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11. 发明授权

US09533397B2 Abrasive article and method of forming 有权
标题翻译：磨料制品及成型方法
公开(公告)号：US09533397B2
公开(公告)日：2017-01-03
申请号：US13930223
申请日：2013-06-28
申请人： Paul W. Rehrig , Yinggang Tian , Wei Che , Arup K. Khaund , Thomas Puthanangady , Christopher Arcona , Srinivasan Ramanath
发明人： Paul W. Rehrig , Yinggang Tian , Wei Che , Arup K. Khaund , Thomas Puthanangady , Christopher Arcona , Srinivasan Ramanath
IPC分类号： B23D61/18 , B28D5/04 , B28D1/06 , B24D11/00 , B23D65/00
CPC分类号： B23D61/185 , B23D65/00 , B24D3/002 , B24D11/00 , B24D11/001 , B28D1/06 , B28D5/042 , B28D5/045
摘要： An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, a first type of abrasive particle overlying the tacking layer, a second type of abrasive particle different than the first type of abrasive particles overlying the tacking layer, and a bonding layer overlying at least a portion of one of the first type of abrasive particle and the second type of abrasive particle and the tacking layer.
摘要翻译：一种磨料制品，包括具有细长体的衬底，覆盖衬底的粘合层，覆盖在粘合层上的第一类型磨料颗粒，与覆盖在粘合层上的第一类磨料颗粒不同的第二类磨料颗粒，以及粘合层覆盖第一类型磨料颗粒和第二类磨料颗粒和粘合层中的至少一部分的至少一部分。

12. 发明申请

US20160303711A1 CONGLOMERATE ABRASIVE PARTICLES, ABRASIVE ARTICLES INCLUDING THE SAME, AND METHODS OF MAKING THE SAME 审中-公开
标题翻译：包含磨料颗粒，包括其的磨料制品及其制造方法
公开(公告)号：US20160303711A1
公开(公告)日：2016-10-20
申请号：US15100585
申请日：2014-12-08
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Toshikazu Kasai , John J. Gagliardi , Timothy D. Fletcher
IPC分类号： B24D3/14 , B24D11/00
CPC分类号： B24D3/14 , B24D11/001 , C09K3/1436
摘要： A method of making conglomerate abrasive particles includes: providing agglomerate abrasive particles comprising mineral particles in a first vitreous binder; combining the agglomerate abrasive particles with a second vitreous binder material precursor to form precursor conglomerate abrasive particles; and heating the precursor conglomerate abrasive particles to convert the second vitreous binder material precursor into a second vitreous binder, different from the first vitreous binder, thereby forming the conglomerate abrasive particles. The first vitreous binder differs from the second vitreous binder by at least one of: i) elemental composition, or ii) an intrinsic physical property; and wherein the conglomerate abrasive particles can pass through a testing sieve having one-millimeter openings. Conglomerate abrasive particles preparable by the method, and abrasive articles containing them, are also disclosed.
摘要翻译：一种制造砾石磨料颗粒的方法包括：在第一玻璃粘合剂中提供包含矿物颗粒的附聚磨料颗粒; 将附聚磨料颗粒与第二玻璃态粘合剂材料前体结合以形成前体砾粒磨料颗粒; 并加热前体砾石磨料颗粒以将第二玻璃态粘合剂材料前体转化成与第一玻璃粘结剂不同的第二玻璃粘合剂，从而形成砾粒磨料颗粒。第一玻璃粘合剂与第二玻璃态粘合剂的不同之处在于：i）元素组成，或ii）固有的物理性质; 并且其中所述砾粒磨料颗粒可以通过具有一毫米开口的测试筛。还公开了通过该方法制备的砾粒磨料颗粒和含有它们的磨料制品。

