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21. 发明申请

US20070006796A1 Crystallization apparatus and crystallization method 失效
公开(公告)号：US20070006796A1
公开(公告)日：2007-01-11
申请号：US11520751
申请日：2006-09-14
申请人： Masakiyo Matsumura , Yukio Taniguchi
发明人： Masakiyo Matsumura , Yukio Taniguchi
IPC分类号： C30B1/00 , C30B5/00 , C30B28/02 , C30B3/00
CPC分类号： C30B1/02 , Y10T117/10 , Y10T117/1004 , Y10T117/1008
摘要： A crystallization apparatus includes an illumination system which illuminates a phase shifter having a phase shift portion, and irradiates a polycrystal semiconductor film or an amorphous semiconductor film with a light beam having a predetermined light intensity distribution in which a light intensity is minimum in a point area corresponding to the phase shift portion of the phase shifter, thereby forming a crystallized semiconductor film, the phase shifter has four or more even-numbered phase shift lines which intersect at a point constituting the phase shift portion. An area on one side and an area on the other side of each phase shift line have a phase difference of approximately 180 degrees.

22. 发明授权

US07156091B2 Oral airway and airway management assistive device provided with the oral airway 失效
标题翻译：口腔气道和气道管理辅助装置配备口腔气道
公开(公告)号：US07156091B2
公开(公告)日：2007-01-02
申请号：US10985935
申请日：2004-11-12
申请人： Junichi Koyama , Kei Jin Shu , Takao Nawakura , Yukio Taniguchi
发明人： Junichi Koyama , Kei Jin Shu , Takao Nawakura , Yukio Taniguchi
IPC分类号： A61M16/00
CPC分类号： A61B1/267 , A61B1/00052 , A61B1/0676 , A61B1/0684 , A61M16/04
摘要： An oral airway, which is used by being inserted into the mouth of a patient who is suffering from unconsciousness or has lost consciousness to secure an airway of the patient, is adapted to be used with a tube to be inserted into the trachea of the patient through the mouth thereof. The oral air way includes a main body, and an insertion part provided on the main body. The insertion part is adapted to be inserted into the trachea of the patient through the mouth thereof so that an appropriate portion of the insertion part at the side of the distal end thereof comes into contact with the root of the tongue of the patient to secure the airway of the patient. The insertion part includes a guide groove for guiding the tube when the tube is inserted into the trachea of the patient, and the guide groove has a structure from which the tube can be separated after the distal end of the tube has been inserted into the trachea of the patient.
摘要翻译：通过插入患有无意识或失去意识以确保患者气道的患者的口中使用的口腔气道适于与待插入患者气管的管一起使用通过它的嘴。口腔空气方式包括主体和设置在主体上的插入部。插入部适于通过其口插入到患者的气管中，使得其远端侧的插入部分的适当部分与患者舌头的根部接触以固定病人气道。插入部包括用于在将管插入患者的气管中时引导管的引导槽，并且引导槽具有在管的远端已经插入气管之后可以从该管分离的结构的病人。

23. 发明申请

US20060138351A1 Laser anneal apparatus 失效
公开(公告)号：US20060138351A1
公开(公告)日：2006-06-29
申请号：US11299789
申请日：2005-12-13
申请人： Masayuki Jyumonji , Yukio Taniguchi , Masakiyo Matsumura , Masato Hiramatsu , Yoshio Takami
发明人： Masayuki Jyumonji , Yukio Taniguchi , Masakiyo Matsumura , Masato Hiramatsu , Yoshio Takami
IPC分类号： A61N5/00 , B23K26/00
CPC分类号： B23K26/066 , B23K26/0006 , B23K26/03 , B23K26/032 , B23K26/034 , B23K26/0838 , B23K26/354 , B23K26/40 , B23K2101/40 , B23K2103/50 , B23K2103/56 , C30B13/24 , C30B29/06 , C30B35/00
摘要： A laser anneal apparatus is provided with a laser source; a homogenizing optical system disposed in an optical path of laser light emitted from the laser source to homogenize an intensity distribution of the laser light in a section which is perpendicular to the optical path; a phase shifter disposed in the optical path of the laser light passed through the homogenizing optical system to produce an intensity distribution pattern of the laser light in the section which is perpendicular to the optical path; a photoreceptor device disposed in the optical path of the laser light passed through the phase shifter to intercept a part of the laser light and to measure a quantity of the intercepted laser light; and an image-forming optical system disposed in the optical path of the laser light passed through the photoreceptor device to focus the laser light on a substrate to be treated.

