专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明申请

US20180090296A1 Measurement of Overlay and Edge Placement Errors With an Electron Beam Column Array 审中-公开
公开(公告)号：US20180090296A1
公开(公告)日：2018-03-29
申请号：US15418946
申请日：2017-01-30
申请人： KLA-Tencor Corporation
发明人： Mark Allen Neil , Frank Laske
IPC分类号： H01J37/20 , H01J37/244 , H01J37/147 , H01J37/28
CPC分类号： H01J37/20 , H01J37/147 , H01J37/244 , H01J37/28 , H01J2237/20285 , H01J2237/2448 , H01J2237/2817
摘要： Methods and systems for performing measurements of multiple die with an array of electron beam columns are presented herein. The wafer is scanned in a direction parallel to the die rows disposed on the wafer. The electron beam measurement columns are spatially separated in a column alignment direction. The wafer is scanned in a direction that is oriented at an oblique angle with respect to the column alignment direction such that each electron beam column measures the same row of die features on different die during the same wafer pass. The wafer is oriented with respect to the array of electron beam columns by rotating the wafer, rotating the electron beam columns, or both. In further aspects, each measurement beam is deflected to correct alignment errors between each column and the corresponding die row to be measured and to correct wafer positioning errors reported by the wafer positioning system.

22. 发明申请

US20170213689A1 CHARGED PARTICLE BEAM LENS APPARATUS, CHARGED PARTICLE BEAM COLUMN, AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS 审中-公开
公开(公告)号：US20170213689A1
公开(公告)日：2017-07-27
申请号：US15335448
申请日：2016-10-27
申请人： ADVANTEST CORPORATION
发明人： Tomohiko ABE , Shinichi KOJIMA
IPC分类号： H01J37/14 , H01J37/317
CPC分类号： H01J37/14 , H01J37/141 , H01J37/3174 , H01J2237/002 , H01J2237/20285 , H01J2237/31774
摘要： Provided is a charged particle beam lens apparatus having a small size and high resolution, and a charged particle beam column and a charged particle beam exposure apparatus.A charged particle beam lens apparatus includes a lens unit positioned around a through hole through which a charged particle beam travels, where the lens unit is configured to converge or diffuse the charged particle beam, and a supporting unit surrounding the lens unit. Here, at least one of an outer peripheral portion of the lens unit that is in contact with the supporting unit and an inner peripheral portion of the supporting unit that is in contact with the lens unit includes a groove through which a coolant fluid flows along an outer periphery of the lens unit.In this way, the charged particle beam lens apparatus can achieve a small size and high resolution.

23. 发明申请

US20170053773A1 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：曝光装置及制造半导体器件的方法
公开(公告)号：US20170053773A1
公开(公告)日：2017-02-23
申请号：US15157407
申请日：2016-05-18
申请人： Samsung Electronics Co., Ltd.
发明人： Rae-Won YI , Byoung-Sup AHN , Dong-Gun LEE , Su-Young LEE
IPC分类号： H01J37/02 , H01J37/20 , H01J37/244
CPC分类号： H01J37/023 , H01J37/20 , H01J37/244 , H01J2237/20285 , H01J2237/20292 , H01J2237/24578
摘要： An exposure apparatus comprising, a stage configured to receive a substrate, a mark array disposed on the stage and comprising a first mark and a second mark separated from each other by a first distance, a first beam irradiator configured to irradiate a first beam to the first mark, a second beam irradiator being separated from the first beam by a pitch greater than the first distance and configured to irradiate a second beam to the second mark, a detector disposed over the mark array and configured to receive a third beam reflected by the first mark and a fourth beam reflected by the second mark, and a controller configured to control the position of the stage using an output of the detector.
摘要翻译：一种曝光装置，包括：被配置为接收基板的台，设置在所述台上的标记阵列，并且包括彼此分开第一距离的第一标记和第二标记;第一光束照射器，被配置为将第一光束照射到第一标记，第二光束照射器，其与所述第一光束分开大于所述第一距离的间距，并被配置为将第二光束照射到所述第二标记;设置在所述标记阵列上方并被配置为接收由所述第一标记阵列反射的第三光束的检测器; 第一标记和由第二标记反射的第四光束，以及控制器，被配置为使用检测器的输出来控制舞台的位置。

