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21. 发明授权

US07863587B2 Symmetrical shaper for an ion beam deposition and etching apparatus 有权
标题翻译：用于离子束沉积和蚀刻装置的对称整形器
公开(公告)号：US07863587B2
公开(公告)日：2011-01-04
申请号：US11701037
申请日：2007-01-31
申请人： Peter M. Dang , Jorge A. Goitia , Cherngye Hwang , Eduardo T. Mireles
发明人： Peter M. Dang , Jorge A. Goitia , Cherngye Hwang , Eduardo T. Mireles
IPC分类号： H01J3/14 , H01J3/26 , A61N5/00 , G21G5/00 , G21K1/08
CPC分类号： G21K1/04 , H01J37/09 , H01J37/305 , H01J37/3178 , H01J2237/08 , H01J2237/083
摘要： A shaper for shaping an ion beam and that can be used for both deposition and etching is described. The shaper includes a plate that is placed between an ion beam grid and an ion beam source. The plate covers holes in the grid, and is shaped and dimensioned such that the plate does not partially cover any holes in the grid that are directly adjacent to the plate. A hole is configured to mount the shaper at a center of the grid and at least one other hole is configured to secure the shaper to the grid to prevent the shaper from rotating relative to the grid. A center mount portion covers holes in the grid. The plate has two axes of reflection symmetry. The uniformity of both deposition and etching is improved.
摘要翻译：描述了用于成形离子束并且可以用于沉积和蚀刻两者的成形器。整形器包括放置在离子束格栅和离子束源之间的板。该板覆盖网格中的孔，并且其形状和尺寸使得该板不部分地覆盖格栅中与板直接相邻的任何孔。孔被构造成将成形器安装在格栅的中心，并且至少一个其它孔被配置成将成形器固定到格栅上，以防止成形机相对于格栅旋转。中心安装部分覆盖网格中的孔。该板具有两个反射对称轴。提高了沉积和蚀刻的均匀性。

22. 发明申请

US20100038340A1 MAGNETIC RECORDING HEAD COATING AND METHOD 失效
标题翻译：磁记录头涂层及方法
公开(公告)号：US20100038340A1
公开(公告)日：2010-02-18
申请号：US12193107
申请日：2008-08-18
申请人： Robert G. Biskeborn , Calvin S. Lo , Gary M. Decad , Cherngye Hwang
发明人： Robert G. Biskeborn , Calvin S. Lo , Gary M. Decad , Cherngye Hwang
IPC分类号： B44C1/22
CPC分类号： G11B5/3106 , G11B5/3169
摘要： A method for encapsulating a magnetic recording head including coating at least a portion of a magnetic recording head containing a recording gap with a first layer of at least one coating material, including silicon nitride, the first layer of at least one coating material having a first removal rate, coating at least a portion of the magnetic recording head containing a recording gap and coated with the first layer of at least one coating material with a second layer of at least one coating material, including aluminum oxide, the second layer of at least one coating material having a second removal rate higher than the first removal rate, and removing at least a portion of the second layer of at least one coating material via a removal process, including chemical-mechanical polishing, lapping, or vacuum processing to at least partially planarize the surface of the recording gap.
摘要翻译：一种用于封装磁记录头的方法，包括将包含记录间隙的磁记录头的至少一部分涂覆至少一层包括氮化硅的涂层材料的第一层，至少一层涂料的第一层具有第一层涂覆至少一部分包含记录间隙的磁记录头并涂覆有第一层至少一种涂层材料的第二层至少一层包括氧化铝的涂层材料，至少第二层一个涂层材料具有高于第一去除速率的第二去除速率，以及通过去除工艺去除至少一部分至少一种涂层材料的第二层，包括化学机械抛光，研磨或真空处理至少部分平面化记录间隙的表面。

23. 发明授权

US07481312B2 Direct cooling pallet assembly for temperature stability for deep ion mill etch process 有权
标题翻译：直接冷却托盘组件，用于深度离子磨蚀刻蚀工艺的温度稳定性
公开(公告)号：US07481312B2
公开(公告)日：2009-01-27
申请号：US11001798
申请日：2004-12-02
申请人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
发明人： Pei Chen , Jorge Goitia , Cherngye Hwang , Bigal Leung , Diana Perez , Yongjian Sun
IPC分类号： B65D85/00
CPC分类号： H01L21/67333 , H01L21/67109
摘要： Embodiments of the present invention are directed to a frame component of a pallet assembly. In one embodiment, the frame comprises a plurality of arms for retaining at least one carrier component. The frame further comprises at least one spring disposed upon one of the plurality of arms. The spring for applying pressure upon the carrier.
摘要翻译：本发明的实施例涉及托盘组件的框架部件。在一个实施例中，框架包括用于保持至少一个载体部件的多个臂。框架还包括设置在多个臂之一上的至少一个弹簧。用于在载体上施加压力的弹簧。

