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21. 发明授权

US6116267A Valving device 失效
标题翻译：阀门装置
公开(公告)号：US6116267A
公开(公告)日：2000-09-12
申请号：US172146
申请日：1998-10-14
申请人： Hidenao Suzuki , Kuniaki Horie , Kiwamu Tsukamoto , Yuji Araki
发明人： Hidenao Suzuki , Kuniaki Horie , Kiwamu Tsukamoto , Yuji Araki
IPC分类号： F16K7/17 , F16K41/10 , F16K41/12 , F16K49/00
CPC分类号： F16K41/12 , F16K41/10 , F16K49/005 , Y10T137/6579
摘要： A valving device can operate stably to provide switching or flow rate control operations, even when it is used for controlling thermodynamically unstable gases. The valving device including a valve casing having an internal passage for process fluids. A valve body is movable against a valve seat for adjusting opening of the internal passage, and a valve driving mechanism can drive the valve body. A flexible member is provided for separating a fluid handling space including the internal passage from a valve mechanism space for housing the valve driving mechanism. A thermal medium space is formed within the valve mechanism space for receiving a thermal medium for providing heat to the valve body.
摘要翻译：即使用于控制热力学不稳定的气体，阀门装置也可以稳定运行，以提供切换或流量控制操作。阀装置包括具有用于处理流体的内部通道的阀壳体。阀体可以抵靠阀座移动，用于调节内部通道的开口，阀驱动机构可以驱动阀体。提供了一种柔性构件，用于将包括内部通道的流体处理空间与用于容纳阀驱动机构的阀机构空间分离。在阀机构空间内形成有热介质空间，用于接收用于向阀体提供热量的热介质。

22. 发明授权

US6132512A Vapor-phase film growth apparatus and gas ejection head 失效
标题翻译：气相膜生长装置和气体喷射头
公开(公告)号：US6132512A
公开(公告)日：2000-10-17
申请号：US3948
申请日：1998-01-08
申请人： Kuniaki Horie , Tsutomu Nakada , Takeshi Murakami , Hidenao Suzuki , Masahito Abe , Yuji Araki
发明人： Kuniaki Horie , Tsutomu Nakada , Takeshi Murakami , Hidenao Suzuki , Masahito Abe , Yuji Araki
IPC分类号： C23C16/44 , C23C16/455 , C30B25/14 , C23C16/00
CPC分类号： C23C16/45574 , C23C16/45565 , C30B25/14
摘要： A vapor-phase film growth apparatus includes a substrate holder for holding a substrate, a gas ejection head, and a radiant heat shield device. The substrate holder has a substrate heater therein, and the gas ejection head has a gas injection surface for ejecting a material gas toward a substrate held by the substrate holder. The radiant heat shield device is disposed between the substrate holder and the gas injection head in confronting relationship to the gas injection surface of the gas ejection nozzle. The substantially planar radiant heat shield device is permeable to gases and has a heating capability.
摘要翻译：气相膜生长装置包括用于保持基板的基板保持器，气体喷射头和辐射热屏蔽装置。衬底保持器在其中具有衬底加热器，并且气体喷射头具有用于将材料气体朝向由衬底保持器保持的衬底喷射的气体注入表面。辐射热屏蔽装置以与气体喷射嘴的气体注入表面相对的关系设置在衬底保持器和气体注入头之间。基本上平面的辐射热屏蔽装置可透气并具有加热能力。

