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11. 发明申请

US20160061583A1 APPARATUS FOR MEASURING THICKNESS OF THIN FILM, SYSTEM INCLUDING THE APPARATUS, AND METHOD FOR MEASURING THICKNESS OF THIN FILM 有权
标题翻译：用于测量薄膜厚度的装置，包括装置的系统和用于测量薄膜厚度的方法
公开(公告)号：US20160061583A1
公开(公告)日：2016-03-03
申请号：US14799107
申请日：2015-07-14
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Sung-Yoon RYU , Sang-Kil LEE , Chung-Sam JUN , Woo-Seok KO , Ho-Jeong KWAK , Souk KIM , Kwan-Woo RYU , Yu-Sin YANG
IPC分类号： G01B11/06
CPC分类号： G01B11/0633
摘要： An apparatus and a system for measuring the thickness of a thin film are provided. The apparatus includes a signal detector, a Fast Fourier Transform (FFT) generator, an Inverse Fast Fourier Transform (IFFT) generator, and a thickness analyzer. The signal detector detects an electric field signal with respect to a reflected light that is reflected from a thin film. The FFT generator performs FFT with respect to the electric field signal to separate a DC component from an AC component of the electric field signal. The IFFT generator receives the separated AC component of the electric field signal, performs IFFT with respect to the AC component, and extracts a phase value of the AC component. The thickness analyzer measures the thickness of the thin film using the extracted phase value.
摘要翻译：提供了用于测量薄膜厚度的装置和系统。该装置包括信号检测器，快速傅里叶变换（FFT）发生器，快速傅里叶逆变换（IFFT）发生器和厚度分析器。信号检测器检测相对于从薄膜反射的反射光的电场信号。 FFT发生器相对于电场信号执行FFT，以将DC分量与电场信号的AC分量分离。 IFFT发生器接收电场信号的分离的AC分量，相对于AC分量执行IFFT，并提取AC分量的相位值。厚度分析器使用提取的相位值来测量薄膜的厚度。

12. 发明授权

US09255789B2 Method for measuring thickness of object 有权
标题翻译：测量物体厚度的方法
公开(公告)号：US09255789B2
公开(公告)日：2016-02-09
申请号：US14286213
申请日：2014-05-23
申请人： Samsung Electronics Co., Ltd.
发明人： Jang-Ik Park , Il-Hwan Nam , Kwan-Woo Ryu
IPC分类号： G01B11/28 , G01B11/06
CPC分类号： G01B11/0633
摘要： Methods for measuring a thickness of an object including acquiring at least one of a wavelength domain spectrum for an amplitude ratio (Ψ) and a phase difference (Δ) of reflected light from a film material, converting the wavelength domain spectrum into a 1/wavelength domain spectrum, acquiring a resulting spectrum by performing fast fourier transform (FFT) on the 1/wavelength domain spectrum, and measuring a thickness of the film material from the resulting spectrum may be provided.
摘要翻译：用于测量物体厚度的方法，包括获取来自胶片材料的反射光的振幅比（Ψ）和相位差（＆Dgr）的波长域光谱中的至少一个，将波长域光谱转换成1 / 波长域光谱，通过在1 /波长域光谱上执行快速傅里叶变换（FFT）获得所得到的光谱，并且可以提供从所得光谱测量膜材料的厚度。

13. 发明申请

US20160033259A1 Method & System For Real-Time In-Process Measurement Of Coating Thickness 有权
标题翻译：涂层厚度的实时在线测量方法与系统
公开(公告)号：US20160033259A1
公开(公告)日：2016-02-04
申请号：US14781457
申请日：2014-03-14
申请人： SENSORY ANALYTICS
发明人： Vivek Komaragiri , Greg Frisby
IPC分类号： G01B11/06
CPC分类号： G01B11/065 , G01B11/0633 , G01B11/0641
摘要： The present disclosure is generally directed to methods and systems for measuring the thickness of coatings or thin films on various substrates. For example, one disclosed method includes the steps of providing and directing light waves of varying wavelengths toward a moving substrate comprising a coating, linearly polarizing the light waves, converting the linearly polarized light waves to circularly polarized light waves, analyzing elliptically polarized light waves reflected by the moving substrate, capturing analyzed light waves, generating light wave data based on the captured light waves, and determining a thickness of the coating based on the light wave data.
摘要翻译：本公开一般涉及用于测量各种基底上的涂层或薄膜的厚度的方法和系统。例如，一种公开的方法包括以下步骤：向包括涂层的移动衬底提供和引导具有不同波长的光波，将光线线性偏振，将线性偏振光波转换成圆偏振光波，分析反射的椭圆偏振光波通过移动基板捕获分析的光波，基于捕获的光波产生光波数据，以及基于光波数据确定涂层的厚度。

