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21. 发明授权

US5657130A Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US5657130A
公开(公告)日：1997-08-12
申请号：US408714
申请日：1995-03-22
申请人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
发明人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70216 , G03F7/70275 , G03F7/70358 , G03F7/70791 , G03F9/70
摘要： In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.
摘要翻译：在曝光装置和方法中，掩模和基板彼此同步地扫描，使得掩模的图案可以通过投影光学系统被转印到基板上。第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。在投影光学系统的光轴的方向上检测其反射光，并且在光束照射的掩模上的点的位置被检测。此外，第二光束照射到沿扫描方向间隔开的基板上的至少两个位置，并且其反射光被接收。检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。

22. 发明授权

US09532033B2 Image sensor and imaging device 有权
标题翻译：图像传感器和成像装置
公开(公告)号：US09532033B2
公开(公告)日：2016-12-27
申请号：US13305272
申请日：2011-11-28
申请人： Kiyoshige Shibazaki , Muneki Hamashima , Susumu Mori , Satoshi Suzuki
发明人： Kiyoshige Shibazaki , Muneki Hamashima , Susumu Mori , Satoshi Suzuki
IPC分类号： H04N13/02 , H01L27/146
CPC分类号： H04N13/286 , H01L27/14621 , H01L27/14623 , H01L27/14629 , H04N13/225 , H04N13/257
摘要： An image capturing element comprising photoelectric converting elements that are arranged two-dimensionally and photoelectrically convert incident light into an electric signal; aperture masks that correspond one-to-one with the photoelectric converting elements; and color filters that correspond one-to-one with the photoelectric converting elements. Among n adjacent photoelectric converting elements, where n is an integer no less than three, apertures of the aperture masks corresponding to at least three of the photoelectric converting elements are included within each pattern of a color filter pattern formed from at least two types of the color filters that respectively pass different wavelength bands, and are positioned to respectively pass light from different partial regions within a cross-sectional region of the incident light, and photoelectric converting element groups that are each formed of the n photoelectric converting elements are arranged in series.
摘要翻译：一种图像拍摄元件，包括被二维布置并将入射光光电转换成电信号的光电转换元件; 与光电转换元件一一对应的孔径掩模; 以及与光电转换元件一一对应的滤色器。在n个相邻的光电转换元件中，n是不小于3的整数，对应于至少三个光电转换元件的孔径掩模的孔径包括在由至少两种类型的光电转换元件形成的滤色器图案的每个图案内分别通过不同波长带的滤色器，并且被定位成分别在入射光的横截面区域内传递来自不同部分区域的光，并且各自由n个光电转换元件形成的光电转换元件组被串联布置。

23. 发明授权

US06538722B2 Projection exposure method, projection exposure apparatus, and methods of manufacturing and optically cleaning the exposure apparatus 失效
公开(公告)号：US06538722B2
公开(公告)日：2003-03-25
申请号：US10143952
申请日：2002-05-14
申请人： Yukako Matsumoto , Susumu Mori , Taro Ogata
发明人： Yukako Matsumoto , Susumu Mori , Taro Ogata
IPC分类号： G03B2742
CPC分类号： G03F7/70108 , G03F7/2006 , G03F7/70208 , G03F7/70925
摘要： A laser beam emitted from an exposure laser beam source has a uniform illuminance distribution after passing through a fly-eye lens selected according to the aperture stop. The exposure light is projected onto a reticle on which a predetermined pattern is formed, and the reticle pattern is projected onto a wafer by means of a projection optical system having a pupil filter inserted therein. A cleaning light beam branching off from the exposure light beam is projected through a beam splitter and a total reflection mirror onto the fly-eye lens located at a retraction position. A plane-parallel plate at the retraction position is irradiated with a cleaning light beam. The fly-eye lens and the plane-parallel plate are self-cleansed by the cleaning light beam, so that the transmissivity is kept higher than a predetermined value during standby.

24. 发明授权

US5715037A Scanning exposure apparatus 失效
标题翻译：扫描曝光装置
公开(公告)号：US5715037A
公开(公告)日：1998-02-03
申请号：US615853
申请日：1996-03-12
申请人： Kazuaki Saiki , Susumu Mori , Hiroshi Shirasu
发明人： Kazuaki Saiki , Susumu Mori , Hiroshi Shirasu
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F9/00 , G03F9/70
摘要： The present invention provides a scanning exposure apparatus for projecting an image of a pattern area of a mask having a first alignment mark onto a photosensitive substrate disposed on a substrate stage. A second alignment mark is provided on at least one of the photosensitive substrate and the substrate stage. The scanning exposure apparatus includes a plurality of projection optical systems disposed along a predetermined direction and adapted to receive the luminous fluxes passed through the mask and to project elected images of unchanged dimension of the plurality of illuminated regions of the mask onto the substrate. There is provided a mark detection system for detecting the first alignment mark on the mask and the second alignment mark, and at least one of the projection optical systems constitutes a part of the mark detection system.
摘要翻译：本发明提供了一种用于将具有第一对准标记的掩模的图案区域的图像投影到设置在基板台上的感光基板上的扫描曝光装置。在感光基板和基板台的至少一个上设置第二对准标记。扫描曝光装置包括沿着预定方向设置的多个投影光学系统，其适于接收通过掩模的光通量，并将掩模的多个照明区域的未改变尺寸的选定图像投影到基板上。提供了一种用于检测掩模上的第一对准标记和第二对准标记的标记检测系统，并且至少一个投影光学系统构成标记检测系统的一部分。

