会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 22. 发明授权
    • Variable dispersion compensator and optical transmission system
    • 可变色散补偿器和光传输系统
    • US06892003B2
    • 2005-05-10
    • US10114321
    • 2002-04-03
    • Makoto KatayamaToshiaki OkunoMasayuki NishimuraTomomi SanoMasakazu ShigeharaHiroshi SuganumaToru IwashimaTomohiko Kanie
    • Makoto KatayamaToshiaki OkunoMasayuki NishimuraTomomi SanoMasakazu ShigeharaHiroshi SuganumaToru IwashimaTomohiko Kanie
    • H04B10/18G02B6/26G02B6/35H04J14/02
    • H04B10/25133
    • An optical signal, which is to become the subject of dispersion compensation, is split by optical combining/splitting unit 2, and each frequency component of the optical signal that is split is reflected by the corresponding reflective mirror 30 included in reflective mirror group 3 to apply a predetermined phase shift to the respective frequency components Each reflected frequency component is then combined using optical combining/splitting unit 2, to give dispersion compensated optical signal Furthermore, in regards to reflective mirror group 3, which is used to apply phase shift to each frequency component of an optical signal, each of the respective plurality of reflective mirrors 30 is made a movable mirror having a movable reflection position that reflects the frequency components. Through this, dispersion that develops in an optical signal may be compensated with favorable controllability and high accuracy. Therefore, the precision and controllability of dispersion compensation will become superior, and realized is a variable dispersion compensator having a miniaturized optical circuit, and an optical transmission system comprising such variable dispersion compensator,
    • 要成为色散补偿的对象的光信号被光学合成/分离单元2分离,并且被分离的光信号的每个频率分量被包括在反射镜组3中的相应的反射镜30反射到 对相应的频率分量施加预定的相移。然后使用光学合成/分离单元2组合每个反射频率分量,以产生色散补偿的光信号。此外,关于反射镜组3,其用于将相移施加到每个 光信号的频率分量,各个反射镜30中的每一个被制成具有反映频率分量的可移动反射位置的可移动反射镜。 由此,可以以良好的可控性和高精度补偿在光信号中产生的色散。 因此,色散补偿的精度和可控性将变得更好,并且实现了具有小型化光电路的可变色散补偿器和包括这种可变色散补偿器的光传输系统,
    • 23. 发明授权
    • Database search system and method
    • 数据库搜索系统和方法
    • US06704748B1
    • 2004-03-09
    • US09651675
    • 2000-08-30
    • Hiroshi Suganuma
    • Hiroshi Suganuma
    • G06F1730
    • G06F17/30244Y10S707/915Y10S707/959Y10S707/99945
    • In order to make possible a variety of database searches, image data is registered on a first hard disk and a plurality of attribute tables each containing attribute information regarding images are registered on a second hard disk. When one search condition has been applied, a search of attribute information is conducted using one attribute table conforming to the search condition from among the attribute tables stored on the second hard disk. When another search condition has been applied, a search of attribute information is conducted using another attribute table stored on the second hard disk. Thus, a database can be searched even when search conditions differ.
    • 为了使各种数据库搜索成为可能,将图像数据登记在第一硬盘上,并且将包含关于图像的属性信息的多个属性表登记在第二硬盘上。 当应用了一个搜索条件时,使用从存储在第二硬盘上的属性表中的符合搜索条件的一个属性表来进行属性信息的搜索。 当应用另一搜索条件时,使用存储在第二硬盘上的另一个属性表进行属性信息的搜索。 因此,即使搜索条件不同,也可以搜索数据库。
    • 25. 发明授权
    • Light exposure and illuminating apparatus
    • 曝光和照明设备
    • US5801870A
    • 1998-09-01
    • US824310
    • 1997-03-26
    • Michio OkaHiroshi Suganuma
    • Michio OkaHiroshi Suganuma
    • G02B17/06G02B26/12G03F7/20G02B26/08
    • G03F7/70233G02B17/0615G02B17/0626G02B26/126
    • A light exposure illuminating apparatus is provided which, employing harmonics of a continuously outputted laser beam, is small-sized, inexpensive and free from speckles and which achieves a high light source utilization efficiency. Specifically, a harmonics generating 1 generates fourth harmonics which are reflected and swept via a scanning lens 2 by a polygonal mirror 3. A cylindrical reflecting mirror radiates the fourth harmonics reflected by the polygonal mirror 3 on an arcuate aperture formed in a light exposure mask by a sweeping movement. The light of fourth harmonics transmitted through the arcuate aperture reaches a reticle 7 set on a semiconductor pattern. The illuminating light passed through the reticle 7 is projected on a wafer 9 via a concave mirror 5 and a convex mirror 76. The area of light exposure may be increased since the reticle 7 and the wafer 9 are moved in synchronism with the scanning of the scanning optical system.
    • 提供了一种使用连续输出的激光束的谐波的小型,便宜并且没有斑点并且实现高光源利用效率的曝光照明装置。 具体地说,谐波产生1产生通过多面镜3经由扫描透镜2被反射和扫掠的第四谐波。圆柱形反射镜将由多面镜3反射的第四谐波辐射在形成在曝光掩模中的弧形孔上 一个彻底的运动。 通过弧形孔传播的第四谐波的光到达设置在半导体图案上的标线片7。 通过标线片7的照明光通过凹面镜5和凸面镜76投影在晶片9上。因为标线片7和晶片9与扫描方向 扫描光学系统。
    • 26. 发明授权
    • Light exposure and illuminating apparatus
    • 曝光和照明设备
    • US5673134A
    • 1997-09-30
    • US502460
    • 1995-07-14
    • Michio OkaHiroshi Suganuma
    • Michio OkaHiroshi Suganuma
    • G02B17/06G02B26/12G03F7/20G02B26/08
    • G03F7/70233G02B17/0615G02B17/0626G02B26/126
    • A light exposure illuminating apparatus is provided which, employing harmonics of a continuously outputted laser beam, is small-sized, inexpensive and free from speckles and which achieves a high light source utilization efficiency. Specifically, a harmonics generating 1 generates light with fourth harmonics which are scanned by a scanning lens 2 and reflected and swept by a polygonal mirror 3. A cylindrical reflecting mirror radiates the sweeping fourth harmonics reflected by the polygonal mirror 3 onto an arcuate aperture formed in a light exposure mask. The light of fourth harmonics transmitted through the arcuate aperture reaches a reticle 7 set on a semiconductor pattern. The illuminating light passed through the reticle 7 is projected onto a wafer 9 via a concave mirror 5 and a convex mirror 76. The area of light exposure may be increased since the reticle 7 and the wafer 9 are moved in synchronism with the scanning of the scanning optical system.
    • 提供了一种使用连续输出的激光束的谐波的小型,便宜并且没有斑点并且实现高光源利用效率的曝光照明装置。 具体地,谐波产生1产生具有由扫描透镜2扫描并被多面镜3反射和扫掠的第四谐波的光。圆柱形反射镜将由多面镜3反射的扫掠的第四谐波辐射到形成为 曝光掩模。 通过弧形孔传播的第四谐波的光到达设置在半导体图案上的标线片7。 通过标线片7的照明光通过凹面镜5和凸面镜76投影到晶片9上。因为标线片7和晶片9与扫描方向 扫描光学系统。