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21. 发明授权

US6122129A Apparatus for reproducing signals from a tape medium 失效
标题翻译：用于从磁带介质再现信号的装置
公开(公告)号：US6122129A
公开(公告)日：2000-09-19
申请号：US811161
申请日：1997-03-04
申请人： Osamu Aoki , Hideaki Kondo
发明人： Osamu Aoki , Hideaki Kondo
IPC分类号： G11B15/665 , G11B15/46
CPC分类号： G11B15/6656
摘要： An apparatus for reproducing signals which are recorded on a tape to form oblique tracks thereon. The apparatus includes a drum which has a plurality of rotary heads adjoining each other for scanning respective oblique tracks simultaneously to produce reproduced signals. The tape is wrapped around the drum and overlaps a first lead angle so that each of the rotary heads scans a plurality of the oblique tracks during one rotation in a still mode in which the tape is not transported. A control unit is also provided for controlling a rotational speed of the rotary heads and a transport speed of the tape; and a processes unit for processing the reproduced signals.
摘要翻译：一种用于再现记录在磁带上以在其上形成斜轨道的信号的装置。该设备包括一个鼓，该滚筒具有彼此相邻的多个旋转头，用于同时扫描相应的倾斜轨道以产生再现信号。磁带缠绕在磁鼓上并与第一引导角重叠，使得每个旋转磁头在不传输磁带的静止模式下的一个旋转期间扫描多个倾斜磁道。还设置有用于控制旋转头的旋转速度和带的传送速度的控制单元; 以及用于处理再现信号的处理单元。

22. 外观设计

USD284188S Telephone instrument 失效
公开(公告)号：USD284188S
公开(公告)日：1986-06-10
申请号：US526840
申请日：1983-08-26
申请人： Hideaki Kondo , Shinsuke Kadota , Keizou Ohta , Takeshi Nakatani , Nagakazu Yokoyama
设计人： Hideaki Kondo , Shinsuke Kadota , Keizou Ohta , Takeshi Nakatani , Nagakazu Yokoyama

23. 发明申请

US20140044502A1 VACUUM PROCESSING APPARATUS AND METHOD OF OPERATING THE SAME 审中-公开
标题翻译：真空加工装置及其操作方法
公开(公告)号：US20140044502A1
公开(公告)日：2014-02-13
申请号：US13606109
申请日：2012-09-07
申请人： Takashi UEMURA , Hideaki Kondo , Masakazu Isozaki , Takahiro Shimomura
发明人： Takashi UEMURA , Hideaki Kondo , Masakazu Isozaki , Takahiro Shimomura
IPC分类号： H01L21/677
CPC分类号： H01L21/67745
摘要： In a vacuum processing apparatus including a plurality of vacuum transfer vessels arranged back and forth at the back of a lock chamber, an intermediate chamber arranged between them and capable of accommodating wafers, and processing units connected to respective vacuum transfer vessels, a wafer processed in a pre-processing vessel out of the processing units connected to the respective vacuum transfer vessels is transferred to a post-processing vessel connected to the same vacuum transfer vessel and post-processing is performed.
摘要翻译：在包括在锁室后部布置的多个真空传送容器的真空处理设备中，布置在它们之间并能够容纳晶片的中间室以及连接到各个真空传送容器的处理单元，连接到相应的真空转移容器的处理单元中的预处理容器被转移到连接到相同的真空转移容器的后处理容器中，并进行后处理。

24. 发明申请

US20140018503A1 POLYMER ALLOY AND RUBBER PRODUCT, AND PRODUCTION METHOD THEREOF 有权
标题翻译：聚合物和橡胶制品及其生产方法
公开(公告)号：US20140018503A1
公开(公告)日：2014-01-16
申请号：US13984563
申请日：2011-11-21
申请人： Naoki Iwase , Hideyuki Imai , Akishige Seo , Hideaki Kondo , Yusuke Katono
发明人： Naoki Iwase , Hideyuki Imai , Akishige Seo , Hideaki Kondo , Yusuke Katono
IPC分类号： C08L19/00 , C08L9/02
CPC分类号： C08L19/006 , C08C19/22 , C08L9/02 , C08L15/00 , C08L23/16 , C08L33/04 , C08L33/08
摘要： To provide a polymer alloy formed of a non-polar rubber and a polar rubber, and a rubber product, which are improved in ozone resistance (weather resistance) while having oil resistance and can achieve high mechanical strength (in particular, tensile strength), and a production method thereof.A rubber product in which an organic peroxide or other cross-linking agent is used to cross-link a polymer alloy comprising: a modified rubber in which EPDM, NR, or another non-polar rubber having a non-conjugated double bond is modified with 2-methoxy-1-naphthonitrile oxide, 2,6-dimethoxybenzonitrile oxide, or another nitrile oxide of an aromatic nitrile oxide derivative; and nitrile rubber, acrylic rubber, or another polar rubber.
摘要翻译：为了提供具有耐油性且能够获得高机械强度（特别是拉伸强度）的耐臭氧性（耐候性）改善的由非极性橡胶和极性橡胶形成的聚合物合金和橡胶制品，及其制造方法。一种橡胶制品，其中使用有机过氧化物或其它交联剂来交联聚合物合金，其包括：改性橡胶，其中EPDM，NR或另一种具有非共轭双键的非极性橡胶用 2-甲氧基-1-萘甲腈氧化物，2,6-二甲氧基苄腈氧化物或芳香族氧化腈衍生物的另一种腈氧化物; 丁腈橡胶，丙烯酸橡胶或其他极性橡胶。

