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21. 发明授权

US07835073B2 Projection objective for lithography 有权
标题翻译：光刻投影目标
公开(公告)号：US07835073B2
公开(公告)日：2010-11-16
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

22. 发明授权

US07187503B2 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US07187503B2
公开(公告)日：2007-03-06
申请号：US11011610
申请日：2004-12-15
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B9/00 , G02B9/60 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

23. 发明申请

US20110026110A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20110026110A1
公开(公告)日：2011-02-03
申请号：US12899297
申请日：2010-10-06
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B3/00
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

24. 发明授权

US07408716B2 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US07408716B2
公开(公告)日：2008-08-05
申请号：US11649274
申请日：2007-01-04
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B3/00 , G02B9/60 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

25. 发明授权

US07551361B2 Lithography lens system and projection exposure system provided with at least one lithography lens system of this type 有权
标题翻译：具有这种类型的至少一个光刻透镜系统的光刻透镜系统和投影曝光系统
公开(公告)号：US07551361B2
公开(公告)日：2009-06-23
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B3/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

26. 发明申请

US20070019170A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置投影目标
公开(公告)号：US20070019170A1
公开(公告)日：2007-01-25
申请号：US11460706
申请日：2006-07-28
申请人： Hans-Juergen Rostalski , Aurelian Dodoc
发明人： Hans-Juergen Rostalski , Aurelian Dodoc
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of the projection objective, delimits an immersion space in the direction of an optical axis of the projection objective. This immersion space can be filled with an immersion liquid. At least one liquid or solid volume having plane-parallel interfaces can be introduced into the beam path of the projection objective, the optical thickness of the at least one volume being at least substantially equal to the optical thickness of the immersion space. By introducing and removing the volume, it is possible to convert the projection objective from dry operation to immersed operation in a straightforward way, without extensive adjustments to the projection objective or alignment work.
摘要翻译：微光刻投影曝光装置的投影物镜在图像侧具有平面于图像侧的最后一个光学元件，并且与投影物镜的像面一起在光轴的方向上限定浸没空间投影目标。该浸渍空间可以用浸没液体填充。具有平面 - 平行界面的至少一个液体或固体体积可以被引入到投影物镜的光束路径中，至少一个体积的光学厚度至少基本上等于浸没空间的光学厚度。通过引入和移除音量，可以以直接的方式将投影物镜从干燥操作转换为浸入式操作，而无需对投影物镜或对准工作进行广泛的调整。

27. 发明申请

US20050190455A1 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US20050190455A1
公开(公告)日：2005-09-01
申请号：US11011610
申请日：2004-12-15
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B13/14 , G02B13/18 , G02B17/08 , G03F7/20 , G02B3/00 , G02B9/00
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

28. 发明申请

US20080174858A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20080174858A1
公开(公告)日：2008-07-24
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B27/18
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

29. 发明申请

US20070258134A1 Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type 有权
标题翻译：光刻镜片系统和投影曝光系统提供了这种类型的至少一个平版镜片系统
公开(公告)号：US20070258134A1
公开(公告)日：2007-11-08
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B17/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

30. 发明申请

US20070109659A1 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
公开(公告)号：US20070109659A1
公开(公告)日：2007-05-17
申请号：US11649274
申请日：2007-01-04
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B3/00
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

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