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21. 发明申请

US20140030112A1 VACUUM DEVICE 审中-公开
标题翻译：真空装置
公开(公告)号：US20140030112A1
公开(公告)日：2014-01-30
申请号：US13685811
申请日：2012-11-27
申请人： ELLCIE INDUSTRIES GMBH
发明人： Martin KLEIN , Peter MARIENHOFF
IPC分类号： F04B23/00
CPC分类号： F04B23/00 , H01J37/18 , H01J2237/1825
摘要： A vacuum device is provided which forms an autarkic subassembly and includes a vacuum container, a vacuum pump connected to the vacuum container, a vacuum connection for connecting to an external installation, and a control device designed for control of the vacuum pump. The vacuum device serves as a suction device to produce a vacuum in and to suck or draw off gas from this connected installation. The vacuum device is designed as an autarkic (self-sufficient or self-contained) subassembly, which can be connected for example to an electron microscope.
摘要翻译：提供一种形成自动子组件的真空装置，包括真空容器，连接到真空容器的真空泵，用于连接到外部设备的真空连接器和用于控制真空泵的控制装置。真空装置用作抽吸装置，以从该连接的装置产生真空并从中吸出或抽出气体。真空装置被设计为自给自足（自给自足或独立）的子组件，其可以连接到例如电子显微镜。

22. 发明授权

US08366423B2 Method and arrangement for realizing a vacuum in a vacuum chamber 失效
标题翻译：在真空室中实现真空的方法和装置
公开(公告)号：US08366423B2
公开(公告)日：2013-02-05
申请号：US12709643
申请日：2010-02-22
申请人： Sander Baltussen
发明人： Sander Baltussen
IPC分类号： F04B41/06 , C23C16/00
CPC分类号： F17D1/00 , B82Y10/00 , B82Y40/00 , H01J37/18 , H01J37/3174 , H01J2237/1825 , Y10S417/901 , Y10T137/0396 , Y10T137/86083 , Y10T137/86131
摘要： The invention relates to a method of realizing a vacuum in a vacuum chamber. The vacuum chamber is connected to a pumping system shared by a plurality of vacuum chambers. The method includes separately pumping down each vacuum chamber. The invention further relates to n arrangement of a plurality of vacuum chambers connected to a pumping system. In this arrangement, the pumping system is arranged for pumping down each vacuum chamber separately.
摘要翻译：本发明涉及一种在真空室中实现真空的方法。真空室连接到由多个真空室共用的泵送系统。该方法包括分别抽吸每个真空室。本发明还涉及连接到泵送系统的多个真空室的n排列。在这种布置中，泵送系统被布置成分开地抽吸每个真空室。

23. 发明授权

US07906762B2 Compact scanning electron microscope 有权
标题翻译：紧凑型扫描电子显微镜
公开(公告)号：US07906762B2
公开(公告)日：2011-03-15
申请号：US12303611
申请日：2007-06-07
申请人： Mart Petrus Maria Bierhoff , Bart Buijsse , Cornelis Sander Kooijman , Hugo Van Leeuwen , Hendrik Gezinus Tappel , Colin August Sanford , Sander Richard Marie Stoks , Ben Jacobus Marie Bormans , Steven Berger , Koen Arnoldus Wilhelmus Driessen , Johannes Antonius Hendricus Wilhelmus Gerardus Persoon
发明人： Mart Petrus Maria Bierhoff , Bart Buijsse , Cornelis Sander Kooijman , Hugo Van Leeuwen , Hendrik Gezinus Tappel , Colin August Sanford , Sander Richard Marie Stoks , Ben Jacobus Marie Bormans , Steven Berger , Koen Arnoldus Wilhelmus Driessen , Johannes Antonius Hendricus Wilhelmus Gerardus Persoon
IPC分类号： H01J37/08 , H01J37/18 , H01J5/02
CPC分类号： H01J37/26 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/20 , H01J37/21 , H01J37/226 , H01J37/244 , H01J37/261 , H01J37/28 , H01J37/302 , H01J2237/1405 , H01J2237/162 , H01J2237/1825 , H01J2237/188 , H01J2237/2003 , H01J2237/2006
摘要： A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.
摘要翻译：紧凑型电子显微镜使用具有形成样品所在的真空区域的一部分的壁的可移除的样品保持器。通过使用可拆卸的样品架来容纳真空，在成像之前需要排空的空气的体积大大减少，并且显微镜可以被快速排空。在优选实施例中，滑动真空密封允许样品保持器位于电子柱下方，并且样品保持器首先在真空缓冲器下通过以除去样品保持器中的空气。