25. 发明授权

US08148268B2 Plasma treatment apparatus and plasma treatment method 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US08148268B2
公开(公告)日：2012-04-03
申请号：US12040011
申请日：2008-02-29
申请人： Kohei Sato , Hideaki Kondo , Susumu Tauchi , Akitaka Makino
发明人： Kohei Sato , Hideaki Kondo , Susumu Tauchi , Akitaka Makino
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01J37/3244 , H01J37/32449 , H01J37/32834
摘要： The invention provides a plasma treatment apparatus or a plasma treatment method having a high productivity while maintaining a stable treatment performance. In a plasma treatment apparatus feeding a plurality of gases fed into the treatment chamber and treating a sample arranged within the treatment chamber by a plasma formed by using the plurality of gases, the plasma treatment apparatus has a plurality of feeding gas lines in which the plurality of gases respectively pass, a plurality of gas flow rate regulators respectively arranged on the feeding gas lines and respectively regulating flow rates of the plurality of gases, and a testing gas flow path coupled to the gas line so as to be arranged outside the treatment chamber and arranging a tester testing a flow rate of a gas from a gas flow rate controller therein, and the plasma treatment apparatus tests the gas flow rate regulator on a gas line corresponding to the gas which is not used for the treatment in the plurality of gases in parallel with the treatment.
摘要翻译：本发明提供一种具有高生产率的等离子体处理装置或等离子体处理方法，同时保持稳定的处理性能。在等离子体处理装置中，供给进入处理室的多个气体并且通过使用多个气体形成的等离子体处理在处理室内布置的样品，等离子体处理装置具有多个供给气体管线，其中多个气体分别通过多个气体流量调节器，分别布置在供给气体管线上并分别调节多个气体的流量，以及连接到气体管线的测试气体流动路径，以布置在处理室外部以及对从气体流量控制器的气体流量进行测试的试验机进行排列，等离子体处理装置对气体流量调节器进行气体流量调节，所述气体管线对应于多个气体中不用于处理的气体与治疗同时进行。

26. 发明申请

US20110229289A1 VACUUM PROCESSING APPARATUS 有权
标题翻译：真空加工设备
公开(公告)号：US20110229289A1
公开(公告)日：2011-09-22
申请号：US13021827
申请日：2011-02-07
申请人： Keita Nogi , Hideaki Kondo , Susumu Tauchi , Teruo Nakata
发明人： Keita Nogi , Hideaki Kondo , Susumu Tauchi , Teruo Nakata
IPC分类号： H01L21/677
CPC分类号： H01L21/67201 , H01L21/67745
摘要： The apparatus includes a load lock adapted to store the workpiece inside and to be switched between atmosphere and vacuum; vacuum transport chambers connected to the load lock and to the corresponding process chambers in a state where the load lock and each of the process chambers are isolated mutually; transfer means for transferring the workpiece between each of the process chambers and the load lock via the corresponding vacuum transport chamber; load lock valves adapted to switch between interrupt and opening at a position between the load lock and the corresponding vacuum transport chambers; process chamber valves adapted to switch between interrupt and opening at a position between the process chambers and the corresponding vacuum transport chambers; and control means for controlling timing of the opening and closing of the valves whose timings are controlled in synchronization with the transfer of the workpieces.
摘要翻译：该装置包括适于将工件存储在大气和真空之间并在大气和真空之间切换的装载锁; 在负载锁定和每个处理室相互隔离的状态下连接到负载锁和相应处理室的真空输送室; 用于通过相应的真空传送室在每个处理室和装载锁之间传送工件的传送装置; 适于在装载锁和相应的真空传送室之间的位置处在中断和打开之间切换的装载锁定阀; 处理室阀适于在处理室和相应的真空输送室之间的位置处在中断和打开之间切换; 以及控制装置，用于控制与工件的传送同步地控制其定时的阀的打开和关闭的定时。

27. 发明授权

US08022549B2 Standard cell and semiconductor device including the same 有权
标题翻译：包括其的标准单元和半导体器件
公开(公告)号：US08022549B2
公开(公告)日：2011-09-20
申请号：US12947344
申请日：2010-11-16
申请人： Ritsuko Ozoe , Hiroki Taniguchi , Hidetoshi Nishimura , Masaki Tamaru , Hideaki Kondo
发明人： Ritsuko Ozoe , Hiroki Taniguchi , Hidetoshi Nishimura , Masaki Tamaru , Hideaki Kondo
IPC分类号： H01L23/52
CPC分类号： H01L27/11807 , H01L27/0207
摘要： This invention prevents a break in a signal wire disposed between wire ends due to attenuation and improves production yields of devices. In a standard cell, a first signal wire extends in a first direction. Second and third signal wires extend in a second direction substantially perpendicular to the first direction and are facing each other across the first signal wire. The second and third signal wires have the widths larger than the width of the first signal wire.
摘要翻译：本发明防止由于衰减引起的布线在线端之间的信号线断裂，并且提高了器件的产量。在标准单元中，第一信号线在第一方向上延伸。第二和第三信号线在基本上垂直于第一方向的第二方向上延伸并且跨越第一信号线彼此面对。第二和第三信号线的宽度大于第一信号线的宽度。

