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    • 23. 发明授权
    • Method of producing semiconductor light-emitting element
    • 半导体发光元件的制造方法
    • US06395572B1
    • 2002-05-28
    • US09518504
    • 2000-03-03
    • Tsuyoshi TsutsuiKotaro Ogura
    • Tsuyoshi TsutsuiKotaro Ogura
    • H01L2100
    • H01L33/22
    • Semiconductor light-emitting elements are produced by providing a wafer substrate of GaP, epitaxially growing on this substrate a semiconductor layered structure including an n-type layer and a p-type layer of GaP for providing a light-emitting layer, forming top electrodes on the semiconductor layered structure each over a portion of the area corresponding to one of the chips into which the substrate is to be later divided, forming a bottom electrode on the bottom surface of the substrate, dicing the wafer substrate into the individual chips, and thereafter carrying out a surface-roughening process on externally exposed portions of the semiconductor structure by means of hydrochloric acid. Each of the top electrodes is of a three-layer structure with a contact metal layer which may be of an alloy of Au and makes an ohmic contact with the GaP of the semiconductor layered structure, a Mo layer on the contact metal layer and an Au layer on the Mo layer.
    • 半导体发光元件是通过提供GaP晶片衬底,在该衬底上外延生长的半导体层状结构,包括n型层和用于提供发光层的GaP的p型层,形成顶部电极 将半导体分层结构分别与对应于要分离基板的芯片之一对应的区域的一部分上,在基板的底面上形成底部电极,将晶片基板切割成各个芯片,之后 通过盐酸对半导体结构的外露部分进行表面粗糙化处理。 每个顶电极具有三层结构,其接触金属层可以是Au的合金,并与半导体层状结构的GaP,欧姆接触,接触金属层上的Mo层和Au Mo层上。
    • 24. 发明授权
    • Method for manufacturing semiconductor light emitting device
    • 半导体发光元件的制造方法
    • US06248607B1
    • 2001-06-19
    • US09391624
    • 1999-09-07
    • Tsuyoshi Tsutsui
    • Tsuyoshi Tsutsui
    • H01L2100
    • H01L33/0095H01L33/007Y10S438/906Y10S438/909
    • In a method for manufacturing semiconductor light emitting device, when a gallium nitride based compound semiconductor layers which include at least an n-type layer and p-type layer and which form a light emitting layer, are laminated on a substrate and heat treatment is performed for activation of the p-type layer of the laminated semiconductor layers, the heat treatment is performed under an atmosphere including oxygen. With this arrangement, the heat treatment for activating the p-type layer of the laminated semiconductor layers comprising gallium nitride based compound semiconductor can be performed in a short time and moreover to reliably perform activation.
    • 在制造半导体发光器件的方法中,当将至少包含n型层和p型层并形成发光层的氮化镓基化合物半导体层层叠在基板上并进行热处理时 为了激活层叠半导体层的p型层,在包括氧的气氛下进行热处理。 通过这种布置,可以在短时间内执行用于激活包含氮化镓基化合物半导体的层叠半导体层的p型层的热处理,而且可靠地进行激活。
    • 25. 发明授权
    • Method of manufacturing a semiconductor light emitting device
    • 制造半导体发光器件的方法
    • US06168962A
    • 2001-01-02
    • US09012193
    • 1998-01-23
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • H01L21302
    • H01L33/0095
    • Disclosed is a method of manufacturing a semiconductor light emitting device. Semiconductor overlying layers are formed on a substrate in a state of a wafer so that a light emitting area is provided therein. The semiconductor overlying layers includes first and second conductivity type layers. Part of the semiconductor overlying layers including the first conductivity type layer on a surface thereof is removed so as to expose part of the second conductivity type layer. Electrodes are formed, for each chip, respectively in connection with the surface of the first conductivity type layer and the surface of the exposed second conductivity type layer. The wafer is divided into individual chips. The exposed areas of the second conductivity type semiconductor layer is provided only part of a peripheral area of the chip so that the first conductivity type semiconductor layer is directly separated during dividing the wafer into individual chips. With such a method, when dividing a wafer into chips, the inefficiency of the space (etched areas do not contribute to light emission) is eliminated in etch-removing the semiconductor overlying layers at areas to be divided, thereby improving chip yield and hence reducing cost.
    • 公开了半导体发光器件的制造方法。 在晶片的状态下在基板上形成半导体覆盖层,以便在其中提供发光区域。 半导体覆盖层包括第一和第二导电类型层。 除去包括其表面上的第一导电类型的半导体覆盖层的一部分,以暴露部分第二导电类型层。 对于每个芯片,分别与第一导电类型层的表面和暴露的第二导电类型层的表面分别形成电极。 晶片分为单个芯片。 第二导电类型半导体层的暴露区域仅提供芯片的周边区域的一部分,使得在将晶片分成单个芯片期间,第一导电类型半导体层被直接分离。 通过这样的方法,当将晶片分成芯片时,在要分割的区域上的半导体覆盖层的蚀刻去除中消除了空间(蚀刻区域对光发射没有贡献)的低效率,从而提高了芯片产量并因此降低了 成本。