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1. 发明授权

US11724356B2 Porous polyurethane polishing pad and preparation method thereof 有权
公开(公告)号：US11724356B2
公开(公告)日：2023-08-15
申请号：US16108607
申请日：2018-08-22
申请人： SK enpulse Co., Ltd.
发明人： Jang Won Seo , Hyuk Hee Han , Hye Young Heo , Joonsung Ryou , Young Pil Kwon
IPC分类号： B24B37/24 , C08L75/04 , H01L21/67 , C08G18/76 , C08G18/18 , C08G18/62 , C08G18/20 , C08J9/12 , C08J9/00 , C08G18/75 , C08G18/48 , B24D11/04 , C08G18/24 , C08G18/42 , C08G18/73 , C08J9/32 , C08G18/44
CPC分类号： B24B37/24 , B24D11/04 , C08G18/1816 , C08G18/1825 , C08G18/1833 , C08G18/2018 , C08G18/2081 , C08G18/244 , C08G18/246 , C08G18/42 , C08G18/44 , C08G18/48 , C08G18/6216 , C08G18/73 , C08G18/755 , C08G18/757 , C08G18/7614 , C08G18/7621 , C08G18/7671 , C08G18/7678 , C08G18/7685 , C08J9/0028 , C08J9/0042 , C08J9/0052 , C08J9/122 , C08J9/32 , C08L75/04 , H01L21/67092 , C08G2110/005 , C08G2110/0025 , C08J2201/026 , C08J2203/06 , C08J2203/22 , C08J2205/044 , C08J2375/04 , C08G18/10 , C08G18/3814
摘要： Embodiments relate to a porous polyurethane polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors and a process for producing the same. In the porous polyurethane polishing pad, it is possible to control the size and distribution of pores, whereby the polishing performance (i.e., polishing rate) of the polishing pad can be adjusted, by way of employing thermally expanded microcapsules as a solid phase foaming agent and an inert gas as a gas phase foaming agent.

2. 发明申请

US20230064962A1 POLISHING PAD AND POLISHING METHOD 有权
公开(公告)号：US20230064962A1
公开(公告)日：2023-03-02
申请号：US17982528
申请日：2022-11-08
申请人： IV Technologies CO., Ltd.
发明人： Yu-Piao Wang
IPC分类号： B24D11/04
摘要： A polishing pad is provided. The polishing pad, suitable for polishing an object, includes a polishing layer and at least one groove. The polishing layer has a central region and a peripheral region surrounding the central region. The at least one groove is disposed in the polishing layer, wherein the at least one groove has two ends both located in the peripheral region, wherein the two ends include an open end and a closed end.

3. 发明授权

US11154964B2 Abrasive particles having particular shapes and methods of forming such particles 有权
公开(公告)号：US11154964B2
公开(公告)日：2021-10-26
申请号：US15346775
申请日：2016-11-09
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： Anthony C. Gaeta , Anuj Seth , Christopher Arcona , Doruk O. Yener , Jennifer H. Czerepinski , Sujatha Iyengar , Frank J. Csillag , William C. Rice , Satyalakshmi K. Ramesh , Gregory G. Lafond , Sidath S. Wijesooriya , Adam D. Lior , Alan J. Brandes , Anil Parmar , Paul Braun , Darrell K. Everts
IPC分类号： B24D3/00 , B24D11/04 , B24D7/02 , C09K3/14 , B24D18/00
摘要： An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.

4. 发明授权

US11148254B2 Abrasive particles having particular shapes and methods of forming such particles 有权
公开(公告)号：US11148254B2
公开(公告)日：2021-10-19
申请号：US16359370
申请日：2019-03-20
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： Anthony C. Gaeta , Anuj Seth , Christopher Arcona , Doruk O. Yener , Jennifer H. Czerepinski , Sujatha K. Iyengar , Frank J. Csillag , William C. Rice , Satyalakshmi K. Ramesh , Gregory G. Lafond , Sidath S. Wijesooriya , Adam D. Lior , Alan J. Brandes , Anil Parmar , Paul Braun , Darrell K. Everts
IPC分类号： B24D3/00 , B24D11/04 , B24D18/00 , B24D7/02 , C09K3/14
摘要： An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.

