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21. 发明授权

US08212227B2 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 有权
标题翻译：电子束曝光或系统检查或测量装置及其方法和高度检测装置
公开(公告)号：US08212227B2
公开(公告)日：2012-07-03
申请号：US12754181
申请日：2010-04-05
申请人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
发明人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
摘要翻译：配备有高度检测系统的电子束装置包括向样本发射电子束的电子束单元和用于检测设置在桌子上的样本的高度的高度检测系统。高度检测系统包括照明系统，其被配置为将第一和第二光束通过具有多狭缝图案的掩模以基本上相反的方位角和基本上相等的入射角度引导到样本的表面，第一和第二检测器分别检测从样本反射的第一和第二光束的第一和第二多个狭缝图像，并产生其输出信号;以及接收输出信号并产生响应于样本的高度的比较信号的装置。根据比较信号控制电子束单元的物镜。

22. 发明授权

US08164058B2 Specimen observation method 有权
标题翻译：标本观察法
公开(公告)号：US08164058B2
公开(公告)日：2012-04-24
申请号：US12501822
申请日：2009-07-13
申请人： Eiko Nakazawa , Masahiro Tomita , Hiroyuki Kobayashi
发明人： Eiko Nakazawa , Masahiro Tomita , Hiroyuki Kobayashi
IPC分类号： G21K7/00
CPC分类号： G01N23/2252 , H01J37/222 , H01J37/226 , H01J37/228 , H01J37/256 , H01J37/28 , H01J2237/221 , H01J2237/2807
摘要： It is an object of the present invention to provide a specimen observation method, an image processing device, and a charged-particle beam device which are preferable for selecting, based on an image acquired by an optical microscope, an image area that should be acquired in a charged-particle beam device the representative of which is an electron microscope. In the present invention, in order to accomplish the above-described object, there are provided a method and a device for determining the position for detection of charged particles by making the comparison between a stained optical microscope image and an elemental mapping image formed based on X-rays detected by irradiation with the charged-particle beam.
摘要翻译：本发明的目的是提供一种样本观察方法，图像处理装置和带电粒子束装置，其优选用于基于由光学显微镜获取的图像来选择应当获取的图像区域在带电粒子束装置中，其代表是电子显微镜。在本发明中，为了实现上述目的，提供了一种方法和装置，用于通过对染色的光学显微镜图像和基于图像形成的基本映射图像进行比较来确定带电粒子的检测位置通过用带电粒子束照射检测X射线。

23. 发明授权

US08093557B2 Method and apparatus for reviewing defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US08093557B2
公开(公告)日：2012-01-10
申请号：US12573479
申请日：2009-10-05
申请人： Hidetoshi Nishiyama , Toshifumi Honda , Sachio Uto
发明人： Hidetoshi Nishiyama , Toshifumi Honda , Sachio Uto
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , G02B15/14 , G02B21/0016 , H01J37/226 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2817 , H01K3/02
摘要： A method of inspecting defects of a sample includes a first step for, on a basis of position information of defects on a sample placed on a movable table which is previously detected and obtained by an other inspection system, driving the table so that the defects come into a viewing field of an optical microscope having a focus which is adjusted, a second step for re-detecting the defects to obtain a first detection result, a third step for correcting the position information of defects on a basis of position information of defects re-detected of the first detection result, and a fourth step for reviewing the defects whose position information is corrected to obtain a second detection result. The method includes classifying types of defects on basis of the first detection result and the second detection result.
摘要翻译：检查样本缺陷的方法包括：第一步骤，基于放置在可移动台上的样本上的缺陷的位置信息，该样本预先由另一检查系统检测并获得，驱动所述台，使得缺陷到达进入具有调整焦点的光学显微镜的观察区域，第二步骤，用于重新检测缺陷以获得第一检测结果;第三步骤，基于缺陷的位置信息来校正缺陷的位置信息 - 检测到第一检测结果，以及第四步骤，用于检查其位置信息被校正以获得第二检测结果的缺陷。该方法包括基于第一检测结果和第二检测结果对缺陷的类型进行分类。

24. 发明申请

US20110248164A1 Combination Laser and Charged Particle Beam System 有权
标题翻译：组合激光和带电粒子束系统
公开(公告)号：US20110248164A1
公开(公告)日：2011-10-13
申请号：US13082372
申请日：2011-04-07
申请人： Marcus Straw , Mark W. Utlaut , N. William Parker
发明人： Marcus Straw , Mark W. Utlaut , N. William Parker
IPC分类号： H01J37/26 , H01J3/14
CPC分类号： H01J37/28 , H01J37/226 , H01J37/244 , H01J37/3056 , H01J2237/2815 , H01J2237/2855 , H01J2237/3174 , H01J2237/31749
摘要： A combined laser and charged particle beam system. A pulsed laser enables milling of a sample at material removal rates several orders of magnitude larger than possible for a focused ion beam. In some embodiments, a scanning electron microscope enables high resolution imaging of the sample during laser processing. In some embodiments, a focused ion beam enables more precise milling of the sample. A method and structure for deactivating the imaging detectors during laser milling enables the removal of imaging artifacts arising from saturation of the detector due to a plasma plume generated by the laser beam. In some embodiments, two types of detectors are employed: type-1 detectors provide high gain imaging during scanning of the sample with an electron or ion beam, while type-2 detectors enable lower gain imaging and endpoint detection during laser milling.
摘要翻译：组合激光和带电粒子束系统。脉冲激光器可以以比聚焦离子束可能的数个数量级的材料去除速率对样品进行铣削。在一些实施例中，扫描电子显微镜能够在激光加工期间对样品进行高分辨率成像。在一些实施例中，聚焦离子束使得能够更精确地研磨样品。用于在激光研磨期间去激活成像检测器的方法和结构使得能够消除由激光束产生的等离子体羽流引起的由检测器的饱和引起的成像伪影。在一些实施例中，采用两种类型的检测器：第一类检测器在用电子或离子束扫描样品期间提供高增益成像，而类型2检测器在激光研磨期间能够进行较低增益成像和端点检测。

