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21. 发明申请

US20070020386A1 Encapsulation of chemically amplified resist template for low pH electroplating 审中-公开
标题翻译：封装化学放大抗蚀剂模板，用于低pH电镀
公开(公告)号：US20070020386A1
公开(公告)日：2007-01-25
申请号：US11186166
申请日：2005-07-20
申请人： Daniel Bedell , John Lam , Matthew Last , Kim Lee , Jyh-Shuey Lo , Dennis McKean , Chun-Ming (Albert) Wang , Yi Zheng
发明人： Daniel Bedell , John Lam , Matthew Last , Kim Lee , Jyh-Shuey Lo , Dennis McKean , Chun-Ming (Albert) Wang , Yi Zheng
IPC分类号： B05D5/12 , B05D5/00 , B05D1/36 , B05C11/02
CPC分类号： G03F7/40 , C25D5/022 , C25D7/12 , G03F7/2024
摘要： Systems and methods for encapsulation of chemically amplified resist template for low pH electroplating are disclosed. In a first method embodiment, a resist template structure is formed on a wafer. Substantially all surfaces of the resist template structure are encapsulated to form an encapsulated structure. Magnetic materials are plated onto the encapsulated structure.
摘要翻译：公开了用于封装用于低pH电镀的化学放大抗蚀剂模板的系统和方法。在第一方法实施例中，在晶片上形成抗蚀剂模板结构。基本上将抗蚀剂模板结构的所有表面封装形成封装结构。将磁性材料电镀在封装结构上。

22. 发明申请

US20060163195A1 Method for making a contact magnetic transfer template 失效
标题翻译：制造接触磁传输模板的方法
公开(公告)号：US20060163195A1
公开(公告)日：2006-07-27
申请号：US11044288
申请日：2005-01-26
申请人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
发明人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
IPC分类号： B44C1/22 , C23F1/00 , C03C25/68
CPC分类号： G11B5/865 , B82Y10/00 , C23F3/04 , C23F4/00 , G11B5/72 , G11B5/743 , G11B5/82 , G11B5/855 , Y10T29/4903 , Y10T29/49032
摘要： A contact magnetic transfer (CMT) master template is made by first adhering a plastic film to a first surface of a silicon wafer. A resist pattern is then formed on the polyimide film and the polyimide is reactive-ion-etched through the resist to form recesses. The resist is removed and a chemical-mechanical-polishing (CMP) stop layer is deposited over the non-recessed regions of the polyimide, and optionally into the bottoms of the recesses. A layer of magnetic material is then deposited over the polyimide film to fill the recesses. A CMP process is then performed to remove magnetic material above the recesses and above the non-recessed regions and continued until the CMP stop layer is reached. The resulting upper surface of the polyimide film is then a continuous planar film of magnetic islands and regions of CMP stop layer material that function as the nonmagnetic regions of the template.
摘要翻译：通过首先将塑料膜粘附到硅晶片的第一表面上来制造接触磁传递（CMT）主模板。然后在聚酰亚胺膜上形成抗蚀剂图案，并通过抗蚀剂反应离子蚀刻聚酰亚胺以形成凹陷。去除抗蚀剂，并在化学机械抛光（CMP）停止层上沉积在聚酰亚胺的非凹陷区域上，并且任选地沉积到凹部的底部中。然后将一层磁性材料沉积在聚酰亚胺膜上以填充凹部。然后执行CMP处理以除去凹部上方的磁性材料并且在非凹陷区域上方并继续直到达到CMP停止层。所得到的聚酰亚胺膜的上表面是磁性岛的连续平面膜和作为模板的非磁性区域的CMP停止层材料的区域。

23. 发明申请

US20060045971A1 Segmented resist islands for photolithography on single sliders 失效
标题翻译：在单个滑块上用于光刻的分段抗蚀岛
公开(公告)号：US20060045971A1
公开(公告)日：2006-03-02
申请号：US10928038
申请日：2004-08-27
申请人： Cherngye Hwang , Kim Lee , Dennis McKean , Gary Suzuki
发明人： Cherngye Hwang , Kim Lee , Dennis McKean , Gary Suzuki
IPC分类号： B05D5/00
CPC分类号： G11B5/6005 , G11B5/3163 , G11B5/3173
摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.
摘要翻译：公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。