24. 发明授权

US09558912B2 Ion milling device 有权
标题翻译：离子铣削装置
公开(公告)号：US09558912B2
公开(公告)日：2017-01-31
申请号：US14890936
申请日：2014-04-28
申请人： Hitachi High-Technologies Corporation
发明人： Asako Kaneko , Hisayuki Takasu , Hirobumi Mutou , Toru Iwaya , Mami Konomi
IPC分类号： H01J37/20 , H01J37/305 , H01J37/302 , G01K1/14 , G01N1/32 , H01J37/30
CPC分类号： H01J37/20 , G01K1/14 , G01N1/32 , H01J37/30 , H01J37/3002 , H01J37/3023 , H01J37/3053 , H01J2237/002 , H01J2237/026 , H01J2237/08 , H01J2237/2001 , H01J2237/2007 , H01J2237/20271 , H01J2237/20285 , H01J2237/317
摘要： The present invention aims at providing an ion milling apparatus for emitting an ion beam to a sample to process the sample and capable of controlling the temperature of the sample with high accuracy regardless of deformation or the like of the sample being irradiated with the ion beam, and proposes an ion milling apparatus including at least one of a shield holding member for supporting a shield for shielding the sample from the ion beam while exposing a part of the sample to the ion beam; a shifting mechanism for shifting a surface of the sample stand in contact with the sample following deformation of the sample during irradiation with the ion beam, the shifting mechanism having a temperature control mechanism for controlling temperature of at least one of the shield holding member and the sample stand; and a sample holding member disposed between the shield and the sample, the sample holding member deforming following deformation of the sample during irradiation with the ion beam, for example.
摘要翻译：本发明的目的在于提供一种离子铣削装置，用于将离子束发射到样品以处理样品并且能够高精度地控制样品的温度，而不管样品被离子束照射的变形等，并提出了一种离子铣削装置，其包括屏蔽保持构件中的至少一个，用于支撑用于将样品从离子束屏蔽的屏蔽，同时将一部分样品暴露于离子束; 移动机构，用于使样品台的表面在与离子束照射期间发生变形之后与试样接触而移动，所述移动机构具有温度控制机构，用于控制至少一个屏蔽保持部件和样品台以及设置在所述屏蔽体和所述试样之间的样品保持部件，所述样品保持部件例如在用所述离子束照射时，随着所述样品的变形而发生变形。

25. 发明申请

US20160372302A1 WORKPIECE TRANSPORT AND POSITIONING APPARATUS 审中-公开
公开(公告)号：US20160372302A1
公开(公告)日：2016-12-22
申请号：US15254557
申请日：2016-09-01
申请人： Howard Hughes Medical Institute
发明人： John H. Price , Davi Bock
IPC分类号： H01J37/20 , H01J37/26 , H01J37/02
CPC分类号： H01J37/20 , G01N1/32 , G01N35/00732 , H01J37/023 , H01J37/185 , H01J37/261 , H01J2237/2007 , H01J2237/201 , H01J2237/20278 , H01J2237/20285 , H01J2237/20292 , H01J2237/204 , H01J2237/26 , H01J2237/2602
摘要： An automated workpiece processing apparatus including a processing section including a processing module configured for processing a workpiece at a process location, a transport module including a first shuttle stage, a second shuttle stage independent of the first stage, and an end effector connected to at least one of the first and second stages, the end effector being configured to hold and transport the workpiece into and out of the processing module, and having a range of motion, defined by a combination of the first and second stage, extending from a workpiece holding station outside the processing module to the processing location inside the processing module so the end effector defines a processing stage of the processing module, and an automated loading and transport section including a load port module through which workpieces are loaded into the automated loading and transport section, and being communicably connected to the transport module.

26. 发明授权

US09415508B1 Multi-link substrate scanning device 有权
标题翻译：多链路基板扫描装置
公开(公告)号：US09415508B1
公开(公告)日：2016-08-16
申请号：US14713456
申请日：2015-05-15
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Robert J. Mitchell , William Weaver
IPC分类号： B25J9/12 , B25J9/10 , B25J9/06 , B25J9/16
CPC分类号： B25J9/1694 , H01J37/20 , H01J2237/20228 , H01J2237/20285 , H01J2237/31701 , Y10S901/09 , Y10S901/23
摘要： A substrate scanning device includes first, second and third linkages, and a direct drive motor coupled between a process chamber and a first end of the first linkage. A first gear motor coupled between a second end of the first linkage and a first end of the second linkage and a second gear motor coupled between a second end of the second linkage and a first end of the third linkage. A substrate support surface coupled to a second end of the third linkage. The direct drive motor for moving the substrate support surface parallel to a scan axis as the direct drive motor moves the substrate support surface along the scan axis. The first and second gear motors can be configured to maintain the substrate support surface in a plane approximately parallel with the scan axis.
摘要翻译：基板扫描装置包括第一，第二和第三连杆，以及耦合在处理室和第一连杆的第一端之间的直接驱动马达。耦合在第一连杆的第二端和第二连杆的第一端之间的第一齿轮马达和耦合在第二连杆的第二端和第三连杆的第一端之间的第二齿轮马达。耦合到第三连杆的第二端的基板支撑表面。直接驱动马达，当直接驱动马达沿着扫描轴移动基板支撑表面时，用于使基板支撑表面平行于扫描轴移动。第一和第二齿轮马达可以被配置为将基板支撑表面保持在与扫描轴线大致平行的平面中。

