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21. 发明授权

US07999915B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07999915B2
公开(公告)日：2011-08-16
申请号：US11981450
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Ivan Lalovic
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54 , H01S3/10 , H01S3/22
CPC分类号： G03F7/70625 , G03F7/70025 , G03F7/70583 , G03F7/70616 , H01S3/08004 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2251 , H01S3/2308
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

22. 发明授权

US08908735B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US08908735B2
公开(公告)日：2014-12-09
申请号：US13231882
申请日：2011-09-13
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/22 , H01S3/225 , H01S3/08 , H01S3/00 , H01S3/23 , H01S3/083 , H01S3/10
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

23. 发明授权

US07317196B2 LPP EUV light source 失效
标题翻译： LPP EUV光源
公开(公告)号：US07317196B2
公开(公告)日：2008-01-08
申请号：US10979919
申请日：2004-11-01
申请人： William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Alexander I. Ershov , David W. Myers
发明人： William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Alexander I. Ershov , David W. Myers
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.
摘要翻译：描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

24. 发明授权

US08462425B2 Oscillator-amplifier drive laser with seed protection for an EUV light source 有权
标题翻译：振荡器放大器驱动激光器，具有EUV光源的种子保护功能
公开(公告)号：US08462425B2
公开(公告)日：2013-06-11
申请号：US13077757
申请日：2011-03-31
申请人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/00 , G02F1/33 , G02B5/22 , H05G2/00 , G06K7/10
CPC分类号： H01S3/117 , H01S3/005 , H01S3/0057 , H01S3/0064 , H01S3/076 , H01S3/0812 , H01S3/2232 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1
摘要翻译：如本文所公开的，在第一方面中，一种装置可以包括：在光束路径上产生光输出的振荡器; 用于在照射部位与光束路径上的光相互作用的目标材料; 在光束路径上的光束延迟具有光束折叠光学布置的光束延迟; 以及沿光束路径定位并且介于振荡器和光束延迟之间的开关; 所述开关可关闭以使所述光束路径上的至少一部分光从所述光束路径转移，所述开关具有接近时间t1，并且所述光束路径具有沿着从所述开关到所述照射部位的路径的长度L1; 与t1

25. 发明授权

US08654438B2 Master oscillator-power amplifier drive laser with pre-pulse for EUV light source 有权
标题翻译：主振荡器 - 功率放大器驱动具有用于EUV光源的预脉冲的激光器
公开(公告)号：US08654438B2
公开(公告)日：2014-02-18
申请号：US13077236
申请日：2011-03-31
申请人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/03
CPC分类号： H01S3/0078 , G03F7/70033 , G03F7/70175 , G03F7/70908 , G03F7/70933 , H01S3/076 , H01S3/1055 , H01S3/117 , H01S3/2232 , H05G2/008
摘要： A device is described herein which may comprise an optical amplifier having a gain band including wavelengths λ1 and λ2, with λ1≠λ2; a pre-pulse seed laser having a tuning module for tuning a pre-pulse output to wavelength λ1; a main pulse seed laser generating a laser output having wavelength, λ2; and a beam combiner for directing the pre-pulse output and the main pulse output on a common path through the optical amplifier.
摘要翻译：本文描述了可以包括具有包括λ1>λ2的波长λ1和λ2的增益带的光放大器的装置; 具有用于将预脉冲输出调谐到波长λ1的调谐模块的预脉冲种子激光器; 产生具有波长λ2的激光输出的主脉冲种子激光器; 以及用于将预脉冲输出和主脉冲输出引导到通过光放大器的公共路径上的光束组合器。

26. 发明授权

US08653437B2 EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods 有权
标题翻译：具有子系统的EUV光源，用于在EUV非输出期间维持LPP驱动激光输出
公开(公告)号：US08653437B2
公开(公告)日：2014-02-18
申请号：US13157233
申请日：2011-06-09
申请人： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
发明人： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H05G2/00
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
摘要翻译：本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

27. 发明授权

US06532247B2 Laser wavelength control unit with piezoelectric driver 有权
公开(公告)号：US06532247B2
公开(公告)日：2003-03-11
申请号：US09794782
申请日：2001-02-27
申请人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
发明人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