23. 发明授权

US5951923A Vaporizer apparatus and film deposition apparatus therewith 失效
标题翻译：气化装置及其成膜装置
公开(公告)号：US5951923A
公开(公告)日：1999-09-14
申请号：US861516
申请日：1997-05-22
申请人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki
发明人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Fumio Kuriyama , Takeshi Murakami , Masahito Abe , Yuji Araki
IPC分类号： B01D1/22 , C23C16/448 , B01F3/04
CPC分类号： B01D1/22 , C23C16/4481 , C23C16/4485 , Y10S261/65
摘要： A vaporizer apparatus efficiently vaporizes difficult-to-vaporize materials such as complex feed materials for producing a high dielectric or ferroelectric material. The vaporizer apparatus includes a vaporizing passage formed by a pair of opposed walls separated by a minute spacing to a liquid feed entrance provided at one end of the vaporizing passage, a vaporized feed exit provided at an opposite end of the vaporizing passage, and a heating arrangement for heating the walls to a temperature in excess of a vaporizing temperature of the liquid feed so that the liquid feed material may be guided into the vaporizing passage to be vaporized.
摘要翻译：蒸发器装置有效地蒸发诸如用于生产高电介质或铁电材料的复合进料的难以汽化的材料。蒸发器装置包括：由与蒸发通道的一端设置的液体进料入口分开的一对相对的壁形成的蒸发通道，设置在蒸发通道的相对端的蒸发进料口，以及加热用于将壁加热到超过液体进料的蒸发温度的温度的布置，使得液体进料可以被引导到蒸发通道中以被蒸发。

24. 发明授权

US5950646A Vapor feed supply system 失效
标题翻译：蒸气供料系统
公开(公告)号：US5950646A
公开(公告)日：1999-09-14
申请号：US3947
申请日：1998-01-08
申请人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Takeshi Murakami , Yukio Fukunaga , Masahito Abe , Hiroyuki Shinozaki , Kiwamu Tsukamoto , Mitsunao Shibasaki , Yuji Araki , Hiroyuki Ueyama
发明人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Takeshi Murakami , Yukio Fukunaga , Masahito Abe , Hiroyuki Shinozaki , Kiwamu Tsukamoto , Mitsunao Shibasaki , Yuji Araki , Hiroyuki Ueyama
IPC分类号： B08B9/00 , C23C16/44 , C23C16/448 , B08B3/10
CPC分类号： C23C16/448 , B08B9/00 , C23C16/4407 , Y10S134/902
摘要： A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.
摘要翻译：包括蒸发器装置和使用这种蒸发器装置的蒸汽流动区域的清洁方法的蒸汽供给系统能够彻底清洁系统，而不必在清洁蒸发器装置的过程中降低整个系统的真空度。该方法包括通过隔离蒸汽流动区域的清洁区域来限定具有预定耐受压力的清洁流体通道，并且在压力下将清洁流体流入清洁流体通道以使清洁流体保持在液体状态在清洁区域的清洁温度下。

25. 发明授权

US08770579B2 Recording apparatus 有权
标题翻译：记录装置
公开(公告)号：US08770579B2
公开(公告)日：2014-07-08
申请号：US13360871
申请日：2012-01-30
申请人： Sanshiro Takeshita , Takehiko Saito , Hidenao Suzuki , Hiroyuki Yoda
发明人： Sanshiro Takeshita , Takehiko Saito , Hidenao Suzuki , Hiroyuki Yoda
IPC分类号： B65H29/66
CPC分类号： B41J13/106
摘要： A recording apparatus includes a holding unit that holds a recorded recording medium in a standing posture, a roller that sends the recording medium to the holding unit, and a restricting unit that restricts the position of the recording medium not to be in contact with the roller.
摘要翻译：记录装置包括：保持单元，其以立式姿势保持记录的记录介质;将记录介质发送到保持单元的辊;以及限制单元，其限制不与辊接触的记录介质的位置。