27. 发明授权

US09368326B2 Scan head and scan arm using the same 有权
标题翻译：扫描头和扫描臂使用相同的
公开(公告)号：US09368326B2
公开(公告)日：2016-06-14
申请号：US13919651
申请日：2013-06-17
申请人： ADVANCED ION BEAM TECHNOLOGY, INC.
发明人： Richard F. McRay
IPC分类号： G01N23/00 , H01J37/317 , H01J37/20
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20207 , H01J2237/20228 , H01J2237/20285
摘要： A scan head assembled to a scan arm for an ion implanter and a scan arm using the same are provided, wherein the scan head comprises a case, a shaft assembly, an ESC, a first driving mechanism and a second driving mechanism. The case has a normal center line. The shaft assembly passes through a first side of the case and has a twist axis, a first pivot point fixed relative to the case and a first end located outside the case. The ESC is fastened on the first end and capable of holding a work piece. The first driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to tilt relative to the normal center line. The second driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to rotate about the twist axis.
摘要翻译：提供了组装到用于离子注入机的扫描臂和使用其的扫描臂的扫描头，其中扫描头包括壳体，轴组件，ESC，第一驱动机构和第二驱动机构。案件有正常的中心线。轴组件穿过壳体的第一侧并且具有扭转轴线，相对于壳体固定的第一枢转点和位于壳体外部的第一端部。 ESC紧固在第一端并能够固定工件。第一驱动机构能够驱动轴组件，ESC和工件相对于正常中心线倾斜。第二驱动机构能够驱动轴组件，ESC和工件围绕扭转轴线旋转。

28. 发明申请

US20150166273A1 WORKPIECE HOLDER FOR WORKPIECE TRANSPORT APPARATUS 审中-公开
标题翻译：工作运输工具的工作人员
公开(公告)号：US20150166273A1
公开(公告)日：2015-06-18
申请号：US14538327
申请日：2014-11-11
申请人： Howard Hughes Medical Institute
发明人： John H. Price , Davi Bock
IPC分类号： B65G65/00
CPC分类号： H01J37/20 , G01N1/32 , G01N35/00732 , H01J37/023 , H01J37/185 , H01J37/261 , H01J2237/2007 , H01J2237/201 , H01J2237/20278 , H01J2237/20285 , H01J2237/20292 , H01J2237/204 , H01J2237/26 , H01J2237/2602
摘要： An automated workpiece processing system including at least one workpiece processing unit, a workpiece holder configured to removably hold a batch of workpieces therein, each workpiece embodying workpiece identifying indicia where the workpiece identifying indicia is a physical representation of a sample held on a respective workpiece, and to interface with the at least one automated workpiece processing unit, and a controller including a memory having a data structure therein that effects, with the workpiece identifying indicia, batch process tracking of each workpiece in the batch of workpieces through the at least one automated workpiece processing unit in a predetermined batch workpiece processing sequence.
摘要翻译：一种自动化工件处理系统，包括至少一个工件处理单元，构造成可拆卸地将一批工件保持在其中的工件保持器，每个工件体现工件识别标记，其中工件识别标记是保持在相应工件上的样品的物理表示，并且与所述至少一个自动化工件处理单元相连接，以及控制器，其包括其中具有数据结构的存储器，其中通过所述至少一个自动化工具，通过所述工件识别标记对所述工件批次中的每个工件进行批处理跟踪工件处理单元在预定的批处理工件处理顺序中。

