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21. 发明申请

US20100081091A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20100081091A1
公开(公告)日：2010-04-01
申请号：US12556425
申请日：2009-09-09
申请人： Koji HASHIMOTO , Daisuke Kawamura , Kentaro Matsunaga , Iwao Higashikawa
发明人： Koji HASHIMOTO , Daisuke Kawamura , Kentaro Matsunaga , Iwao Higashikawa
IPC分类号： G03F7/20
CPC分类号： H01L21/32139 , H01L21/0337
摘要： According to an aspect of the present invention, there is provided a method for manufacturing a semiconductor device, the method including; sequentially forming a first film and a second film on a base film; processing the second film, thereby forming a second pattern; processing the first film with the second pattern, thereby forming a first pattern; removing the second pattern; depositing a third film on the base film and the first pattern; processing the third film, thereby forming a third pattern on side walls of the first pattern; removing the first pattern; and processing the base film with the third pattern; wherein, when processing the third film, a process condition is adjusted based on at least one information of a size of the second pattern and a size of the first pattern.
摘要翻译：根据本发明的一个方面，提供了一种半导体器件的制造方法，该方法包括：在基膜上依次形成第一膜和第二膜; 处理第二膜，从而形成第二图案; 用第二图案处理第一胶片，从而形成第一图案; 去除第二模式; 在基膜和第一图案上沉积第三膜; 处理第三膜，从而在第一图案的侧壁上形成第三图案; 去除第一个模式; 并用第三图案处理基膜; 其中，当处理所述第三胶片时，基于所述第二图案的尺寸和所述第一图案的尺寸的至少一个信息来调整处理条件。

22. 发明授权

US07638001B2 Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices 失效
标题翻译：成膜装置，制造管理系统以及制造半导体装置的方法
公开(公告)号：US07638001B2
公开(公告)日：2009-12-29
申请号：US11123093
申请日：2005-05-06
申请人： Daisuke Kawamura
发明人： Daisuke Kawamura
IPC分类号： B05C5/02 , B05D1/26
CPC分类号： H01L21/316 , H01L21/02282
摘要： A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.
摘要翻译：一种通过利用化学溶液在基板上形成膜的成膜装置，包括：相关数据生成单元，其从与化学溶液的质量相关的数据生成与化学溶液的质量相关的相关数据化学溶液，包括要加载的化学溶液的储存温度数据和要加载的化学溶液的压力数据中的至少一个; 以及确定单元，其基于所述相关数据来确定所述化学溶液是否保持其预期质量。

23. 发明授权

US07459264B2 Device manufacturing method 失效
标题翻译：器件制造方法
公开(公告)号：US07459264B2
公开(公告)日：2008-12-02
申请号：US11175275
申请日：2005-07-07
申请人： Daisuke Kawamura , Akiko Mimotogi , Takashi Sato
发明人： Daisuke Kawamura , Akiko Mimotogi , Takashi Sato
IPC分类号： G03F7/26
CPC分类号： G03F7/70341
摘要： A device manufacturing method is disclosed, which includes forming a resist film on a substrate, preparing an exposure tool which comprises a projection optical system, preparing a photo mask on which a mask pattern is formed, mounting the substrate and the photo mask on the exposure tool, the substrate having the resist film formed thereon, transferring the mask pattern formed on the photo mask onto the resist film in a state in which a solution including an oxidative agent is filled between the resist film and a final element of a projection optical system to form a latent image of the mask pattern on the resist film, heating the resist film having the latent image formed thereon, and developing the heated resist film.
摘要翻译：公开了一种器件制造方法，其包括在衬底上形成抗蚀剂膜，制备曝光工具，其包括投影光学系统，制备其上形成掩模图案的光掩模，将衬底和光掩模安装在曝光工具，其上形成有抗蚀剂膜的基板，在将包含氧化剂的溶液填充在抗蚀剂膜和投影光学系统的最终元件之间的状态下，将形成在光掩模上的掩模图案转印到抗蚀剂膜上在抗蚀剂膜上形成掩模图案的潜像，加热其上形成有潜像的抗蚀剂膜，并显影加热的抗蚀剂膜。

