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1. 发明申请

US20050241138A1 Method of making a read sensor while protecting it from electrostatic discharge (ESD) damage 失效
标题翻译：制造读取传感器同时防止静电放电（ESD）损坏的方法
公开(公告)号：US20050241138A1
公开(公告)日：2005-11-03
申请号：US10835807
申请日：2004-04-30
申请人： Frederick Dill , Meng Ding , Kuok Ho , Jordan Katine , Scott MacDonald , Huey-Ming Tzeng
发明人： Frederick Dill , Meng Ding , Kuok Ho , Jordan Katine , Scott MacDonald , Huey-Ming Tzeng
IPC分类号： G11B5/187 , G11B5/31 , G11B5/39 , G11B5/40
CPC分类号： G11B5/3906 , G11B5/3163 , G11B5/40 , Y10T29/49021 , Y10T29/49043 , Y10T29/49048
摘要： A method of making a read sensor while protecting it from electrostatic discharge (ESD) damage involves forming a severable shunt during the formation of the read sensor. The method may include forming a resist layer over a plurality of read sensor layers; performing lithography with use of a mask to form the resist layer into a patterned resist which exposes left and right side regions over the read sensor layers as well as a shunt region; etching, with the patterned resist in place, to remove materials in the left and right side regions and in the shunt region; and depositing, with the patterned resist in place, left and right hard bias and lead layers in the left and right side regions, respectively, and in the shunt region for forming a severable shunt which electrically couples the left and right hard bias and lead layers together for ESD protection.
摘要翻译：制造读取传感器同时防止静电放电（ESD）损坏的方法包括在形成读取的传感器期间形成可分离的分流。该方法可以包括在多个读取传感器层上形成抗蚀剂层; 使用掩模执行光刻以将抗蚀剂层形成图案化的抗蚀剂，其在读取的传感器层以及分流区域上暴露左侧区域和右侧区域; 蚀刻，图案化抗蚀剂就位，以去除左右侧区域和分流区域中的材料; 并且分别在左侧区域和右侧区域以及分流区域中分别将图案化的抗蚀剂沉积在左侧和右侧的硬偏压和引线层，以形成可分离的分流器，其将左右硬偏压和引线层电耦合一起为ESD保护。

2. 发明申请

US20060165959A1 Contact magnetic transfer template 失效
公开(公告)号：US20060165959A1
公开(公告)日：2006-07-27
申请号：US11044777
申请日：2005-01-26
申请人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
发明人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
IPC分类号： B32B3/00
CPC分类号： G11B5/865 , G11B5/855 , Y10T428/24612
摘要： A contact magnetic transfer (CMT) master template has a flexible plastic film with a planarized top or upper surface containing magnetic islands separated from one another by nonmagnetic regions. The flexible plastic film is secured at its perimeter to a silicon annulus that provides rigid support at the perimeter of the film. The plastic film is preferably polyimide that has recesses filled with the magnetic material that form the pattern of magnetic islands. The upper surfaces of the islands and the upper surfaces of the nonmagnetic regions form a continuous planar surface. The nonmagnetic regions are formed of chemical-mechanical-polishing (CMP) stop layer material that remains after a CMP process has planarized the upper surface of the plastic film.