29. 发明授权

US09024280B2 Composite charged particle beam apparatus 有权
标题翻译：复合带电粒子束装置
公开(公告)号：US09024280B2
公开(公告)日：2015-05-05
申请号：US13622028
申请日：2012-09-18
申请人： Atsushi Uemoto , Yo Yamamoto , Tatsuya Asahata
发明人： Atsushi Uemoto , Yo Yamamoto , Tatsuya Asahata
IPC分类号： H01J37/00 , H01J37/26 , G01N23/22 , G01N23/225 , G01N1/32 , H01J37/28 , H01J37/317
CPC分类号： H01J37/261 , G01N1/32 , G01N23/2208 , G01N23/225 , G01N2223/0816 , G01N2223/102 , G01N2223/105 , H01J37/28 , H01J37/317 , H01J2237/20285 , H01J2237/31745 , H01J2237/31749
摘要： A composite charged particle beam apparatus comprises an FIB column and an SEM column arranged so that the ion and the electron beam irradition axes intersect with each other substantially at a right angle. A sample stage mounts a sample, and a detector detects secondary particles generated from the sample when irradiated with the ion beam or the electron beam. An observation image formation portion forms an FIB image and an SEM image based on a detection signal of the detector. An optical microscope observes the sample, and a display portion displays the FIB image, the SEM image and an optical microscope image. A stage control portion changes the coordinate system of the sample stage to any selected one of the coordinate systems of the FIB image, the SEM image and the optical microscope image.
摘要翻译：复合带电粒子束装置包括FIB柱和SEM柱，其布置成使得离子和电子束辐照轴基本上彼此相交。样品台安装样品，当用离子束或电子束照射时，检测器检测从样品产生的二次颗粒。观察图像形成部基于检测器的检测信号，形成FIB图像和SEM图像。光学显微镜观察样品，显示部显示FIB图像，SEM图像和光学显微镜图像。舞台控制部分将样本舞台的坐标系改变为FIB图像，SEM图像和光学显微镜图像的任意一个坐标系。

30. 发明授权

US09000325B2 Roller mold manufacturing device and manufacturing method 有权
标题翻译：辊模制造装置及制造方法
公开(公告)号：US09000325B2
公开(公告)日：2015-04-07
申请号：US13700783
申请日：2011-06-08
申请人： Naoto Ito , Toshio Kitada , Hidenari Kiguchiya
发明人： Naoto Ito , Toshio Kitada , Hidenari Kiguchiya
IPC分类号： H01J37/305 , B29C33/38 , B23K15/08 , H01J37/20 , H01J37/317 , G03F1/20 , G03F7/20 , G03F7/24 , B82Y10/00 , B82Y40/00
CPC分类号： B29C33/3842 , B23K15/08 , B29C33/38 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F7/2037 , G03F7/24 , H01J37/20 , H01J37/305 , H01J37/3174 , H01J2237/20214 , H01J2237/2025 , H01J2237/20271 , H01J2237/20285
摘要： A phenomenon where a depicted pattern becomes unclear owing to a rotational runout of a roller mold in the direction of a rotary shaft is suppressed while restraining an increase in the cost. For the purpose of achieving the above, a roller mold manufacturing device (1) is provided with an electron beam irradiation device (2); a mask (3) which has an opening that allows passage of some of electron beams, and which forms a plurality of beams that perform simultaneous depiction on a resist; a rotation drive device (4) which rotates a roller mold (100) around a rotary shaft (8); a displacement amount detection sensor (5) which detects a rotational runout displacement amount of the roller mold (100) in the direction of the rotary shaft (8); a control device (6); and an actuator (7) which, based on a control signal from the control device (6), allows a depiction position by the electron beams to follow the displacement of the roller mold (100) in the direction of the rotary shaft (8), wherein misalignment of an exposed position of the resist, which is caused by rotational runout displacement of the roller mold (100) in the direction of the rotary shaft (8), is suppressed.
摘要翻译：在抑制成本增加的同时抑制了由于辊模在旋转轴的方向上的旋转跳动而导致的图形变得不清楚的现象。为了实现上述目的，一种辊模制造装置（1）设置有电子束照射装置（2）; 具有允许一些电子束通过的开口的掩模（3），并形成对抗蚀剂进行同时描绘的多个光束; 旋转驱动装置（4），其围绕旋转轴（8）旋转辊模具（100）; 位移量检测传感器（5），其检测所述滚筒模具（100）沿所述旋转轴（8）的方向的旋转偏移位移量; 控制装置（6）; 以及基于来自控制装置（6）的控制信号的致动器（7）允许电子束的描绘位置跟随滚子模具（100）沿旋转轴（8）的方向的位移，其特征在于，抑制由所述辊模（100）沿所述旋转轴（8）的方向的旋转偏移而引起的所述抗蚀剂的露出位置的偏移。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式