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1. 发明授权

US11965103B2 Additive manufacturing of polishing pads 有权
公开(公告)号：US11965103B2
公开(公告)日：2024-04-23
申请号：US16996744
申请日：2020-08-18
申请人： Applied Materials, Inc.
发明人： Yingdong Luo , Sivapackia Ganapathiappan , Ashwin Murugappan Chockalingam , Daihua Zhang , Uma Sridhar , Daniel Redfield , Rajeev Bajaj , Nag B. Patibandla , Hou T. Ng , Sudhakar Madhusoodhanan
IPC分类号： C09D11/107 , B24B37/24 , B29C64/112 , B29K33/00 , B29K509/02 , B29L31/00 , B33Y10/00 , B33Y40/10 , B33Y70/10 , B33Y80/00 , C09K3/14
CPC分类号： C09D11/107 , B24B37/245 , B29C64/112 , B33Y10/00 , B33Y40/10 , B33Y70/10 , B33Y80/00 , C09K3/1409 , B29K2033/08 , B29K2509/02 , B29L2031/736
摘要： A formulation, system, and method for additive manufacturing of a polishing pad. The formulation includes monomer, dispersant, and nanoparticles. A method of preparing the formulation includes adding a dispersant that is a polyester derivative to monomer, adding metal-oxide nanoparticles to the monomer, and subjecting the monomer having the nanoparticles and dispersant to sonication to disperse the nanoparticles in the monomer.

2. 发明授权

US11794308B2 Printed chemical mechanical polishing pad having particles therein 有权
公开(公告)号：US11794308B2
公开(公告)日：2023-10-24
申请号：US16012699
申请日：2018-06-19
申请人： Applied Materials, Inc.
发明人： Kasiraman Krishnan , Nag B. Patibandla , Periya Gopalan
IPC分类号： B24D18/00 , B29C64/112 , B29C64/165 , B33Y10/00 , B33Y80/00 , B24B37/24 , B24D3/28 , B33Y30/00 , B33Y50/02 , B29K101/10 , B29K105/16 , B29K101/12 , B29K105/00 , B29L31/00
CPC分类号： B24D18/0054 , B24B37/245 , B24D3/28 , B29C64/112 , B29C64/165 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y80/00 , B29K2101/10 , B29K2101/12 , B29K2105/0067 , B29K2105/16 , B29L2031/736
摘要： A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer. A plurality of layers of the polymer matrix is successively deposited with a 3D printer, each layer of the plurality of layers of polymer matrix being deposited by ejecting a polymer matrix precursor from a nozzle. A plurality of layers of the particles is successively deposited according to the desired distribution with the 3D printer. The polymer matrix precursor is solidified into a polymer matrix having the particles embedded in the desired distribution.

3. 发明授权

US11673225B2 Printing a chemical mechanical polishing pad 有权
公开(公告)号：US11673225B2
公开(公告)日：2023-06-13
申请号：US17555056
申请日：2021-12-17
申请人： Applied Materials, Inc.
发明人： Rajeev Bajaj , Barry Lee Chin , Terrance Y. Lee
IPC分类号： B33Y10/00 , B29C64/112 , B24B37/26 , B29C64/393 , B33Y30/00 , B33Y50/02 , B29C64/209 , B33Y80/00 , B24D18/00 , B29C35/08 , B29K75/00 , B29K509/02 , B29K105/00 , B29K105/16 , B29L31/00
CPC分类号： B24B37/26 , B24D18/00 , B24D18/009 , B29C35/0805 , B29C64/112 , B29C64/209 , B29C64/393 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y80/00 , B29C2035/0827 , B29K2075/00 , B29K2105/0002 , B29K2105/16 , B29K2509/02 , B29L2031/736
摘要： A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.

4. 发明授权

US10493691B2 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles 有权
公开(公告)号：US10493691B2
公开(公告)日：2019-12-03
申请号：US15722810
申请日：2017-10-02
申请人： Applied Materials, Inc.
发明人： Kasiraman Krishnan , Daniel Redfield , Russell Edward Perry , Gregory E. Menk , Rajeev Bajaj , Fred C. Redeker , Nag B. Patibandla , Mahendra C. Orilall , Jason G. Fung
IPC分类号： B24B37/22 , B29C64/112 , B24B37/26 , B29K105/16 , B29L31/00
CPC分类号： B29C64/112 , B24B37/22 , B24B37/26 , B29K2105/16 , B29K2995/007 , B29L2031/736
摘要： A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.

