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21. 发明授权

US07862402B2 Polishing apparatus and substrate processing apparatus 有权
标题翻译：抛光装置和基板处理装置
公开(公告)号：US07862402B2
公开(公告)日：2011-01-04
申请号：US12699318
申请日：2010-02-03
申请人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
发明人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
IPC分类号： B24B49/00
CPC分类号： B24B37/02 , B24B9/065 , B24B21/002
摘要： The present invention relates to a polishing apparatus for removing surface roughness produced at a peripheral portion of a substrate, or for removing a film formed on a peripheral portion of a substrate. The polishing apparatus includes a housing for forming a polishing chamber therein, a rotational table for holding and rotating a substrate, a polishing tape supply mechanism for supplying a polishing tape into the polishing chamber and taking up the polishing tape which has been supplied to the polishing chamber, a polishing head for pressing the polishing tape against a bevel portion of the substrate, a liquid supply for supplying a liquid to a front surface and a rear surface of the substrate, and a regulation mechanism for making an internal pressure of the polishing chamber being set to be lower than an external pressure of the polishing chamber.
摘要翻译：本发明涉及一种用于去除在基板的周边部分产生的表面粗糙度或用于去除形成在基板的周边部分上的膜的抛光装置。抛光装置包括：用于在其中形成抛光室的壳体，用于保持和旋转基板的旋转台;抛光带供给机构，用于将研磨带供给到抛光室中并且吸收已经被供给到抛光的研磨带用于将抛光带压靠在基板的斜面部分上的抛光头，用于将液体供应到基板的前表面和后表面的液体供应源，以及用于使抛光室的内部压力的调节机构被设定为低于抛光室的外部压力。

22. 发明授权

US07834898B2 Image forming device, image forming method, and exposure head 失效
标题翻译：图像形成装置，图像形成方法和曝光头
公开(公告)号：US07834898B2
公开(公告)日：2010-11-16
申请号：US12188034
申请日：2008-08-07
申请人： Kenji Yamaguchi , Nozomu Inoue , Yujiro Nomura , Ken Ikuma
发明人： Kenji Yamaguchi , Nozomu Inoue , Yujiro Nomura , Ken Ikuma
IPC分类号： B41J2/435 , B41J2/47
CPC分类号： G03G15/326 , B41J2/451 , G03G15/04072 , G03G2215/0409 , H04N1/12 , H04N1/1911 , H04N1/1916 , H04N1/1917 , H04N1/1918 , H04N1/193 , H04N1/1932 , H04N1/1933 , H04N1/1934
摘要： An image forming device includes a photoconductor drum having a rotational shaft in a first direction, and an exposure head having a plurality of imaging optical systems disposed in the first direction and a second direction and each having a negative optical magnification, and a light emitting element substrate on which a plurality of light emitting elements are disposed, the plurality of light emitting elements emitting light beams imaged on the photoconductor drum by one of the imaging optical systems, and the light beams are imaged by the imaging optical systems disposed in the second direction on the photoconductive drum at positions different from each other in the second direction.
摘要翻译：图像形成装置包括具有沿第一方向的旋转轴的感光鼓和具有沿第一方向和第二方向设置并且各自具有负光学倍率的多个成像光学系统的曝光头，以及发光元件其上设置多个发光元件的多个发光元件，所述多个发光元件通过所述成像光学系统之一发射成像在所述感光鼓上的光束，并且所述光束被设置在所述第二方向上的所述成像光学系统成像在感光鼓上在第二方向上彼此不同的位置处。

