above the fixed cover and configured to guide the processing solutions into the liquid collection regions; and a cup elevating unit configured to move up and down the elevating cup depending on the kinds of the processing solutions.
摘要翻译：基板液体处理装置包括：基板旋转单元，被配置为在处理空间内保持和旋转基板; 处理溶液供应单元，被配置为选择性地提供多种处理方案; 收集杯，其被配置为收集处理溶液; 在收集杯处形成的液体收集区域，并且被构造成收集处理溶液; 液体排出口，形成在所述收集杯的底部并且被配置为排出所述处理溶液; 形成在排液口上方的排气口; 固定盖，其被构造成在其间具有空间覆盖所述排气口的上部; 提升杯，其设置在所述固定盖的上方并且被构造成将所述处理溶液引导到所述液体收集区域中; 以及杯升降单元，其配置为根据处理溶液的种类上下移动升降杯。

33. 发明申请

US20120160275A1 LIQUID TREATMENT APPARATUS AND METHOD 有权
标题翻译：液体处理装置及方法
公开(公告)号：US20120160275A1
公开(公告)日：2012-06-28
申请号：US13337547
申请日：2011-12-27
申请人： Jiro HIGASHIJIMA , Nobuhiro OGATA , Satoshi KANEKO , Shuichi NAGAMINE , Yoshihiro KAI
发明人： Jiro HIGASHIJIMA , Nobuhiro OGATA , Satoshi KANEKO , Shuichi NAGAMINE , Yoshihiro KAI
IPC分类号： B08B3/04
CPC分类号： H01L21/67051 , H01L21/68728 , H01L21/68785 , H01L21/68792
摘要： Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate.
摘要翻译：公开了一种液体处理装置，其包括位于基板保持单元保持的基板下方的喷嘴。喷嘴能够喷射液体和气体的混合物的两种流体。喷嘴包括用于喷射液体的多个喷液通道和用于喷射气体的多个气体喷射通道，并且还包括各自对应于一个喷液通道的多个液体喷射口。液体喷射口排列在从基板的周边部分下方的位置向内延伸的水平线上。液体喷射口被配置为沿喷射方向朝向基板的下表面喷射液体，并且喷射方向以相对于平面旋转的旋转驱动单元旋转的基板的旋转方向以倾斜角度倾斜包括基底的下表面。

34. 发明申请

US20090033898A1 DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20090033898A1
公开(公告)日：2009-02-05
申请号：US12173262
申请日：2008-07-15
申请人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
发明人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
IPC分类号： G03B27/42 , G03F7/22
CPC分类号： G03B27/42 , G03F7/3021 , H01L21/6715 , H01L21/67178
摘要： A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.
摘要翻译：显影装置包括：处理各自涂覆有抗蚀剂并通过显影处理曝光处理的基板的显影装置包括：多个显影单元，每个显影单元设置有用于将显影剂稳定地浇注到基板上的基板保持装置，第一显影剂喷嘴通过多个显影单元共同使用将显影剂倾倒在由每个基板保持装置保持的基板上的带状流中，用于将第一显影剂喷嘴从另一个承载到显影单元的喷嘴驱动机构，并且移动第一显影剂喷嘴，其中一个带状区域的一端，显影剂将通过第一显影剂喷嘴注入到每个显影单元中的基板的中心，使得其中的部分在显影剂注入的基板从中心部分向周边部分移动，或从周边部分朝向表面的中心部分移动 e基板，其全部用显影剂膜涂覆基板的表面;以及第二显影剂喷嘴，用于将显影剂倾倒成比带状区域的短的短的短的长度的圆形区域或带状区域，第一显影剂喷嘴将显影剂倾倒在其上已由第一显影剂喷嘴形成有显影剂膜的基板的中心部分。喷嘴被选择性地用于显影步骤。

35. 发明授权

US06533864B1 Solution processing apparatus and method 有权
标题翻译：解决方案处理装置和方法
公开(公告)号：US06533864B1
公开(公告)日：2003-03-18
申请号：US09639172
申请日：2000-08-16
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： B05C1110
CPC分类号： H01L21/6715 , B05C11/08
摘要： An upper side of a cup provided around a wafer is formed in a rectangular shape and a lower side thereof is formed in a cylindrical shape. The cup is formed such that, when seen from above, the portion forming the cylindrical shape is positioned within the portion forming the rectangular shape. The cup has a raising and lowering mechanism and is controlled by a control section. The upper side of the cup is placed by the side of the wafer during a scan by a supply nozzle. The lower side of the cup is placed over an upper level and a lower level of the wafer while a rinse liquid and a developing solution are shaken off. The scan by the supply nozzle is performed with the supply nozzle positioned in the upper cup portion.
摘要翻译：设置在晶片周围的杯的上侧形成为矩形，其下侧形成为圆筒状。杯形成为从上方观察，形成圆筒形状的部分位于形成矩形形状的部分内。杯具有升降机构，由控制部控制。杯子的上侧在扫描期间被供给喷嘴放置在晶片的侧面。将杯的下侧放置在晶片的上层和下层上，同时冲洗液体和显影液被摇动。由供给喷嘴进行的扫描由位于上杯部的供给喷嘴进行。

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