24. 发明授权

US07432796B2 Security control system for managing registration of ID codes for portable devices 有权
标题翻译：用于管理便携式设备的ID代码注册的安全控制系统
公开(公告)号：US07432796B2
公开(公告)日：2008-10-07
申请号：US11058831
申请日：2005-02-16
申请人： Daisuke Kawamura , Kiyokazu Ohtaki , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
发明人： Daisuke Kawamura , Kiyokazu Ohtaki , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
IPC分类号： G05B19/00 , G06F7/00 , G06F7/04 , H04Q1/00 , H04B1/00
CPC分类号： G07C9/00309 , B60R25/04 , B60R25/2036 , B60R25/24 , B60R2325/205 , G07C9/00103 , G07C9/00571
摘要： A security control system for improving security. The security control system includes a portable device, having a communication function and a portable device ID code. A security controller includes a memory for recording a controller ID code. The security controller communicates with the portable device and determines whether the portable device ID code matches the controller ID code. In accordance with the determination, the security controller selectively deactivates the security functions of a door lock driver and an engine controller. The security controller records and registers the portable device ID code as the controller ID code in the memory and transmits a registration signal containing the portable device ID code. A portable device management apparatus receives the registration signal from the security controller and manages the portable device based on the registration signal.
摘要翻译：一种用于提高安全性的安全控制系统。安全控制系统包括具有通信功能的便携式设备和便携式设备ID代码。安全控制器包括用于记录控制器ID代码的存储器。安全控制器与便携式设备通信，并确定便携式设备ID代码是否与控制器ID代码相匹配。根据该确定，安全控制器选择性地去激活门锁驱动器和发动机控制器的安全功能。安全控制器将便携式设备ID代码记录并登记为存储器中的控制器ID代码，并发送包含便携式设备ID代码的注册信号。便携式设备管理设备从安全控制器接收注册信号，并根据注册信号管理便携式设备。

25. 发明申请

US20070188733A1 Manufacturing method of semiconductor device 失效
标题翻译：半导体器件的制造方法
公开(公告)号：US20070188733A1
公开(公告)日：2007-08-16
申请号：US11654566
申请日：2007-01-18
申请人： Shinichi Ito , Kentaro Matsunaga , Daisuke Kawamura
发明人： Shinichi Ito , Kentaro Matsunaga , Daisuke Kawamura
IPC分类号： G03B27/32
CPC分类号： G03D3/08 , G03B27/42 , G03F7/70341
摘要： A manufacturing method of a semiconductor device including a liquid immersion movement exposure of interposing a liquid between an exposure target substrate and a projection optical system of an exposure apparatus, and carrying out an exposure processing with respect to a plurality of exposure regions set on a surface of the substrate while relatively moving the substrate with respect to the system, a first liquid immersion movement of relatively moving the substrate with respect to the system while interposing the liquid between the substrate and the system, in adjacent exposure regions of said each exposure region, and a second liquid immersion movement of relatively moving the substrate with respect to the system at a speed lower than a movement speed in the first movement, while interposing the liquid between the substrate and the system, in a distance that is longer than a movement distance in the first movement.
摘要翻译：一种半导体器件的制造方法，包括在曝光对象基板和曝光装置的投影光学系统之间插入液体的液浸式移动曝光，并对相对于设置在表面上的多个曝光区域进行曝光处理在相对于所述系统相对移动所述衬底的同时，在所述每个曝光区域的相邻曝光区域中相对于所述衬底相对地移动所述衬底同时在所述衬底和所述系统之间插入液体的第一液浸动作，以及第二液浸移动，其以比第一移动中的移动速度低的速度相对于所述系统移动所述基板，同时在所述基板和所述系统之间以比移动距离长的距离在第一动作。

26. 发明授权

US07227447B2 Switch device 有权
标题翻译：开关装置
公开(公告)号：US07227447B2
公开(公告)日：2007-06-05
申请号：US10823160
申请日：2004-04-13
申请人： Kiyokazu Ohtaki , Takayuki Hiramitsu , Daisuke Kawamura , Tomoyuki Funayama , Koji Iwamoto
发明人： Kiyokazu Ohtaki , Takayuki Hiramitsu , Daisuke Kawamura , Tomoyuki Funayama , Koji Iwamoto
IPC分类号： G06K19/00 , B60R25/00 , B60R25/04
CPC分类号： G07C9/00944 , B60R25/04 , B60R25/045 , B60R25/2063 , B60R25/24 , B60R25/245 , G05G1/02 , G07C9/00309 , G07C2009/00793
摘要： A switch device is provided that ensures formation of a communicable area by a coil antenna. The switch device includes an ignition switch operated by an operator for driving an engine starter, a decorative cap arranged to surround the ignition switch and having an ornamental surface, and the coil antenna arranged adjacent to the decorative cap for transmitting a transponder-driving radio wave. The decorative cap includes a transmittable area that can transmit the transponder-driving radio wave therethrough. The transmittable area is formed in a part of the decorative cap excluding the ornamental surface.
摘要翻译：提供一种确保通过线圈天线形成可通信区域的开关装置。开关装置包括由操作者操作的用于驱动发动机起动器的点火开关，设置成围绕点火开关并具有装饰面的装饰盖，以及与装饰盖相邻布置的线圈天线，用于发送应答器驱动无线电波。装饰帽包括可透射应答器驱动无线电波的可传输区域。可传送区域形成在除了装饰面之外的装饰盖的一部分中。