24. 发明授权

US07300556B2 Method for depositing a thin film adhesion layer 有权
标题翻译：沉积薄膜粘附层的方法
公开(公告)号：US07300556B2
公开(公告)日：2007-11-27
申请号：US10651632
申请日：2003-08-29
申请人： Cherngye Hwang , Eun Row , Ning Shi , Eric (Yongjian) Sun
发明人： Cherngye Hwang , Eun Row , Ning Shi , Eric (Yongjian) Sun
IPC分类号： C23C14/34
CPC分类号： C23C28/046 , C23C14/024 , C23C14/0605 , C23C14/165 , C23C28/04
摘要： A method of physical vapor deposition (PVD) is disclosed in which xenon is used as the operating gas in the vacuum chamber in the deposition of an adhesion layer, preferably silicon, which allows the adhesion layer to be ultra-thin with improved durability over prior art films. The use of argon as is typical in the prior art results in argon atoms being incorporated into the ultra-thin silicon film with deleterious results. In films that are only several angstroms thick, the contamination of the film with argon or other elements can yield a film with reduced adhesion performance and in some cases noble atoms such as argon can escape the film leaving voids or pinholes. The use of the larger and heavier xenon atoms in the vacuum chamber produces a substantially purer film with reduced risk of voids and pinholes. In a preferred embodiment the use of xenon as the operating gas for deposition of the silicon adhesion layer is combined with the use of a filtered cathodic arc (FCA) process to deposit the protective overcoat, preferably carbon based, on a magnetic recording head.
摘要翻译：公开了一种物理气相沉积（PVD）的方法，其中在沉积粘合层（优选硅）时，将氙用作真空室中的操作气体，其允许粘附层超薄，同时具有改善的耐久性艺术电影。如现有技术中典型的使用氩气导致氩原子被掺入到超薄硅膜中，具有有害的结果。在只有几埃厚的薄膜中，用氩气或其它元素污染薄膜可能产生具有降低的粘附性能的膜，并且在某些情况下，诸如氩气的贵重原子可以逸出留下空隙或针孔的膜。在真空室中使用更大和更重的氙原子产生基本上更纯的膜，具有降低的空隙和针孔的风险。在优选的实施方案中，将氙作为沉积硅粘合层的工作气体的使用与使用过滤的阴极电弧（FCA）方法结合，以将保护性外涂层，优选基于碳的沉积物沉积在磁性记录头上。

25. 发明申请

US20060045971A1 Segmented resist islands for photolithography on single sliders 失效
标题翻译：在单个滑块上用于光刻的分段抗蚀岛
公开(公告)号：US20060045971A1
公开(公告)日：2006-03-02
申请号：US10928038
申请日：2004-08-27
申请人： Cherngye Hwang , Kim Lee , Dennis McKean , Gary Suzuki
发明人： Cherngye Hwang , Kim Lee , Dennis McKean , Gary Suzuki
IPC分类号： B05D5/00
CPC分类号： G11B5/6005 , G11B5/3163 , G11B5/3173
摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.
摘要翻译：公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。

26. 发明申请

US20050045468A1 Method for depositing a thin film adhesion layer 有权
标题翻译：沉积薄膜粘附层的方法
公开(公告)号：US20050045468A1
公开(公告)日：2005-03-03
申请号：US10651632
申请日：2003-08-29
申请人： Cherngye Hwang , Eun Row , Ning Shi , Eric Sun
发明人： Cherngye Hwang , Eun Row , Ning Shi , Eric Sun
IPC分类号： C23C14/02 , C23C14/06 , C23C14/16 , C23C14/28 , C23C14/32 , C23C16/27 , C23C28/04 , G11B5/127
CPC分类号： C23C28/046 , C23C14/024 , C23C14/0605 , C23C14/165 , C23C28/04
摘要： A method of physical vapor deposition (PVD) is disclosed in which xenon is used as the operating gas in the vacuum chamber in the deposition of an adhesion layer, preferably silicon, which allows the adhesion layer to be ultra-thin with improved durability over prior art films. The use of argon as is typical in the prior art results in argon atoms being incorporated into the ultra-thin silicon film with deleterious results. In films that are only several angstroms thick, the contamination of the film with argon or other elements can yield a film with reduced adhesion performance and in some cases noble atoms such as argon can escape the film leaving voids or pinholes. The use of the larger and heavier xenon atoms in the vacuum chamber produces a substantially purer film with reduced risk of voids and pinholes. In a preferred embodiment the use of xenon as the operating gas for deposition of the silicon adhesion layer is combined with the use of a filtered cathodic arc (FCA) process to deposit the protective overcoat, preferably carbon based, on a magnetic recording head.
摘要翻译：公开了一种物理气相沉积（PVD）的方法，其中在沉积粘合层（优选硅）时，将氙用作真空室中的操作气体，其允许粘附层超薄，同时具有改善的耐久性艺术电影。如现有技术中典型的使用氩气导致氩原子被掺入到超薄硅膜中，具有有害的结果。在只有几埃厚的薄膜中，用氩气或其它元素污染薄膜可能产生具有降低的粘附性能的膜，并且在某些情况下，诸如氩气的贵重原子可以逸出留下空隙或针孔的膜。在真空室中使用更大和更重的氙原子产生基本上更纯的膜，具有降低的空隙和针孔的风险。在优选的实施方案中，将氙作为沉积硅粘合层的工作气体的使用与使用过滤的阴极电弧（FCA）方法结合，以将保护性外涂层（优选碳基）沉积在磁性记录头上。

