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    • 21. 发明申请
    • COMBINATIONS OF THERAPEUTIC AGENTS FOR TREATING MELANOMA
    • 用于治疗梅毒的治疗药物的组合
    • US20130330421A1
    • 2013-12-12
    • US13689380
    • 2012-11-29
    • KATHOLIEKE UNIVERSITEIT LEUVEN, K.U. LEUVEN R&DVIB VZW
    • Jean-Christophe Marine
    • A61K38/02G01N33/50A61K31/195C12Q1/68A61K33/24A61K31/496
    • A61K38/02A61K31/195A61K31/496A61K33/24A61K38/1866A61K38/30A61K45/06C12Q1/6886C12Q2600/156G01N33/5005G01N33/5743G01N2800/52
    • The present disclosure relates to the field of oncology, more particularly to the field of melanoma. Provided are methods of treating melanoma, particularly advanced cutaneous melanoma, with a combination of pharmaceutical agents comprising MDM4-specific antagonists (such as an inhibitor of the MDM4-p53 interaction or a molecule that decreases MDM4 protein stability) or MDM4-MDM2 dual inhibitors (i.e., molecules that disrupt the interactions between p53 and MDM2 and p53 and MDM4) and one or more chemotherapeutic agents such as for example alkylating agents (i.e., Dacarbazine (DITC) or melphalan), alkylating-like agents (i.e., cisplatin or carboplatin) or mitotic inhibitors (taxanes docetaxel or paclitaxel) and PI3K-AKT, B-RAF and MEK inhibitors. Further provided are pharmaceutical formulations of MDM4-specific antagonists (be it an inhibitor of the MDM4-p53 interaction or a molecule that decreases MDM4 protein stability) or MDM4-MDM2 dual inhibitors (i.e., molecules that disrupt the interactions between p53 and MDM2 and p53 and MDM4) and a pharmaceutical formulation of one or more chemotherapeutic agents such as for example alkylating agents (i.e., Dacarbazine (DITC) or melphalan), alkylating-like agents (i.e., cisplatin or carboplatin) or mitotic inhibitors (taxanes docetaxel or paclitaxel) and B-RAF and MEK inhibitors.
    • 本公开涉及肿瘤学领域,更具体地涉及黑素瘤领域。 提供了通过包含MDM4特异性拮抗剂(例如MDM4-p53相互作用的抑制剂或降低MDM4蛋白稳定性的分子)或MDM4-MDM2双重抑制剂(MDM4-MDM2双重抑制剂)的药物组合治疗黑素瘤,特别是晚期皮肤黑色素瘤的方法, 即破坏p53和MDM2与p53和MDM4之间的相互作用的分子)和一种或多种化学治疗剂,例如烷化剂(即达卡巴嗪(DITC)或美法仑)),烷化化试剂(即顺铂或卡铂) 或有丝分裂抑制剂(紫杉烷多西紫杉醇或紫杉醇)和PI3K-AKT,B-RAF和MEK抑制剂。 还提供了MDM4特异性拮抗剂(无论是MDM4-p53相互作用的抑制剂还是降低MDM4蛋白稳定性的分子)或MDM4-MDM2双重抑制剂(即破坏p53和MDM2与p53之间的相互作用的分子)的药物制剂 和MDM4)和一种或多种化学治疗剂的药物制剂,例如烷化剂(即达卡巴嗪(DITC)或美法仑)),烷化化试剂(即顺铂或卡铂)或有丝分裂抑制剂(紫杉烷多西紫杉醇或紫杉醇) 和B-RAF和MEK抑制剂。
    • 25. 发明授权
    • Method for forming MEMS devices having low contact resistance and devices obtained thereof
    • 用于形成具有低接触电阻的MEMS器件的方法及其获得的器件
    • US08487386B2
    • 2013-07-16
    • US12817631
    • 2010-06-17
    • Ajay JainSimone SeveriGert ClaesJohn Heck
    • Ajay JainSimone SeveriGert ClaesJohn Heck
    • H01L27/14
    • B81C1/00246B81B2203/0118B81B2207/015B81B2207/07B81C2203/0714B81C2203/0735
    • The present disclosure proposes a method for manufacturing in a MEMS device a low-resistance contact between a silicon-germanium layer and a layer contacted by this silicon-germanium layer, such as a CMOS metal layer or another silicon-germanium layer, through an opening in a dielectric layer stack separating both layers. An interlayer is formed in this opening, thereby covering at least the sidewalls of the opening on the exposed surface of the another layer at the bottom of this opening. This interlayer may comprise a TiN layer in contact with the silicon-germanium layer. This interlayer can further comprise a Ti layer in between the TiN layer and the layer to be contacted. In another embodiment this interlayer comprises a TaN layer in contact with the silicon-germanium layer. This interlayer can then further comprise a Ta layer in between the TaN layer and the layer to be contacted.
    • 本公开提出了一种用于在MEMS器件中制造硅 - 锗层与由该硅 - 锗层接触的层之间的低电阻接触的方法,例如CMOS金属层或另一硅 - 锗层,通过开口 在分离两层的电介质层叠层中。 在该开口中形成中间层,从而至少覆盖在该开口底部的另一层的露出表面上的开口的至少侧壁。 该中间层可以包括与硅 - 锗层接触的TiN层。 该中间层可以进一步包括在TiN层和待接触层之间的Ti层。 在另一个实施方案中,该中间层包括与硅 - 锗层接触的TaN层。 然后该中间层可以进一步包括在TaN层和待接触层之间的Ta层。