25. 发明授权

US07961397B2 Single-channel optical processing system for energetic-beam microscopes 有权
标题翻译：用于能量束显微镜的单通道光学处理系统
公开(公告)号：US07961397B2
公开(公告)日：2011-06-14
申请号：US12201447
申请日：2008-08-29
申请人： Herschel M. Marchman , Thomas M. Moore , Rocky Kruger
发明人： Herschel M. Marchman , Thomas M. Moore , Rocky Kruger
IPC分类号： G02B27/10
CPC分类号： H01J37/226 , H01J37/3045 , H01J2237/2482 , H01J2237/317 , H01J2237/31749
摘要： A single-channel optical processing system for an energetic-beam instrument has separate sources for processing radiation and illumination radiation. The processing radiation and the illumination radiation are combined in a single optical path and directed to a sample surface inside the energetic-beam instrument through a self-focusing rod lens. The self-focusing rod lens thus has a working distance from the sample surface that will not interfere with typical arrangements of ion beams and electron beams in such instruments. A combination of polarizers and beam splitters allows separation of the combined incident radiation and the combined radiation reflected from the sample surface and returned through the same optical channel, so that the reflected radiation may be directed to an optical detector, such as a camera or spectrometer. In other embodiments, additional illumination of the sample surface is provided at an angle to the central axis of the self-focusing rod lens.
摘要翻译：用于能量束仪器的单通道光学处理系统具有用于处理辐射和照射辐射的单独源。处理辐射和照射辐射在单个光学路径中组合并通过自聚焦棒透镜指向能量束仪器内部的样品表面。因此，自聚焦棒透镜具有与样品表面的工作距离，其不会干扰这些仪器中的离子束和电子束的典型布置。偏振器和分束器的组合允许组合的入射辐射和从样品表面反射的组合辐射分离并通过相同的光学通道返回，使得反射的辐射可以被引导到诸如相机或光谱仪的光学检测器。在其他实施例中，样品表面的附加照明以与自聚焦棒透镜的中心轴成一定角度设置。

26. 发明授权

US07906762B2 Compact scanning electron microscope 有权
标题翻译：紧凑型扫描电子显微镜
公开(公告)号：US07906762B2
公开(公告)日：2011-03-15
申请号：US12303611
申请日：2007-06-07
申请人： Mart Petrus Maria Bierhoff , Bart Buijsse , Cornelis Sander Kooijman , Hugo Van Leeuwen , Hendrik Gezinus Tappel , Colin August Sanford , Sander Richard Marie Stoks , Ben Jacobus Marie Bormans , Steven Berger , Koen Arnoldus Wilhelmus Driessen , Johannes Antonius Hendricus Wilhelmus Gerardus Persoon
发明人： Mart Petrus Maria Bierhoff , Bart Buijsse , Cornelis Sander Kooijman , Hugo Van Leeuwen , Hendrik Gezinus Tappel , Colin August Sanford , Sander Richard Marie Stoks , Ben Jacobus Marie Bormans , Steven Berger , Koen Arnoldus Wilhelmus Driessen , Johannes Antonius Hendricus Wilhelmus Gerardus Persoon
IPC分类号： H01J37/08 , H01J37/18 , H01J5/02
CPC分类号： H01J37/26 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/20 , H01J37/21 , H01J37/226 , H01J37/244 , H01J37/261 , H01J37/28 , H01J37/302 , H01J2237/1405 , H01J2237/162 , H01J2237/1825 , H01J2237/188 , H01J2237/2003 , H01J2237/2006
摘要： A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.
摘要翻译：紧凑型电子显微镜使用具有形成样品所在的真空区域的一部分的壁的可移除的样品保持器。通过使用可拆卸的样品架来容纳真空，在成像之前需要排空的空气的体积大大减少，并且显微镜可以被快速排空。在优选实施例中，滑动真空密封允许样品保持器位于电子柱下方，并且样品保持器首先在真空缓冲器下通过以除去样品保持器中的空气。

