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21. 发明授权

US5093279A Laser ablation damascene process 失效
标题翻译：激光烧蚀镶嵌工艺
公开(公告)号：US5093279A
公开(公告)日：1992-03-03
申请号：US653209
申请日：1991-02-01
申请人： Joseph C. Andreshak , Robert J. Baseman
发明人： Joseph C. Andreshak , Robert J. Baseman
IPC分类号： B23K26/00 , H01L21/3105 , H01L21/3205 , H01L21/768 , H01S3/00 , H05K3/02 , H05K3/40
CPC分类号： H01L21/76879 , H01L21/3105 , H01L21/7684 , H05K3/027 , H05K3/4076 , Y10S148/093 , Y10S438/94
摘要： A laser ablation damascene process for the planarizing of metal/polymer structures. More specifically, the process is especially adapted for the fabrication of both interlevel via metallization and circuitization layers in integrated circuit (IC) interconnects. Subsequent to the forming or etching of holes or depressions in a polymer insulating layer, a metal layer or film is deposited thereon for the purpose of fabricating vias or trenches for metallization and circulation layers in IC connects. Thereafter, the surface of the metal layer which has been deposited or superimposed on the polymer substrate through any suitable method known in the art is irradiated with at least one laser pulse which will cause the metal layer to melt and reflow and resultingly fill the vias and trenches etched in the polymer substrate while simultaneously ablating and removing the metal from the planarized surface of the substrate in the regions about the vias and trenches.

22. 发明授权

US08328950B2 Foreign material contamination detection 有权
标题翻译：异物污染检测
公开(公告)号：US08328950B2
公开(公告)日：2012-12-11
申请号：US12783702
申请日：2010-05-20
申请人： Robert J. Baseman , Tomasz J. Nowicki
发明人： Robert J. Baseman , Tomasz J. Nowicki
IPC分类号： B08B7/04
CPC分类号： B08B13/00 , H01L21/67288 , Y10T436/11
摘要： There are provided a system, method and computer program product for detecting foreign materials in a semiconductor manufacturing process. The manufacturing process uses a plurality of semiconductor manufacturing tools. The system categorizes at least one monitoring wafer according to one or more categories. The system supplies the categorized monitoring wafer to a semiconductor manufacturing tool. The system observes a level of contamination on the categorized monitoring wafer. The system compares the level of contamination to a threshold. The system cleans the tool in a response to determining that the level of contamination is larger than the threshold. The system determines which category of the wafer leaves a highest level of contamination on the tool. The system identifies a root cause of the highest level of contamination on the tool.
摘要翻译：提供了一种用于在半导体制造工艺中检测异物的系统，方法和计算机程序产品。制造工艺使用多个半导体制造工具。该系统根据一个或多个类别对至少一个监视晶片进行分类。该系统将分类的监控晶片提供给半导体制造工具。该系统观察到分类监控晶片的污染程度。系统将污染水平与阈值进行比较。系统在响应中清洁工具以确定污染物的水平大于阈值。该系统确定哪个类别的晶片在工具上留下最高的污染水平。系统识别工具上最高污染水平的根本原因。

23. 发明申请

US20110282472A1 COMPREHENSIVE ANALYSIS OF QUEUE TIMES IN MICROELECTRONIC MANUFACTURING 失效
标题翻译：微电子制造中队列时间的综合分析
公开(公告)号：US20110282472A1
公开(公告)日：2011-11-17
申请号：US12778457
申请日：2010-05-12
申请人： Robert J. Baseman , Tomasz J. Nowicki
发明人： Robert J. Baseman , Tomasz J. Nowicki
IPC分类号： G06F17/50 , G06N5/02
CPC分类号： G06N99/005 , G06F2217/10
摘要： A system for determining a group of semiconductor manufacturing process steps with a similar influence on individual semiconductor products. The system generates a first table including time stamps for the individual semiconductor products. The system creates a second table including Q-times based on the first table. The Q-times refers to time differences between every pair of the time stamps. The system forms a dependency table by grouping the Q-times with similar dependencies together. The system identifies groups of the similar dependencies. The system extracts semiconductor process steps belonging to the groups.
摘要翻译：一种用于确定对各个半导体产品具有相似影响的一组半导体制造工艺步骤的系统。该系统产生包括各个半导体产品的时间戳的第一表。系统创建第二个表，其中包括基于第一个表的Q次。 Q时间是指每对时间戳之间的时差。系统通过将Q次与相似的依赖关系分组在一起来形成依赖关系表。系统识别类似依赖关系的组。系统提取属于这些组的半导体工艺步骤。