24. 发明申请

US20030001528A1 Ion implanting system 失效
标题翻译：离子注入系统
公开(公告)号：US20030001528A1
公开(公告)日：2003-01-02
申请号：US10164612
申请日：2002-06-10
发明人： Young-Byeong Joo
IPC分类号： H01J023/00
CPC分类号： H01J37/18 , H01J2237/1825 , H01J2237/184 , H01J2237/31701 , Y10S417/901
摘要： An ion implanting system including an ion implanting chamber for implanting an ion into a semiconductor wafer, a load lock chamber for loading the semiconductor wafer into the ion implanting chamber, a turbo pump for creating a high vacuum atmosphere in the load lock chamber, a low vacuum pump for creating a low vacuum atmosphere in the turbo pump, a cryo pump controller for generating a control signal to control a pumping operation of the turbo pump, a control voltage generator for generating a control voltage in response to the control signal generated from the cryo pump controlle, an interface for generating a starting signal in response to the control voltage, and a turbo pump controller for applying a voltage to operate the turbo pump and the low vacuum pump in response to the starting signal output from the interface.
摘要翻译：一种离子植入系统，包括用于将离子注入半导体晶片的离子注入室，用于将半导体晶片装载到离子注入室中的负载锁定室，用于在负载锁定室中产生高真空气氛的涡轮泵，低用于在涡轮泵中产生低真空气氛的真空泵，用于产生控制信号以控制涡轮泵的泵送操作的冷冻泵控制器，控制电压发生器，用于响应于从所述涡轮泵产生的控制信号产生控制电压低温泵控制器，用于响应于控制电压产生启动信号的接口，以及涡轮泵控制器，用于响应于从接口输出的启动信号，施加电压来操作涡轮泵和低真空泵。

25. 发明授权

US5433238A Pumping system for evacuating reactor chambers 失效
标题翻译：抽风反应室抽水系统
公开(公告)号：US5433238A
公开(公告)日：1995-07-18
申请号：US300935
申请日：1994-09-06
申请人： Stephen Cannizzaro , John Cain , Miguel Delgado , Ramiro Solis
发明人： Stephen Cannizzaro , John Cain , Miguel Delgado , Ramiro Solis
IPC分类号： C23C16/44 , H01J37/18 , B65B31/04
CPC分类号： H01J37/32834 , C23C16/4412 , H01J37/18 , H01J2237/022 , H01J2237/1825 , Y10T137/0396 , Y10T137/86131 , Y10T137/87684 , Y10T137/877
摘要： A system for evacuating a reactor chamber includes a main evacuation line connected at one end thereof to the reactor chamber and at another end thereof to a means for creating a partial vacuum. A valve in the main evacuation line divides the line into a chamber side and a vacuum side. A second line is connected at one end to the vacuum side of the main evacuation line and at another end to a fluid supply source. As the valve in the main evacuation line is opened, fluid is supplied through the second line to the main evacuation line to prevent rapid, turbulence-inducing pressure drops in the reactor chamber.
摘要翻译：用于抽空反应室的系统包括在其一端连接到反应室的主抽空线，并且在另一端连接到用于产生部分真空的装置。主排气管中的阀将管线分成室侧和真空侧。第二管路一端连接到主排气管的真空侧，另一端连接到流体供应源。当主排气管路中的阀打开时，流体通过第二管线供应到主排气管线，以防止反应室中迅速引起湍流的压降。

26. 发明授权

US5376799A Turbo-pumped scanning electron microscope 失效
标题翻译：涡轮泵浦扫描电子显微镜
公开(公告)号：US5376799A
公开(公告)日：1994-12-27
申请号：US054163
申请日：1993-04-26
申请人： Frederick H. Schamber , Fred C. Schwerer , Albert H. Beebe , Richard J. Lee
发明人： Frederick H. Schamber , Fred C. Schwerer , Albert H. Beebe , Richard J. Lee
IPC分类号： H01J37/18 , H01J37/16
CPC分类号： H01J37/18 , H01J2237/1825 , H01J2237/28
摘要： A scanning electron microscope with an effective vacuum evacuation system and vacuum pump mounting system is disclosed. A manifold having a sufficiently large gas conductance is connected to a gun assembly and to a specimen chamber. A vacuum pump is connected to the manifold for evacuating the gun assembly, specimen chamber and a beam tube. The vacuum pump mounting includes a cylindrical sleeve extending between the vacuum pump and the scanning electron microscope housing with a pair of radial O-rings sealing between the cylindrical sleeve, housing and vacuum pump.
摘要翻译：公开了一种具有有效真空排气系统和真空泵安装系统的扫描电子显微镜。具有足够大气体导通性的歧管连接到枪组件和试样室。真空泵连接到歧管，用于抽空枪组件，试样室和束管。真空泵安装件包括在真空泵和扫描电子显微镜壳体之间延伸的圆柱形套筒，其中一对径向O形环密封在圆柱形套筒，壳体和真空泵之间。

27. 发明公开

US20240203694A1 ETCHING METHOD AND ETCHING APPARATUS 审中-公开
公开(公告)号：US20240203694A1
公开(公告)日：2024-06-20
申请号：US18067917
申请日：2022-12-19
申请人： Tokyo Electron Limited
发明人： Takuji SAKO , Kyohei NOGUCHI , Masaki HOSONO , Masahiro YAMAMOTO , Julen AROZAMENA
IPC分类号： H01J37/32
CPC分类号： H01J37/32449 , H01J37/32724 , H01J37/32357 , H01J37/32816 , H01J2237/1825 , H01J2237/334
摘要： An etching method of etching silicon formed on a side surface of a recess that exists in a substrate includes: forming an oxide film on a surface of the silicon by performing a radical oxidation processing on the substrate; performing a chemical processing with a gas on the oxide film; and removing a reaction product produced by the chemical processing, wherein the forming the oxide film includes: a first phase of performing a radical processing with a plasma of an oxygen-containing gas; and a second phase of performing a radical processing with a plasma of the oxygen-containing gas and an etching gas, and wherein the forming the oxide film, the performing the chemical processing, and the removing the reaction product are repeated multiple times.