26. 发明授权

US08528897B2 Recording apparatus 有权
标题翻译：记录装置
公开(公告)号：US08528897B2
公开(公告)日：2013-09-10
申请号：US13365694
申请日：2012-02-03
申请人： Sanshiro Takeshita , Takehiko Saito , Hidenao Suzuki , Hiroyuki Yoda
发明人： Sanshiro Takeshita , Takehiko Saito , Hidenao Suzuki , Hiroyuki Yoda
IPC分类号： B65H31/00 , B65H31/08 , B65H31/26
CPC分类号： B41J13/106
摘要： A recording apparatus includes: a holding unit that holds the recorded recording medium fed out from the medium discharge unit in a standing position; and a medium pressing unit that protrudes to the holding unit with respect to a virtual surface in the feeding-out direction of the recording medium by the nip roller of the medium discharge unit, opposite to the holding unit, and presses the recorded recording medium fed out from the medium discharge unit against the holding unit.
摘要翻译：记录装置包括：保持单元，其将从介质排出单元输出的记录的记录介质保持在站立位置; 以及介质按压单元，其通过与保持单元相对的介质排出单元的夹持辊相对于记录介质的输出方向上的虚拟表面突出到保持单元，并且将记录的记录介质按压从介质排出单元离开保持单元。

27. 发明授权

US08382091B2 Recording apparatus 有权
标题翻译：记录装置
公开(公告)号：US08382091B2
公开(公告)日：2013-02-26
申请号：US13360943
申请日：2012-01-30
申请人： Hiroyuki Yoda , Takehiko Saito , Sanshiro Takeshita , Hidenao Suzuki
发明人： Hiroyuki Yoda , Takehiko Saito , Sanshiro Takeshita , Hidenao Suzuki
IPC分类号： B65H5/22 , B65H83/00 , B65H85/00 , B65H1/00
CPC分类号： B65H1/027 , B41J29/02 , B41J29/023 , B41J29/026 , B65H3/0607 , B65H31/22 , B65H2301/4213 , B65H2301/4214 , B65H2301/51256 , B65H2402/46 , B65H2404/1115 , B65H2404/1531 , B65H2405/20 , B65H2405/31 , B65H2405/33125 , B65H2405/3322
摘要： A recording apparatus includes a recording section that performs recording on a recording medium, a housing that stores the recording section, a recording medium cassette that is detachably mounted on the housing and has a cassette body that holds the recording medium in the vertical position, and a holder that holds the recording medium that has been fed from the cassette body and has been recorded in the recording section on the outer surface of the cassette body in the vertical position.
摘要翻译：一种记录装置，包括：记录介质，记录介质的存储部分;存储记录部分的壳体;可拆卸地安装在壳体上并具有将记录介质保持在垂直位置的盒体的记录介质盒;以及保持器，其保持已经从盒体馈送并已被记录在盒体的外表面上的记录部分中的垂直位置的记录介质。

28. 发明授权

US06387182B1 Apparatus and method for processing substrate 失效
标题翻译：基板处理装置及方法
公开(公告)号：US06387182B1
公开(公告)日：2002-05-14
申请号：US09517699
申请日：2000-03-02
申请人： Kuniaki Horie , Yukio Fukunaga , Naoaki Ogure , Tsutomu Nakada , Masahito Abe , Mitsunao Shibasaki , Hidenao Suzuki , Yuji Araki , Kiwamu Tsukamoto
发明人： Kuniaki Horie , Yukio Fukunaga , Naoaki Ogure , Tsutomu Nakada , Masahito Abe , Mitsunao Shibasaki , Hidenao Suzuki , Yuji Araki , Kiwamu Tsukamoto
IPC分类号： B05C2100
CPC分类号： C23C16/45574 , C23C16/409 , C23C16/45514 , C23C16/45561 , C23C16/45563 , C23C16/4557
摘要： A substrate processing apparatus forms a thin film of high-dielectric or ferroelectric such as barium/strontium titanates, or a copper film for wiring on a substrate, and has a gas ejection head for individually introducing at least two gases including a material gas and ejecting the gases toward a substrate to be processed. The gas ejection head has at least two gas passageways for individually introducing the two gases, and at least two temperature control devices for individually controlling temperatures of the gases flowing through the gas passageways.
摘要翻译：基板处理装置在基板上形成诸如钡/锶钛酸盐或铜箔的高电介质或铁电薄膜，并且具有气体喷射头，用于分别引入包括材料气体的至少两种气体并喷射朝向待处理基板的气体。气体喷射头具有用于分别引入两种气体的至少两个气体通道和用于单独控制流过气体通道的气体的温度的至少两个温度控制装置。

