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21. 发明授权

US07329886B2 EUV illumination system having a plurality of light sources for illuminating an optical element 有权
标题翻译： EUV照明系统具有用于照射光学元件的多个光源
公开(公告)号：US07329886B2
公开(公告)日：2008-02-12
申请号：US10755846
申请日：2004-01-12
申请人： Wolfgang Singer , Martin Antoni , Nils Dieckmann , Dirk Rothweiler , Jörg Schultz
发明人： Wolfgang Singer , Martin Antoni , Nils Dieckmann , Dirk Rothweiler , Jörg Schultz
IPC分类号： G21K5/04
CPC分类号： G21K5/04 , B82Y10/00 , G03F7/7005 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00
摘要： There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and an optical element. The first light source illuminates a first area of the optical element and the second light source illuminates a second area of the optical element.
摘要翻译：提供照明系统。照明系统包括第一光源和第二光源，每个光源用于提供波长<= 193nm的光和光学元件。第一光源照亮光学元件的第一区域，第二光源照亮光学元件的第二区域。

22. 发明申请

US20080002167A1 PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME 有权
标题翻译：投影曝光装置及其操作方法
公开(公告)号：US20080002167A1
公开(公告)日：2008-01-03
申请号：US11427183
申请日：2006-06-28
申请人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Hmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
发明人： Toralf Gruner , Olaf Conradi , Nils Dieckmann , Markus Schwab , Olaf Hmann , Michael Totzeck , Daniel Kraehmer , Vladimir Kamenov
IPC分类号： G03B27/42 , G02B9/00
CPC分类号： G03F7/70958 , G02B13/143 , G02B17/0856 , G02B17/0892 , G02B27/0012 , G03F7/70091
摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).
摘要翻译：本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。

23. 发明申请

US20050146704A1 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US20050146704A1
公开(公告)日：2005-07-07
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

24. 发明授权

US06707537B2 Projection exposure system 失效
标题翻译：投影曝光系统
公开(公告)号：US06707537B2
公开(公告)日：2004-03-16
申请号：US10189279
申请日：2002-07-02
申请人： Nils Dieckmann , Jess Köhler , Johannes Wangler
发明人： Nils Dieckmann , Jess Köhler , Johannes Wangler
IPC分类号： G03B2754
CPC分类号： G03F7/70141 , G02B27/0037 , G02B27/4222 , G02B27/4294 , G03F7/70108
摘要： A projection exposure system, in particular for microlithography, serves to generate an image of an object disposed in an object plane in an image plane. For this purpose, use is made of a light source emitting projection light, illumination optics disposed in the beam path between the light source and the object plane and projection optics disposed in the beam path between the object plane and the image plane. Disposed in the vicinity of a field plane of the illumination optics is at least one optical element that changes the angular illumination distribution of the projection light passing through. The change, impressed by the optical element, in the angular illumination distribution is non-rotationally symmetrical with respect to the optical axis. The optical element can be disposed in various angular positions around an axis perpendicular to the field plane. Such an optical element makes it possible to modify the symmetry of the angular illumination distribution flexibly.
摘要翻译：特别是用于微光刻的投影曝光系统用于在图像平面中产生设置在物平面中的物体的图像。为此，使用发射投影光的光源，设置在光源和物平面之间的光束路径中的照明光学器件和布置在物平面和像平面之间的光束路径中的投影光学元件。设置在照明光学器件的场平面附近的至少一个光学元件，其改变通过的投影光的角度照度分布。角度照明分布中由光学元件照射的变化相对于光轴是非旋转对称的。光学元件可以围绕垂直于场平面的轴设置在各种角度位置。这样的光学元件使得可以灵活地改变角度照明分布的对称性。

