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    • 12. 发明申请
    • Write head design and method for reducing adjacent track interference in at very narrow track widths
    • 用于在非常窄的轨道宽度上减少相邻轨道干扰的写头设计和方法
    • US20070230046A1
    • 2007-10-04
    • US11391942
    • 2006-03-28
    • Quang LeJui-Lung Li
    • Quang LeJui-Lung Li
    • G11B5/147
    • G11B5/1278G11B5/3116G11B5/315G11B5/3163
    • A perpendicular write head having a wrap around trailing shield for reducing stray field writing and adjacent track interference. The trailing shield is notched, having an un-notched portion directly behind (trailing) the write pole and first and second notched portions that extend laterally to either side. The un-notched portion of the trailing shield is located adjacent to the trailing edge of the write pole and is separated from the trailing edge of the write pole by a trailing shield notch. The notched portions are separated from the trailing edge of the write gap by a notch depth, measured along the trailing direction, the notch depth as measured in the trailing direction being larger than the trailing shield distance. The notch depth as measured in the trailing direction is preferably 25-50 nm larger than the trailing shield gap distance.
    • 垂直写头,其具有围绕后屏蔽的卷绕,用于减少杂散场写入和相邻轨道干涉。 后屏蔽被切口,具有直写在后面(后面)写入极的未切口部分,以及横向延伸到任一侧的第一和第二切口部分。 后屏蔽的未切口部分位于与写极的后缘相邻并且通过后屏蔽切口与写极的后缘分离。 切口部分从写入间隙的后缘与沿着拖尾方向测量的切口深度分开,在后沿方向上测量的切口深度大于尾部屏蔽距离。 在拖尾方向上测量的凹口深度优选比后屏蔽间隙距离大25-50nm。
    • 16. 发明授权
    • Method for fabricating narrow magnetic read width TMR/CPP sensors
    • 制造窄磁读宽TMR / CPP传感器的方法
    • US08011084B2
    • 2011-09-06
    • US12184054
    • 2008-07-31
    • Quang LeJui-Lung Li
    • Quang LeJui-Lung Li
    • G11B5/127H04R31/00
    • G11B5/3909B82Y10/00B82Y25/00G01R33/093G01R33/098G11B5/3163G11B5/3932G11B2005/3996Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49048Y10T29/49052
    • A method for manufacturing a manufacturing a magnetoresistive sensor that allows the sensor to be constructed with a very narrow and well controlled track width. The method includes depositing a layer of diamond like carbon over a series of sensor layers. A first mask is then formed to define a sensor, and an ion milling is performed to remove sensor material not protected by the first mask. Then, a second mask is formed, and a hard bias layer is deposited to the thickness of the sensor layers. The second mask is then lifted off and a CMP is performed to remove the first mask structure. Because all areas other than the area directly over the sensor are substantially planar a quick, gentle CMP can be used to remove the first mask layer even if the first mask is small, such as for definition of a very narrow track-width sensor.
    • 一种用于制造磁阻传感器的方法,该传感器允许传感器被构造成具有非常窄且良好控制的轨道宽度。 该方法包括在一系列传感器层上沉积一层类似金刚石的碳。 然后形成第一掩模以限定传感器,并且执行离子铣削以去除未被第一掩模保护的传感器材料。 然后,形成第二掩模,并且在传感器层的厚度上沉积硬偏置层。 然后将第二掩模剥离并执行CMP以除去第一掩模结构。 由于除传感器正上方的区域以外的所有区域基本上是平面的(由于第二掩模的移除和硬偏置材料的低水平),可以使用快速,温和的CMP来去除第一掩模层,即使 第一个掩模很小,如定义非常窄的轨道宽度传感器。