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21. 发明授权

US07692764B2 Exposure apparatus, operation decision method, substrate processing system, maintenance management method, and device manufacturing method 有权
标题翻译：曝光装置，操作决定方法，基板处理系统，维护管理方法和装置制造方法
公开(公告)号：US07692764B2
公开(公告)日：2010-04-06
申请号：US11660906
申请日：2005-08-29
申请人： Yousuke Shirata
发明人： Yousuke Shirata
IPC分类号： G03B27/42 , G03B27/32 , G03D5/00 , G06F19/00
CPC分类号： H01L21/67225 , G03F7/70525
摘要： An exposure apparatus is equipped with a main controller that decides an operation of the exposure apparatus based on information on maintenance from a C/D. Therefore, the main controller can decide to perform a specific operation, which is necessary for maintaining performance of the exposure apparatus and requires stop of the primary operation of the exposure apparatus, during maintenance of the C/D, that is, when the primary operation of the exposure apparatus has to be stopped by necessity, in parallel with the maintenance of the C/D. As a consequence, downtime of the exposure apparatus necessary for performing the specific operation can be decreased as a whole, which makes it possible to improve the operating rate without lowering apparatus performance of the exposure apparatus that is inline connected to a substrate processing apparatus.
摘要翻译：曝光装置配备有基于来自C / D的关于维护的信息来决定曝光装置的操作的主控制器。因此，主控制器可以决定执行特定的操作，这是为了维持曝光装置的性能所必需的，并且在C / D的维护期间，即主要操作时，要求停止曝光装置的主要操作必须与C / D的维护同时停止曝光装置。结果，整体上可以减少执行特定操作所需的曝光装置的停机时间，这样可以在不降低与衬底处理装置在线连接的曝光装置的装置性能的情况下提高工作速度。

22. 发明授权

US07651285B2 Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium 失效
标题翻译：边缘曝光装置，涂层显影装置，边缘曝光方法和涂覆显影方法以及存储介质
公开(公告)号：US07651285B2
公开(公告)日：2010-01-26
申请号：US11907131
申请日：2007-10-09
申请人： Hitoshi Kosugi , Taro Yamamoto , Yoshiaki Yamada , Yasuhito Saiga
发明人： Hitoshi Kosugi , Taro Yamamoto , Yoshiaki Yamada , Yasuhito Saiga
IPC分类号： G03D5/00 , G03B27/32 , B05C11/02
CPC分类号： G03B27/52 , G03F7/2028
摘要： An edge exposure apparatus performing an exposure process on an edge portion of a wafer having a coating film (resist film) formed thereon includes position detection means for detecting positional data of an outer edge of a wafer held by a spin chuck, an exposure portion for performing an exposure process on the edge portion of the wafer, a development nozzle supplying a developer to the exposed region, and alignment means for horizontally moving the spin chuck. An exposure process is performed by the exposure portion on the edge portion of the wafer held by the spin chuck while the alignment means is controlled, based on the positional data of the outer edge of the wafer which is detected by the position detection means, such that the positional relation between the outer edge of the wafer and the exposure portion is kept constant.
摘要翻译：在其上形成有涂膜（抗蚀剂膜）的晶片的边缘部分进行曝光处理的边缘曝光装置包括位置检测装置，用于检测由旋转卡盘保持的晶片的外边缘的位置数据，对晶片的边缘部分进行曝光处理，将显影剂供应到曝光区域的显影喷嘴以及用于使旋转卡盘水平移动的对准装置。基于由位置检测装置检测到的晶片的外边缘的位置数据，通过控制对准装置的由旋转卡盘保持的晶片的边缘部分上的曝光部分进行曝光处理，晶片的外边缘与曝光部分之间的位置关系保持恒定。

23. 发明授权

US07651284B2 Development apparatus and development method 失效
标题翻译：开发设备和开发方法
公开(公告)号：US07651284B2
公开(公告)日：2010-01-26
申请号：US11559112
申请日：2006-11-13
申请人： Tetsuya Kitamura
发明人： Tetsuya Kitamura
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A development apparatus has a holder which horizontally holds a substrate, a nozzle which supplies a developer to a resist film on the substrate held by the holder, a liquid flow suppressing member whose size in a two-dimensional plane viewing field is equal to or larger than that of the substrate and which has a mesh having many openings and hydrophilic properties with respect to the developer and transmits the developer supplied from the nozzle through the openings of the mesh to form a liquid film of the developer between the mesh and the substrate, and a moving mechanism which movably supports this liquid flow suppressing member, sets the mesh to face the resist film on the substrate and brings the mesh into contact with a surface of the liquid film of the developer or immerges the mesh in the liquid film.
摘要翻译：显影装置具有水平地保持基板的保持器，将由显影剂供给到由保持器保持的基板上的抗蚀剂膜的喷嘴，在二维平面视野中的尺寸等于或大于其的尺寸的液体流动抑制构件并且具有相对于显影剂具有许多开口和亲水性质的网，并且将从喷嘴供给的显影剂透过网孔的开口，以形成网状物和基底之间的显影剂的液膜，以及移动机构，其可移动地支撑该液体流动抑制构件，将网格设置为面对基板上的抗蚀剂膜，并使网格与显影剂的液膜的表面接触或浸没在液膜中。

