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    • 24. 发明授权
    • Ultrasonic processing device and electronic parts fabrication method using the same
    • 超声波处理装置及使用其的电子部件制造方法
    • US06619301B2
    • 2003-09-16
    • US09738851
    • 2000-12-15
    • Kazuki KobayashiHitoshi OnoYasunobu TagusaTomomi HikidaYuichi Maida
    • Kazuki KobayashiHitoshi OnoYasunobu TagusaTomomi HikidaYuichi Maida
    • B08B310
    • H01L21/67051B08B3/123G03F7/428H05K3/0085H05K3/26Y10S134/902
    • To provide an ultrasonic processing device that is capable of effectively carrying out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the ultrasonic processing target region by means of ultrasonic oscillation elements each having a width smaller than an ultrasonic processing target region of a processing object, as well as to provide an electronic parts fabrication method using the foregoing device, a plurality of ultrasonic oscillation elements are arranged so as to planarly extend in a glass substrate transport direction and in a glass substrate width direction, and projected figures obtained by projecting said ultrasonic oscillation elements to a plane perpendicular to the glass substrate transport direction form a single belt-like region of a width exceeding a width of the ultrasonic processing target region. The foregoing arrangement causes ultrasonic-projected regions of the ultrasonic oscillation elements to partly overlap each other on a surface of the glass substrate when the glass substrate is transported by transport rollers in the transport direction, thereby enabling ultrasonic projection over the complete entirety of the ultrasonic processing target region.
    • 为了提供能够通过超声波振荡元件均匀地超声波超声波处理对象区域的超声波均匀化而进行清洗动作,抗蚀剂剥离动作等的超声波处理装置。 处理对象的超声波处理对象区域,以及提供使用上述装置的电子部件制造方法,多个超声波振荡元件被布置成在玻璃基板输送方向和玻璃基板宽度上平面地延伸 通过将所述超声波振动元件投射到与玻璃基板输送方向垂直的平面而获得的方向和投影图形形成宽度超过超声波处理对象区域的宽度的单个带状区域。 当玻璃基板由输送辊沿输送方向输送时,上述布置使得超声波振荡元件的超声波投影区域在玻璃基板的表面上部分地彼此重叠,从而能够超过整个超声波的超声波投影 加工目标区域。
    • 25. 发明授权
    • Liquid crystal display device and method for fabricating the same
    • 液晶显示装置及其制造方法
    • US06407786B1
    • 2002-06-18
    • US09589503
    • 2000-06-08
    • Akihiro YamamotoTakeshi HaraKazuki KobayashiMasumi Kubo
    • Akihiro YamamotoTakeshi HaraKazuki KobayashiMasumi Kubo
    • G02F11335
    • G02F1/133553
    • The liquid crystal display device of this invention includes a plurality of pixels arranged in a matrix constituting a plurality of pixel columns. Each of the plurality of pixels has a reflection region permitting reflection-mode display, the reflection region including an insulating layer having a convex/concave surface and a reflector formed on the convex/concave surface of the insulating layer. The formation of the insulating layer having the convex/concave surface includes the steps of: forming a photosensitive resin film; exposing a first region of the photosensitive region film via a first photomask (first exposure step); exposing a second region of the photosensitive region film that includes a region different from the first region via a second photomask (second exposure step); and developing the exposed photosensitive resin film, wherein the first and second exposure steps are performed so that a boundary portion defined as an overlap between the first region and the second region or a space between the first region and the second region is located to overlap with at least part of an inter-column space between adjacent pixel columns among the plurality of pixel columns.
    • 本发明的液晶显示装置包括以构成多个像素列的矩阵排列的多个像素。 多个像素中的每一个具有允许反射模式显示的反射区域,该反射区域包括具有凸/凹表面的绝缘层和形成在绝缘层的凸/凹表面上的反射器。 形成具有凸/凹表面的绝缘层包括以下步骤:形成感光树脂膜; 通过第一光掩模曝光感光区域膜的第一区域(第一曝光步骤); 通过第二光掩模曝光包括不同于第一区域的区域的感光区域膜的第二区域(第二曝光步骤); 并且曝光的感光树脂膜显影,其中执行第一和第二曝光步骤,使得限定为第一区域和第二区域之间的重叠的边界部分或第一区域和第二区域之间的空间被定位成与 所述多个像素列中的相邻像素列之间的列间空间的至少一部分。
    • 26. 发明申请
    • DISPLAY PANEL AND PROCESS FOR PRODUCTION THEREOF
    • 显示面板及其生产工艺
    • US20120327345A1
    • 2012-12-27
    • US13583131
    • 2010-12-03
    • Katsuki InoueKazuki Kobayashi
    • Katsuki InoueKazuki Kobayashi
    • G02F1/1337H01J9/00G02F1/1333
    • C03C17/32C03C17/002C03C2218/32G02F2202/023
    • The present invention provides a display panel in which a defect such as a depressed portion formed on the glass substrate is restored, and a damage on an alignment layer due to the restoration is sufficiently suppressed, so that occurrence of display poor is prevented. The display panel of the present invention comprises: a pair of substrates; a display element disposed between the substrates; and a functional film disposed on a surface facing the display element of at least one of the substrates, the functional film being formed from a material having a photosensitive group, at least one of the substrates having a depressed portion on its surface and the depressed portion being filled with a cured product of an ultraviolet-curable resin, and the cured product having been formed by curing the ultraviolet-curable resin with ultraviolet rays at a wavelength of 400 nm or longer.
