会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 23. 发明授权
    • Method and apparatus using an infrared laser based optical probe for
measuring electric fields directly from active regions in an integrated
circuit
    • 使用基于红外激光的光学探针的方法和装置,用于直接从集成电路中的有源区测量电场
    • US5872360A
    • 1999-02-16
    • US766149
    • 1996-12-12
    • Mario J. PanicciaValluri R. Rao
    • Mario J. PanicciaValluri R. Rao
    • G01R31/309G01R31/28
    • G01R31/309
    • A method and an apparatus for detecting an electric field in the active regions of an integrated circuit disposed in a semiconductor. In one embodiment, a laser beam is operated at a wavelength near the band gap of a semiconductor such as silicon. The laser beam is focused onto a P-N junction, such as for example the drain of an MOS transistor, through the back side of the semiconductor substrate. As a result of photo-absorption, the laser beam is partially absorbed in the P-N junction. When an external electric field is impressed on the P-N junction, such as when for example the drain of the transistor switches, the degree of photo-absorption will be modulated in accordance with the modulation in the electric field due to the phenomenon of electro-absorption. Electro-absorption also leads to electro-refraction which leads to a modulation in the reflection coefficient for the light reflected from the P-N junction/oxide interface. The laser beam passes through the P-N junction region, reflects off the oxide interface and metal behind the junction, and returns back through the P-N junction and back out of the silicon surface. Any amplitude modulation in this reflected laser beam is detected with an optical detection system, and is attributed to a corresponding modulation in the electric field in the P-N junction due to the combined effects of electro-absorption and electro-refraction.
    • 一种用于检测设置在半导体中的集成电路的有源区域中的电场的方法和装置。 在一个实施例中,激光束以接近诸如硅之类的半导体的带隙的波长工作。 激光束通过半导体衬底的背面聚焦到P-N结,例如MOS晶体管的漏极。 作为光吸收的结果,激光束被部分地吸收在P-N结中。 当在PN结上施加外部电场时,例如当例如晶体管开关的漏极时,由于电吸收的现象,将根据电场中的调制来调制光吸收的程度 。 电吸收也导致电折射,这导致从P-N结/氧化物界面反射的光的反射系数的调制。 激光束穿过P-N结区域,从结点后面的氧化物界面和金属反射出来,并通过P-N结返回并返回硅表面。 这种反射激光束中的任何幅度调制都用光学检测系统检测,并且归因于由于电吸收和电折射的组合效应而在P-N结中的电场中的相应调制。