14. 发明授权

US09157857B2 Electromagnetic wave measurement device, measurement method, and recording medium 有权
标题翻译：电磁波测量装置，测量方法和记录介质
公开(公告)号：US09157857B2
公开(公告)日：2015-10-13
申请号：US14108882
申请日：2013-12-17
申请人： ADVANTEST CORPORATION
发明人： Shigeru Ono , Kazunori Shiota , Masaichi Hashimoto , Akiyoshi Irisawa
IPC分类号： G01J5/02 , G01N21/59 , G01B11/06
CPC分类号： G01N21/59 , G01B11/0633
摘要： According to the present invention, an electromagnetic wave measurement device includes: an electromagnetic wave detector, a frequency component acquisition unit, and a thickness indication quantity deriving unit. An object to be measured is disposed on a substrate and includes at least two layers, and the electromagnetic wave detector detects a substrate-surface-reflected electromagnetic wave which has been made incident to the object, has been reflected by the substrate, and has passed through the object. The frequency component acquisition unit acquires an amplitude of a frequency component of the substrate-surface-reflected electromagnetic wave. The thickness indication quantity deriving unit derives a thickness indication quantity based on the amplitude of the frequency component of the substrate-surface-reflected electromagnetic wave and a relationship between the thickness indication quantity and the amplitude of the frequency component of the substrate-surface-reflected electromagnetic wave.
摘要翻译：根据本发明，电磁波测量装置包括：电磁波检测器，频率分量获取单元和厚度指示量导出单元。将被测量物体配置在基板上，至少包含两层，电磁波检测器检测出已被入射到物体的基板表面反射的电磁波已被基板反射，并且已经通过通过对象。频率分量获取单元获取基板表面反射电磁波的频率分量的振幅。厚度指示量导出单元基于基板表面反射电磁波的频率分量的振幅和基板表面反射电磁波的厚度指示量与频率分量的振幅之间的关系导出厚度指示量电磁波。

15. 发明申请

US20150159995A1 Caliper sensor and method using mid-infrared interferometry 有权
标题翻译：卡尺传感器和使用中红外干涉测量的方法
公开(公告)号：US20150159995A1
公开(公告)日：2015-06-11
申请号：US14103733
申请日：2013-12-11
申请人： Sebastien Tixier , Michael Kon Yew Hughes , Stephane Savard
发明人： Sebastien Tixier , Michael Kon Yew Hughes , Stephane Savard
IPC分类号： G01B11/06
CPC分类号： G01B11/0691 , G01B9/02001 , G01B11/0633 , G01B11/0675 , G01B2210/42 , G01B2210/44 , G01B2290/65
摘要： Non-contacting caliper measurements of free standing sheets such as porous polymer and paper detect mid-IR interferometric fringes created by the reflection of light from the top and bottom surfaces of the sheet. The technique includes directing a laser beam at a selected angle of incidence onto a single spot on the exposed outer surface wherein the laser beam comprises radiation having a wavelength in the 3-50 micron range and scanning the laser beam through a selected angle range as the laser beam is directed onto the exposed outer surface and measuring the intensity of an interference pattern that forms from the superposition of radiation that is reflected From the exposed outer surface and from the inner surface. Thickness can be extracted from the fringe separation in the interference pattern. Rotating and focusing elements ensure that the spot position on the sheet remains the same while varying the incident angle.
摘要翻译：通过从片材的顶部和底部表面反射的光产生的自由基片材（如多孔聚合物和纸张）的非接触卡尺测量检测中红外干涉条纹。该技术包括将激光束定向到暴露的外表面上的单个点上的入射角，其中激光束包括波长在3-50微米范围内的辐射，并且将激光束扫过选定的角度范围作为激光束被引导到暴露的外表面上，并且测量从暴露的外表面和内表面反射的辐射的叠加形成的干涉图案的强度。可以从干涉图案中的边缘分离中提取厚度。旋转和聚焦元件可确保纸张上的光点位置保持不变，同时改变入射角度。