13. 发明授权

US09370876B2 Molded microstructured articles and method of making same 有权
标题翻译：成型微结构制品及其制造方法
公开(公告)号：US09370876B2
公开(公告)日：2016-06-21
申请号：US12999026
申请日：2009-04-09
申请人： Joseph D. Rule , Kevin M. Lewandowski
发明人： Joseph D. Rule , Kevin M. Lewandowski
IPC分类号： B32B3/30 , B29C35/02 , B24D3/20 , B24D11/00 , B24D18/00 , B29C37/00 , C08G61/08 , B29C59/02
CPC分类号： B29C35/02 , B24D3/20 , B24D11/001 , B24D18/0009 , B29C37/0053 , B29C2059/023 , C08G61/08 , C08G2261/3325 , C08G2261/418 , Y10T428/24355 , Y10T428/24479
摘要： Disclosed herein are microstructured articles that can be made by molding. The microstructured articles comprise crosslinked unsaturated polymers formed by ring opening metathesis polymerization (ROMP) of a monomer composition, the monomer composition comprising a cyclic monomer having at least one reactive double bond. The microstructured articles may be structured in that they comprise at least one microstructured feature having a dimension of less than about 2 mm, or less than about 500 um. The microstructured articles may also comprise a plurality of such microstructured features. Also disclosed herein are methods of making the microstructured articles.
摘要翻译：本文公开了可以通过模制制造的微结构制品。微结构化制品包括通过单体组合物的开环易位聚合（ROMP）形成的交联的不饱和聚合物，所述单体组合物包含具有至少一个反应性双键的环状单体。微结构制品可以构造成它们包括至少一个具有小于约2mm或小于约500μm的尺寸的微结构特征。微结构制品还可以包括多个这样的微结构特征。本文还公开了制备微结构物品的方法。

14. 发明申请

US20160114458A1 POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS 审中-公开
标题翻译：由添加剂制造工艺生产的抛光垫
公开(公告)号：US20160114458A1
公开(公告)日：2016-04-28
申请号：US14920801
申请日：2015-10-22
申请人： APPLIED MATERIALS, INC.
发明人： Rajeev BAJAJ , Daniel REDFIELD , Mahendra C. ORILALL , Boyi FU , Aniruddh KHANNA , Jason G. FUNG , Mario CORNEJO , Ashwin CHOCKALINGAM , Mayu YAMAMURA , Veera Raghava REDDY , Ashavani KUMAR , Venkatachalam HARIHARAN , Gregory E. MENK , Fred C. REDEKER , Nag B. PATIBANDLA , Hou T. NG , Robert E. DAVENPORT , Amritanshu SINHA
IPC分类号： B24B37/26 , B24B37/24 , B24D11/04 , B24D3/28 , B24D11/00
CPC分类号： B24B37/26 , B24B37/22 , B24B37/24 , B24D3/28 , B24D11/00 , B24D11/001 , B24D11/04 , B33Y10/00 , B33Y80/00
摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.
摘要翻译：本公开的实施例涉及具有可调节的化学，材料和结构特性的高级抛光垫及其制造方法。根据本公开的一个或多个实施例，已经发现可以通过诸如三维（3D）印刷工艺的添加剂制造工艺来生产具有改进性能的抛光垫。因此，本公开的实施例可以提供具有离散特征和几何形状的先进抛光垫，其由至少两种不同的材料形成，包括功能性聚合物，功能低聚物，反应性稀释剂和固化剂。例如，先进的抛光垫可以由多个聚合物层形成，通过至少一种树脂前体组合物的自动顺序沉积，然后至少一个固化步骤，其中各层可代表至少一种聚合物组合物和/ 或不同组成的区域。