27. 发明申请

US20070008507A1 Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium 失效
标题翻译：浸渍曝光方法和浸渍曝光装置，其通过浸渍介质将形成在掩模上的图案的图像转印到基底上
公开(公告)号：US20070008507A1
公开(公告)日：2007-01-11
申请号：US11474298
申请日：2006-06-26
申请人： Takuya Kono , Kazuya Fukuhara , Daisuke Kawamura
发明人： Takuya Kono , Kazuya Fukuhara , Daisuke Kawamura
IPC分类号： G03B27/42
CPC分类号： G03F7/70891 , G03F7/70341
摘要： This invention discloses an immersion exposure method which executes immersion exposure for an exposure target film by transferring an image of a pattern formed on a mask onto the exposure target film through an immersion medium. A first vapor pressure as the target value in an immersion exposure atmosphere which surrounds the immersion medium is set. A second vapor pressure in the immersion exposure atmosphere is measured. The first vapor pressure is compared with the second vapor pressure. Whether to adjust the vapor pressure in the immersion exposure atmosphere is selected in accordance with the comparison result.
摘要翻译：本发明公开了一种浸渍曝光方法，其通过浸渍介质将曝光目标膜上形成的图案的图像转印到曝光目标膜上，对曝光目标膜进行浸没曝光。设置围绕浸渍介质的浸没曝光气氛中作为目标值的第一蒸气压。测量浸渍曝光气氛中的第二蒸气压。将第一蒸气压与第二蒸气压进行比较。根据比较结果选择是否调整浸入曝光气氛中的蒸气压。

28. 发明授权

US07005249B2 Apparatus for processing substrate and method of processing the same 失效
公开(公告)号：US07005249B2
公开(公告)日：2006-02-28
申请号：US11030064
申请日：2005-01-07
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： G03C5/00
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

29. 发明授权

US07005238B2 Apparatus for processing substrate and method of processing the same 失效
公开(公告)号：US07005238B2
公开(公告)日：2006-02-28
申请号：US11030135
申请日：2005-01-07
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： G03C5/00
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

30. 发明申请

US20060008747A1 Device manufacturing method 失效
标题翻译：器件制造方法
公开(公告)号：US20060008747A1
公开(公告)日：2006-01-12
申请号：US11175275
申请日：2005-07-07
申请人： Daisuke Kawamura , Akiko Mimotogi , Takashi Sato
发明人： Daisuke Kawamura , Akiko Mimotogi , Takashi Sato
IPC分类号： G03F7/00
CPC分类号： G03F7/70341
摘要： A device manufacturing method is disclosed, which includes forming a resist film on a substrate, preparing an exposure tool which comprises a projection optical system, preparing a photo mask on which a mask pattern is formed, mounting the substrate and the photo mask on the exposure tool, the substrate having the resist film formed thereon, transferring the mask pattern formed on the photo mask onto the resist film in a state in which a solution including an oxidative agent is filled between the resist film and a final element of a projection optical system to form a latent image of the mask pattern on the resist film, heating the resist film having the latent image formed thereon, and developing the heated resist film.
摘要翻译：公开了一种器件制造方法，其包括在衬底上形成抗蚀剂膜，制备曝光工具，其包括投影光学系统，制备其上形成掩模图案的光掩模，将衬底和光掩模安装在曝光工具，其上形成有抗蚀剂膜的基板，在将包含氧化剂的溶液填充在抗蚀剂膜和投影光学系统的最终元件之间的状态下，将形成在光掩模上的掩模图案转印到抗蚀剂膜上在抗蚀剂膜上形成掩模图案的潜像，加热其上形成有潜像的抗蚀剂膜，并显影加热的抗蚀剂膜。

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