25. 发明授权

US4943733A Projection optical apparatus capable of measurement and compensation of distortion affecting reticle/wafer alignment 失效
标题翻译：能够测量和补偿影响光罩/晶片对准的失真的投影光学装置
公开(公告)号：US4943733A
公开(公告)日：1990-07-24
申请号：US436745
申请日：1989-11-15
申请人： Susumu Mori , Masato Shibuya
发明人： Susumu Mori , Masato Shibuya
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/706 , G03F7/70633 , G03F7/70691 , G03F9/70
摘要： A projection optical apparatus has a projection optical system for projecting an image of a reticle pattern on a stage-mounted semi-conductor wafer and includes a light-emitting surface of the stage. A photoelectric detector receives light from the light-emitting surface through the projection optical system and the reticle. The stage is moved to move a projected image of the light-emitting surface relative to the reticle, and the positional relation between the projected image of the light-emitting surface and the reticle is determined. Numerical apertures of various components of the projection optical apparatus are set for optimal performance.
摘要翻译：投影光学装置具有投影光学系统，用于将分划板图案的图像投影在载置半导体晶片上并且包括该台的发光表面。光电检测器通过投影光学系统和掩模版接收来自发光表面的光。移动舞台以相对于光罩移动发光表面的投影图像，并且确定发光表面和掩模版的投影图像之间的位置关系。设置投影光学装置的各种部件的数值孔径以获得最佳性能。

26. 发明授权

US5625436A Scanning type exposure apparatus and exposure method 失效
标题翻译：扫描式曝光装置和曝光方法
公开(公告)号：US5625436A
公开(公告)日：1997-04-29
申请号：US689691
申请日：1996-08-13
申请人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
发明人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/70241 , G03F7/70258 , G03F7/70358 , G03F7/70858 , G03F7/70883 , G03F9/70
摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.
摘要翻译：在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面，提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

27. 发明授权

US5579147A Scanning light exposure apparatus 失效
标题翻译：扫描曝光装置
公开(公告)号：US5579147A
公开(公告)日：1996-11-26
申请号：US354715
申请日：1994-12-06
申请人： Susumu Mori , Tsuyoshi Naraki
发明人： Susumu Mori , Tsuyoshi Naraki
IPC分类号： G03B27/50 , G03F7/20 , H01L21/027 , G02B26/08
CPC分类号： G03F7/7005 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
摘要翻译：扫描曝光装置包括用于将光束照射到掩模的图案区域中的多个子区域的照明光学系统，沿着预定方向布置的多个投影光学系统，用于投影子像素的单位放大率的竖立图像，通过掩模将光束透射到感光基板上的区域，在每个照明光学系统中布置在与感光基板基本共轭的位置处的光阑部件，用于将子区域的投影面积限制在光敏基片上，敏感基板，用于相对于所述投影光学系统和隔膜控制装置基本横向于预定方向同步扫描所述掩模和所述感光基板的扫描装置，用于沿横向于预定的方向改变每个隔膜部件的孔的宽度方向。

28. 发明授权

US5144527A Multilayer capacitor and method of fabricating the same 失效
标题翻译：多层电容器及其制造方法
公开(公告)号：US5144527A
公开(公告)日：1992-09-01
申请号：US663942
申请日：1991-03-14
申请人： Toshinori Amano , Susumu Mori
发明人： Toshinori Amano , Susumu Mori
IPC分类号： H01G4/012 , H01G4/30 , H01G13/06
CPC分类号： H01G4/012 , H01G13/06 , H01G4/30 , Y10T29/435
摘要： A multilayer capacitor constructed using a monolithic type dielectric body in which a plurality of dielectric layers are laminated with inner electrodes being interposed therebetween and having a structure in which the width of the inner electrodes is made smaller than that of the dielectric layers so that side margin regions are provided in side parts of the inner electrodes. In this multilayer capacitor, the inner electrodes originally have the same width as the dielectric layers and have side edges which are exposed at side surfaces of the above described monolithic type dielectric body. The exposed side edges of the inner electrodes are etched or physically removed to form the above described side margin regions. The side margin regions are formed by removing parts of the inner electrodes by etching or physical removal, so that the width of the side margin regions is accurately achieved. In addition, the multilayer capacitor is constructed by forming the above side margin regions after overlapping the inner electrodes while they still have the same width as the dielectric layers, so that the overlapping area of the inner electrodes is accurately controlled.
摘要翻译： PCT No.PCT / JP90 / 01075 Sec。 371日期1991年3月14日 102（e）1992年3月14日PCT PCT 1990年8月24日PCT公布。出版物WO91 / 03064 1991年7月3日，1991年。一种使用单片式电介质体构成的多层电容器，其中多个电介质层与其间插入有内电极并且具有内部电极的宽度小于电介质层使得侧边缘区域设置在内部电极的侧部中。在该层叠电容器中，内部电极原来具有与电介质层相同的宽度，并且具有在上述单片型电介质体的侧面露出的侧边缘。蚀刻或物理去除内部电极的暴露的侧边缘以形成上述侧边缘区域。通过蚀刻或物理去除去除内部电极的一部分来形成侧边缘区域，从而准确地实现边缘区域的宽度。此外，层叠电容器通过在与内部电极重叠之后形成上述侧边缘区域而构成，同时它们仍然具有与电介质层相同的宽度，从而精确地控制内部电极的重叠面积。