28. 发明申请

US20090152242A1 PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US20090152242A1
公开(公告)日：2009-06-18
申请号：US12040011
申请日：2008-02-29
申请人： Kohei Sato , Hideaki Kondo , Susumu Tauchi , Akitaka Makino
发明人： Kohei Sato , Hideaki Kondo , Susumu Tauchi , Akitaka Makino
IPC分类号： C23F1/00
CPC分类号： H01J37/3244 , H01J37/32449 , H01J37/32834
摘要： The invention provides a plasma treatment apparatus or a plasma treatment method having a high productivity while maintaining a stable treatment performance. In a plasma treatment apparatus feeding a plurality of gases fed into the treatment chamber and treating a sample arranged within the treatment chamber by a plasma formed by using the plurality of gases, the plasma treatment apparatus has a plurality of feeding gas lines in which the plurality of gases respectively pass, a plurality of gas flow rate regulators respectively arranged on the feeding gas lines and respectively regulating flow rates of the plurality of gases, and a testing gas flow path coupled to the gas line so as to be arranged outside the treatment chamber and arranging a tester testing a flow rate of a gas from a gas flow rate controller therein, and the plasma treatment apparatus tests the gas flow rate regulator on a gas line corresponding to the gas which is not used for the treatment in the plurality of gases in parallel with the treatment.
摘要翻译：本发明提供一种具有高生产率的等离子体处理装置或等离子体处理方法，同时保持稳定的处理性能。在等离子体处理装置中，供给进入处理室的多个气体并且通过使用多个气体形成的等离子体处理在处理室内布置的样品，等离子体处理装置具有多个供给气体管线，其中多个气体分别通过多个气体流量调节器，分别布置在供给气体管线上并分别调节多个气体的流量，以及连接到气体管线的测试气体流动路径，以布置在处理室外部以及对从气体流量控制器的气体流量进行测试的试验机进行排列，等离子体处理装置对气体流量调节器进行气体流量调节，所述气体管线对应于多个气体中不用于处理的气体与治疗同时进行。

29. 发明申请

US20080297240A1 Filter Circuit and Semiconductor Device 有权
标题翻译：滤波电路和半导体器件
公开(公告)号：US20080297240A1
公开(公告)日：2008-12-04
申请号：US12125609
申请日：2008-05-22
申请人： Hideaki Kondo , Masaru Sawada , Norio Murakami , Syoichi Masui
发明人： Hideaki Kondo , Masaru Sawada , Norio Murakami , Syoichi Masui
IPC分类号： H04B1/10 , H03B1/04
CPC分类号： H03H11/1291 , H03H7/12 , H03H2007/0192 , H03H2011/0494
摘要： A filter circuit includes a low-pass filter and a calibration circuit calibrating a frequency characteristic of the low-pass filter. The calibration circuit includes a negative feedback circuit and a control circuit.
摘要翻译：滤波器电路包括低通滤波器和校准低通滤波器的频率特性的校准电路。校准电路包括负反馈电路和控制电路。

30. 发明申请

US20080246160A1 STANDARD CELL AND SEMICONDUCTOR DEVICE INCLUDING THE SAME 有权
标题翻译：包括其的标准单元和半导体器件
公开(公告)号：US20080246160A1
公开(公告)日：2008-10-09
申请号：US12098035
申请日：2008-04-04
申请人： Ritsuko Ozoe , Hiroki Taniguchi , Hidetoshi Nishimura , Masaki Tamaru , Hideaki Kondo
发明人： Ritsuko Ozoe , Hiroki Taniguchi , Hidetoshi Nishimura , Masaki Tamaru , Hideaki Kondo
IPC分类号： H01L23/52
CPC分类号： H01L27/11807 , H01L27/0207
摘要： This invention prevents a break in a signal wire disposed between wire ends due to attenuation and improves production yields of devices. In a standard cell, a first signal wire extends in a first direction. Second and third signal wires extend in a second direction substantially perpendicular to the first direction and are facing each other across the first signal wire. The second and third signal wires have the widths larger than the width of the first signal wire.
摘要翻译：本发明防止由于衰减引起的布线在线端之间的信号线断裂，并且提高了器件的产量。在标准单元中，第一信号线在第一方向上延伸。第二和第三信号线在基本上垂直于第一方向的第二方向上延伸并且跨越第一信号线彼此面对。第二和第三信号线的宽度大于第一信号线的宽度。

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