24. 发明授权

US07630052B2 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device 失效
标题翻译：曝光处理系统，曝光处理方法以及半导体装置的制造方法
公开(公告)号：US07630052B2
公开(公告)日：2009-12-08
申请号：US11024322
申请日：2004-12-29
申请人： Takuya Kono , Nobuhiro Komine , Tatsuhiko Higashiki , Shoichi Harakawa , Makato Ikeda
发明人： Takuya Kono , Nobuhiro Komine , Tatsuhiko Higashiki , Shoichi Harakawa , Makato Ikeda
IPC分类号： G03B27/32 , G03B27/54 , G03D5/00 , G03C5/00 , H01L21/00
CPC分类号： H01L21/67253
摘要： An exposure processing system comprises an exposure apparatus to expose a resist on a wafer, a heating apparatus comprising heating apparatus units, the heating apparatus heating the exposed resist by a heating apparatus unit in the heating apparatus units, a developing apparatus comprising developing apparatus units, the developing apparatus developing the exposed and heated resist by a developing apparatus unit in the developing apparatus units, and a control apparatus to control the exposure apparatus by using correction data so that a wafer on process object being exposed, the correction data being data for correcting a dimensional dispersion of a resist pattern caused by a pair of heating apparatus unit and developing apparatus unit used for the wafer on the process object, the pair of heating and developing apparatus unit comprising a heating and developing apparatus unit in the heating and developing apparatus used for the wafer on the process object.
摘要翻译：曝光处理系统包括：曝光装置，用于在晶片上曝光抗蚀剂，加热装置包括加热装置单元，加热装置通过加热装置单元中的加热装置加热曝光的抗蚀剂;显影装置，包括显影装置单元，显影装置通过显影装置单元中的显影装置单元显影曝光和加热的抗蚀剂;以及控制装置，通过使用校正数据来控制曝光装置，使得处理对象被曝光的晶片，校正数据是用于校正的数据由一对加热装置单元和用于处理对象上的晶片的显影装置单元引起的抗蚀剂图案的尺寸分散，所述一对加热显影装置单元包括使用的加热和显影装置中的加热和显影装置单元用于处理对象上的晶圆。

25. 发明授权

US07591600B2 Method and system for monitoring photolithography processing based on a batch change in light sensitive material 有权
标题翻译：基于光敏材料批次变化监控光刻处理的方法和系统
公开(公告)号：US07591600B2
公开(公告)日：2009-09-22
申请号：US11678410
申请日：2007-02-23
申请人： David Dixon , Bryan Swain
发明人： David Dixon , Bryan Swain
IPC分类号： G03D5/00 , B05C11/00 , G03F1/00
CPC分类号： G03F7/70425 , G03F7/70608 , G03F7/70625
摘要： A method for monitoring photolithography processing includes monitoring application of a light sensitive material to the surface of each of a plurality of substrates and detecting that a supply of the light sensitive material applied to the substrates has changed from a first batch of light sensitive material to a second batch light sensitive material. A change in photolithography process results caused by the change from the first batch to the second batch of light sensitive material is determined. Also included is initiating corrective action based on the change in photolithography process results.
摘要翻译：一种用于监测光刻处理的方法包括：将感光材料的应用监测到多个基板中的每一个的表面，并检测施加到基板的光敏材料的供应已经从第一批感光材料变为第二批光敏材料。确定由第一批到第二批感光材料的变化引起的光刻工艺结果的变化。还包括基于光刻过程结果的变化启动校正动作。