29. 发明授权

US4724020A Method for jointing ceramic elements 失效
标题翻译：陶瓷元件接合方法
公开(公告)号：US4724020A
公开(公告)日：1988-02-09
申请号：US900778
申请日：1986-08-27
申请人： Yoshihiro Ebata , Masanori Kohyama , Nobuyuki Tamari , Makoto Kinoshita , Ryozo Hayami , Susumu Mori , Masahiko Nozawa , Tokuzo Nishi
发明人： Yoshihiro Ebata , Masanori Kohyama , Nobuyuki Tamari , Makoto Kinoshita , Ryozo Hayami , Susumu Mori , Masahiko Nozawa , Tokuzo Nishi
IPC分类号： C04B37/00 , B32B18/00 , B32B31/28
CPC分类号： C04B37/005 , C04B37/001 , C04B2237/06 , C04B2237/062 , C04B2237/343 , C04B2237/368 , C04B2237/704 , C04B2237/76
摘要： A method for jointing ceramic elements is disclosed. Ceramic elements to be joined are arranged between a pair of torces each having a nozzle for spouting combustion gas.The joint line of ceramic elements is first heated by flames of combustion gas spouted from each nozzle and, then, a high voltage is applied between said pair of torches. Ceramic elements are joined by said heating and applying a high voltage between torches.
摘要翻译：公开了一种用于接合陶瓷元件的方法。要连接的陶瓷元件布置在每个具有用于喷射燃烧气体的喷嘴的一对套筒之间。陶瓷元件的接合线首先由从每个喷嘴喷出的燃烧气体的火焰加热，然后在所述一对炬之间施加高电压。陶瓷元件通过所述加热连接并在炬之间施加高电压。

30. 发明授权

US4316202A Semiconductor integrated circuit device having a Schottky barrier diode 失效
标题翻译：具有肖特基势垒二极管的半导体集成电路器件
公开(公告)号：US4316202A
公开(公告)日：1982-02-16
申请号：US234848
申请日：1981-02-17
申请人： Susumu Mori
发明人： Susumu Mori
IPC分类号： H01L27/082 , H01L21/8222 , H01L27/06 , H01L27/08 , H01L29/47 , H01L29/872 , H03K19/013 , H03K19/084 , H01L29/48 , H01L29/56 , H01L29/64
CPC分类号： H03K19/084 , H01L27/0814 , H01L29/872 , H03K19/013
摘要： An integrated Schottky barrier diode having a low forward voltage is disclosed. It has been discovered that, contrary to previous theory, the mathematical relationships between the contact area of a Schottky barrier diode and the series resistance thereof and between the contact area and the forward current at zero forward voltage are non-linear for sufficiently small contact areas. According to the present invention, a Schottky barrier diode comprises several smaller Schottky barrier diodes connected in parallel and sharing a common cathode, the Schottky barrier contact area of each of the component diodes being sufficiently small to fall within the range in which barrier contact area is non-linearly related to at least one of series resistance and forward current at zero forward voltage. A Schottky barrier diode formed of several smaller diodes in this manner has a lower forward voltage than an SBD that has the same total barrier contact area but that is not split up into several component diodes.
摘要翻译：公开了具有低正向电压的集成肖特基势垒二极管。已经发现，与以前的理论相反，肖特基势垒二极管的接触面积与其串联电阻之间的数学关系以及在正向正压下的接触面积和正向电流之间的数学关系对于足够小的接触面积是非线性的。根据本发明，肖特基势垒二极管包括并联连接并共享公共阴极的几个较小的肖特基势垒二极管，每个元件二极管的肖特基势垒接触面积足够小以落入屏障接触面积的范围内非线性地与零正向电压下的串联电阻和正向电流中的至少一个相关。以这种方式由几个较小的二极管形成的肖特基势垒二极管具有比具有相同总屏障接触面积但不分成多个组件二极管的SBD更低的正向电压。

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