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    • 21. 发明申请
    • OPTICAL TOMOGRAPHIC IMAGE PHOTOGRAPHING APPARATUS AND CONTROL METHOD THEREFOR
    • 光学图像摄影装置及其控制方法
    • US20120229763A1
    • 2012-09-13
    • US13405678
    • 2012-02-27
    • Nobuhito SuehiraTomoyuki Makihira
    • Nobuhito SuehiraTomoyuki Makihira
    • A61B3/14H04N7/18
    • A61B3/102G01B9/0203G01B9/02077G01B9/02091G06T7/246G06T2207/10101G06T2207/30041
    • An optical tomographic image photographing apparatus having a tracking function, capable of appropriately controlling a scan in acquiring a tomographic image. The optical tomographic image photographing apparatus according to the invention includes a fundus image photographing section which photographs fundus images of an eye to be inspected and a tomographic image photographing section which photographs tomographic images of the eye to be inspected. A control method of the optical tomographic image photographing apparatus includes the steps of: calculating coordinate values matching a plurality of previously-acquired characteristic areas in the fundus image; calculating a spatial variation between the plurality of coordinate values; and controlling the scan of a measuring light by the tomographic image photographing section for acquiring the tomographic images on the basis of a result of the calculation.
    • 一种具有跟踪功能的光学断层图像拍摄设备,能够适当地控制在获取断层图像时的扫描。 根据本发明的光学断层图像拍摄装置包括拍摄要检查的眼睛的眼底图像的眼底图像拍摄部和拍摄要检查的眼睛的断层图像的断层图像拍摄部。 光学断层图像拍摄装置的控制方法包括以下步骤:计算与眼底图像中的多个先前获取的特征区域匹配的坐标值; 计算所述多个坐标值之间的空间变化; 以及通过断层图像摄影部分控制测量光的扫描,以根据计算结果获取断层图像。
    • 22. 发明授权
    • Imprint method and process for producing a chip that change a relative position between a member to be processed and a support portion
    • 用于制造改变要处理的构件和支撑部分之间的相对位置的芯片的压印方法和工艺
    • US08246887B2
    • 2012-08-21
    • US11876058
    • 2007-10-22
    • Junichi SekiMasao MajimaNobuhito Suehira
    • Junichi SekiMasao MajimaNobuhito Suehira
    • B28B5/02B28B11/08B29C59/00B29C59/02
    • G03F7/0002B82Y10/00B82Y40/00
    • An imprint method includes (i) holding a mold by a first holding portion, (ii) holding, by a second holding portion, a member to be processed so that the member to be processed is capable of bending by its own weight, (iii) supporting, by a support portion, a back surface of the member to be processed in a first area so that an amount of the bending is decreased, (iv) pressing a pattern of the mold against a front surface of the member to be processed, which is supported by the support portion in the first area, (v) supporting, by the support portion, the back surface of the member to be processed in a second area different from the first area, so that the amount of the bending is decreased, by changing a relative position between the member to be processed and the support portion, and (vi) pressing the pattern of the mold against the front surface of the member to be processed, which is supported by the support portion in the second area.
    • 压印方法包括:(i)通过第一保持部分保持模具,(ii)通过第二保持部分保持待加工的部件,使得待加工的部件能够通过其自重来弯曲,(iii )通过支撑部分在第一区域中支撑待加工构件的后表面,使得弯曲量减少,(iv)将模具的图案压靠在待处理构件的前表面上 ,其由所述第一区域中的支撑部支撑,(v)由所述支撑部分在与所述第一区域不同的第二区域中支撑待加工构件的后表面,使得弯曲量为 通过改变要处理的构件与支撑部之间的相对位置来减小,以及(vi)将模具的图案压靠在被处理构件的前表面上,该构件由第二区域中的支撑部分支撑 。
    • 23. 发明申请
    • TOMOGRAPHIC IMAGING APPARATUS AND PHOTOGRAPHING METHOD
    • TOMOGRAPHIC成像设备和摄影方法
    • US20120189184A1
    • 2012-07-26
    • US13282778
    • 2011-10-27
    • Kazuhiro MatsumotoNobuhito SuehiraNobuhiro Tomatsu
    • Kazuhiro MatsumotoNobuhito SuehiraNobuhiro Tomatsu
    • G06K9/00
    • A61B3/102
    • Provided is a tomographic imaging apparatus including: a light source; an optical splitter unit for splitting light from the light source into reference light and measuring light; a reference optical system including an adjustment unit for adjusting an optical path length of the reference light; a spectral unit for spectrally splitting combined light of the reference light and the return light obtained by irradiating an object to be inspected with the measuring light so as to acquire an interfering signal; a detection unit for detecting an optical path length when a tomographic image of the object is photographed; a storage unit for recording data about a refractive index of a refracting element of the object; and a calculation unit for calculating image data from the interfering signal acquired by the spectral unit based on an actual size using data about the optical path length and the refractive index.