24. 发明申请

US20060043258A1 Method of picking up sectional image of laser light 失效
标题翻译：拾取激光截面图像的方法
公开(公告)号：US20060043258A1
公开(公告)日：2006-03-02
申请号：US11178562
申请日：2005-07-12
申请人： Masayuki Jyumonji , Masakiyo Matsumura , Yukio Taniguchi , Masato Hiramatsu , Hiroyuki Ogawa , Noritaka Akita
发明人： Masayuki Jyumonji , Masakiyo Matsumura , Yukio Taniguchi , Masato Hiramatsu , Hiroyuki Ogawa , Noritaka Akita
IPC分类号： G02B7/04
CPC分类号： G02B27/40 , B23K26/705 , G01J1/04 , G01J1/0411 , G01J1/0448 , G01J1/4257 , G02B7/36
摘要： A knife edge is disposed at a height corresponding to a section on which a sectional image (light intensity distribution) is picked up in such a manner as to intercept a part of the section of the laser light. The knife edge is irradiated with the laser light, and the sectional image of the laser light is enlarged with an image forming optics, and is picked up by a CCD. While picking up the sectional image in this manner, focusing of the image forming optics is performed. Next, the knife edge is retracted from the optical path of the laser light, the laser light is allowed to enter the CCD via the image forming optics, and the sectional image of the laser light is picked up.
摘要翻译：刀刃设置在与截面图像（光强度分布）被拾取的部分相对应的高度处，以截取激光的一部分的一部分。用激光照射刀刃，用成像光学元件放大激光的截面图像，并用CCD拾取。以这种方式拾取截面图像时，执行成像光学元件的聚焦。接下来，刀刃从激光的光路缩回，允许激光经由图像形成光学器件进入CCD，并且拾取激光的截面图像。

25. 发明申请

US20060027809A1 Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus for the semiconductor thin film 审中-公开
标题翻译：包含半导体薄膜的半导体薄膜，其经受热处理以具有对准标记，用于半导体薄膜的结晶方法和用于半导体薄膜的结晶装置
公开(公告)号：US20060027809A1
公开(公告)日：2006-02-09
申请号：US11194607
申请日：2005-08-02
申请人： Hiroyuki Ogawa , Noritaka Akita , Yukio Taniguchi , Masato Hiramatsu , Masayuki Jyumonji , Masakiyo Matsumura
发明人： Hiroyuki Ogawa , Noritaka Akita , Yukio Taniguchi , Masato Hiramatsu , Masayuki Jyumonji , Masakiyo Matsumura
IPC分类号： H01L29/76 , H01L23/544 , H01L29/04
CPC分类号： H01L21/02678 , H01L21/2026 , H01L21/268 , H01L23/544 , H01L27/1214 , H01L27/1285 , H01L27/1288 , H01L29/78675 , H01L2223/5442 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： Exact alignment of a recrystallized region, which is to be formed in an amorphous or polycrystalline film, is facilitated. An alignment mark is formed, which is usable in a step of forming an electronic device, such as a thin-film transistor, in the recrystallized region. In addition, in a step of obtaining a large-grain-sized crystal-phase semiconductor from a semiconductor film, a mark structure that is usable as an alignment mark in a subsequent step is formed on the semiconductor film in the same exposure step. Thus, the invention includes a light intensity modulation structure that modulates light and forms a light intensity distribution for crystallization, and a mark forming structure that modulates light and forms a light intensity distribution including a pattern with a predetermined shape, and also forms a mark indicative of a predetermined position on a crystallized region.
摘要翻译：促进在非晶或多晶膜中形成的再结晶区域的精确取向。形成对准标记，其可用于在再结晶区域中形成诸如薄膜晶体管的电子器件的步骤。此外，在从半导体膜获得大晶粒尺寸的晶相半导体的步骤中，在相同的曝光步骤中，在半导体膜上形成可用作后续步骤中的对准标记的标记结构。因此，本发明包括调制光并形成用于结晶的光强度分布的光强调制结构，以及调制光并形成包括具有预定形状的图案的光强度分布的标记形成结构，并且还形成标记在结晶区域上的预定位置。