5. 发明申请

US20170355140A1 PRINTING A CHEMICAL MECHANICAL POLISHING PAD 审中-公开
公开(公告)号：US20170355140A1
公开(公告)日：2017-12-14
申请号：US15688408
申请日：2017-08-28
申请人： Applied Materials, Inc.
发明人： Rajeev Bajaj , Barry Lee Chin , Terrance Y. Lee
IPC分类号： B29C64/209 , B24D18/00 , B33Y10/00 , B29C64/20 , B29C64/112 , B24B37/26 , B33Y80/00 , B29C35/08 , B29L31/00 , B29K509/02 , B29K105/16 , B29K75/00 , B29K105/00
CPC分类号： B29C64/209 , B24B37/26 , B24D18/00 , B24D18/009 , B29C35/0805 , B29C64/112 , B29C64/20 , B29C2035/0827 , B29K2075/00 , B29K2105/0002 , B29K2105/16 , B29K2509/02 , B29L2031/736 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y80/00
摘要： A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.

6. 发明申请

US20160375550A1 CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD 有权
标题翻译：用于形成抛光垫的控制 - 孔隙度方法
公开(公告)号：US20160375550A1
公开(公告)日：2016-12-29
申请号：US14751328
申请日：2015-06-26
申请人： Rohm and Haas Electronic Materials CMP Holdings, Inc. , DOW GLOBAL TECHNOLOGIES LLC
发明人： Yuhua Tong , Andrew Wank , Diego Lugo , Marc R. Stack , David Michael Veneziale , Marty W. DeGroot , George C. Jacob , Jeffrey B. Miller
IPC分类号： B24D11/00 , B29C41/12
CPC分类号： B24D11/001 , B29C41/12 , B29L2031/736
摘要： The invention is to a method of manufacturing a polishing pad suitable for planarizing at least one of semiconductor, optical and magnetic substrates. The method includes applying droplets of a liquid polymer against a substrate to form a plurality of pores. The liquid polymer contains a nonionic surfactant, the nonionic surfactant has a concentration sufficient to facilitate growth of pores within the liquid polymer and an ionic surfactant has a concentration sufficient to limit growth of the pores within the liquid polymer. Curing the solid polymer forms a polishing pad with final size of the plurality of pores controlled by the concentration of nonionic surfactant and ionic surfactants.
摘要翻译：本发明是一种制造适于平坦化半导体，光学和磁性基板中的至少一种的抛光垫的方法。该方法包括将液体聚合物的液滴施加到基底上以形成多个孔。液体聚合物含有非离子表面活性剂，非离子表面活性剂具有足以促进液体聚合物内孔的生长的浓度，离子表面活性剂的浓度足以限制液体聚合物内孔的生长。固化固体聚合物形成抛光垫，其具有由非离子表面活性剂和离子表面活性剂的浓度控制的多个孔的最终尺寸。

7. 发明申请

US20160347002A1 APPARATUS FOR PRINTING A CHEMICAL MECHANICAL POLISHING PAD 有权
公开(公告)号：US20160347002A1
公开(公告)日：2016-12-01
申请号：US15237140
申请日：2016-08-15
申请人： Applied Materials, Inc.
发明人： Rajeev Bajaj , Barry Lee Chin , Terrance Y. Lee
IPC分类号： B29C67/00 , B33Y30/00 , B24D18/00 , B33Y50/02 , B33Y80/00 , B24B37/26 , B33Y10/00 , B29C35/08
CPC分类号： B29C64/209 , B24B37/26 , B24D18/00 , B24D18/009 , B29C35/0805 , B29C64/112 , B29C64/20 , B29C2035/0827 , B29K2075/00 , B29K2105/0002 , B29K2105/16 , B29K2509/02 , B29L2031/736 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y80/00
摘要： A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.