23. 发明申请

US20100256079A1 ERIOCITRIN-CONTAINING MATERIAL, METHOD FOR PRODUCTION OF THE ERIOCITRIN-CONTAINING MATERIAL, AND FOOD, BEVERAGE, PHARMACEUTICAL PREPARATION AND COSMETIC EACH COMPRISING THE EROCITRIN-CONTAINING MATERIAL 有权
标题翻译：含ERIOCITRIN的材料，含有含ERIITRIN的材料的生产方法，以及包含含EROCITRIN的材料的食品，饮料，药物制备和化妆品
公开(公告)号：US20100256079A1
公开(公告)日：2010-10-07
申请号：US12740331
申请日：2008-12-23
申请人： Masanori Hiramitsu , Toshikazu Omori , Kenji Yamaguchi , Hiroaki Bessho
发明人： Masanori Hiramitsu , Toshikazu Omori , Kenji Yamaguchi , Hiroaki Bessho
IPC分类号： A61K31/7048 , A61P39/06
CPC分类号： A61K31/7048 , A61K8/498 , A61K36/752 , A61Q19/00 , C07H17/07
摘要： A process for producing an eriocitrin-containing material comprises the steps of: preparing an eriocitrin-containing citrus extract from a citrus fruit using an extractant; and separating eriocitrin from the citrus extract. The step of separating eriocitrin from the citrus extract comprises the steps of: bringing the citrus extract into contact with a porous synthetic adsorption resin such that eriocitrin in the citrus extract is adsorbed on the porous synthetic adsorption resin, the porous synthetic adsorption resin comprising a phenol-formaldehyde resin as a main framework and having amino and phenolic hydroxyl groups; and eluting the eriocitrin adsorbed on the porous synthetic adsorption resin using an elution solvent.
摘要翻译：一种用于产生含有黑色素的材料的方法包括以下步骤：使用提取剂从柑橘类水果制备含有黑色素的柑橘提取物; 并从柑橘提取物中分离出白藜芦醇。从柑橘提取物中分离出白藜芦醇的步骤包括以下步骤：使柑橘提取物与多孔合成吸附树脂接触，使得柑橘提取物中的白藜芦醇吸附在多孔合成吸附树脂上，多孔合成吸附树脂包含苯酚甲醛树脂为主要骨架，具有氨基和酚羟基; 并使用洗脱溶剂洗脱吸附在多孔合成吸附树脂上的白藜芦醇。

24. 发明授权

US07682225B2 Polishing apparatus and substrate processing apparatus 有权
标题翻译：抛光装置和基板处理装置
公开(公告)号：US07682225B2
公开(公告)日：2010-03-23
申请号：US10581669
申请日：2005-02-23
申请人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
发明人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
IPC分类号： B24B24/00
CPC分类号： B24B37/02 , B24B9/065 , B24B21/002
摘要： The present invention relates to a polishing apparatus for removing surface roughness produced at a peripheral portion of a substrate, or for removing a film formed on a peripheral portion of a substrate. The polishing apparatus includes a housing for forming a polishing chamber therein, a rotational table for holding and rotating a substrate, a polishing tape supply mechanism for supplying a polishing tape into the polishing chamber and taking up the polishing tape which has been supplied to the polishing chamber, a polishing head for pressing the polishing tape against a bevel portion of the substrate, a liquid supply for supplying a liquid to a front surface and a rear surface of the substrate, and a regulation mechanism for making an internal pressure of the polishing chamber being set to be lower than an external pressure of the polishing chamber.
摘要翻译：本发明涉及一种用于去除在基板的周边部分产生的表面粗糙度或用于去除形成在基板的周边部分上的膜的抛光装置。抛光装置包括：用于在其中形成抛光室的壳体，用于保持和旋转基板的旋转台;抛光带供给机构，用于将研磨带供给到抛光室中并且吸收已经被供给到抛光的研磨带用于将抛光带压靠在基板的斜面部分上的抛光头，用于将液体供应到基板的前表面和后表面的液体供应源，以及用于使抛光室的内部压力的调节机构被设定为低于抛光室的外部压力。

25. 发明申请

US20090314764A1 Electric heating device and manufacturing method thereof 审中-公开
标题翻译：电加热装置及其制造方法
公开(公告)号：US20090314764A1
公开(公告)日：2009-12-24
申请号：US12310888
申请日：2007-09-10
申请人： Kazuaki Mori , Yuusuke Nakamura , Kenji Yamaguchi
发明人： Kazuaki Mori , Yuusuke Nakamura , Kenji Yamaguchi
IPC分类号： H05B3/06 , B23P17/00
CPC分类号： F24H3/0405 , F24H3/0429 , F24H3/0435 , F24H3/047 , F24H9/1872 , H05B3/50 , H05B2203/02 , Y10T29/49083
摘要： An electric heating device includes a heating member (70) having a PTC element (72) and a fin member (80) configured to radiate heat generated in the heater member (70) into the atmosphere. The fin member (80) is provided in contact with a casing member provided outside the heating member (70). The electric heating device includes a pair of sandwiching plates (75, 75) configured to hold a constituent of the heating member that include the PTC element (72) in a vertically sandwiching manner. Moreover, a clip member (90) which is configured to engage end edges of both of the sandwiching plates (75, 75) with each other while applying a load to the sandwiching plates (75, 75) in the sandwiching direction, is provided on front surfaces (75a) of the pair of sandwiching plates (75, 75).
摘要翻译：电加热装置包括具有PTC元件（72）的加热构件（70）和被配置为将在加热器构件（70）中产生的热量辐射到大气中的翅片构件（80）。翅片构件（80）设置成与设置在加热构件（70）外侧的壳体构件接触。电加热装置包括一对夹持板（75,75），其构造成以垂直夹持的方式保持包括PTC元件（72）的加热构件的构成。此外，夹持构件（90）被配置为在夹持方向上向夹持板（75,75）施加负载的同时将两个夹持板（75,75）的端部边缘彼此接合，一对夹持板（75,75）的前表面（75a）。