5. 发明授权

US10981260B2 Abrasive product and a method for manufacturing such 有权
公开(公告)号：US10981260B2
公开(公告)日：2021-04-20
申请号：US15579694
申请日：2016-05-25
申请人： KWH MIRKA LTD
发明人： Stefan Lindvall , Mats Sundell
IPC分类号： B24D11/04 , B24D18/00 , B24D11/00
摘要： An abrasive product having an abrasive surface, a belt of an abrasive product, a roll of an abrasive product and a method for manufacturing an abrasive product. An abrasive product includes a backing and an abrasive surface. The abrasive surface includes at least a first abrasive area and a second abrasive area, wherein abrasive properties of the first abrasive area are different from abrasive properties of the second abrasive area.

6. 发明申请

US20180345440A1 MULTI-STAGE BATCH POLISHING METHOD FOR END SURFACE OF OPTICAL FIBER CONNECTOR, AND POLISHING FILM 审中-公开
公开(公告)号：US20180345440A1
公开(公告)日：2018-12-06
申请号：US15970041
申请日：2018-05-03
申请人： NTT Advanced Technology Corporation , Mipox Corporation
发明人： Kenji Aoki , Naoki Sugita , Toshihiro Igawa , Mitsunobu Shishido
IPC分类号： B24B19/22 , B24B21/00 , B24D11/04
CPC分类号： B24B19/00 , B24B21/00 , B24D11/04
摘要： A polishing method and a polishing film are provided for automatically performing multi-stage batch polishing on an end surface of a workpiece. An end surface of a workpiece and a polishing plate are moved relative to each other while bringing the end surface of the workpiece into contact with a polishing film of the polishing plate. The end surface is moved in a circular motion with a diameter 2 R relative to the polishing film; the center of the circular motion is moved linearly by a distance S on the polishing film; the polishing film is provided with first, second, and third polishing surfaces; and the polishing film is further provided with cleaning surfaces between the polishing surfaces so that the range of the distance S in which one rotation in the circular motion crosses over different polishing surfaces is reduced, or does not cross over different polishing surfaces.

7. 发明申请

US20180250793A1 FLEXIBLE ABRASIVE ROTARY TOOL 审中-公开
公开(公告)号：US20180250793A1
公开(公告)日：2018-09-06
申请号：US15758192
申请日：2016-09-06
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Bruce A. Sventek , David G. Baird , Adam J. Painter , Tammy J. Engfer , Dennis J. Stapleton
IPC分类号： B24D3/10 , B24B5/48 , B24B9/06 , B24B9/10 , B24D11/02 , B24D11/04 , B24D13/12 , B24D13/14 , B24D3/18 , B24D3/28
CPC分类号： B24D3/10 , B24B5/313 , B24B5/48 , B24B9/065 , B24B9/10 , B24D3/18 , B24D3/28 , B24D11/02 , B24D11/04 , B24D13/12 , B24D13/142 , B24D13/147
摘要： An abrasive rotary tool includes a tool shank a flexible planar section positioned opposite the tool shank. The flexible planar section forms a first abrasive external surface on a first side of the flexible planar section and a second abrasive external surface on a second side of the flexible planar section. The flexible planar section facilitates abrading, corners of a workpiece across multiple angles relative to the axis of rotation for the rotary tool through bending of the flexible planar section when the abrasive external surfaces are applied to a corner of the workpiece.