29. 发明授权

US06312569B1 Chemical vapor deposition apparatus and cleaning method thereof 失效
标题翻译：化学气相沉积设备及其清洁方法
公开(公告)号：US06312569B1
公开(公告)日：2001-11-06
申请号：US09172141
申请日：1998-10-14
申请人： Hidenao Suzuki , Tsutomu Nakada , Masahito Abe , Masao Saitoh
发明人： Hidenao Suzuki , Tsutomu Nakada , Masahito Abe , Masao Saitoh
IPC分类号： C25F100
CPC分类号： C23C16/4401 , Y10S156/916
摘要： A chemical vapor deposition apparatus for depositing a thin film of highly dielectric materials for giga-capacity memory devices can reliably clean reaction products formed within the deposition chamber without sacrificing the production efficiency. The apparatus comprises a hermetic deposition chamber containing a substrate holding section for supporting a substrate, and a gas supply head disposed opposite to the substrate holding section for directing a gaseous feed material onto the substrate. There are provided a trapping member supporting device for supporting a trapping member so as to be opposite to a target cleaning area inside the deposition chamber, and a plasma generation device for generating a plasma between the target cleaning area and the trapping member supported by the trapping member supporting device.
摘要翻译：用于沉积用于千兆容量存储器件的高介电材料薄膜的化学气相沉积设备可以可靠地清洁沉积室内形成的反应产物而不牺牲生产效率。该装置包括一个包含用于支撑衬底的衬底保持部分的气密淀积室和一个与衬底保持部分相对设置的用于将气体进料材料引导到衬底上的气体供给头。提供了一种捕获构件支撑装置，用于支撑捕获构件以与沉积室内的目标清洁区域相对;以及等离子体产生装置，用于在目标清洁区域和由捕获物支撑的捕获构件之间产生等离子体会员支持装置。

30. 发明授权

US06282368B1 Liquid feed vaporization system and gas injection device 失效
标题翻译：液体进料蒸发系统和气体注入装置
公开(公告)号：US06282368B1
公开(公告)日：2001-08-28
申请号：US09663358
申请日：2000-09-15
申请人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
发明人： Kuniaki Horie , Hidenao Suzuki , Tsutomu Nakada , Takeshi Murakami , Masahito Abe , Yuji Araki , Hiroyuki Ueyama
IPC分类号： A61H3306
CPC分类号： C23C16/45565 , C23C16/448 , C23C16/45561 , C23C16/4557
摘要： A compact vaporizer system is presented to produce a high quality vapor feed from a liquid feed to be delivered to a chemical vapor deposition processing chamber to produce thin film devices based on highly dielectric or ferroelectric materials such as BaTiO3, SrTiO3 and other such materials. The vaporization apparatus comprises a feed tank for storing the liquid feed; feed delivery means for transporting the liquid feed by way of a feed delivery path; a vaporizer section disposed in the delivery path comprising a high temperature heat exchanger having a capillary tube for transporting the liquid feed and a heat source for externally heating the capillary tube; and a vaporization prevention section disposed upstream of the vaporizer section for preventing effects of the vaporizer section to the liquid feed within the vaporization prevention section.
摘要翻译：提供了一种紧凑的蒸发器系统，以从液体进料产生高品质的蒸气进料，以将其输送到化学气相沉积处理室，以产生基于高电介质或铁电材料如BaTiO 3，SrTiO 3等材料的薄膜器件。蒸发装置包括用于储存液体进料的进料罐; 用于通过进料输送路径输送液体进料的进料输送装置; 设置在输送路径中的蒸发器部分包括具有用于输送液体进料的毛细管和用于外部加热毛细管的热源的高温热交换器; 以及设置在蒸发部的上游的防蒸发部，用于防止蒸发部对蒸发防止部内的液体进料的影响。

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