24. 发明申请

US20050264956A1 Novel rie defined CPP read heads 失效
标题翻译：新颖的定义了CPP读取头
公开(公告)号：US20050264956A1
公开(公告)日：2005-12-01
申请号：US10857095
申请日：2004-05-28
申请人： Kim Lee , Tsann Lin
发明人： Kim Lee , Tsann Lin
IPC分类号： G11B5/127 , G11B5/33 , G11B5/39
CPC分类号： G11B5/39
摘要： A magnetoresistive sensor having a trackwidth defined by AFM biasing layers disposed beneath a free layer of the sensor.
摘要翻译：具有由设置在传感器的自由层下方的AFM偏置层限定的轨道宽度的磁阻传感器。

25. 发明申请

US20050227184A1 Topographically defined thin film CPP read head fabrication 失效
标题翻译：图形定位薄膜CPP读头制造
公开(公告)号：US20050227184A1
公开(公告)日：2005-10-13
申请号：US10815447
申请日：2004-03-31
申请人： David Heim , Kim Lee , Tsann Lin , Jih-Shiuan Luo
发明人： David Heim , Kim Lee , Tsann Lin , Jih-Shiuan Luo
IPC分类号： G11B5/127 , G11B5/31
CPC分类号： B82Y10/00 , G11B5/3163 , Y10T29/49048 , Y10T403/58
摘要： A method of constructing a small trackwidth magnetorsesistive sensor by defining a trench between first and second hard bias layers and depositing the sensor into the trench.
摘要翻译：一种通过在第一和第二硬偏置层之间限定沟槽并将传感器沉积到沟槽中来构造小轨道磁体主动传感器的方法。

26. 发明申请

US20050135019A1 Thin film head reader with lead overlay a method of fabrication thereof 失效
标题翻译：具有铅覆盖的薄膜头读取器其制造方法
公开(公告)号：US20050135019A1
公开(公告)日：2005-06-23
申请号：US11053118
申请日：2005-02-07
申请人： Howard Zolla , Edward Lee , Kim Lee , Tsann Lin , Chun-Ming Wang
发明人： Howard Zolla , Edward Lee , Kim Lee , Tsann Lin , Chun-Ming Wang
IPC分类号： G11B5/31 , G11B5/39 , G11B5/33 , G11B5/127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3116 , G11B5/313 , G11B5/3163 , G11B5/3903 , G11B5/3909 , G11B2005/3996 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A magnetoresistive sensor having a well defined track width and method of manufacture thereof.
摘要翻译：具有良好限定的轨道宽度的磁阻传感器及其制造方法。

27. 发明申请

US20070048624A1 Magnetic recording head wiht overlaid leads 失效
标题翻译：磁记录头与重叠导线
公开(公告)号：US20070048624A1
公开(公告)日：2007-03-01
申请号：US11211877
申请日：2005-08-24
申请人： Tsung Chen , Frederick Dill , James Frietag , Kuok San Ho , Wipul Jayasekara , Kim Lee , Mustafa Pinarbasi , Ching Tsang , Pactrick Webb
发明人： Tsung Chen , Frederick Dill , James Frietag , Kuok San Ho , Wipul Jayasekara , Kim Lee , Mustafa Pinarbasi , Ching Tsang , Pactrick Webb
IPC分类号： G03H3/00 , G11B5/127
CPC分类号： G11B5/3932 , G11B5/3929 , G11B5/398 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： An embodiment of the invention is a magnetic head with overlaid lead pads that contact the top surface of the sensor between the hardbias structures and do not contact the hardbias structures which are electrically insulated from direct contact with the sensor. The lead pad contact area on the top of the sensor is defined by sidewall deposition of a conductive material to form leads pads on a photoresist prior to formation of the remainder of the leads. The conductive material for the lead pads is deposited at a shallow angle to maximize the sidewall deposition on the photoresist, then ion-milled at a high angle to remove the conductive material from the field while leaving the sidewall material. An insulation layer is deposited on the lead material at a high angle, then milled at a shallow angle to remove insulation from the sidewall.
摘要翻译：本发明的一个实施例是具有覆盖的引线焊盘的磁头，该焊盘在硬质合金结构之间接触传感器的顶表面，并且不接触与传感器直接接触的电绝缘的硬质合金结构。传感器顶部的引线焊盘接触区域由导电材料的侧壁沉积限定，以在形成其余引线之前在光致抗蚀剂上形成引线焊盘。用于引线焊盘的导电材料以浅角度沉积，以使光致抗蚀剂上的侧壁沉积最大化，然后以高角度离子研磨，以从外界移除导电材料，同时留下侧壁材料。绝缘层以高角度沉积在引线材料上，然后以浅角度铣削以除去与侧壁的绝缘。