26. 发明申请

US20060027162A1 Crystallization apparatus, crystallization method, and phase modulation device 有权
标题翻译：结晶装置，结晶方法和相位调制装置
公开(公告)号：US20060027162A1
公开(公告)日：2006-02-09
申请号：US11098647
申请日：2005-04-05
申请人： Tomoya Kato , Masakiyo Matsumura , Yukio Taniguchi
发明人： Tomoya Kato , Masakiyo Matsumura , Yukio Taniguchi
IPC分类号： C30B23/00 , C30B25/00 , C30B28/12 , C30B28/14
CPC分类号： C30B1/00 , C30B13/24 , Y10T117/1004
摘要： A crystallization apparatus of the present invention irradiates a non-single-crystal semiconductor film with a luminous flux having a predetermined light intensity distribution to crystallize the film, and comprises a phase modulation device comprising a plurality of unit areas which are arranged in a certain period and which mutually have substantially the same pattern, and an optical image forming system disposed between the phase modulation device and the non-single-crystal semiconductor film. The unit area of the phase modulation device has a reference face having a certain phase, a first area disposed in the vicinity of a center of each unit area and having a first phase difference with respect to the reference face, and a second area disposed in the vicinity of the first area and having substantially the same phase difference as that of the first phase difference with respect to the reference face.
摘要翻译：本发明的结晶装置用具有预定的光强度分布的光通量照射非单晶半导体膜，使薄膜结晶化，并且包括相位调制装置，该相位调制装置包括在一定时间内排列的多个单位区域并且相互具有基本相同的图案，以及设置在相位调制装置和非单晶半导体膜之间的光学图像形成系统。相位调制装置的单位面积具有一定的相位的基准面，设置在各单位面积的中心附近的第一区域，相对于基准面具有第一相位差，第二区域设置在第一区域的附近并且具有与第一相位差相对于基准面大致相同的相位差。

27. 发明申请

US20050272274A1 Apparatus for forming a semiconductor thin film 有权
标题翻译：用于形成半导体薄膜的装置
公开(公告)号：US20050272274A1
公开(公告)日：2005-12-08
申请号：US11198656
申请日：2005-08-05
申请人： Masakiyo Matsumura , Mikihiko Nishitani , Yoshinobu Kimura , Masayuki Jyumonji , Yukio Taniguchi , Masato Hiramatsu , Fumiki Nakano
发明人： Masakiyo Matsumura , Mikihiko Nishitani , Yoshinobu Kimura , Masayuki Jyumonji , Yukio Taniguchi , Masato Hiramatsu , Fumiki Nakano
IPC分类号： B23K26/06 , C30B1/00 , C30B13/00 , C30B13/24 , H01L21/20 , H01L21/268 , H01L21/26
CPC分类号： H01L21/02678 , B23K26/06 , B23K26/066 , B23K2101/40 , C30B1/00 , C30B13/24 , C30B29/06 , H01L21/02691 , H01L21/2026 , Y10T117/1004 , Y10T117/1008 , Y10T117/1016
摘要： Disclosed are apparatus for forming a semiconductor film having an excellent crystallinity from a non-single crystal semiconducting layer formed on a base layer made of an insulating material. The apparatus includes a light source, a homogenizer for homogenizing an intensity distribution of the emitted light, an amplitude-modulation means for performing the amplitude-modulation such that the amplitude of the light, of which the intensity distribution is homogenized, is increased in the direction of the relative motion of the light to the base layer, an optional light projection optical system for projecting the amplitude-modulated light onto the surface of the non-single crystal semiconductor such that a predetermined irradiation energy can be obtained, a phase shifter for providing a low temperature point in the surface irradiated by the light, and a substrate stage to move the light relative to the substrate thereby enabling scanning in the X and Y axis.
摘要翻译：公开了一种从由绝缘材料制成的基底层上形成的非单晶半导体层形成具有优异结晶度的半导体膜的装置。该装置包括光源，用于均匀化发射光的强度分布的均质器，用于执行调幅的幅度调制装置，使得强度分布均匀化的光的振幅在光向基层的相对运动的方向，用于将调幅光投影到非单晶半导体的表面上以使得能够获得预定的照射能量的可选的光投射光学系统，用于在由光照射的表面中提供低温点，以及衬底台，以相对于衬底移动光，从而使得能够在X和Y轴上进行扫描。

