会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明授权
    • Integrated circuit testing apparatus and method
    • 集成电路测试仪器及方法
    • US08378698B2
    • 2013-02-19
    • US12798605
    • 2010-04-07
    • Jae-Young ChoiChang-Hyun Cho
    • Jae-Young ChoiChang-Hyun Cho
    • G01R31/20
    • G01R31/318511
    • A testing apparatus includes a test controller configured to output a plurality of chip selection signals for selecting chips to be tested from among a plurality of chips, a plurality of first control signals for controlling supply of a power supply voltage to the chips selected by the chip selection signals, and a plurality of second control signals for controlling receiving of test voltages output from the chips supplied with the power supply voltage, and a probe card including one or more test blocks each having a plurality of signal transmitters configured to respectively transfer the power supply voltage to the corresponding chips in response to the different first control signals and respectively apply the test voltages output from the corresponding chips to the test controller in response to the different second control signals.
    • 测试装置包括:测试控制器,被配置为从多个芯片中输出用于选择要测试的芯片的多个芯片选择信号;多个第一控制信号,用于控制向由芯片选择的芯片提供的电源电压 选择信号和多个第二控制信号,用于控制从提供有电源电压的芯片输出的测试电压的接收;以及探针卡,其包括一个或多个测试块,每个测试块具有多个信号发射机,其被配置为分别传输功率 响应于不同的第一控制信号向相应的芯片提供电压,并且响应于不同的第二控制信号分别将从相应芯片输出的测试电压施加到测试控制器。
    • 23. 发明授权
    • Method of forming self-aligned inner gate recess channel transistor
    • 形成自对准内门凹沟道晶体管的方法
    • US07670910B2
    • 2010-03-02
    • US11641845
    • 2006-12-20
    • Ji-Young KimChang-Hyun ChoSoo-Ho ShinTae-Young Chung
    • Ji-Young KimChang-Hyun ChoSoo-Ho ShinTae-Young Chung
    • H01L21/336
    • H01L21/28114H01L29/42376H01L29/66553H01L29/66621H01L29/7834
    • A self-aligned inner gate recess channel in a semiconductor substrate includes a recess trench formed in an active region of the substrate, a gate dielectric layer formed on a bottom portion of the recess trench, recess inner sidewall spacers formed on sidewalls of the recess trench, a gate formed in the recess trench so that an upper portion of the gate protrudes above an upper surface of the substrate, wherein a thickness of the recess inner sidewall spacers causes a center portion of the gate to have a smaller width than the protruding upper portion and a lower portion of the gate, a gate mask formed on the gate layer, gate sidewall spacers formed on the protruding upper portion of gate and the gate mask, and a source/drain region formed in the active region of the substrate adjacent the gate sidewall spacers.
    • 半导体衬底中的自对准内门凹槽通道包括形成在衬底的有源区中的凹槽,形成在凹槽的底部的栅介电层,形成在凹槽沟槽的侧壁上的凹陷内侧壁 形成在所述凹槽中的栅极,使得所述栅极的上部突出于所述基板的上表面之上,其中所述凹陷内侧壁间隔物的厚度使得所述栅极的中心部分具有比所述突出的上部 栅极的部分和下部,形成在栅极层上的栅极掩模,形成在栅极的突出上部上的栅极侧壁间隔物和栅极掩模,以及形成在邻近基板的基板的有源区域中的源极/漏极区域 门侧壁间隔件。
    • 28. 发明申请
    • Self-aligned buried contact pair
    • 自对准埋地接触对
    • US20060205147A1
    • 2006-09-14
    • US11430036
    • 2006-05-09
    • Cheol-Ju YunChang-Hyun ChoTae-Young Chung
    • Cheol-Ju YunChang-Hyun ChoTae-Young Chung
    • H01L21/8242
    • H01L21/76897H01L27/10814H01L27/10855H01L27/10885H01L28/91
    • A self-aligned buried contact (BC) pair includes a substrate having diffusion regions; an oxide layer exposing a pair of diffusion regions formed on the substrate; bit lines formed between adjacent diffusion regions and on the oxide layer, each of the bit lines having bit line sidewall spacers formed on sidewalls thereof; a first interlayer dielectric (ILD) layer formed over the bit lines and the oxide layer; a pair of BC pads formed between adjacent bit lines and within the first ILD layer, each BC pad being aligned with one of the pair of exposed diffusion regions in the substrate; and a pair of capacitors, each of the pair of BC pads having one of the pair of capacitors formed thereon, wherein a pair of the bit line sidewall spacers is adjacent to each of the BC pads and the pair of bit line sidewall spacers has an asymmetrical shape.
    • 自对准埋层接触(BC)对包括具有扩散区域的衬底; 暴露形成在所述基板上的一对扩散区域的氧化物层; 在相邻扩散区之间和氧化物层上形成的位线,每个位线在其侧壁上形成有位线侧壁间隔物; 形成在位线和氧化物层上的第一层间电介质(ILD)层; 一对BC焊盘,形成在相邻位线之间并在第一ILD层内,每个BC焊盘与衬底中一对暴露的扩散区域中的一个对准; 和一对电容器,所述一对BC焊盘中的每一对具有形成在其上的一对电容器中的一个,其中一对位线侧壁间隔件与每个BC焊盘相邻,并且所述一对位线侧壁间隔件具有 不对称形状。