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11. 发明授权

US09494875B2 Chuck, a chuck control system, a lithography apparatus and a method of using a chuck 有权
标题翻译：卡盘，卡盘控制系统，光刻设备和使用卡盘的方法
公开(公告)号：US09494875B2
公开(公告)日：2016-11-15
申请号：US14349900
申请日：2012-09-19
申请人： ASML Netherlands B.V.
发明人： Sebastiaan Maria Johannes Cornelissen , Noud Jan Gilissen , Anko Jozef Cornelus Sijben , Roger Wilhelmus Antonius Henricus Schmitz , Arnoud Willem Notenboom , Ronald Van Der Wilk , Manon Elise Will
IPC分类号： G03F7/20 , H01L21/683 , G10L15/08 , G10L15/22
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70875 , G03F7/70908 , G10L15/08 , G10L2015/223 , H01L21/6831
摘要： A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.
摘要翻译：公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48）用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于由于施加到驱动电极的电压而减少或防止温度调节流体通道中温度调节流体的电场的发展，以便减少或防止流体中的电解。

12. 发明申请

US20160306285A1 METHOD OF OVERLAY IN EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY 有权
标题翻译：超极紫外（EUV）光刻法的覆盖方法
公开(公告)号：US20160306285A1
公开(公告)日：2016-10-20
申请号：US15191831
申请日：2016-06-24
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Chia-Ching Huang , Chia-Hao Hsu , Chia-Chen Chen
IPC分类号： G03F7/20 , C23C16/56 , C23C16/04 , H01L21/683 , C23C16/34
CPC分类号： G03F7/70708 , C23C16/042 , C23C16/34 , C23C16/56 , G03F7/70633 , G03F7/70783 , H01L21/6833 , Y10T29/49155
摘要： The present disclosure relates to a deformable reticle chuck. In some embodiments, an extreme ultraviolet (EUV) deformable reticle chuck has a substrate of insulating material with a plurality of protrusions extending outward from a first side of the substrate. A resistive material is arranged along a second side of the substrate below the plurality of protrusions. The resistive material is configured to expand in response to an applied current or voltage to adjust a shape of a reticle.
摘要翻译：本公开涉及可变形的光罩卡盘。在一些实施例中，极紫外（EUV）可变形标线卡盘具有绝缘材料的基底，其具有从基底的第一侧向外延伸的多个突起。电阻材料沿着多个突起下方的衬底的第二侧布置。电阻材料被配置为响应于所施加的电流或电压而膨胀以调整掩模版的形状。

13. 发明授权

US09436100B2 Exposure machine 有权
标题翻译：曝光机
公开(公告)号：US09436100B2
公开(公告)日：2016-09-06
申请号：US14087806
申请日：2013-11-22
申请人： Boe Technology Group Co., Ltd. , Chengdu Boe Optoelectronics Technology Co., Ltd.
发明人： Zhong Lu , ByungChun Lee , Lijuan Huang , Fujiang Jin
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70708 , G03F7/2008
摘要： Disclosed is exposure machine, comprising: a loading frame, for placing an object to be exposed; a light source device, located at one side of a plane where the loading frame is positioned, wherein the light emitting direction of the light source device is perpendicular to a plane where the object to be exposed is positioned. During exposure, the loading frame will not reflect the light transmitting through the object to be exposed, and thus the stage spots are avoided. Further, when the exposure machine is operated in a vertical manner, a bidirectional exposure may be achieved only by adding a single prism into the light source device in the prior art, and thus the exposure efficiency is greatly improved.
摘要翻译：公开了一种曝光机，包括：装载框架，用于放置待曝光的物体; 光源装置，位于装载框架所在的平面的一侧，其中光源装置的发光方向垂直于要暴露的物体所在的平面。在曝光期间，装载框架不会反射透过待曝光物体的光线，从而避免舞台光斑。此外，当曝光机以垂直方式操作时，可以仅通过在现有技术中向光源装置中添加单个棱镜来实现双向曝光，因此大大提高了曝光效率。