24. 发明申请

US20100249976A1 METHOD AND SYSTEM FOR EVALUATING A MACHINE TOOL OPERATING CHARACTERISTICS 有权
标题翻译：用于评估机床工作特性的方法和系统
公开(公告)号：US20100249976A1
公开(公告)日：2010-09-30
申请号：US12415348
申请日：2009-03-31
申请人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh All Tipu , Adam Daniel Ticknor , Timothy M. McCormack
发明人： Ehud Aharoni , Robert J. Baseman , Ramona Kei , Oded Margalit , Kevin Mackey , Michal Rosen-Zvi , Raminderpal Singh , Noam Slonim , Hong Lin , Fateh All Tipu , Adam Daniel Ticknor , Timothy M. McCormack
IPC分类号： G06F17/00
CPC分类号： G05B23/0216 , G05B23/0229 , G05B2219/32191 , G05B2219/32194 , G05B2219/45031 , G05B2219/50065 , Y02P90/22 , Y02P90/86 , Y10T409/309408
摘要： A method and system for evaluating a performance of a semiconductor manufacturing tool while manufacturing microelectronic devices are disclosed. At least one report is generated based on executions of at least one statistical test. The report includes at least one heat map having rows that correspond to sensors, columns that correspond to trace data obtained during recipe steps, and cells at the intersection of the rows and the columns. At least one sensor in the tool obtains trace data of a recipe step while manufacturing at least one microelectronic device. A computing device analyzes the obtained trace data to determine a level of operational significance found in the data and assigns a score to the trace data that indicates a level of operational significance. Then, the computing device places the score in a corresponding cell of the heat map. A user uses the cell for evaluating the tool performance.
摘要翻译：公开了一种用于在制造微电子器件的同时评估半导体制造工具的性能的方法和系统。至少根据执行至少一项统计测试生成一份报告。该报告包括至少一个具有与传感器对应的行的热图，对应于配方步骤期间获得的跟踪数据的列，以及行和列的交叉点处的单元格。工具中至少有一个传感器获得配方步骤的痕迹数据，同时制造至少一个微电子器件。计算设备分析所获得的跟踪数据以确定在数据中发现的操作意义的水平，并向指示操作意义水平的跟踪数据分配分数。然后，计算设备将分数放置在热图的相应单元中。用户使用单元格来评估刀具性能。

25. 发明授权

US5346518A Vapor drain system 失效
标题翻译：蒸气排放系统
公开(公告)号：US5346518A
公开(公告)日：1994-09-13
申请号：US35999
申请日：1993-03-23
申请人： Robert J. Baseman , Charles A. Brown , Benjamin N. Eldridge , Laura B. Rothman , Herman R. Wendt , James T. Yeh , Arthur R. Zingher
发明人： Robert J. Baseman , Charles A. Brown , Benjamin N. Eldridge , Laura B. Rothman , Herman R. Wendt , James T. Yeh , Arthur R. Zingher
IPC分类号： B65D85/86 , B65G1/00 , H01L21/673 , H01L21/677 , B65B5/00 , B65D81/26 , B65D85/62 , F17C11/00
CPC分类号： H01L21/67366 , B65G1/00 , H01L21/67393
摘要： During wafer fabrication, a transportable enclosure, such as a Standard Manufacturing InterFace (SMIF) pod encloses a nascent product, such as a semiconductor wafer, to protect the wafer against contamination during manufacture, storage or transportation. However chemical vapors emitted inside the pod can accumulate in the air and degrade wafers during subsequent fabrication. In order to absorb the vapors inside a closed pod, a vapor removal element typically including an activated carbon absorber, covered by a particulate-filtering vapor-permeable barrier, and covered by a guard plate with holes is disposed within the enclosure. A vapor removal element is disposed closely adjacent to each respective wafer. Alternatively, a single vapor removal element is located inside the enclosure. In certain instances, a fan or thermo-buoyant circulation causes any vapors located inside the enclosure to a vapor removal element for removal. Alternatively a porous vapor removal element may be disposed for removing vapors from air entering the enclosure. In another embodiment a vapor removal element is integrated with the back face of each wafer.
摘要翻译：在晶片制造期间，诸如标准制造界面（SMIF）的可移动外壳包围新生产品，例如半导体晶片，以在制造，存储或运输期间保护晶片免受污染。然而，发射在荚内的化学气体可能积聚在空气中，并在随后的制造过程中降解晶片。为了吸收封闭的容器内的蒸气，通常包括活性炭吸收器的蒸气去除元件被覆盖有颗粒过滤蒸气可透过的屏障并被具有孔的保护板覆盖。蒸汽去除元件被设置为紧邻每个相应的晶片。或者，单个蒸气去除元件位于外壳内。在某些情况下，风扇或热浮动循环使得位于外壳内部的任何蒸气成为除去蒸气的元件。或者，可以设置多孔蒸气去除元件以从进入外壳的空气中除去蒸汽。在另一个实施例中，蒸气去除元件与每个晶片的背面一体化。

