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    • 21. 发明申请
    • Integrated Circuit and Method for Trainable Control and Operation of DC Motor
    • 直流电机可编程控制和运行的集成电路及方法
    • US20050196156A1
    • 2005-09-08
    • US10906629
    • 2005-02-28
    • Andrew Carlson
    • Andrew Carlson
    • H02P5/06
    • H02P7/28
    • A method and device for control of a low-cost DC motor such as that suitable for portable or battery-powered applications are disclosed such that an intended behavior for the motor may be programmed without reliance on external equipment or specific expertise. The invention enables programming of a motor controlling device by means of physical manipulation of the motor. In other words, the invention allows for the training of a motor by demonstrating the intended behavior for the motor. The invention specifies a method of parsing an observation of the motor system into storable commands, while preserving information on motor response and conditions for execution. A motor controller device comprising an implementation of this method is also presented.
    • 公开了一种用于控制诸如适用于便携式或电池供电应用的低成本DC电动机的方法和装置,使得可以在不依赖于外部设备或特定专门知识的情况下编程电动机的预期行为。 本发明能够通过电动机的物理操纵对电动机控制装置进行编程。 换句话说,本发明允许通过展示电动机的预期行为来训练电动机。 本发明规定了将电动机系统的观测解析为可存储命令的方法,同时保留关于电动机响应和执行条件的信息。 还提出了包括该方法的实现的电动机控制器装置。
    • 22. 发明申请
    • Reduction of thermal non-cyclic error effects in interferometers
    • 降低干涉仪中的热非循环误差效应
    • US20050094155A1
    • 2005-05-05
    • US10879681
    • 2004-06-28
    • Henry HillMichael SchroederAndrew Carlson
    • Henry HillMichael SchroederAndrew Carlson
    • G01B9/02G03F7/20
    • G01B9/02049G01B9/02003G01B2290/70G03F7/70775G03F7/70858
    • In general, in one aspect, the invention features an interferometer assembly for use in a lithography tool used for fabricating integrated circuits on a wafer, wherein the lithography tool includes a support structure and a stage for positioning the wafer relative to the support structure, the interferometer assembly including an interferometer configured to direct a measurement beam between the stage and the support structure and combine the measurement beam with another beam to form an output beam which includes a phase related to a position of the stage relative to the support structure, wherein the interferometer is mechanically secured to the lithography tool through an interferometer surface selected to cause the phase of the output beam to be insensitive to thermal changes of the interferometer over a range of temperatures.
    • 通常,在一个方面,本发明的特征在于一种用于在用于在晶片上制造集成电路的光刻工具中使用的干涉仪组件,其中所述光刻工具包括支撑结构和用于相对于支撑结构定位晶片的台, 干涉仪组件,包括干涉仪,其被配置为将测量光束引导在所述平台和所述支撑结构之间并且将所述测量光束与另一个光束组合以形成输出光束,所述输出光束包括与所述平台相对于所述支撑结构的位置相关的相位,其中, 干涉仪通过干涉仪表面被机械地固定到光刻工具,所述干涉仪表面被选择为使得输出光束的相位对于干涉仪在一定温度范围内的热变化不敏感。
    • 26. 发明申请
    • Interferometers and systems using interferometers
    • 使用干涉仪的干涉仪和系统
    • US20050195404A1
    • 2005-09-08
    • US11071878
    • 2005-03-03
    • Andrew Carlson
    • Andrew Carlson
    • G01B9/02G03F7/20H01L21/027
    • G01B9/02059G01B9/02002G01B9/02018G01B2290/70G03F7/70775
    • In general, in one aspect, the invention features apparatus that include an interferometer including a main assembly having two laterally displaced polarizing beam splitter interfaces, wherein the interfaces are positioned to receive two spatially separated beams and direct them each to make at least two passes to one or more remote objects. Each interface reflects and transmits each beam at least once, and the interferometer is configured to combine the two beams after they make the at least two passes to the one or more remote objects to produce an output beam including information about an optical path length difference between paths traveled by the two beams.
    • 通常,在一个方面,本发明的特征在于包括干涉仪的装置,所述干涉仪包括具有两个横向偏移的偏振分束器接口的主组件,其中所述界面被定位成接收两个空间上分离的光束,并将它们引导至少两次, 一个或多个远程对象。 每个接口反映并发射每个波束至少一次,并且干涉仪被配置为在两个波束进行至少两次传递到一个或多个远程对象之后组合两个波束以产生输出波束,该输出波束包括关于光路长度差的信息 由两个梁行进的路径。