27. 发明授权

US06858909B2 CMP assisted liftoff micropatterning 失效
公开(公告)号：US06858909B2
公开(公告)日：2005-02-22
申请号：US10307093
申请日：2002-11-29
申请人： Marie-Claire Cyrille , Frederick H. Dill , Cherngye Hwang , Jui-Lung Li
发明人： Marie-Claire Cyrille , Frederick H. Dill , Cherngye Hwang , Jui-Lung Li
IPC分类号： G11B5/39 , G11B5/31 , H01L21/304 , H01L43/08 , H01L27/14
CPC分类号： G11B5/313
摘要： A method and structure for a microelectronic device comprises a first film over a substrate, a first polish resistant layer over the first film, a second film over the first polish resistant layer, a second polish resistant layer over the second film, wherein the first and second polish resistant layers comprise diamond-like carbon. The first film comprises an electrically resistive material, while the second film comprises low resistance conductive material. The first film is an electrical resistor embodied as a magnetic read sensor. The electrically resistive material is sensitive to magnetic fields. The device further comprises a generally vertical junction between the first and second films and a dielectric film abutted to the electrically resistive material.

28. 发明授权

US06434814B1 Method of manufacturing a magnetic head including a read head with read track width defining layer that planarizes the write gap layer of a write head 失效
标题翻译：一种制造磁头的方法，该磁头包括具有读磁道宽度限定层的读头，平面化写头的写间隙层
公开(公告)号：US06434814B1
公开(公告)日：2002-08-20
申请号：US09212724
申请日：1998-12-16
申请人： Henry C. Chang , Cherngye Hwang , Robert Otto Schwenker
发明人： Henry C. Chang , Cherngye Hwang , Robert Otto Schwenker
IPC分类号： G11B5127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/012 , G11B5/3116 , G11B5/3163 , G11B5/3903 , G11B5/3932 , G11B5/3967 , G11B2005/3996 , Y10T29/49025 , Y10T29/49032 , Y10T29/49041 , Y10T29/49044 , Y10T29/4905 , Y10T29/49052
摘要： A method of making a magnetic head that has a read head with a track width includes the steps of depositing a read track width defining material layer on a read sensor material layer; forming a bi-layer photoresist mask on the read track width defining material layer that masks a read track width defining layer portion of the read track width defining material layer; removing by reactive ion etching (RIE) a portion of the read track width defining material layer not masked by the photoresist mask to form the read track width defining layer portion with exposed first and second side edges that are spaced apart a distance equal to the track width; removing by ion milling a first portion of the read sensor material layer not masked by the read track width defining layer portion to form a second portion of the read sensor material layer with exposed first and second side edges that have a width equal to the track width; depositing hard bias and lead material layers on the photoresist mask in contact with the first and second side edges of each of the second portion of the read sensor material layer and the read track width defining layer portion; and removing the photoresist mask, thereby lifting off a portion of the hard bias and lead material layers leaving first and second hard bias and lead layers connected to the first and second side edges of each of the second portion of the read sensor material layer and the read track width defining layer portion.
摘要翻译：制造具有带磁道宽度的读头的磁头的方法包括以下步骤：在读取的传感器材料层上沉积限定材料层的读取磁道宽度; 在所述读取磁道宽度限定材料层上形成双层光致抗蚀剂掩模，其掩蔽所述读取磁道宽度限定材料层的读取磁道宽度限定层部分; 通过反应离子蚀刻（RIE）去除未被光致抗蚀剂掩模掩蔽的读磁道宽度限定材料层的一部分，以形成具有暴露的第一和第二侧边缘，该第一和第二侧边缘间隔开等于轨道的距离宽度; 通过离子研磨读取的传感器材料层的第一部分而不被读取磁道宽度限定层部分掩蔽，以形成具有等于轨道宽度的宽度的暴露的第一和第二侧边缘的读取传感器材料层的第二部分 ; 在所述光致抗蚀剂掩模上沉积与所述读取传感器材料层的第二部分和所述读取磁道宽度限定层部分中的每一个的第一和第二侧边缘接触的硬偏压和引线材料层; 并且去除光致抗蚀剂掩模，从而剥离硬偏压和引线材料层的一部分，留下第一和第二硬偏压和引线层，其连接到读取传感器材料层的第二部分的第一和第二侧边缘，并且读取磁道宽度定义层部分。