3. 发明申请

US20060163195A1 Method for making a contact magnetic transfer template 失效
标题翻译：制造接触磁传输模板的方法
公开(公告)号：US20060163195A1
公开(公告)日：2006-07-27
申请号：US11044288
申请日：2005-01-26
申请人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
发明人： Zvonimir Bandic , A. Erpelding , Jordan Katine , Quang Le , Kim Lee , Jui-Lung Li , Michael Rooks
IPC分类号： B44C1/22 , C23F1/00 , C03C25/68
CPC分类号： G11B5/865 , B82Y10/00 , C23F3/04 , C23F4/00 , G11B5/72 , G11B5/743 , G11B5/82 , G11B5/855 , Y10T29/4903 , Y10T29/49032
摘要： A contact magnetic transfer (CMT) master template is made by first adhering a plastic film to a first surface of a silicon wafer. A resist pattern is then formed on the polyimide film and the polyimide is reactive-ion-etched through the resist to form recesses. The resist is removed and a chemical-mechanical-polishing (CMP) stop layer is deposited over the non-recessed regions of the polyimide, and optionally into the bottoms of the recesses. A layer of magnetic material is then deposited over the polyimide film to fill the recesses. A CMP process is then performed to remove magnetic material above the recesses and above the non-recessed regions and continued until the CMP stop layer is reached. The resulting upper surface of the polyimide film is then a continuous planar film of magnetic islands and regions of CMP stop layer material that function as the nonmagnetic regions of the template.
摘要翻译：通过首先将塑料膜粘附到硅晶片的第一表面上来制造接触磁传递（CMT）主模板。然后在聚酰亚胺膜上形成抗蚀剂图案，并通过抗蚀剂反应离子蚀刻聚酰亚胺以形成凹陷。去除抗蚀剂，并在化学机械抛光（CMP）停止层上沉积在聚酰亚胺的非凹陷区域上，并且任选地沉积到凹部的底部中。然后将一层磁性材料沉积在聚酰亚胺膜上以填充凹部。然后执行CMP处理以除去凹部上方的磁性材料并且在非凹陷区域上方并继续直到达到CMP停止层。所得到的聚酰亚胺膜的上表面是磁性岛的连续平面膜和作为模板的非磁性区域的CMP停止层材料的区域。

4. 发明申请

US20070047154A1 CPP read sensors having constrained current paths made of lithographically-defined conductive vias and methods of making the same 有权
标题翻译： CPP读取具有由光刻定义的导电通孔制成的约束电流路径的传感器及其制造方法
公开(公告)号：US20070047154A1
公开(公告)日：2007-03-01
申请号：US11219108
申请日：2005-09-01
申请人： Jeffrey Childress , Jordan Katine
发明人： Jeffrey Childress , Jordan Katine
IPC分类号： G11B5/127 , G11B5/33
CPC分类号： H01F41/308 , B82Y25/00 , B82Y40/00 , G11B5/3163 , G11B5/398 , H01L43/12 , Y10T29/49032 , Y10T29/49041
摘要： Current-perpendicular-to-planes (CPP) read sensors for magnetic heads having constrained current paths made of lithographically-defined conductive vias, and methods of making the same, are disclosed. In one illustrative example, a sensor stack structure which includes an electrically conductive spacer layer is formed over a first shield layer. An insulator layer is deposited over and adjacent the spacer layer, and a resist structure which exposes one or more portions of the insulator layer is formed over the insulator layer. With the resist structure in place, the exposed insulator layer portions are removed by etching to form one or more apertures through the insulator layer down to the spacer layer. Electrically conductive materials are subsequently deposited within the one or more apertures to form one or more lithographically-defined conductive vias of a current-constraining structure. Advantageously, such lithographically-defined conductive vias increase the current density in the active sensing region of the read sensor to thereby simultaneously increase its resistance and magnetoresistance. The size and number of vias may be varied and selected so as to precisely “tune” the sensor's resistance and magnetoresistance.
摘要翻译：公开了具有由光刻定义的导电通孔制成的约束电流路径的磁头的电流垂直平面（CPP）读取传感器及其制造方法。在一个说明性示例中，包括导电间隔层的传感器堆叠结构形成在第一屏蔽层上。绝缘体层沉积在间隔层之上并与其相邻，并且在绝缘体层上形成暴露绝缘体层的一个或多个部分的抗蚀剂结构。在抗蚀剂结构就位的情况下，通过蚀刻去除暴露的绝缘体层部分，以形成穿过绝缘体层的一个或多个孔直到间隔层。导电材料随后沉积在一个或多个孔内以形成电流约束结构的一个或多个光刻定义的导电通孔。有利地，这种光刻定义的导电通孔增加读取传感器的有源感测区域中的电流密度，从而同时增加其电阻和磁阻。可以改变和选择通孔的尺寸和数量，以精确地“调谐”传感器的电阻和磁阻。

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