26. 发明授权

US07553474B2 Method for producing metal oxide sol 有权
标题翻译：金属氧化物溶胶的制造方法
公开(公告)号：US07553474B2
公开(公告)日：2009-06-30
申请号：US11660086
申请日：2005-08-08
申请人： Yutaka Ohmori , Hirokazu Kato , Yoshinari Koyama , Kenji Yamaguchi
发明人： Yutaka Ohmori , Hirokazu Kato , Yoshinari Koyama , Kenji Yamaguchi
IPC分类号： B01J37/03 , B01J37/06 , B01J37/08 , C01B13/14 , C01B13/32 , C01B33/12 , C01B33/141 , C01B33/148 , C01B33/18 , C01F1/00 , C01G1/02 , C01G23/053 , B01J21/00 , B01J23/00 , C01F5/02 , C01F7/02 , C01F11/02 , C01G9/02 , C01G19/02 , C01G23/047 , C01G25/02 , C01G49/02 , C01G51/04 , C01G53/04
CPC分类号： B01J13/0047 , B01J21/06 , B01J21/066 , B01J23/10 , B01J35/0013 , B01J37/10 , B82Y30/00 , C01B13/366 , C01F7/448 , C01F17/0043 , C01G1/02 , C01G25/02 , C01G30/004 , C01P2002/72 , C01P2004/04 , C01P2004/50 , C01P2004/64 , C01P2006/10 , C01P2006/22 , C09C1/407
摘要： It is an object to provide a method for producing stable alkaline metal oxide sols having a uniform particle size distribution. The method comprises the steps of: heating a metal compound at a temperature of 60° C. to 110° C. in an aqueous medium that contains a carbonate of quaternary ammonium; and carrying out hydrothermal processing at a temperature of 110° C. to 250° C. The carbonate of quaternary ammonium is (NR4)2CO3 or NR4HCO3 in which R represents a hydrocarbon group, or a mixture thereof. The metal compound is one, or two or more metal compounds selected from a group of compounds based on a metal having a valence that is bivalent, trivalent, or tetravalent.
摘要翻译：本发明的目的是提供一种具有均匀粒度分布的稳定的碱金属氧化物溶胶的制造方法。该方法包括以下步骤：在含有季铵盐的水性介质中，在60℃至110℃的温度下加热金属化合物; 并在110℃至250℃的温度下进行水热处理。季铵的碳酸酯是其中R表示烃基的（NR4）2CO3或NR4HCO3，或其混合物。金属化合物是选自基于具有二价，三价或四价的价数的金属的一组或两种以上的金属化合物。

27. 发明申请

US20080200100A1 Substrate Processing Apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US20080200100A1
公开(公告)日：2008-08-21
申请号：US11630512
申请日：2006-04-18
申请人： Tamami Takahashi , Mitsuhiko Shirakashi , Kenya Ito , Kazuyuki Inoue , Kenji Yamaguchi , Masaya Seki
发明人： Tamami Takahashi , Mitsuhiko Shirakashi , Kenya Ito , Kazuyuki Inoue , Kenji Yamaguchi , Masaya Seki
IPC分类号： B24B9/06 , H01L21/304 , B24B49/12
CPC分类号： H01L21/67219 , B24B9/065 , B24B49/04 , H01L21/302 , H01L21/461 , H01L21/67253 , H01L21/68707 , H01L21/68728
摘要： A substrate processing apparatus (1) includes first and second polishing units (70A, 70B) for polishing a peripheral portion of a substrate (W), a primary cleaning unit (100) for cleaning the substrate (W), a secondary cleaning and drying unit (110) for drying the substrate (W) cleaned in the primary cleaning unit (100), and a measurement unit (30) for measuring the peripheral portion of the substrate (W). The measurement unit (30) includes a mechanism for measurement required for polishing in the first and second polishing units (70A and 70B), such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.
摘要翻译：一种基板处理装置（1）包括：用于研磨基板周边部分的第一和第二研磨单元（70A，70B）;用于清洗基板（W）的主清洁单元（100），二次清洗以及用于干燥在主清洗单元（100）中清洁的基板（W）的干燥单元（110），以及用于测量基板（W）的周边部分的测量单元（30）。测量单元（30）包括用于在第一和第二研磨单元（70A和70B）中抛光所需的测量机构，例如直径测量机构，横截面形状测量机构或表面状态测量机构。