29. 发明授权

US5948532A Cermet adhesion layer with carbonaceous wear layer for head/disk interfaces 失效
标题翻译：用于头/磁盘接口的碳质磨损层的金属陶瓷附着层
公开(公告)号：US5948532A
公开(公告)日：1999-09-07
申请号：US763265
申请日：1996-12-10
申请人： Cherngye Hwang , Vedantham Raman , John Walter Raniseski
发明人： Cherngye Hwang , Vedantham Raman , John Walter Raniseski
IPC分类号： C23C14/06 , G11B5/10 , G11B5/127 , G11B5/187 , G11B5/255 , G11B5/31 , G11B5/39 , G11B5/48 , G11B5/58 , B32B9/00
CPC分类号： G11B5/484 , C23C14/06 , G11B5/10 , G11B5/58 , G11B5/1278 , G11B5/187 , G11B5/255 , G11B5/3106 , G11B5/3903 , G11B5/3916 , Y10T428/1164 , Y10T428/30
摘要： We disclose a bi-layer wear pad, for use in a slider/magnetic media interface, comprising a wear layer and an adhesion layer. The wear material is either carbon or a carbonaceous material. Typical carbonaceous materials useful for wear layers include elements such as hydrogen, fluorine, nitrogen, boron, and silicon dioxide. The adhesion layer is a thin cermet such as nichrome oxide (NiCrOx) or chromium silicon oxide (CrSiOx). Use of the cermet adhesion layer allows a relatively thick wear layer to be deposited with good adhesion and superior durability.
摘要翻译：我们公开了一种双层耐磨垫，用于滑动/磁性介质界面，包括耐磨层和粘合层。磨损材料是碳或碳质材料。用于耐磨层的典型含碳材料包括诸如氢，氟，氮，硼和二氧化硅的元素。粘合层是诸如氧化铬（NiCrOx）或氧化铬（CrSiO x）的薄金属陶瓷。使用金属陶瓷粘合层允许沉积相对较厚的耐磨层，具有良好的粘合性和优异的耐久性。

30. 发明授权

US5872684A Air bearing slider having a relieved trailing edge 失效
标题翻译：空气轴承滑块具有缓和的后缘
公开(公告)号：US5872684A
公开(公告)日：1999-02-16
申请号：US857111
申请日：1997-05-15
申请人： Robert Glenn Hadfield , Cherngye Hwang , Andrew Chiuyan Ting , Eric K. Wong , Tanya M. Zook
发明人： Robert Glenn Hadfield , Cherngye Hwang , Andrew Chiuyan Ting , Eric K. Wong , Tanya M. Zook
IPC分类号： G11B5/105 , G11B5/31 , G11B5/60 , G11B17/32 , G11B19/04 , G11B5/187
CPC分类号： G11B5/105 , G11B5/3106 , G11B5/6005 , G11B17/32 , G11B19/04 , G11B5/6011
摘要： The present invention discloses a slider having an alumina overcoat layer that is etched so as to be tapered, sloped, inclined, recessed, or faceted with respect to the air-bearing surfaces of the slider. The present invention also relates to a method for eliminating overcoat protrusions by etching away portions of the alumina overcoat layer at row level. Preferably, photolithographic techniques are used at row level to both etch the air-bearing surfaces of the slider and to etch away potential protrusion regions of the alumina overcoat.
摘要翻译：本发明公开了一种具有氧化铝外涂层的滑块，其被蚀刻成相对于滑块的空气轴承表面呈锥形，倾斜，倾斜，凹入或刻面。本发明还涉及通过在行级别刻蚀掉氧化铝外涂层的部分来消除外涂层突起的方法。优选地，在行级使用光刻技术来蚀刻滑块的空气轴承表面并蚀刻氧化铝外涂层的潜在突出区域。

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