28. 发明申请

US20050217571A1 Crystallization apparatus, crystallization method, device, optical modulation element, and display apparatus 失效
标题翻译：结晶装置，结晶方法，装置，光调制元件和显示装置
公开(公告)号：US20050217571A1
公开(公告)日：2005-10-06
申请号：US11087619
申请日：2005-03-24
申请人： Yukio Taniguchi , Masayuki Jyumonji , Hiroyuki Ogawa
发明人： Yukio Taniguchi , Masayuki Jyumonji , Hiroyuki Ogawa
IPC分类号： C30B1/00 , C30B3/00 , C30B5/00 , C30B13/24 , C30B28/02 , H01L21/00
CPC分类号： C30B13/24 , Y10T117/1004 , Y10T117/1008 , Y10T117/1012 , Y10T117/1016
摘要： A first optical modulation element irradiates a non-single-crystal substance with a light beam which is to have a first light intensity distribution on the non-single crystal substance by modulating an intensity of an incident first light beam, thereby melting the substance. A second optical modulation element irradiates the substance with a light beam which is to have a second light intensity distribution on the substance by modulating an intensity of an incident second light beam, thereby melting the substance. An illumination system causes the light beam having the second light intensity distribution to enter the molten part of the substance in a period that the substance is partially molten by irradiation of the light beam having the first light intensity distribution.
摘要翻译：第一光调制元件通过调制入射的第一光束的强度，将具有第一光强度分布的光束的非单晶物质照射在非单晶物质上，由此熔化物质。第二光调制元件通过调制入射的第二光束的强度，从而使该物质熔化，从而将具有第二光强分布的光束照射在该物质上。照射系统使得具有第二光强分布的光束在物质通过具有第一光强度分布的光束的照射而部分熔融的时段内进入物质的熔融部分。

29. 发明申请

US20050190352A1 Method and apparatus for forming pattern on thin substrate or the like 有权
标题翻译：在薄基板等上形成图案的方法和装置
公开(公告)号：US20050190352A1
公开(公告)日：2005-09-01
申请号：US11118479
申请日：2005-05-02
申请人： Yukio Taniguchi , Hirotaka Yamaguchi , Susumu Tsujikawa
发明人： Yukio Taniguchi , Hirotaka Yamaguchi , Susumu Tsujikawa
IPC分类号： H01L21/027 , G03F7/20 , G03B27/42
CPC分类号： G03F7/70783 , G03F7/70791
摘要： A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field to be processed, by locally displacing the retaining base on the basis of the detected undulation or thickness unevenness of the substrate. Blurring of an image formed on the substrate can be thereby prevented.
摘要翻译：本发明的基板处理装置具有保持基板的保持基座，检测波动或厚度不均匀的装置以及操作检测装置的控制装置。通过基于检测到的基板的起伏或厚度不均匀性，局部地移动保持基板，使基板在待加工的场的范围内变形。因此可以防止形成在基板上的图像的模糊。

30. 发明申请

US20050179885A1 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element 有权
标题翻译：光照射装置，光照射法，结晶装置，结晶方法，装置和光调制元件
公开(公告)号：US20050179885A1
公开(公告)日：2005-08-18
申请号：US11051189
申请日：2005-02-07
申请人： Yukio Taniguchi
发明人： Yukio Taniguchi
IPC分类号： B23K26/00 , B23K26/06 , B23K26/073 , B23K26/08 , G02F1/00 , G02F1/133 , G03B27/54 , G03F7/20 , H01L21/00 , H01L21/20 , H01L21/324 , H01L21/77
CPC分类号： H01L21/02678 , B23K26/066 , B23K26/073 , B23K26/08 , H01L21/2026 , H01L27/1285 , H01L27/1296
摘要： A light irradiation apparatus includes a light modulation element which modulates a phase of an incident light beam to obtain a V-shaped light intensity distribution having a bottom portion of a minimum light intensity, and an image formation optical system which applies the modulated light beam from the light modulation element to an irradiation target surface in such a manner that the V-shaped light intensity distribution is provided on the irradiation target surface. The light modulation element has such a complex amplitude transmittance distribution that a secondary derivative of a phase value of a complex amplitude distribution becomes substantially zero at the bottom portion of the V-shaped light intensity distribution in an image space of the image formation optical system.
摘要翻译：光照射装置包括光调制元件，其调制入射光束的相位以获得具有最小光强度的底部的V形光强分布;以及图像形成光学系统，其施加来自光调制元件以照射目标表面上的V形光强度分布的方式照射到照射目标表面。光调制元件具有这样的复振幅透射率分布，使得复数振幅分布的相位值的二次导数在图像形成光学系统的图像空间中的V形光强度分布的底部处变为基本为零。

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