28. 发明申请

US20080133792A1 Information processing device, method and program for displaying number of transferred data 审中-公开
标题翻译：信息处理装置，显示传送数据数的方法和程序
公开(公告)号：US20080133792A1
公开(公告)日：2008-06-05
申请号：US11976242
申请日：2007-10-23
申请人： Kenji Yamaguchi , Yasutaro Miyake , Noriko Shikata
发明人： Kenji Yamaguchi , Yasutaro Miyake , Noriko Shikata
IPC分类号： G06F13/18
CPC分类号： G06T1/20 , G09G5/00
摘要： An information processing device for reducing the time required for the data transfer as much as possible while displaying information of the data transfer state in synchronization with the data transfer. The information processing device is equipped with a counter for counting the number of pieces of data having been transferred in a data transfer. When a large number of pieces of data is to be transferred in the data transfer, the number of pieces of data having been transferred is displayed every time a certain number of pieces of data, not one piece of data, are transferred.
摘要翻译：一种信息处理装置，用于在数据传送同步显示数据传送状态的信息的同时尽可能地减少数据传送所需的时间。信息处理装置配备有用于对在数据传送中传送的数据数进行计数的计数器。当在数据传送中要传送大量数据时，每当传送一定数量的数据而不是一条数据时，就显示已传送的数据数。

29. 发明授权

US07172717B2 In-mold foam molding apparatus and method, and in-mold foam molded articles 失效
标题翻译：模内发泡成型装置和方法以及模内发泡成型制品
公开(公告)号：US07172717B2
公开(公告)日：2007-02-06
申请号：US10617091
申请日：2003-07-11
申请人： Masahiko Sameshima , Yoshiyuki Kobayashi , Kenji Yamaguchi
发明人： Masahiko Sameshima , Yoshiyuki Kobayashi , Kenji Yamaguchi
IPC分类号： B29C44/04
CPC分类号： B29C44/0469 , Y10S425/247 , Y10T428/24174 , Y10T428/24273 , Y10T428/24331 , Y10T428/24996 , Y10T428/249981
摘要： There is provided an in-mold foam molding apparatus affording a significantly simpler design for a molding apparatus capable of molding molded portions comprising bead starting materials having different properties into a unitary molded article, and effectively preventing various drawbacks associated with the provision of partitioning members; and an in-mold foam molded article devoid of flash projecting from its visible surfaces. There are provided partitioning members (32), (40) for partitioning into a plurality of partitioned mold chambers a mold cavity (13) defined by a core mold (11) and a cavity mold (12), these partitioning members (32), (40) being arranged such that at least a portion of the plurality of partitioned molding sections (11a), (11b) constituting the partitioned mold chambers within the core mold (11) are unitary, and filling units are provided to each partitioned mold chamber for filling thereof with a bead starting material, adjacent partitioned mold chambers being fillable with bead starting materials of different properties.
摘要翻译：提供了一种模内发泡成型装置，其对于能够将包括具有不同性质的珠粒起始材料成型的成型部分的模制装置设计成一体成型制品，并且有效地防止了与提供分隔件相关的各种缺陷; 以及从其可见表面没有闪光的模内发泡模塑制品。设置有分隔构件（32），（40），用于将由模芯（11）和空腔模具（12）限定的模腔（13）分隔成多个分隔模腔，这些分隔构件（32），（40）被布置成使得在所述芯模具（11）内构成分隔模腔的所述多个分隔模塑部分（11a），（11b）的至少一部分是一体的，并且将填充单元设置到每个分隔模具室，用于用胎圈起始材料填充，相邻的分隔模具室可以用不同性质的胎圈起始材料填充。

30. 发明申请

US20060175679A1 Semiconductor device and method for manufacturing the same 审中-公开
公开(公告)号：US20060175679A1
公开(公告)日：2006-08-10
申请号：US11384244
申请日：2006-03-21
申请人： Hiroyuki Amishiro , Toshio Kumamoto , Motoshige Igarashi , Kenji Yamaguchi
发明人： Hiroyuki Amishiro , Toshio Kumamoto , Motoshige Igarashi , Kenji Yamaguchi
IPC分类号： H01L29/00
CPC分类号： H01L27/0207 , H01L27/0629 , H01L27/0802 , H01L28/20
摘要： A semiconductor device of the invention has a plurality of resistor elements formed on an element isolating oxide film in predetermined regions on a surface of a semiconductor substrate. Active regions are furnished close to the resistor elements. This allows the element isolating oxide film near the resistor elements to be divided into suitable strips, forestalling a concave formation at the center of the element isolating oxide film upon polishing of the film by CMP and thereby enhancing dimensional accuracy of the resistor elements upon fabrication.

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