26. 发明授权

US5053250A Thin film magnetic medium with controlled grain morphology and topology for improved performance 失效
标题翻译：具有受控晶粒形态和拓扑结构的薄膜磁介质，以提高性能
公开(公告)号：US5053250A
公开(公告)日：1991-10-01
申请号：US672992
申请日：1991-03-21
申请人： Robert J. Baseman , Christopher V. Jahnes
发明人： Robert J. Baseman , Christopher V. Jahnes
IPC分类号： G11B5/84
CPC分类号： G11B5/84
摘要： A magnetic storage medium is composed of a non-wettable substrate upon which a transient liquid metal layer is deposited and maintained as a distribution of discontinuous liquid features. A magnetic film layer is deposited on the transient liquid metal layer resulting in a reaction of the liquid metal with the magnetic film. The topology of the magnetic film is controllable by adjusting the thickness of the transient liquid metal layer.
摘要翻译：磁性存储介质由不可润湿的基底组成，其上沉积有瞬态液态金属层并保持为不连续液体特征的分布。磁性膜层沉积在瞬态液态金属层上，导致液态金属与磁性膜的反应。通过调整瞬态液态金属层的厚度可以控制磁膜的拓扑结构。

27. 发明授权

US08718809B2 Comprehensive analysis of queue times in microelectronic manufacturing 失效
标题翻译：微电子制造队列时间综合分析
公开(公告)号：US08718809B2
公开(公告)日：2014-05-06
申请号：US12778457
申请日：2010-05-12
申请人： Robert J. Baseman , Tomasz J. Nowicki
发明人： Robert J. Baseman , Tomasz J. Nowicki
IPC分类号： G06F19/00
CPC分类号： G06N99/005 , G06F2217/10
摘要： A system for determining a group of semiconductor manufacturing process steps with a similar influence on individual semiconductor products. The system generates a first table including time stamps for the individual semiconductor products. The system creates a second table including Q-times based on the first table. The Q-times refers to time differences between every pair of the time stamps. The system forms a dependency table by grouping the Q-times with similar dependencies together. The system identifies groups of the similar dependencies. The system extracts semiconductor process steps belonging to the groups.
摘要翻译：一种用于确定对各个半导体产品具有相似影响的一组半导体制造工艺步骤的系统。该系统产生包括各个半导体产品的时间戳的第一表。系统创建第二个表，其中包括基于第一个表的Q次。 Q时间是指每对时间戳之间的时差。系统通过将Q次与相似的依赖关系分组在一起来形成依赖关系表。系统识别类似依赖关系的组。系统提取属于这些组的半导体工艺步骤。