    • 本发明提供一种断层成像装置,包括:光源; 光分路器单元,用于将来自光源的光分成参考光和测量光; 参考光学系统,包括用于调整参考光的光路长度的调整单元; 光谱单元,用于光谱分解参考光的合成光和通过用测量光照射被检查物体而获得的返回光,以获得干扰信号; 检测单元,用于当拍摄对象的断层图像时检测光程长度; 用于记录关于物体的折射元件的折射率的数据的存储单元; 以及计算单元,用于使用关于光程长度和折射率的数据,基于实际大小从由光谱单元获取的干扰信号计算图像数据。
    • 28. 发明申请
    • Multilayer Structure Measuring Method and Multilayer Structure Measuring Apparatus
    • 多层结构测量方法和多层结构测量仪器
    • US20100007894A1
    • 2010-01-14
    • US12487026
    • 2009-06-18
    • Nobuhito Suehira
    • Nobuhito Suehira
    • G01B11/02
    • A61B3/1005A61B3/102G01B9/02044G01B9/02057G01B9/02091G01B11/0625G01B11/0675
    • A tomographic image measuring method according to the present invention includes a first step of calculating information corresponding to an optical distance of each layer thickness from a wave-number spectrum, a second step of separating and extracting information of each layer from the information corresponding to the optical distance of each layer thickness, a third step of reconverting information of each layer into a wave-number spectrum, respectively, a fourth step of obtaining a interference wave number from the result of the-third step, a fifth step of calculating an order of interference from the interference wave number and the optical distance of each layer; and a sixth step of calculating the optical distance of each layer by making use of the fact that the order of interference is an integer. Thus, when discrete Fourier transform is used, the measuring precision of layers is improved.
    • 根据本发明的断层图像测量方法包括:第一步骤,从与波数谱相关联的每层厚度的光学距离计算信息;第二步骤,从与 每层厚度的光学距离,第三步骤,将每层的信息分别转换为波数谱;第四步骤,从第三步骤的结果中获得干扰波数;第五步骤,计算顺序 来自干扰波数和每层光学距离的干扰; 以及通过利用干扰顺序为整数的事实来计算每层的光学距离的第六步骤。 因此,当使用离散傅里叶变换时,层的测量精度提高。
    • 29. 发明授权
    • Processing apparatus, processing method, and process for producing chip
    • 加工设备,加工方法和生产芯片的工艺
    • US07635260B2
    • 2009-12-22
    • US11448033
    • 2006-06-07
    • Junichi SekiMasao MajimaNobuhito Suehira
    • Junichi SekiMasao MajimaNobuhito Suehira
    • B29C43/58B29C59/02
    • G03F7/0002B82Y10/00B82Y40/00
    • An imprint apparatus for forming an imprinted pattern on a member to be processed or a pattern forming material on the member to be processed by using a mold having a pattern. The apparatus includes a first holding portion for holding the mold, a second holding portion for holding the member to be processed, and a support portion for partially supporting the member to be processed at a position opposite to the mold held by the first holding portion. The second holding portion is movable in a direction of a first axis and a direction of a second axis and is also movable in a direction parallel to a plane defined by the first axis and the second axis so that the position at which the support portion supports the member to be processed is changed. The support portion is movable, independently of the first holding portion, perpendicularly to the plane so that the support portion is moved apart from the member to be processed, and the support portion is also movable perpendicularly to the plane so as to support the member to be processed.
    • 一种压印装置,用于通过使用具有图案的模具在要加工的构件上形成压印图案或图案形成材料。 该装置包括用于保持模具的第一保持部分,用于保持待处理部件的第二保持部分和用于在与由第一保持部分保持的模具相对的位置处部分地支撑待加工部件的支撑部分。 第二保持部分可沿第一轴线和第二轴线的方向移动,并且也可以在平行于由第一轴线和第二轴线限定的平面的方向上移动,使得支撑部分支撑的位置 要处理的成员被更改。 所述支撑部分可独立于所述第一保持部分而与所述平面垂直地移动,使得所述支撑部分移动离开所述待处理部件,并且所述支撑部分也可垂直于所述平面移动,以便将所述部件支撑到 被处理。
    • 30. 发明申请
    • IMPRINT APPARATUS, IMPRINT METHOD, AND MOLD FOR IMPRINT
    • 印刷装置,印刷方法和模具用于印刷
    • US20090283938A1
    • 2009-11-19
    • US12509996
    • 2009-07-27
    • Nobuhito SuehiraJunichi SekiHideki Ina
    • Nobuhito SuehiraJunichi SekiHideki Ina
    • B29C59/16B29C35/08
    • G03F7/0002B29C35/08B29C59/16B82Y10/00B82Y40/00G01B11/14G03F9/703G03F9/7042G03F9/7065
    • An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.
    • 用于将模具图案压印到基板或基板上的部件上的压印装置包括用于照射与基板相对设置的模具表面和基板的表面的光源; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器,用于分析模具表面与基板表面之间的距离。 分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。