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    • 11. 发明授权
    • Method and apparatus for slicing a work
    • 用于切片工作的方法和装置
    • US5902171A
    • 1999-05-11
    • US918923
    • 1997-08-26
    • Tatsumi HamasakiYoshihiro TaderaYukinori ImadaKeishi Kawaguchi
    • Tatsumi HamasakiYoshihiro TaderaYukinori ImadaKeishi Kawaguchi
    • B24B27/06B23D59/00B28D5/02B28D1/02
    • B23D59/002B28D5/028
    • An apparatus for slicing a work includes: a blade member rotating device which rotates a blade member having an internal circular cutting edge; a radial moving device which produces a relative movement between the blade member and a work in a radial direction of the blade member to cut an end portion of the work; an axial moving device which produces a relative movement between the blade member and the work in an axial direction of the blade member; a displacement detector which detects an axial displacement of an inner portion of the rotating blade member; a rotational controller which controls the rotational speed of the blade member based on a detected axial displacement to reduce the axial displacement; and an axial movement controller which controls the axial relative movement between the blade member and the work based on the detected axial displacement so that an actual cutting position of the internal cutting edge with respect to the work is at a predetermined cutting reference position.
    • 一种用于切割工件的设备包括:叶片构件旋转装置,其使具有内部圆形切割刃的叶片构件旋转; 径向移动装置,其在所述刀片构件和所述工件之间在所述刀片构件的径向方向上产生相对运动,以切割所述工件的端部; 轴向移动装置,其在叶片构件的轴向方向上产生叶片构件和作业之间的相对运动; 位移检测器,其检测所述旋转叶片构件的内部的轴向位移; 旋转控制器,其基于检测到的轴向位移来控制所述叶片构件的旋转速度,以减小所述轴向位移; 以及轴向移动控制器,其基于检测到的轴向位移来控制所述刀片构件和所述工件之间的轴向相对运动,使得所述内部切削刃相对于所述工件的实际切割位置处于预定的切割参考位置。
    • 13. 发明授权
    • Method and apparatus for the rotary sawing of brittle and hard materials
    • 用于旋转锯切脆性和硬质材料的方法和装置
    • US5351446A
    • 1994-10-04
    • US938691
    • 1992-09-01
    • Karlheinz Langsdorf
    • Karlheinz Langsdorf
    • H01L21/304B28D1/00B28D1/22B28D5/02B28D5/04B24B1/00
    • B28D1/003B28D1/221B28D5/028B28D5/045
    • Ingot-type semiconductor single crystals having diameters of more than 200m can be sawed into thin wafers using an annular saw if the crystal is fed towards the cutting edge of the annular saw while rotating around its longitudinal axis. The method includes having a wafer sawed out in this way until a residual joint is created between a wafer and the end face of the ingot. Ingot and wafer are finally separated by means of a residue separation technique which leaves behind various central material projections on the ingot and the wafer. Particularly suitable for residue separation are torsion separation and separation by a wire saw. This procedure reliably prevents the frequently observable, uncontrollable breaking-off of the wafer in the final phase of the annular sawing if this is exclusively used as the method of separation. The method, whose final step involves the removal of the material projection on the wafer by rotation grinding, proves to be particularly suitable for crystals having diameters of more than 200 mm. In this case, the material saving is exceedingly high as a result of the absence of chips from the ingot or wafer as a consequence of uncontrolled breaking-off of the wafer.
    • 如果在围绕其纵向轴线旋转的同时将晶体馈送到环形锯的切割边缘,则可以使用环形锯将直径大于200mm的锭形半导体单晶切割成薄晶片。 该方法包括以这种方式锯切晶片,直到在晶片和晶锭的端面之间产生残留接合点。 锭和晶片最后通过残留物分离技术分离,留下锭子和晶片上的各种中心材料投影。 特别适用于残渣分离的是通过线锯的扭转分离和分离。 该方法可以可靠地防止在环形锯切的最后阶段中晶片经常可观察到的,不可控制的断裂,如果它仅用作分离方法。 该方法的最终步骤涉及通过旋转研磨去除晶片上的材料投影,证明特别适用于直径大于200mm的晶体。 在这种情况下,作为晶片的不受控断裂的结果,由于不存在来自晶锭或晶片的芯片,所以材料节省非常高。
    • 15. 发明授权
    • Apparatus for loading and re-slicing semiconductor wafer
    • 装载和重新放置半导体波形的装置
    • US5142756A
    • 1992-09-01
    • US599861
    • 1990-10-19
    • Tadashi IbarakiTsutomu Sato
    • Tadashi IbarakiTsutomu Sato
    • H01L21/304B28D1/00B28D5/00B28D5/02H01L21/677
    • B28D1/005B28D5/0058B28D5/0094B28D5/028H01L21/67778Y10T29/41
    • The present invention is directed to an apparatus for loading an unprocessed semiconductor wafer which is doped in advance with impurity diffusion layers on both sides or not doped, re-slicing the wafer and unloading two sheets of the re-sliced wafer as processed wafers upon completion of re-slicing the unprocessed wafer into two sheets to a recovery wafer magazine as a total system. More particularly, the present invention provides an improved loading and unloading mechanism arranged between a storage space of both unprocessed and processed wafers and a re-slicing mechanism, with chucking mechanisms and wafer magazines in the storage space. The loading and unloading mechanism includes a loading manipulator and an unloading manipulator, wherein the loading manipulator receives an unprocessed wafer from the storage space and then conveys and loads the wafer on a chucking mechanism which is operated in combination with a re-slicing mechanism, and then the unloading manipulator recovers two sheets of re-sliced wafers from the chucking mechanism and further unloads them into another wafer magazine. While the unloading manipulator is unloading the two sheets of re-sliced wafers into the magazine, simultaneously the loading manipulator will take out a new unprocessed wafer, wherein the new wafer is conveyed to a stand-by position and awaits until the completion of re-slicing an earlier wafer on the chucking mechanism.