16. 发明授权

US09007599B2 Depth of hole measurement by subtracting area of two spectra separated by time 有权
标题翻译：通过减去由时间分开的两个光谱的面积来测量孔的深度
公开(公告)号：US09007599B2
公开(公告)日：2015-04-14
申请号：US13859405
申请日：2013-04-09
申请人： Shimadzu Corporation
发明人： Hiroomi Goto , Yuzo Nagumo , Rui Kato
IPC分类号： G01B11/02 , G01B11/06
CPC分类号： G01B11/06 , G01B11/0633
摘要： A measurement light having a predetermined wavelength bandwidth from a light source is radiated onto the structure to be measured in a specimen 50, light reflected from a first plane and second plane of the structure to be measured is made to interfere in an optical fiber, and a spectrum of the interference light is generated. This interference light spectrum is acquired by a spectrometric unit at two time points separated in time, and in data processing unit, absolute difference area computation unit determines the absolute difference area of the difference spectrum. This absolute difference area changes periodically each time the dimension of the structure to be measured changes by λ/4, making it possible to determine the dimension of the structure to be measured based on that change.
摘要翻译：将具有来自光源的预定波长带宽的测量光照射到被检体50中的被测量结构上，使被测定结构的第一平面和第二平面反射的光干涉光纤，产生干涉光的光谱。该干涉光谱由时间分离的两个时间点的光谱测定单元获取，在数据处理单元中，绝对差分区域计算单元确定差分谱的绝对差分面积。每当测量结构的尺寸变化λ/ 4时，该绝对差值区域周期性地变化，从而可以基于该变化来确定要测量的结构的尺寸。

17. 发明申请

US20150022658A1 NOISE REDUCTION TECHNIQUES, FRACTIONAL BI-SPECTRUM AND FRACTIONAL CROSS-CORRELATION, AND APPLICATIONS 审中-公开
标题翻译：噪声减少技术，分数双频和相关交叉相关及应用
公开(公告)号：US20150022658A1
公开(公告)日：2015-01-22
申请号：US14332948
申请日：2014-07-16
申请人： Faramarz FARAHI , Gelareh BABAIE , Mehrdad ABOLBASHARI
发明人： Faramarz FARAHI , Gelareh BABAIE , Mehrdad ABOLBASHARI
IPC分类号： G01B9/02 , G01B11/06
CPC分类号： G01B9/02007 , A61B3/101 , G01B9/02021 , G01B9/02032 , G01B9/02082 , G01B9/02084 , G01B11/0633 , G01B11/2441
摘要： A measurement method and system include illuminating an object to be measured with light at two different wavelengths and an incident angle; capturing an image of the object; detecting a frequency of an interference pattern from the image using Fractional Bi-Spectrum Analysis; and calculating a thickness of the object based on the Fractional Bi-Spectrum Analysis. The thickness is calculated based on a relationship between the thickness and the frequency of the interference pattern. The Fractional Bi-Spectrum Analysis is performed on a linear medium with the two different wavelengths being known.
摘要翻译：测量方法和系统包括用两种不同波长的光和入射角照射待测物体; 捕获物体的图像; 使用分数双频谱分析从图像中检测干扰图案的频率; 并基于分数双频谱分析计算物体的厚度。基于干涉图案的厚度和频率之间的关系来计算厚度。在具有两种不同波长的线性介质中进行分数双频谱分析。

18. 发明申请

US20140220862A1 FILM THICKNESS MONITORING METHOD, FILM THICKNESS MONITORING DEVICE, AND POLISHING APPARATUS 审中-公开
标题翻译：薄膜厚度监测方法，薄膜厚度监测装置和抛光装置
公开(公告)号：US20140220862A1
公开(公告)日：2014-08-07
申请号：US14019786
申请日：2013-09-06
申请人： KABUSHIKI KAISHA TOSHIBA
发明人： Toru KOIKE
IPC分类号： B24B37/013 , B24B49/12 , G01B11/06
CPC分类号： B24B37/013 , B24B49/04 , B24B49/12 , G01B11/0633 , G01B11/0683 , G01B11/0691
摘要： In accordance with an embodiment, a film thickness monitoring method includes polishing an opaque film on a transparent film on a substrate, irradiating the substrate with light concurrently with the polishing of the substrate, obtaining a first signal by detecting reflected light from the substrate, acquiring first data from the first signal, and calculating a polishing amount of the opaque film using the first data. The polishing is performed by relative rotation of the substrate and a polishing table to which a polishing pad is attached. The first data is obtained by grouping the first signals obtained from positions each remote from a central position of the substrate by a same distance, and by performing data processing.
摘要翻译：根据实施例，膜厚监测方法包括在基板上的透明膜上抛光不透明膜，在与基板的研磨同时照射基板的同时，通过检测来自基板的反射光获得第一信号，获取从第一信号获得第一数据，并使用第一数据计算不透明膜的抛光量。抛光通过基板和抛光台的相对旋转进行，抛光台附接有抛光垫。通过将从基板的中心位置远离的位置获得的第一信号分组相同的距离，并且通过执行数据处理来获得第一数据。