26. 发明授权

US07563042B2 Substrate carrying apparatus, substrate carrying method, and coating and developing apparatus 有权
标题翻译：基板搬送装置，基板搬运方法以及涂装显影装置
公开(公告)号：US07563042B2
公开(公告)日：2009-07-21
申请号：US11504785
申请日：2006-08-16
申请人： Masahiro Nakaharada , Seiki Ishida , Taro Yamamoto , Katsuhiro Morikawa
发明人： Masahiro Nakaharada , Seiki Ishida , Taro Yamamoto , Katsuhiro Morikawa
IPC分类号： G03D5/00 , G03B27/52 , C23C16/18
CPC分类号： G03D3/08 , H01L21/67126 , H01L21/68707 , Y10S414/141
摘要： A substrate carrying apparatus includes an arm body; supporting portion provided in the arm body and adapted to support a region inside the periphery of the rear face of the substrate; a one-side restricting portion and an other-side restricting portion provided at opposite positions across the periphery of the substrate to restrict the peripheral positions of the substrate; and liquid receivers provided between each supporting portion and each restricting portion. A liquid drop attached to the rear peripheral portion of the substrate flows down on the bottom face of each liquid receiver. Even though repeated substrate carrying operations are performed and thus the liquid drop is accumulated in each liquid receiver, there is no risk that the liquid drop in each liquid receiver would be scattered in the air by the action of the periphery of the substrate and hence the scattered liquid would be attached again onto the surface of the substrate.
摘要翻译：基板承载装置包括臂体; 支撑部，其设置在所述臂主体中并且适于支撑所述基板的后表面的周边内的区域; 一侧限制部和另一侧限制部，设置在穿过基板的周边的相对位置，以限制基板的周边位置; 以及设置在每个支撑部分和每个限制部分之间的液体接收器。附着在基板的后周缘部分的液滴在每个液体接收器的底面上向下流动。即使进行重复的基板搬运操作，因此液滴在每个液体接收器中积聚，也不存在每个液体接收器中的液滴通过基板周边的作用在空气中散射的风险，因此分散的液体将再次附着到基底的表面上。

27. 发明授权

US07549811B2 Substrate treating apparatus 有权
标题翻译：底物处理装置
公开(公告)号：US07549811B2
公开(公告)日：2009-06-23
申请号：US11948198
申请日：2007-11-30
申请人： Yoshihisa Yamada , Masafumi Maeda , Takashi Taguchi
发明人： Yoshihisa Yamada , Masafumi Maeda , Takashi Taguchi
IPC分类号： G03D5/00 , G03B13/00 , G03B27/52 , B05C11/02 , B05B13/04
CPC分类号： H01L21/67748 , H01L21/67178 , H01L21/67225 , H01L21/67276 , Y10S414/135
摘要： A forward direction-only path (first substrate transport path) is formed for transporting substrates in a forward direction to pass the substrates on to an exposing apparatus. A separate, substrate transport path (second substrate transport path) is formed exclusively for post-exposure bake (PEB). Substrate transport along each path is carried out independently of substrate transport along the other. A fourth main transport mechanism is interposed as a predetermined substrate transport mechanism between transfer points consisting of a buffer acting as a temporary storage module for temporarily storing the substrates and a post-exposure bake (PEB) unit corresponding to a predetermined treating unit. This arrangement forms the path for transporting the substrates between the buffer and the PEB unit, to allow PEB treatment of the substrates to be performed smoothly. Similarly, the substrates are transported smoothly to the buffer.
摘要翻译：形成向前方向路径（第一基板输送路径），用于沿正向方向输送基板，使基板通过曝光装置。单独的基板输送路径（第二基板输送路径）专门用于后曝光烘烤（PEB）。沿着每个路径的基板传送独立于彼此的基板传送进行。第四主要传送机构作为预定的基板传送机构，在由用作临时存储基板的临时存储模块的缓冲器和对应于预定处理单元的曝光后烘烤（PEB）单元组成的传送点之间。该布置形成用于在缓冲器和PEB单元之间传送基板的路径，以允许平滑地执行基板的PEB处理。类似地，衬底被平滑地输送到缓冲器。