25. 发明授权

US09274435B2 Illumination system or projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统或投影物镜
公开(公告)号：US09274435B2
公开(公告)日：2016-03-01
申请号：US12415173
申请日：2009-03-31
申请人： Nils Dieckmann , Damian Fiolka
发明人： Nils Dieckmann , Damian Fiolka
IPC分类号： G03F7/20 , G02B27/28
CPC分类号： G03F7/70216 , G02B27/281 , G02B27/286 , G03F7/70091 , G03F7/70566
摘要： The disclosure relates to an optical system, such as an illumination system or a projection objective of a microlithographic projection exposure apparatus, including such an optical system having a polarization-influencing optical arrangement which permits enhanced flexibility in affording a desired polarization distribution.
摘要翻译：本公开涉及一种光学系统，例如微光刻投影曝光设备的照明系统或投影物镜，其包括具有偏振影响光学布置的光学系统，其允许提供期望的偏振分布的增强的灵活性。

26. 发明授权

US08488104B2 Projection objective with diaphragms 有权
标题翻译：投影目的与隔膜
公开(公告)号：US08488104B2
公开(公告)日：2013-07-16
申请号：US13107011
申请日：2011-05-13
申请人： Nils Dieckmann , Alexander Wolf , Christian Holland , Ulrich Loering , Franz Sorg
发明人： Nils Dieckmann , Alexander Wolf , Christian Holland , Ulrich Loering , Franz Sorg
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70941 , G02B27/0043
摘要： A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element. Each of the false light diaphragms is fashioned in such a way that the false light diaphragm screens at least a part of the edge region against radiation running outside the imaging beam path.
摘要翻译：用于将布置在投影物镜的物平面中的物体成像为位于投影物镜的像平面中的物体的图像的投影物镜具有多个透明光学元件和用于将光学元件保持在规定位置的保持装置投影物镜的成像光束路径。每个光学元件具有位于成像光束路径中的光学有用区域和位于光学有用区域外部的边缘区域。分配给光学元件的保持装置的至少一个保持元件作用在接触区域的边缘区域。至少一个光学元件被分配有具有布置在光学元件的正上游的假光膜的膜片装置和直接布置在光学元件的下游的第二假光膜。每个假光隔膜以这样的方式形成，使得假光隔膜将至少一部分边缘区域屏蔽到抵抗在成像光束路径外部运行的辐射。

27. 发明申请

US20090040496A1 MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE SYSTEM FOR CARRYING OUT THE METHOD 有权
标题翻译：作为实施方法的投影曝光系统的微观曝光方法
公开(公告)号：US20090040496A1
公开(公告)日：2009-02-12
申请号：US12177715
申请日：2008-07-22
申请人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

28. 发明授权

US07408616B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07408616B2
公开(公告)日：2008-08-05
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/42
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

29. 发明授权

US06512780B1 System for compensating directional and positional fluctuations in light produced by a laser 失效
标题翻译：用于补偿由激光产生的光的方向和位置波动的系统
公开(公告)号：US06512780B1
公开(公告)日：2003-01-28
申请号：US09717560
申请日：2000-11-21
申请人： Nils Dieckmann
发明人： Nils Dieckmann
IPC分类号： H01S310
CPC分类号： G03F7/70141 , G02B27/648 , G03F7/709
摘要： A beam splitter (4) arranged in a laser beam (2) and at least two beam-deflecting devices (7) are provided in a system for at least far-reaching compensation of directional and positional fluctuations in the light beam (2) produced by a laser (1), in particular for micro lithographic illuminating devices. The beam splitter (4) guides a partial beam (2a) directly onto an illuminating reference surface (3) of the illuminating device, while a further partial beam (2b) is led back to the beam splitter (4) via a detour (5) in which the at least two beam-deflecting devices (6, 7) are located, and is subsequently likewise fed to the illuminating reference surface (3).
摘要翻译：布置在激光束（2）中的分束器（4）和至少两个光束偏转装置（7）设置在用于至少深入地补偿所产生的光束（2）中的方向和位置波动的系统中通过激光（1），特别是用于微光刻照明装置。分束器（4）将部分光束（2a）直接引导到照明装置的照明参考表面（3）上，而另外的部分光束（2b）经由绕线（5）被引导回到分束器（4）），其中所述至少两个光束偏转装置（6,7）位于，并且随后同样地被馈送到照明参考表面（3）。

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