8. 发明授权

US09067299B2 Printed chemical mechanical polishing pad 有权
标题翻译：印刷化学机械抛光垫
公开(公告)号：US09067299B2
公开(公告)日：2015-06-30
申请号：US13591051
申请日：2012-08-21
申请人： Rajeev Bajaj , Barry Lee Chin , Terrance Y. Lee
发明人： Rajeev Bajaj , Barry Lee Chin , Terrance Y. Lee
IPC分类号： B29C67/00 , B24B37/26 , B24D18/00
CPC分类号： B29C64/209 , B24B37/26 , B24D18/00 , B24D18/009 , B29C35/0805 , B29C64/112 , B29C64/20 , B29C2035/0827 , B29K2075/00 , B29K2105/0002 , B29K2105/16 , B29K2509/02 , B29L2031/736 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y80/00
摘要： A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.
摘要翻译：制造抛光垫的抛光层的方法包括用3D打印机连续沉积多个层，通过从喷嘴喷射垫材料前体而沉积多个抛光层的每层，并固化焊盘材料前体以形成固化垫材料。

9. 发明申请

US20140038493A1 TANK AND METHOD FOR PRODUCING POLISHING PAD USING TANK 有权
标题翻译：用于生产抛光垫的罐和方法
公开(公告)号：US20140038493A1
公开(公告)日：2014-02-06
申请号：US14111120
申请日：2011-04-25
申请人： Hiroshi Seyanagi
发明人： Hiroshi Seyanagi
IPC分类号： B24B37/24 , B65D25/04 , B24B37/04 , B65D8/00
CPC分类号： B24B37/24 , B24B37/042 , B29C39/006 , B29C39/24 , B29C44/38 , B29K2075/00 , B29L2031/736 , B65D7/04 , B65D25/04
摘要： It is an object of the invention to provide a tank for use in making high-quality, air void-less, polishing pads, to provide a method for producing a polishing pad using the tank, and to provide a polishing pad obtained by such a production method. A tank for holding a resin composition, the tank comprising two or more body components and joint parts, wherein the two or more body components are joined by the joint parts to form a frame-shaped body, at least one of the joint parts includes an opening and closing member that joins adjacent ones of the body components in such a way that the adjacent body components can swing open, and at least another one of the joint parts includes a joint member that joins adjacent ones of the body components in such a way that the adjacent body components can swing about the joint member.
摘要翻译：本发明的目的是提供一种用于制造高质量无空气的抛光垫的罐，以提供一种使用该罐生产抛光垫的方法，并提供由这样的抛光垫获得的抛光垫生产方式。一种用于保持树脂组合物的罐，所述罐包括两个或更多个主体部件和接头部件，其中所述两个或更多个主体部件通过所述接合部分连接以形成框架体，所述接合部件中的至少一个包括打开和关闭构件，其以相邻的身体部件可以摆动打开的方式连接身体部件中的相邻身体部件，并且至少另一个接合部件包括以这种方式连接身体部件的相邻部件的接合部件相邻的主体部件可围绕接头部件摆动。

10. 发明授权

US07678310B2 Block tool for surface finishing operations and method of obtaining the same 有权
标题翻译：用于表面精加工的块工具及其获得方法
公开(公告)号：US07678310B2
公开(公告)日：2010-03-16
申请号：US11436031
申请日：2006-05-18
申请人： Stefano Fioratti
发明人： Stefano Fioratti
IPC分类号： D04H1/52
CPC分类号： B29C45/0013 , B24D3/28 , B24D18/0009 , B24D99/005 , B29C45/14778 , B29C2045/14983 , B29L2031/736
摘要： A block tool for surface finishing operations, which has a support and coupling member (2) for connection to a machine tool, and an abrasive block (3) held by the support member (2), the abrasive block being obtained from a solution or emulsion of a granular abrasive material dispersed in a matrix comprising a thermoplastic resin.
摘要翻译：用于表面精加工操作的块工具，其具有用于连接到机床的支撑和联接构件（2）以及由所述支撑构件（2）保持的研磨块（3），所述研磨块由溶液或分散在包含热塑性树脂的基质中的粒状研磨材料的乳液。

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