28. 发明申请

US20130339919A1 Method and Apparatus for Hierarchical Wafer Quality Predictive Modeling 有权
标题翻译：分层晶片质量预测建模方法与装置
公开(公告)号：US20130339919A1
公开(公告)日：2013-12-19
申请号：US13526152
申请日：2012-06-18
申请人： Robert J. Baseman , Jingrui He , Yada Zhu
发明人： Robert J. Baseman , Jingrui He , Yada Zhu
IPC分类号： G06F17/50
CPC分类号： G06Q10/04 , G05B19/41875 , Y02P90/22 , Y02P90/26
摘要： A method for performing enhanced wafer quality prediction in a semiconductor manufacturing process includes the steps of: obtaining data including at least one of tensor format wafer processing conditions, historical wafer quality measurements and prior knowledge relating to at least one of the semiconductor manufacturing process and wafer quality; building a hierarchical prediction model including at least the tensor format wafer processing conditions; and predicting wafer quality for a newly fabricated wafer based at least on the hierarchical prediction model and corresponding tensor format wafer processing conditions.
摘要翻译：一种用于在半导体制造过程中执行增强的晶片质量预测的方法包括以下步骤：获得包括张量格式晶片处理条件，历史晶片质量测量和与半导体制造工艺和晶片中的至少一个相关的先前知识中的至少一个的数据质量; 构建包括至少张量格式晶片处理条件的分级预测模型; 并且至少基于分层预测模型和对应的张量格式晶片处理条件来预测新制造的晶片的晶片质量。

29. 发明申请

US20100017009A1 SYSTEM FOR MONITORING MULTI-ORDERABLE MEASUREMENT DATA 审中-公开
标题翻译：监控多种测量数据的系统
公开(公告)号：US20100017009A1
公开(公告)日：2010-01-21
申请号：US12164603
申请日：2008-06-30
申请人： Robert J. Baseman , William K. Hoffman , Steven Ruegsegger , Emmanuel Yashchin
发明人： Robert J. Baseman , William K. Hoffman , Steven Ruegsegger , Emmanuel Yashchin
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B19/0428 , G05B19/4183 , G05B2219/31437 , G05B2219/31483 , G05B2219/33313 , Y02P90/10 , Y02P90/20
摘要： A computer-based measurement monitoring system and method for monitoring multi-stage processes capable of producing multi-orderable data and identifying, at any stage in the monitored process, unacceptable deviations from an expected value at particular stages of the process, and communicating same detected deviation to facilitate corrective action in the process. The system and method consolidate data obtained at various stages of the process, arrange the measurement data in a multi-orderable data framework, compare the multi-orderable framework data with expected parameter values corresponding to the various stages, and detects unacceptable deviations from the expected values. The unacceptable deviations are communicated to responsible personnel, and the system and method provides same personnel with supplemental information useful in diagnosing the root cause of the problem leading to the detected deviations.
摘要翻译：一种基于计算机的测量监测系统和方法，用于监测能够产生多重数据的多级过程，并且在所监视的过程的任何阶段识别在该过程的特定阶段与期望值的不可接受的偏差，并且将所检测到的通信偏差以促进过程中的纠正措施。该系统和方法整合在该过程的各个阶段获得的数据，将测量数据安排在多重数据框架中，将多阶段框架数据与对应于各个阶段的预期参数值进行比较，并检测出与预期的不符合的偏差价值观。将不可接受的偏差传达给负责人员，系统和方法为相同的人员提供补充信息，这些补充信息有助于诊断导致检测到的偏差的问题的根本原因。

30. 发明授权

US5134038A Thin film magnetic recording medium with controlled grain morphology and topology 失效
标题翻译：具有控制颗粒形态和拓扑学的薄膜磁记录介质
公开(公告)号：US5134038A
公开(公告)日：1992-07-28
申请号：US754343
申请日：1991-09-04
申请人： Robert J. Baseman , Christopher V. Jahnes , Igor Y. Khandros , Seyyed M. T. Mirzamaani , Michael A. Russak
发明人： Robert J. Baseman , Christopher V. Jahnes , Igor Y. Khandros , Seyyed M. T. Mirzamaani , Michael A. Russak
IPC分类号： G11B5/66 , G11B5/64 , G11B5/73 , G11B5/738 , G11B5/82 , G11B5/84
CPC分类号： G11B5/7325 , G11B5/738 , Y10S428/90 , Y10S428/928 , Y10S428/939 , Y10T428/12465 , Y10T428/12472 , Y10T428/12486 , Y10T428/12535 , Y10T428/12681 , Y10T428/12806 , Y10T428/12812 , Y10T428/265
摘要： A magnetic storage medium is composed of a non-wettable substrate upon which a transient liquid metal layer is deposited and maintained as a distribution of discontinuous liquid features. A magnetic film layer is deposited on the transient liquid metal layer resulting in a reaction of the liquid metal with the magnetic film. The topology of the magnetic film is controllable by adjusting the thickness of the transient liquid metal layer.

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