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21. 发明申请

US20100136892A1 CARRIER HEAD WITH RETAINING RING AND CARRIER RING 有权
标题翻译：带保持环和承载环的承载头
公开(公告)号：US20100136892A1
公开(公告)日：2010-06-03
申请号：US12698009
申请日：2010-02-01
申请人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
发明人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
IPC分类号： B24B41/06
CPC分类号： B24B37/32 , B24B37/30
摘要： A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The retaining ring is connected to and vertically movable relative to the base assembly and has a lower surface configured to contact a polishing pad and an inner surface configured to circumferentially surround the edge of a substrate to retain the substrate. The carrier ring is connected to and vertically fixed relative to the base assembly, circumferentially surrounds the retaining ring to prevent lateral motion of the retaining ring, and has a bottom surface configured to contact a polishing pad.
摘要翻译：描述了具有壳体，基座组件，保持环，载体环和柔性膜的承载头。基座组件相对于外壳可垂直移动。保持环相对于基座组件连接并且可垂直移动，并且具有被配置为接触抛光垫的下表面和被配置为周向围绕衬底的边缘以保持衬底的内表面。承载环相对于基座组件连接并且垂直固定，周向地包围保持环以防止保持环的横向运动，并且具有构造成接触抛光垫的底表面。

22. 发明授权

US07699688B2 Carrier ring for carrier head 有权
标题翻译：承载头用于承载头
公开(公告)号：US07699688B2
公开(公告)日：2010-04-20
申请号：US11741677
申请日：2007-04-27
申请人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
发明人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
IPC分类号： B24B21/18
CPC分类号： B24B37/32
摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion having a lower surface with a smaller inner diameter than the upper surface of the annular upper portion, wherein the carrier ring circumferentially surrounds a retaining ring and has a lower surface to contact a polishing pad.
摘要翻译：描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。承载环具有环形上部和环形下部，其具有比环形上部的上表面更小的内径的下表面，其中承载环周向地包围保持环并且具有接触抛光的下表面垫。

23. 发明授权

US07654888B2 Carrier head with retaining ring and carrier ring 有权
标题翻译：带保护环和承载环的承载头
公开(公告)号：US07654888B2
公开(公告)日：2010-02-02
申请号：US11862096
申请日：2007-09-26
申请人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
发明人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
IPC分类号： B24B41/06
CPC分类号： B24B37/32 , B24B37/30
摘要： A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The retaining ring is connected to and vertically movable relative to the base assembly and has a lower surface configured to contact a polishing pad and an inner surface configured to circumferentially surround the edge of a substrate to retain the substrate. The carrier ring is connected to and vertically fixed relative to the base assembly, circumferentially surrounds the retaining ring to prevent lateral motion of the retaining ring, and has a bottom surface configured to contact a polishing pad.
摘要翻译：描述了具有壳体，基座组件，保持环，载体环和柔性膜的承载头。基座组件相对于外壳可垂直移动。保持环相对于基座组件连接并且可垂直移动，并且具有被配置为接触抛光垫的下表面和被配置为周向围绕衬底的边缘以保持衬底的内表面。承载环相对于基座组件连接并且垂直固定，周向地包围保持环以防止保持环的横向运动，并且具有构造成接触抛光垫的底表面。

24. 发明授权

US07527271B2 Fast substrate loading on polishing head without membrane inflation step 有权
标题翻译：抛光头上的快速衬底加载，无膜充气步骤
公开(公告)号：US07527271B2
公开(公告)日：2009-05-05
申请号：US11757069
申请日：2007-06-01
申请人： Jeonghoon Oh , Andrew Nagengast , Steven M. Zuniga , Hung Chih Chen
发明人： Jeonghoon Oh , Andrew Nagengast , Steven M. Zuniga , Hung Chih Chen
IPC分类号： B23B31/30
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/67005 , Y10T29/5313 , Y10T279/11
摘要： The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.
摘要翻译：本发明涉及一种用于改善和加速基板加载过程的装置和方法。一个实施例提供了用于真空吸附衬底的方法。该方法包括将配置用于安装衬底的柔性膜的中心室排出，移动衬底，使得衬底的背面与柔性膜完全接触，并且抽真空中心室以将衬底的背面真空吸附到柔性膜。

25. 发明申请

US20080119122A1 Flexible Membrane for Carrier Head 有权
标题翻译：用于载体头的柔性膜
公开(公告)号：US20080119122A1
公开(公告)日：2008-05-22
申请号：US11741692
申请日：2007-04-27
申请人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
发明人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
IPC分类号： B24B41/06 , B24B37/04
CPC分类号： B24B37/30 , Y10T428/24174 , Y10T428/24182
摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge and an annular recess above the hinge along the outer wall of the outer annular portion.
摘要翻译：描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。柔性膜具有主要部分和外部环形部分，其中主要部分和外部环形部分之间的接合处包括周边边缘铰链和沿着外部环形部分的外壁的铰链上方的环形凹部。