14. 发明授权

US09429857B2 Electrostatic clamp, lithographic apparatus and method 有权
标题翻译：静电夹，光刻设备及方法
公开(公告)号：US09429857B2
公开(公告)日：2016-08-30
申请号：US14395979
申请日：2013-03-19
申请人： ASML Netherlands B.V.
发明人： Ronald Van Der Wilk , Roger Wilhelmus Antonius Henricus Schmitz , Arnoud Willem Notenboom , Manon Elise Will
IPC分类号： G03B27/52 , G03F7/20 , H01L21/683
CPC分类号： G03F7/70708 , G03F7/70875 , H01L21/6831
摘要： An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.
摘要翻译：一种构造成保持物体的静电夹具（21），所述静电夹具包括电极（24），由位于所述电极上的电阻材料形成的电阻部分（23）和由电介质材料形成的电介质部分位于电阻部分上。

15. 发明授权

US09366973B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09366973B2
公开(公告)日：2016-06-14
申请号：US13983203
申请日：2011-12-20
申请人： David Christopher Ockwell , Noud Jan Gilissen
发明人： David Christopher Ockwell , Noud Jan Gilissen
IPC分类号： G03F7/20 , H01H13/83 , H01H13/704 , H01H13/7065 , H01H3/12 , H01H13/86
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70733 , H01H3/125 , H01H13/704 , H01H13/7065 , H01H13/83 , H01H13/86 , H01H2219/036 , H01H2219/064 , H01H2221/03 , H01H2223/036 , H01H2227/028 , H01L21/6831 , H01L21/6833 , H01L21/6875 , Y10T29/49826
摘要： A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.
摘要翻译：为光刻设备提供衬底支撑件。支撑件包括被构造成保持衬底和用于衬底台的卡盘的衬底台。在操作中，基板台被卡盘支撑并夹紧。衬底支撑件包括在支撑块的表面上的第一组毛刺，用于在夹紧过程中抵靠衬底台，并且在衬底台的表面上具有第二组毛刺，用于在夹紧期间抵靠支撑块。

16. 发明申请

US20150261104A1 ELECTROSTATIC CHUCK CLEANER, CLEANING METHOD, AND EXPOSURE APPARATUS 有权
标题翻译：静电清洗机，清洁方法和曝光装置
公开(公告)号：US20150261104A1
公开(公告)日：2015-09-17
申请号：US14466250
申请日：2014-08-22
申请人： KABUSHIKI KAISHA TOSHIBA
发明人： TAKASHI KAMO , YOSHIHITO KOBAYASHI
IPC分类号： G03F7/20 , B08B7/00 , H02N13/00
CPC分类号： G03F7/70708 , G03F7/70925
摘要： According to one embodiment, an electrostatic chuck cleaner cleaning an adsorption face of an electrostatic chuck capable of attracting a reticle, and the cleaner includes: a plurality of substrates; adhesive layers provided on a major surface of each of the substrates, the adhesive layers being pressed against the adsorption face; and conductive layers provided on the major surface of each of the substrates, and the conductive layers being provided in a region other than a region where the adhesive layer being provided. The adhesive layers provided on the major surface of each of the substrates are disposed in different regions, and the entire adsorption face is pressed by the adhesive layers when the adhesive layers of the substrates are pressed against the adsorption face.
摘要翻译：根据一个实施例，一种能够吸收能够吸引掩模版的静电卡盘的吸附面的静电卡盘清洁器，并且所述清洁器包括：多个基板; 粘合剂层设置在每个基材的主表面上，粘合剂层压在吸附面上; 以及设置在每个基板的主表面上的导电层，并且导电层设置在除了设置有粘合剂层的区域之外的区域中。设置在各基板的主表面上的粘合层设置在不同的区域中，并且当基板的粘合剂层压在吸附面上时，整个吸附面被粘合层挤压。

17. 发明申请

US20150131072A1 LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION 有权
标题翻译：用于改进的覆盖度校正的低接触式印刷机
公开(公告)号：US20150131072A1
公开(公告)日：2015-05-14
申请号：US14536069
申请日：2014-11-07
申请人： CANON NANOTECHNOLOGIES, INC. , TOSHIBA CORPORATION
发明人： Mario Johannes Meissl , Anshuman Cherala , Byung-Jin Choi , Seth J. Bamesberger
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/0002
摘要： Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
摘要翻译：提供了压印光刻模板卡盘以及相当的系统和方法，其基本上保持了结构支撑功能，同时显着提高了压印质量功能。卡盘结合动态真空密封件，以便在对准和失真校正期间大大减少模板接触，同时在分离时仍然提供良好的结构支撑。

