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    • 24. 发明授权
    • Manufacturing method for a micromechanical component having a thin-layer capping
    • 具有薄层封盖的微机械部件的制造方法
    • US08212326B2
    • 2012-07-03
    • US12835328
    • 2010-07-13
    • Ando Feyh
    • Ando Feyh
    • H01L29/84
    • G01P15/0802B81B2201/0235B81B2201/0242B81B2201/0264B81C1/00476G01L9/0042G01P15/125
    • A manufacturing method for a micromechanical component having a thin-layer capping. The method includes the following: forming a functional layer on a substrate; structuring the functional layer in first cutout regions having a first width and in regions of the functional layer to be removed having a second width, the second width being substantially greater than the first width; forming a first oxide layer on the structured functional layer; forming a first sealing layer on the thermally oxidized and structured functional layer, the first cutout regions having the first width being sealed; forming a cap layer on the first sealing layer; forming first through holes which extend through the cap layer, the first sealing layer, and the first oxide layer for at least partially exposing the regions of the functional layer to be removed; and selectively removing the regions of the functional layer to be removed, by introducing a first etching medium through the first through holes, resulting in second cutout regions in the functional layer which have the second width.
    • 具有薄层封盖的微机械部件的制造方法。 该方法包括:在基板上形成功能层; 在具有第一宽度的第一切口区域中和在要移除的功能层的区域中具有第二宽度的第二宽度基本上大于第一宽度; 在所述结构化功能层上形成第一氧化物层; 在所述热氧化结构的功能层上形成第一密封层,所述第一切口区域具有第一宽度被密封; 在所述第一密封层上形成盖层; 形成延伸穿过盖层的第一通孔,第一密封层和第一氧化物层,用于至少部分地暴露要去除的功能层的区域; 并通过引入第一蚀刻介质通过第一通孔选择性去除待去除的功能层的区域,从而产生具有第二宽度的功能层中的第二切除区域。