    • 本发明提供了一种显示面板,其中形成在玻璃基板上的凹陷部分的缺陷恢复,并且由于恢复而对取向层的损伤被充分抑制,从而防止了显示不良的发生。 本发明的显示面板包括:一对基板; 布置在所述基板之间的显示元件; 以及设置在与所述至少一个所述基板的所述显示元件相对的表面上的功能膜,所述功能膜由具有感光基团的材料形成,所述基板中的至少一个在其表面具有凹陷部,所述凹部 填充有紫外线固化树脂的固化物,并且通过紫外线固化树脂用波长400nm以上的紫外线固化而形成的固化物。
    • 27. 发明申请
    • EXHAUST GAS TREATING METHOD AND APPARATUS
    • 排气处理方法和装置
    • US20100071348A1
    • 2010-03-25
    • US12516845
    • 2007-12-24
    • Kazuki KobayashiHirofumi KikkawaHiroshi IshizakaHiroshi TakezakiHiroyuki Nosaka
    • Kazuki KobayashiHirofumi KikkawaHiroshi IshizakaHiroshi TakezakiHiroyuki Nosaka
    • F01N11/00B01D53/56F01N5/02F01N9/00
    • F23J15/003B01D53/10B01D53/50B01D53/64B01D53/8625B01D2257/602F23J15/006F23J15/025F23J2215/60F23J2217/10F23J2219/40F23J2219/60F23J2219/70F23J2900/15081
    • After adjusting an exhaust gas temperature at an exit of a heat recovery unit (11) of an exhaust gas treating apparatus to not more than a dew point temperature of sulfur trioxide (SO3), a heavy metal adsorbent is supplied from a heavy metal adsorbent supply unit (16) disposed in an exhaust gas at an entrance of a precipitator (4) or an intermediate position within the precipitator (4), and the exhaust gas containing the heavy metal adsorbent is supplied into the precipitator (4). Preferably at this stage, the heavy metal adsorbent is supplied into the exhaust gas at the entrance of the precipitator (4) 0.1 seconds after the exhaust gas temperature at the exit of the heat recovery unit (11) has been adjusted to not more than the dew point temperature of SO3. Further preferably, in order to prevent acid corrosion of equipment, the heavy metal adsorbent is supplied after spraying an alkali into the exhaust gas at the entrance or exit of the heat recovery unit (11) and adjusting the exhaust gas temperature at the exit of the heat recovery unit to not more than the dew point temperature of SO3. Accordingly, even when coal with a high sulfur content is used as fuel, heavy metals in the exhaust gas can be removed effectively.
    • 在废气处理装置的热回收单元(11)的出口处的排气温度调节至三氧化硫(SO3)的露点温度以下之前,重金属吸附剂由重金属吸附剂供给源 设置在除尘器(4)的入口处的排气中或者除尘器(4)内的中间位置的单元(16),并且将含有重金属吸附剂的排气供给到除尘器(4)中。 优选在此阶段,在热回收单元(11)的出口处的排气温度已经调整到不超过该温度的0.1秒之后,将重金属吸附剂供入到除尘器(4)入口处的废气中 露点温度SO3。 进一步优选为了防止设备的酸腐蚀,在热回收单元(11)的入口或出口处的排气中喷入碱后,再供给重金属吸附剂,并调节出口处的排气温度 热回收单位不得超过SO3的露点温度。 因此,即使使用具有高硫含量的煤作为燃料,也能够有效地除去废气中的重金属。
    • 28. 发明授权
    • Transistor array and active-matrix substrate
    • 晶体管阵列和有源矩阵基板
    • US07586131B2
    • 2009-09-08
    • US11042406
    • 2005-01-25
    • Hirohiko NishikiKazuki Kobayashi
    • Hirohiko NishikiKazuki Kobayashi
    • H01L29/74
    • H01L27/28G02F1/1368H01L27/3244
    • A transistor array includes conductor lines, function lines, and transistors. Each of the conductor lines includes a core and a conductor layer that covers the core. Each of the function lines includes a core, at least the surface of which is electrically conductive, an insulating layer that covers the core, and a semiconductor layer that covers the insulating layer. Each of the function lines contacts with, and crosses, the conductor lines. Each of the transistors includes a first ohmic contact region, which is defined by a region where one of the conductor lines crosses one of the function lines and which makes an ohmic contact with the semiconductor layer, a second ohmic contact region, which also makes an ohmic contact with the semiconductor layer, and a channel region, which is defined in the semiconductor layer between the first and second ohmic contact regions.
    • 晶体管阵列包括导线,功能线和晶体管。 每个导体线包括芯和覆盖芯的导体层。 每个功能线包括至少其表面是导电的芯,覆盖芯的绝缘层和覆盖绝缘层的半导体层。 每个功能线与导体线接触并交叉。 每个晶体管包括第一欧姆接触区,其由导体线中的一个与一个功能线交叉并且与半导体层发生欧姆接触的区域限定,第二欧姆接触区也形成第二欧姆接触区, 与半导体层的欧姆接触以及在第一和第二欧姆接触区域之间的半导体层中限定的沟道区域。