18. 发明申请

US20150124234A1 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板保持器，平面设备和器件制造方法
公开(公告)号：US20150124234A1
公开(公告)日：2015-05-07
申请号：US14390973
申请日：2013-03-19
申请人： ASML Netherlands B.V.
发明人： Raymond Wilhelmus Louis Lafarre , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg , Harmeet Singh
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/70708 , H01L21/6831 , H01L21/6875
摘要： A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned.
摘要翻译：一种用于光刻设备的衬底保持器，所述衬底保持器包括：具有表面的主体; 从表面突出并具有用于支撑基板的端面的多个毛刺; 以及在所述主体表面上的薄膜堆叠并形成电气部件，所述薄膜叠层具有导电层，所述导电层被配置为基本上均匀地分布电荷，所述导电层在导电层所位于的堆叠的整个平面内。

19. 发明申请

US20150077733A1 Method of Overlay In Extreme Ultra-Violet (EUV) Lithography 有权
标题翻译：极紫外（EUV）平版印刷方法
公开(公告)号：US20150077733A1
公开(公告)日：2015-03-19
申请号：US14029844
申请日：2013-09-18
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Chia-Ching Huang , Chia-Hao Hsu , Chia-Chen Chen
IPC分类号： G03F7/20 , H01L21/683
CPC分类号： G03F7/70708 , C23C16/042 , C23C16/34 , C23C16/56 , G03F7/70633 , G03F7/70783 , H01L21/6833 , Y10T29/49155
摘要： Some embodiments of the present disclosure relate to a method of overlay control which utilizes a deformable electrostatic chuck. The method comprises exposing a substrate to radiation which is reflected off of a reticle. The reticle is mounted to a deformable electrostatic chuck by a plurality of raised contacts, where each raised contact is configured to independently vary in height from a surface of the deformable electrostatic chuck. After exposure of the substrate to radiation which is reflected off of the reticle, a displacement between a first alignment shape formed on a first layer disposed on a surface of the substrate and a second alignment shape formed by the exposure is measured. The height of one or more of the plurality of raised contact is changed based upon the displacement to alter a surface topology of the reticle, which negates some effects of clamping topology. Other embodiments are also disclosed.
摘要翻译：本公开的一些实施例涉及利用可变形的静电卡盘的覆盖控制的方法。该方法包括将衬底暴露于从掩模版反射的辐射。通过多个凸起的触点将掩模版安装到可变形的静电卡盘上，其中每个凸起的触点构造成独立地从可变形的静电卡盘的表面改变高度。在将衬底暴露于从掩模版反射的辐射之后，测量形成在设置在衬底表面上的第一层上形成的第一对准形状与通过曝光形成的第二取向形状之间的位移。基于位移改变多个凸起接触中的一个或多个的高度，以改变掩模版的表面拓扑，这消除了钳位拓扑的一些影响。还公开了其他实施例。

20. 发明申请

US20150036258A1 ELECTROSTATIC CLAMP 有权
标题翻译：静电夹
公开(公告)号：US20150036258A1
公开(公告)日：2015-02-05
申请号：US14380622
申请日：2013-01-29
申请人： ASML Netherlands B.V.
发明人： Tjarko Adriaan Rudolf Van Empel
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , G03F7/70708
摘要： An electrostatic clamp configured to, in use, hold an article, such as a reticle or a wafer in a lithographic apparatus. The clamp includes a lower portion; an upper portion formed of a dielectric material, and a plurality of electrodes disposed between the lower portion and the upper portion. The electrodes include a first electrode configured in use to be held at a first voltage, at least one intermediate electrode configured in use to be held at a second voltage, and a ground electrode. The at least one intermediate electrode is located between the first electrode and the ground electrode and the second voltage is between the first voltage and ground to reduce the voltage across a barrier between the electrodes and so reduce the risk of high-voltage breakdown.
摘要翻译：构造成在使用中的静电夹持器将光学设备中的物品（例如光罩或晶片）保持在其中。夹具包括下部; 由介电材料形成的上部，以及设置在下部与上部之间的多个电极。电极包括被配置为保持在第一电压的第一电极，至少一个中间电极被配置为保持在第二电压，以及接地电极。所述至少一个中间电极位于第一电极和接地电极之间，并且第二电压在第一电压和地之间，以降低电极之间的屏障上的电压，并因此降低高压击穿的风险。

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