26. 发明申请

US20200001426A1 Temperature Control of Chemical Mechanical Polishing 审中-公开
公开(公告)号：US20200001426A1
公开(公告)日：2020-01-02
申请号：US16448874
申请日：2019-06-21
申请人： Hari Soundararajan , Shou-Sung Chang , Haosheng Wu , Jianshe Tang , Jeonghoon Oh , Rajeev Bajaj , Andrew Siordia
发明人： Hari Soundararajan , Shou-Sung Chang , Haosheng Wu , Jianshe Tang , Jeonghoon Oh , Rajeev Bajaj , Andrew Siordia
IPC分类号： B24B37/015 , B24B37/20 , B24B37/27 , G05D23/24
摘要： A chemical mechanical polishing apparatus includes a platen to hold a polishing pad, a carrier to hold a substrate against a polishing surface of the polishing pad during a polishing process, a dispenser to supply a polishing liquid to the polishing surface, and a temperature control system. The temperature control system includes a plurality of thermal control modules positioned above the polishing pad at a plurality of different radial positions to heat or cool a plurality of regions of the polishing pad. Each thermal control module is configured to independently heat or cool a radial region of the polishing pad.

27. 发明申请

US20180021918A1 RETAINING RING FOR CMP 审中-公开
公开(公告)号：US20180021918A1
公开(公告)日：2018-01-25
申请号：US15658294
申请日：2017-07-24
申请人： Andrew J. Nagengast , Christopher Heung-Gyun Lee , Thomas Li , Anand N. Iyer , Jie Diao , Huanbo Zhang , Erik S. Rondum , Wei-Cheng Lee , Jeonghoon Oh
发明人： Andrew J. Nagengast , Christopher Heung-Gyun Lee , Thomas Li , Anand N. Iyer , Jie Diao , Huanbo Zhang , Erik S. Rondum , Wei-Cheng Lee , Jeonghoon Oh
IPC分类号： B24B37/32 , H01L21/67 , H01L21/687 , H01L21/306
CPC分类号： B24B37/32 , H01L21/30625 , H01L21/67063 , H01L21/67092 , H01L21/68735
摘要： A retaining ring includes a generally annular body having an inner surface to constrain a substrate and a bottom surface, the bottom surface having a plurality of channels extending from an outer surface to the inner surface, and a plurality of islands separated by the channels and providing a contact area to contact a polishing pad, wherein the contact area is about 15-40% of a plan area of the bottom surface.

28. 发明授权

US09850576B2 Anti-arc zero field plate 有权
公开(公告)号：US09850576B2
公开(公告)日：2017-12-26
申请号：US12982843
申请日：2010-12-30
申请人： Jonghoon Baek , Edwin C. Suarez , Tsutomu Tanaka , Edward P. Hammond, IV , Jeonghoon Oh
发明人： Jonghoon Baek , Edwin C. Suarez , Tsutomu Tanaka , Edward P. Hammond, IV , Jeonghoon Oh
IPC分类号： C23C16/00 , C23C16/50 , C23F1/00 , H01L21/306 , C23C16/455 , H01J37/32 , C23C16/509
CPC分类号： C23C16/45565 , C23C16/509 , H01J37/32082 , H01J37/32431 , H01J37/3244
摘要： Embodiments of the present invention generally relate to apparatus for reducing arcing and parasitic plasma in substrate processing chambers. The apparatus generally include a processing chamber having a substrate support, a backing plate, and a showerhead disposed therein. A showerhead suspension electrically couples the backing plate to the showerhead. An electrically conductive bracket is coupled to the backing plate and spaced apart from the showerhead. The electrically conductive bracket may include a plate, a lower portion, an upper portion, and a vertical extension. The electrically conductive bracket contacts an electrical isolator.

29. 发明授权

US08585468B2 Retaining ring with shaped surface 有权
公开(公告)号：US08585468B2
公开(公告)日：2013-11-19
申请号：US13305589
申请日：2011-11-28
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B5/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

30. 发明授权

US08469776B2 Flexible membrane for carrier head 有权
标题翻译：用于载体头的柔性膜
公开(公告)号：US08469776B2
公开(公告)日：2013-06-25
申请号：US13104711
申请日：2011-05-10
申请人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
发明人： Steven M. Zuniga , Andrew J. Nagengast , Jeonghoon Oh
IPC分类号： B24B5/35
CPC分类号： B24B37/30 , Y10T428/24174 , Y10T428/24182
摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge and an annular recess above the hinge along the outer wall of the outer annular portion.
摘要翻译：描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。柔性膜具有主要部分和外部环形部分，其中主要部分和外部环形部分之间的接合处包括周边边缘铰链和沿着外部环形部分的外壁的铰链上方的环形凹部。

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