8. 发明授权

US09895790B2 Multi-abrasive tool 有权
公开(公告)号：US09895790B2
公开(公告)日：2018-02-20
申请号：US14117695
申请日：2011-07-07
申请人： Nicola Fiore
发明人： Nicola Fiore
IPC分类号： B24D7/14 , B24D5/14 , B24D7/06 , B24D11/04
CPC分类号： B24D7/14 , B24D5/14 , B24D7/06 , B24D11/04
摘要： A multi-abrasive tool is constituted by a support on which abrasive elements are present. Such abrasive elements are arranged in a manner so as to form one or more paths along which the successive abrasive elements have grain size sequentially increasing or decreasing by an arbitrary quantity when passing from on element to the next. Such principle gives rise to abrasive tools with different conformation both for polishing machines and for grindstones. For roto-orbital and planetary polishing machines, and optionally orbital, such support is circular and the grain sequence is circumferential, or radial, or in both directions. A first tool is constituted by contiguous (or non-contiguous) circular rings, that are differently abrasive. A second tool comprises differently abrasive elements arranged along the circular peripheral edge. A third tool comprises differently abrasive elements arranged along a spiral path of 360° starting from the edge. A fourth tool comprises two 180° spiral paths with reversed roughness sequences. A fourth tool comprises pairs of differently abrasive small cylinders fixed to a plate on concentric circumferences. A fifth tool is obtained directly on the plate of the polishing machine by means of reliefs and spacers for fixing differently abrasive sectors. For linear polishing machines, the abrasive support is a belt along which differently abrasive rectangular or oblique zones follow each other. For alternative polishing machines, the abrasive support is a plate shaped like the aforesaid belt. For tools to use with grindstones, the multi-abrasive element has a cylindrical rotation symmetry, or conical with rounded tip, or spherical symmetry.

9. 发明申请

US20150224630A1 SANDPAPER AND METHOD OF USE THEREOF 审中-公开
标题翻译： SANDPAPER及其使用方法
公开(公告)号：US20150224630A1
公开(公告)日：2015-08-13
申请号：US14690767
申请日：2015-04-20
申请人： CHRISTIAN T. ZYNIECKI
发明人： CHRISTIAN T. ZYNIECKI
IPC分类号： B24D11/04 , B24B7/18
CPC分类号： B24D11/04 , B24B7/188
摘要： Disclosed herein is sandpaper that includes a first plurality of particles having a first grain size, the first plurality of particles having a first sanding surface covering a first area of the sandpaper. The sandpaper includes a second plurality of particles having a second grain size that is smaller than the first grain size, the second plurality of particles having a second sanding surface covering a second area of the sandpaper. Further, the sandpaper includes a bonding layer having a back surface located opposite the first sanding surface and second sanding surface and a buffer positioned to raise the second plurality of particles such that the first sanding surface and the second sanding surface of the sandpaper are substantially planar.
摘要翻译：本文公开了包括具有第一粒度的第一多个颗粒的砂纸，第一多个颗粒具有覆盖砂纸的第一区域的第一砂光表面。砂纸包括具有小于第一粒度的第二粒度的第二多个颗粒，第二多个颗粒具有覆盖砂纸的第二区域的第二砂磨表面。此外，砂纸包括具有与第一砂磨表面相对的后表面和第二砂磨表面的接合层，以及缓冲器，其被定位成升高第二多个颗粒，使得砂纸的第一砂磨表面和第二砂磨表面基本上是平面的。

10. 发明授权

US09011211B2 Sandpaper and method of use thereof 有权
标题翻译：砂纸及其使用方法
公开(公告)号：US09011211B2
公开(公告)日：2015-04-21
申请号：US12748583
申请日：2010-03-29
申请人： Christian T. Zyniecki
发明人： Christian T. Zyniecki
IPC分类号： B24D11/00 , B24B7/18 , B24D11/04
CPC分类号： B24D11/04 , B24B7/188
摘要： Disclosed herein is sandpaper that includes a first plurality of particles having a first grain size, the first plurality of particles having a first sanding surface covering a first area of the sandpaper. The sandpaper includes a second plurality of particles having a second grain size that is smaller than the first grain size, the second plurality of particles having a second sanding surface covering a second area of the sandpaper. Further, the sandpaper includes a bonding layer having a back surface located opposite the first sanding surface and second sanding surface and a buffer positioned to raise the second plurality of particles such that the first sanding surface and the second sanding surface of the sandpaper are substantially planar.
摘要翻译：本文公开了包括具有第一粒度的第一多个颗粒的砂纸，第一多个颗粒具有覆盖砂纸的第一区域的第一砂光表面。砂纸包括具有小于第一粒度的第二粒度的第二多个颗粒，第二多个颗粒具有覆盖砂纸的第二区域的第二砂磨表面。此外，砂纸包括具有与第一砂磨表面相对的后表面和第二砂磨表面的接合层，以及缓冲器，其被定位成升高第二多个颗粒，使得砂纸的第一砂磨表面和第二砂磨表面基本上是平面的。

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