19. 发明申请

US20140110582A1 SYSTEM FOR DIRECTLY MEASURING THE DEPTH OF A HIGH ASPECT RATIO ETCHED FEATURE ON A WAFER 审中-公开
标题翻译：用于直接测量水平高比例蚀刻特征深度的系统
公开(公告)号：US20140110582A1
公开(公告)日：2014-04-24
申请号：US14145497
申请日：2013-12-31
申请人： RUDOLPH TECHNOLOGIES, INC.
发明人： David S. Marx , David L. Grant
IPC分类号： G01B11/22
CPC分类号： G01B11/22 , G01B11/0633 , G01B11/0675 , G01B2210/56
摘要： A system (10) for directly measuring the depth of a high aspect ratio etched feature on a wafer (80) that includes an etched surface (82) and a non-etched surface (84). The system (10) utilizes an infrared reflectometer (12) that in a preferred embodiment includes a swept laser (14), a fiber circulator (16), a photodetector (22) and a combination collimator (18) and an objective lens (20). From the objective lens (20) a focused incident light (23) is produced that is applied to the non-etched surface (84) of the wafer (80). From the wafer (80) is produced a reflected light (25) that is processed through the reflectometer (12) and applied to an ADC (24) where a corresponding digital data signal (29) is produced. The digital data signal (29) is applied to a computer (30) that, in combination with software (32), measures the depth of the etched feature that is then viewed on a display (34).
摘要翻译：一种用于直接测量包括蚀刻表面（82）和非蚀刻表面（84）的晶片（80）上的高纵横比蚀刻特征的深度的系统（10）。系统（10）利用红外反射计（12），在优选实施例中，扫描激光器（14），光纤循环器（16），光电检测器（22）和组合准直仪（18）和物镜（20））。从物镜（20），产生被施加到晶片（80）的未蚀刻表面（84）的聚焦入射光（23）。从晶片（80）产生的反射光（25）通过反射计（12）处理并被施加到产生相应的数字数据信号（29）的ADC（24）。数字数据信号（29）被应用于与软件（32）组合的计算机（30），其测量在显示器（34）上被观看的蚀刻特征的深度。

20. 发明申请

US20120206710A1 MEASURING INSTRUMENT AND METHOD FOR DETERMINATION OF THE PROPERTIES OF AN ITEM AND ITS SURFACE 有权
标题翻译：测量仪器和方法，用于确定项目及其表面的性质
公开(公告)号：US20120206710A1
公开(公告)日：2012-08-16
申请号：US13500073
申请日：2010-10-07
申请人： Karri Niemelä , Heimo Keränen
发明人： Karri Niemelä , Heimo Keränen
IPC分类号： G01N21/55 , G01B11/06 , G01B11/24 , G01C3/08 , G01N21/57 , G01J4/00 , G01N21/41
CPC分类号： G01B11/0633 , G01B11/065 , G01B2210/50 , G01N21/41 , G01N21/57
摘要： A measurement device for the determination of the characteristics of the object's surface by means of the optical radiation, wherein a measurement device comprises an optical radiation source and a detector to receive the radiation reflected from the surface being measured. In addition, a measurement device comprises an emitted optical radiation processing unit, which is adjusted to split optical radiation emitted by an optical source into separate wavelengths and to direct said separate wavelengths to the object being measured in a direction, that differs from the normal of the surface being measured so, that at least the shortest and the longest wavelengths of said wavelengths are focused on different halves and different heights of the measured object's surface, in the direction of the normal of the surface being measured. In addition, a measurement device comprises a reflected optical radiation processing unit, which is adjusted to receive an optical radiation reflected from the measured object at least in the direction of a specular reflection, which differs from the normal of the surface being measured, and to direct received optical radiation to said detector. Still further, the measurement device is adjusted to analyze an electric signal produced by the detector and proportional to the intensity of the radiation focused thereto, and to further determine a surface gloss (gloss degree) and/or thickness characteristic property of the measured object, based on the intensity of its wavelength, the focus point of which was located on the measured surface, and which wavelength was the strongest reflected from that point to the detector in the specular geometry.
摘要翻译：一种用于通过光学辐射确定物体表面的特性的测量装置，其中测量装置包括光学辐射源和用于接收从所测量的表面反射的辐射的检测器。此外，测量装置包括发射的光辐射处理单元，其被调整以将由光源发射的光辐射分裂成分离的波长并将所述分离的波长指向被测量的物体，该方向与被测量的表面是所述波长的至少最短波长和最长波长在所测量的表面的法线方向上聚焦在被测物体表面的不同高度和不同高度上。此外，测量装置包括反射光辐射处理单元，其被调整为至少在与所测量的表面的法线不同的镜面反射方向上接收从测量对象反射的光辐射，并且至少直接接收光辐射到所述检测器。此外，调整测量装置以分析由检测器产生的电信号并与其聚焦的辐射的强度成比例，并且进一步确定测量对象的表面光泽度（光泽度）和/或厚度特性，基于其波长的强度，其焦点位于测量的表面上，并且哪个波长在镜面几何形状中从该点到检测器反射最强。

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