28. 发明申请

US20090059187A1 COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM 有权
标题翻译：涂料和开发设备，涂料和开发方法和储存介质
公开(公告)号：US20090059187A1
公开(公告)日：2009-03-05
申请号：US12197682
申请日：2008-08-25
申请人： Yoshitaka Hara , Shingo Katsuki
发明人： Yoshitaka Hara , Shingo Katsuki
IPC分类号： G03B27/32 , G03D5/00
CPC分类号： H01L21/67225 , G03F7/70525 , G03F7/7075 , G03F7/70808 , H01L21/6715 , H01L21/67745 , Y10S414/14
摘要： Disclosed herein is a coating and developing apparatus 1 whose decreases in substrate-conveying accuracy can be suppressed. A processing block S2 of the coating and developing apparatus 1 includes multiple resist-film forming blocks G2, G3, and a developing block G1. A conveyance element 12 for substrate loading into the processing block S2 is provided to convey substrates W from a carrier C to the resist-film forming blocks G2, G3. Also, a conveyance element I for substrate loading into an exposure apparatus S4 is provided in an interface block S3 to load the substrates W into the exposure apparatus S4 and after unloading the substrates W from the exposure apparatus S4, convey the substrates W to the developing block G1. The processing block loading conveyance element 12 conveys the substrates W, one at a time, from the carrier C to each resist-film forming block G2, G3, sequentially and periodically, and the exposure apparatus loading conveyance element I loads the substrates W from each resist-film forming block G2, G3 into the exposure apparatus S4 in the sequence that each has been conveyed to the resist-film forming block G2, G3 by the processing block loading conveyance element 12.
摘要翻译：这里公开了可以抑制基板输送精度降低的涂布显影装置1。涂布显影装置1的处理块S2包括多个抗蚀剂膜形成块G2，G3和显影块G1。提供了用于将衬底装载到处理块S2中的传送元件12，用于将衬底W从载体C传送到抗蚀剂膜形成块G2，G3。此外，在接口块S3中设置用于将曝光装置S4中的基板载置的输送元件I，将基板W装载到曝光装置S4中，在从曝光装置S4取出基板W之后，将基板W输送到显影块G1。处理块装载传送元件12依次和周期地将基板W一次一个地从载体C传送到每个抗蚀剂膜形成块G2，G3，并且曝光装置装载传送元件I从每个基板W装载基板W 抗蚀剂膜形成块G2，G3以通过处理块装载传送元件12被传送到抗蚀剂膜形成块G2，G3的顺序进入曝光装置S4。

29. 发明申请

US20080267619A1 DEVELOPING APPARATUS, DEVELOPING METHOD, COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法，涂装和开发系统和存储介质
公开(公告)号：US20080267619A1
公开(公告)日：2008-10-30
申请号：US12105701
申请日：2008-04-18
申请人： Nobuaki MATSUOKA
发明人： Nobuaki MATSUOKA
IPC分类号： G03D5/00
CPC分类号： G03D5/00
摘要： A developing apparatus includes two rotating members 41 and 42 respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism 4 extended between the rotating members 41 and 42 to form a carrying passage, and capable of moving along an orbital path to carry a wafer W supported thereon along the carrying passage, a sending-in transfer unit 31 disposed at the upstream end of the carrying passage, a sending-out transfer unit 32 disposed at the downstream end of the carrying passage, a developer pouring nozzle 71 for pouring a developer onto the wafer W, a cleaning nozzle 72 for pouring a cleaning liquid onto the wafer W, and a gas nozzle 74 for blowing a gas against the wafer W. The developer pouring nozzle 71, the cleaning nozzle 72 and the gas nozzle 74 are arranged in that order in a direction in which the wafer W is carried along the carrying passage between the upstream and the downstream end of the carrying passage.
摘要翻译：显影装置包括分别具有平行的水平旋转轴线和彼此纵向相对布置的两个旋转构件41和42，在旋转构件41和42之间延伸的承载通道形成机构4，以形成承载通道，并且能够沿着携带沿着输送通道支撑在其上的晶片W的轨道，设置在运送通道的上游端的送入传送单元31，设置在运送通道的下游端的送出传送单元32，用于将显影剂倾倒到晶片W上的显影剂倾倒嘴71，用于将清洗液注入到晶片W上的清洁喷嘴72和用于将气体吹向晶片W的气体喷嘴74.显影剂倾倒嘴71，清洁喷嘴 72和气体喷嘴74沿着沿着车辆的上游和下游端之间的输送通道承载晶片W的方向依次布置通行证

30. 发明授权

US07441968B2 Spray development of photosensitive plates 失效
公开(公告)号：US07441968B2
公开(公告)日：2008-10-28
申请号：US11588714
申请日：2006-10-27
申请人： Howard A. Fromson , William J. Rozell , William J. Ryan
发明人： Howard A. Fromson , William J. Rozell , William J. Ryan
IPC分类号： G03D5/00 , B41N3/00
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/24 , B41C2210/262 , G03D5/00 , G03F7/3042
摘要： Excellent development of photosensitive coatings on planographic printing plates is achieved by directing a dynamic flow of fresh alkaline developer solution that impinges on a target area of the coating extending the width of the plate and floods the target area with a turbulent flow. At sufficient volumetric flow rate, the developer solution at the target area is constantly displaced during the development time, whereby no boundary layer forms on and travels with the plate during the development time and thus the target area is always in contact with fresh developer solution.

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