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    • 23. 发明申请
    • Fluid processing device
    • 流体处理装置
    • US20060013742A1
    • 2006-01-19
    • US10891650
    • 2004-07-15
    • Dar BahattDebjyoti Banerjee
    • Dar BahattDebjyoti Banerjee
    • B01L3/00
    • B01L3/5027B01L3/50273B01L2200/027B01L2300/0636B01L2300/0803B01L2300/0864B01L2300/0867B01L2400/0406B01L2400/0409Y10T436/11Y10T436/143333
    • A fluid processing device and method of using the device are provided. The fluid processing device can include a substrate with a fluid processing pathway at least partially formed in or on the substrate. The fluid processing pathway can include an input end, at least one output end, a first input opening, a plurality of reaction sites each in fluid communication with the first input opening and arranged between the first input opening and the at least one output end. The fluid processing pathway can include a plurality of second input openings including two or more in fluid communication respectively with each of the reaction sites, the second input openings being arranged with the reaction site disposed between the at least one output end and the second input openings. The fluid processing device can include one or more output openings in fluid communication with one or more of the plurality of reaction sites and arranged at the at least one output end of the fluid processing pathway.
    • 提供一种使用该装置的流体处理装置和方法。 流体处理装置可以包括具有至少部分地形成在基底中或基底上的流体处理通路的基底。 流体处理通道可以包括输入端,至少一个输出端,第一输入开口,多个反应位置,每个反应位置与第一输入开口流体连通并且布置在第一输入开口和至少一个输出端之间。 流体处理路径可以包括多个第二输入开口,包括两个或更多个分别与每个反应位置流体连通的第二输入开口,第二输入开口被布置成使反应部位设置在至少一个输出端和第二输入开口 。 流体处理装置可以包括与多个反应部位中的一个或多个处于流体连通并且布置在流体处理通路的至少一个输出端处的一个或多个输出开口。