27. 发明申请

US20100091362A1 Complex type microscopic device 有权
标题翻译：复杂型微型器件
公开(公告)号：US20100091362A1
公开(公告)日：2010-04-15
申请号：US12588387
申请日：2009-10-14
申请人： Hisashi Isozaki , Fumio Ohtomo , Kazuo Nunokawa
发明人： Hisashi Isozaki , Fumio Ohtomo , Kazuo Nunokawa
IPC分类号： G02B21/36 , G21K7/00
CPC分类号： G02B21/367 , H01J37/226 , H01J37/228 , H01J37/28
摘要： A complex type microscopic device includes a slider unit moving a stage, an optical microscope, a scanning electron microscope with an electron axis intersecting with an optical axis of the optical microscope, an optical measurement/observation unit having a magnification between those of the scanning electron microscope and the optical microscope and co-using an objective lens with the optical microscope, and a control unit controlling the entire device, and a display unit having a display screen. During display of a low-magnification optical microscopic image, the control unit controls the display unit to display, on the image, a representation to designate an area to be observed at a magnification of the optical measurement/observation unit, and to display, on the image, another representation to designate an area to be observed at a magnification of the scanning electron microscope during display of a high-magnification optical microscopic image.
摘要翻译：复合型显微镜装置包括：移动台的滑块单元，光学显微镜，具有与光学显微镜的光轴相交的电子轴的扫描电子显微镜;具有扫描电子的放大率的光学测量/观察单元显微镜和光学显微镜，并与光学显微镜共同使用物镜，以及控制整个装置的控制单元和具有显示屏的显示单元。在显示低倍率光学显微镜图像期间，控制单元控制显示单元在图像上显示表示以在光学测量/观察单元的放大倍率下观察的区域，并且在该图像是在显示高倍率光学显微镜图像期间指定在扫描电子显微镜的放大倍率下观察的区域的另一表示。

28. 发明授权

US07692144B2 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 有权
标题翻译：电子束曝光或系统检查或测量装置及其方法和高度检测装置
公开(公告)号：US07692144B2
公开(公告)日：2010-04-06
申请号：US11925142
申请日：2007-10-26
申请人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
发明人： Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/226 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/20235 , H01J2237/20292 , H01J2237/216 , H01J2237/2445 , H01J2237/24578 , H01J2237/2482 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817 , H01J2237/2826 , H01J2237/304 , H01J2237/3175
摘要： A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.
摘要翻译：用于评价试样的高度的方法和装置包括：电子束单元，具有电子束源，透镜，用于设置样本的台面并可在高度方向上控制;以及检测器，以及用于检测高度的高度检测系统样本被放置在桌子上，而样品被电子束照射。高度检测系统还包括照明系统，收集系统，第一和第二检测器，被配置为在样本被电子束照射的同时从第一和第二检测器接收输出信号并从输出产生比较信号的装置信号，其中比较信号响应于样本的高度。

29. 发明申请

US20090194690A1 Inspection Method And Inspection System Using Charged Particle Beam 审中-公开
标题翻译：使用带电粒子的检查方法和检查系统
公开(公告)号：US20090194690A1
公开(公告)日：2009-08-06
申请号：US12423291
申请日：2009-04-14
申请人： Hidetoshi Nishiyama , Mari Nozoe
发明人： Hidetoshi Nishiyama , Mari Nozoe
IPC分类号： G01N23/00
CPC分类号： H01J37/026 , H01J37/226 , H01J37/28 , H01J2237/047 , H01J2237/2594 , H01J2237/2817
摘要： An electron beam system includes a sample holder to hold a sample, electron optics to obtain an image of the sample, an electrode to control a charged state of the sample, a monitor to determine a range of voltage applied to the electrode, and a processing unit to obtain plural images of different charged states of the sample in accordance with a change of the applied to the electrode and to determine voltage from the voltage contrasts of the images.
摘要翻译：电子束系统包括用于保持样品的样品保持器，用于获得样品图像的电子光学器件，用于控制样品的带电状态的电极，用于确定施加到电极的电压范围的监视器，以及处理单元，以根据施加到电极的变化获得样品的不同充电状态的多个图像，并根据图像的电压对比度确定电压。

30. 发明授权

US07297949B2 Inspection system by charged particle beam and method of manufacturing devices using the system 失效
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US07297949B2
公开(公告)日：2007-11-20
申请号：US11528595
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Toru Takagi
IPC分类号： H01J37/26 , H01J37/28
CPC分类号： G03F7/70616 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/073 , H01J37/075 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/0435 , H01J2237/057 , H01J2237/06316 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/248 , H01J2237/2482 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.
摘要翻译：检查装置及使用该检查装置的半导体装置的制造方法。检查装置用于诸如晶片的样品的缺陷检查，线宽测量，表面电位测量等。在检查装置中，多个带电粒子从初级光学系统传送到样品，从样品发射的二次带电粒子与主光学系统分离，并通过二次光学系统引入到检测器。在移动样品的同时进行带电粒子的照射。带电粒子的照射点沿着样品的移动方向排列成N行，沿着与其垂直的方向排列成M列。带电粒子的每一列照射点在垂直于样品的移动方向的方向上连续移动预定量。

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