15. 发明申请

US20160107381A1 POLISHING ARTICLES AND INTEGRATED SYSTEM AND METHODS FOR MANUFACTURING CHEMICAL MECHANICAL POLISHING ARTICLES 有权
标题翻译：抛光制品和制造化学机械抛光物品的综合系统和方法
公开(公告)号：US20160107381A1
公开(公告)日：2016-04-21
申请号：US14863409
申请日：2015-09-23
申请人： Applied Materials, Inc.
发明人： Kasiraman KRISHNAN , Daniel REDFIELD , Russell Edward PERRY , Gregory E. MENK , Rajeev BAJAJ , Fred C. REDEKER , Nag B. PATIBANDLA , Mahendra C. ORILALL , Jason G. FUNG
IPC分类号： B29C67/00 , B24B37/22 , B24B37/26
CPC分类号： B29C64/112 , B24B37/22 , B24B37/24 , B24B37/26 , B24D11/001 , B29K2105/16 , B29K2995/007 , B29L2031/736
摘要： A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.
摘要翻译：一种抛光制品制造系统，包括进料部分和卷取部分，所述卷取部分包括供料辊，所述供料辊具有设置在其上用于化学机械抛光工艺的抛光制品，所述打印部分包括设置在所述进料之间的多个打印头以及设置在所述进料部和所述卷取部之间的固化部，所述固化部包括热固化装置和电磁固化装置中的一个或两个。

16. 发明申请

US20160052107A1 POLISHING METHOD 有权
标题翻译：抛光方法
公开(公告)号：US20160052107A1
公开(公告)日：2016-02-25
申请号：US14823967
申请日：2015-08-11
申请人： EBARA CORPORATION
发明人： Yu ISHII , Hiroyuki KAWASAKI , Masayuki NAKANISHI , Kenya ITO , Kenji KODERA , Michiyoshi YAMASHITA
IPC分类号： B24D11/00
CPC分类号： B24D11/001 , B24B9/065 , B24B21/002 , B24B21/004 , B24B21/008 , B24B21/08 , B24B21/18 , B24B27/0076 , B24B49/12 , H01L21/304 , H01L21/3105
摘要： There is disclosed a method of polishing a peripheral portion of a wafer having a hard film with use of an abrasive film while preventing damage to the abrasive film. The polishing method uses an abrasive film including a base film made of polyimide, a binder made of polyimide, and abrasive grains held by the binder. The polishing method includes: rotating a silicon substrate having a surface on which a silicon carbide film is formed; and removing the silicon carbide film from a peripheral portion of the silicon substrate by pressing the abrasive film at a low force against the silicon carbide film on the peripheral portion of the silicon substrate.
摘要翻译：公开了一种利用磨料膜研磨具有硬质膜的晶片的周边部分的方法，同时防止对研磨膜的损伤。抛光方法使用包括由聚酰亚胺制成的基膜，由聚酰亚胺制成的粘合剂和由粘合剂保持的磨粒的研磨膜。抛光方法包括：旋转具有形成有碳化硅膜的表面的硅衬底; 并且通过以低的力将研磨膜压在硅衬底的周边部分上的碳化硅膜上，从硅衬底的周边部分去除碳化硅膜。

17. 发明申请

US20150352689A1 ABRASIVE PRODUCTS AND METHODS FOR FINISHING HARD SURFACES 审中-公开
标题翻译：磨料产品和方法来完成硬表面
公开(公告)号：US20150352689A1
公开(公告)日：2015-12-10
申请号：US14830123
申请日：2015-08-19
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： James J. MANNING , Mark E. Sternberg , Jianna Wang
IPC分类号： B24D3/28 , B24D11/00
CPC分类号： B24D3/28 , B24B1/00 , B24B29/00 , B24D11/001 , C09K3/1409
摘要： A coated abrasive product includes green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles and a nanoparticle binder, wherein the abrasive aggregates are dispersed within a polymer resin coating, and wherein the coated abrasive product is capable of superfinishing a metal surface having an initial Ra in the range of about 1.5 micro inches to about 12.5 micro inches prior to application of the coated abrasive product and after application the surface has an Ra of less than 1.0 micro inch.
摘要翻译：涂覆的磨料产品包括具有通常为球形或环形形状的绿色未烧成的磨料聚集体，所述聚集体由包含磨粒砂粒和纳米颗粒粘合剂的组合物形成，其中所述磨料聚集体分散在聚合物树脂涂层内，并且其中所述涂覆的磨料在施加涂覆的磨料产品之前，产品能够对具有约1.5微英寸至约12.5微英寸范围内的初始Ra的金属表面进行超精加工，并且在施加之后，表面具有小于1.0微英寸的Ra。