28. 发明申请

US20060232882A1 P3 fabrication with NiFe and alumina mask using resist shrinking process 失效
标题翻译： P3使用抗蚀剂收缩工艺制备NiFe和氧化铝掩模
公开(公告)号：US20060232882A1
公开(公告)日：2006-10-19
申请号：US11110534
申请日：2005-04-19
申请人： Kim Lee , Jyh-Shuey Lo , Yi Zheng
发明人： Kim Lee , Jyh-Shuey Lo , Yi Zheng
IPC分类号： G11B5/147
CPC分类号： G11B5/3163 , G11B5/1278 , Y10T29/49043 , Y10T29/49048 , Y10T29/49052 , Y10T29/49071 , Y10T29/49073
摘要： A method for forming a P3 layer with NiFe and alumina mask using resist shrink process for use in perpendicular magnetic write heads. The method includes forming a laminated layer, forming an alumina layer on top of the laminated layer, depositing a conductive layer onto the laminated layer, forming a plating frame on a gap layer. The plating frame has a trench defined by plating track, the alumina, laminated and conductive layers each including an area below the trench. The method further includes shrinking the trench, plating NiFe into a portion of the shrunk trench, stripping the plating frame, removing the conductive layer except the conductive layer formed below the trench, removing the alumina layer except the alumina layer formed below the trench, removing the laminated layer except the laminated layer formed below the trench and patterning the laminated layer formed below the trench.
摘要翻译：用于使用用于垂直磁写头的抗蚀剂收缩工艺形成具有NiFe和氧化铝掩模的P3层的方法。该方法包括形成叠层，在叠层上形成氧化铝层，在层压层上沉积导电层，在间隙层上形成电镀框架。电镀框架具有由电镀轨道限定的沟槽，氧化铝，层压和导电层各自包括沟槽下方的区域。该方法还包括收缩沟槽，将NiFe电镀到收缩沟槽的一部分中，剥离电镀框架，除去形成在沟槽下方的导电层以外的导电层，除去形成在沟槽下方的氧化铝层以外的氧化铝层，除去除了形成在沟槽下方的层压层之外的层压层，并且对形成在沟槽下方的叠层进行图案化。

29. 发明申请

US20060165959A1 Contact magnetic transfer template 失效
公开(公告)号：US20060165959A1
公开(公告)日：2006-07-27
申请号：US11044777
申请日：2005-01-26
申请人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
发明人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
IPC分类号： B32B3/00
CPC分类号： G11B5/865 , G11B5/855 , Y10T428/24612
摘要： A contact magnetic transfer (CMT) master template has a flexible plastic film with a planarized top or upper surface containing magnetic islands separated from one another by nonmagnetic regions. The flexible plastic film is secured at its perimeter to a silicon annulus that provides rigid support at the perimeter of the film. The plastic film is preferably polyimide that has recesses filled with the magnetic material that form the pattern of magnetic islands. The upper surfaces of the islands and the upper surfaces of the nonmagnetic regions form a continuous planar surface. The nonmagnetic regions are formed of chemical-mechanical-polishing (CMP) stop layer material that remains after a CMP process has planarized the upper surface of the plastic film.

30. 发明申请

US20060010684A1 Methods of making magnetic write heads with use of linewidth shrinkage techniques 失效
标题翻译：使用线宽收缩技术制造磁头的方法
公开(公告)号：US20060010684A1
公开(公告)日：2006-01-19
申请号：US10881782
申请日：2004-06-30
申请人： Kim Lee , Jyh-Shuey Lo , Dennis McKean
发明人： Kim Lee , Jyh-Shuey Lo , Dennis McKean
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/3116 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes. Advantageously, the reduction in channel width using the resist channel shrinking film provides for self-alignment of the second pole piece with the pedestal which can be symmetrically notched for improved overwrite (OW) properties and reduced adjacent track interference (ATI).
摘要翻译：一种用于制造磁写头的方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成图案化抗蚀剂; 在图案化的抗蚀剂的通道内的第一极片层上电镀一个基座; 在图案化的抗蚀剂的通道内的基座上方电镀金属间隙层; 在图案化的抗蚀剂上形成抗蚀剂通道收缩膜; 在图案上烘烤抗蚀剂通道收缩膜，从而减小通道的宽度; 去除抗蚀剂通道收缩膜; 在图案化的抗蚀剂的减小宽度的通道内电镀第二极片; 去除图案化的抗蚀剂; 并使用第二极片作为掩模铣削基座，以形成具有倾斜斜面的侧壁的中心凹口底座。有利地，使用抗蚀剂通道收缩薄膜的通道宽度的减小提供了第二极靴与基座的自对准，该基座可对称切口以改善覆盖（OW）特性和减小的相邻轨道干涉（ATI）。

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