28. 发明授权

US10872779B2 Plasma etching method and plasma etching apparatus 有权
公开(公告)号：US10872779B2
公开(公告)日：2020-12-22
申请号：US16286262
申请日：2019-02-26
申请人： HITACHI HIGH-TECH CORPORATION
发明人： Nobuya Miyoshi , Hiroyuki Kobayashi , Kazunori Shinoda , Kohei Kawamura , Kazumasa Ookuma , Yutaka Kouzuma , Masaru Izawa
IPC分类号： H01L21/311 , H01J37/32 , H01L21/67 , H01L21/683
CPC分类号： H01L21/31116 , H01J37/32449 , H01J37/32724 , H01L21/67069 , H01L21/67115 , H01L21/67248 , H01J2237/002 , H01J2237/1825 , H01J2237/24585 , H01J2237/3341 , H01L21/6831
摘要： An plasma etching method for etching a film layer includes a plurality of times repeating a step set including a first step of introducing a gas containing hydrogen fluoride into a processing chamber and supplying hydrogen fluoride molecules to the surface of an oxide film, a second step of exhausting the interior of the processing chamber in vacuum to remove the hydrogen fluoride, and a third step of introducing a gas containing hydrogen nitride into the processing chamber and supplying hydrogen nitride to the surface of the oxide film to form a compound layer containing nitrogen, hydrogen, and fluorine on the surface of the film layer, and removing the compound layer formed on the surface of the film layer. Foreign object contamination is prevented by inhibiting mixing of hydrogen fluoride gas and hydrogen nitride gas, and the etching amount is controlled by the number of times of repeating application thereof.

29. 发明申请

US20190013177A1 OBSERVATION SUPPORT UNIT FOR CHARGED PARTICLE MICROSCOPE AND SAMPLE OBSERVATION METHOD USING SAME 审中-公开
公开(公告)号：US20190013177A1
公开(公告)日：2019-01-10
申请号：US15753685
申请日：2015-08-21
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Yusuke OMINAMI , Akiko HISADA
IPC分类号： H01J37/16 , H01J37/28 , H01J37/20 , H01J37/244
CPC分类号： H01J37/16 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/1825 , H01J2237/2003 , H01J2237/2007
摘要： In order to observe a water-containing sample with excellent convenience under an air atmosphere or a gas atmosphere, or under a desired pressure, in the present invention, there is provided an observation support unit for observation by irradiating the sample disposed in a non-vacuum space separated by a diaphragm from an inner space of a charged particle optical lens barrel that generates a charged particle beam, with the charged particle beam. The observation support unit includes a main body portion for covering a hole portion that forms an observation region where the sample is observed, and the sample, and the observation support unit is directly mounted between the sample and the diaphragm, that is, on the sample.

30. 发明申请

US20180308664A1 PLASMA REACTOR WITH FILAMENTS AND RF POWER APPLIED AT MULTIPLE FREQUENCIES 审中-公开
公开(公告)号：US20180308664A1
公开(公告)日：2018-10-25
申请号：US15960382
申请日：2018-04-23
申请人： Kenneth S. Collins , Kartik Ramaswamy , Yue Guo , Shahid Rauf , Kallol Bera , James D. Carducci , Michael R. Rice
发明人： Kenneth S. Collins , Kartik Ramaswamy , Yue Guo , Shahid Rauf , Kallol Bera , James D. Carducci , Michael R. Rice
IPC分类号： H01J37/32 , C23C16/455
CPC分类号： H01J37/32183 , C23C16/4554 , H01J37/32091 , H01J37/321 , H01J37/32449 , H01J37/32541 , H01J37/32568 , H01J37/32715 , H01J2237/1825 , H01J2237/3321 , H01J2237/3323 , H01J2237/334 , H01L21/67069 , H01L21/6831
摘要： A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma chamber, a pump coupled to the plasma chamber to evacuate the chamber, a workpiece support to hold a workpiece, and an intra-chamber electrode assembly including a plurality of filaments extending laterally through the plasma chamber between a ceiling of the plasma chamber and the workpiece support. At least one bus is electrically connected to a conductor of each filament. An RF power source is configured to apply a first RF signal of a first frequency to the plurality of filaments at a first location on at least one bus, and to apply a second RF signal of different second frequency to the plurality of filaments at a different second location on the at least one bus.

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