28. 发明授权

US07088758B2 Relax gas discharge laser lithography light source 有权
标题翻译：放气放电激光光刻光源
公开(公告)号：US07088758B2
公开(公告)日：2006-08-08
申请号：US10956784
申请日：2004-10-01
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Thomas A. Yager , Alexander I. Ershov , Robert J. Rafac , German E. Rylov
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Thomas A. Yager , Alexander I. Ershov , Robert J. Rafac , German E. Rylov
IPC分类号： H01S3/22
CPC分类号： G01J1/429 , B23K26/0622 , B23K2101/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
摘要翻译：公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置脉冲光束在可变折射光学元件上。可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

29. 发明授权

US06704340B2 Lithography laser system with in-place alignment tool 有权
标题翻译：光刻激光系统具有就地对准工具
公开(公告)号：US06704340B2
公开(公告)日：2004-03-09
申请号：US10255806
申请日：2002-09-25
申请人： Alexander I. Ershov , William N. Partlo , Palash P. Das , Laura S. Casas , Daniel J. W. Brown
发明人： Alexander I. Ershov , William N. Partlo , Palash P. Das , Laura S. Casas , Daniel J. W. Brown
IPC分类号： H01S310
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with optical components adjustable from outside of the enclosure without the need to open it. Targets and beam directors are included within the beam path enclosure and are used to judge the quality of alignment. These target and beam directors are located on a moveable mount which is insertable in the beam path for alignment and are removed out of the beam path for normal operation. The positions of the targets and beam directors are controlled from outside the beam path enclosure. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. In a preferred embodiment the beam directors clients laser beam being aligned to a monitor outside the beam path enclosure to permit the normal to image a cross-section of the beam and the target.
摘要翻译：本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。该系统包括封闭和清洗的光束路径，光学元件可从外壳外部调节，无需打开。目标和光束导向器包含在光束路径外壳内，用于判断对准的质量。这些目标和光束指向器位于可移动的安装件上，该安装件可插入到光束路径中用于对准，并且被移出光束路径以用于正常操作。目标和光束导向器的位置由光束外壳外部控制。在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。在优选实施例中，光束导向器将激光束与射束路径外部的监视器对准，以允许对光束和靶的横截面进行法向成像。

30. 发明申请

US20090296755A1 Laser system 审中-公开
标题翻译：激光系统
公开(公告)号：US20090296755A1
公开(公告)日：2009-12-03
申请号：US11980288
申请日：2007-10-30
申请人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/10 , H01S3/22
CPC分类号： H01S3/225 , G02F1/3534 , G02F1/37 , G03F7/70583 , H01S3/0057 , H01S3/0092 , H01S3/067 , H01S3/08004 , H01S3/0835 , H01S3/10092 , H01S3/1618 , H01S3/2258 , H01S3/2308 , H01S3/2383
摘要： A method and apparatus may comprise a laser light source system which may comprise a solid state laser seed beam source providing a seed laser output; a frequency conversion stage converting the seed laser output to a wavelength suitable for seeding an excimer or molecular fluorine gas discharge laser; an excimer or molecular fluorine gas discharge laser gain medium amplifying the converted seed laser output to produce a gas discharge laser output at approximately the converted wavelength. The excimer or molecular fluorine laser may be selected from a group comprising XeCl, XeF, KrF, ArF and F2 laser systems. The laser gain medium may comprise a power amplifier. The power amplifier may comprise a single pass amplifier stage, a multiple-pass amplifier stage, a ring power amplification stage or a power oscillator. The ring power amplification stage may comprise a bow-tie configuration or a race track configuration.
摘要翻译：方法和装置可以包括激光光源系统，其可以包括提供种子激光输出的固态激光种子光源; 将种子激光输出转换成适合于接种准分子或分子氟气放电激光的波长的变频级; 放大转换的种子激光输出的准分子或分子氟气放电激光增益介质，以产生大致转换波长的气体放电激光输出。受激准分子或分子氟激光可以选自包括XeCl，XeF，KrF，ArF和F2激光系统的组。激光增益介质可以包括功率放大器。功率放大器可以包括单通放大器级，多通道放大级，环形功率放大级或功率振荡器。环形功率放大级可以包括弓形配置或赛道配置。

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