18. 发明申请

US20150290773A1 Abrasive Product Coated with Agglomerated Particles Formed in Situ and Method of Making the Same 审中-公开
标题翻译：磨料产品涂覆在现场形成的聚集颗粒及其制备方法
公开(公告)号：US20150290773A1
公开(公告)日：2015-10-15
申请号：US14532670
申请日：2014-11-04
申请人： Fabrica Nacional de Lija, S.A. de C. V.
发明人： Alfredo BANUELOS , Dario ALARCON , Hector F. MEDEL , Octavio A. ROSTRO
IPC分类号： B24D11/00
CPC分类号： B24D11/001 , B24D11/005
摘要： The present invention relates to a coated abrasive article containing abrasive agglomerates based on target cores that provide an extended surface. Target cores are defined as geometric shapes, e.g., spherical, rectangular, tetrahedral, conical, cylindrical, pyramidal or combinations and mixtures thereof. The preferred cores are porous structures with their own abrasive capacity as a grinding aid element. They are bonded on substrates, e.g., textile fabrics, plastic films, saturated or no treated papers, vulcanized fibers, non-wovens and mixtures thereof to produce extended surfaces on which are deposited the working abrasive particles, e.g., aluminum oxide, silicon carbide, zirconia alumina, ceramic aluminum oxide and mixtures thereof, through an electrostatic field to improve performance capabilities. The electrostatic field promotes orientation of the deposited grains around the cores with exposed sharp edges over the extended area, causing as a secondary effect the compacting of the abrasive grains. The abrasive grains are agglomerated in situ via nucleation of the surface of the target cores during the coated abrasive manufacturing process. Incorporation of the abrasive particles on the interstices between target cores also produces increased life of the coated abrasive article. The invention includes the method of manufacturing the abrasive article by forming the agglomerated particles in situ during the manufacturing process.
摘要翻译：本发明涉及一种涂覆的磨料制品，其包含基于提供延伸表面的靶芯的磨料凝聚体。靶芯被定义为几何形状，例如球形，矩形，四面体，圆锥形，圆柱形，金字塔形或其组合和混合物。优选的核心是具有其自身研磨能力的多孔结构作为研磨助剂元件。它们粘合在基底上，例如纺织织物，塑料薄膜，饱和或未经处理的纸，硫化纤维，无纺布及其混合物，以产生延伸表面，在其上沉积工作磨料颗粒，例如氧化铝，碳化硅，氧化锆氧化铝，陶瓷氧化铝及其混合物，通过静电场来提高性能。静电场促进沉积的颗粒在芯周围的方向，在延伸区域上具有暴露的尖锐边缘，导致磨粒的二次效应。在涂层磨料制造过程中，磨料颗粒通过靶芯表面的成核原位凝聚。将磨料颗粒结合到靶芯之间的空隙中也可以增加涂层磨料制品的使用寿命。本发明包括通过在制造过程中原位形成凝聚颗粒来制造磨料制品的方法。

19. 发明申请

US20150273656A1 POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER 审中-公开
标题翻译：抛光垫与基础层和抛光表面层
公开(公告)号：US20150273656A1
公开(公告)日：2015-10-01
申请号：US14736568
申请日：2015-06-11
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
IPC分类号： B24B37/24 , B24B37/22 , B24B37/26 , B24B37/20
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
摘要翻译：描述了具有基础层和抛光表面层的抛光垫。在一个实例中，用于抛光衬底的抛光垫包括基础层。抛光表面层结合到基础层。还描述了制造具有结合到基础层的抛光表面层的抛光垫的方法。

20. 发明申请

US20150273655A1 POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER 有权
公开(公告)号：US20150273655A1
公开(公告)日：2015-10-01
申请号：US14732497
申请日：2015-06-05
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
IPC分类号： B24B37/24 , B24D11/00 , B24D18/00 , B24B37/26
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.

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