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11. 发明授权

US08435149B2 Reduction gear device 失效
标题翻译：减速装置
公开(公告)号：US08435149B2
公开(公告)日：2013-05-07
申请号：US12223471
申请日：2007-02-06
申请人： Ryuhei Koyama , Toshiharu Hibino , Masakazu Kurita , Jun Hirose
发明人： Ryuhei Koyama , Toshiharu Hibino , Masakazu Kurita , Jun Hirose
IPC分类号： F16H1/32
CPC分类号： F16H1/32 , B25J9/102 , F16H57/0463
摘要： A reduction gear device includes a first reduction mechanism and a second reduction mechanism. The second reduction mechanism includes a crankshaft, an external gear and an internal gear. One of the internal gear and the external gear is fixed to a base part side member of a robot arm of an industrial robot, and the other of the internal gear and the external gear is fixed to an anterior end side member of the robot arm of the industrial robot. An inner diameter D of the internal gear is 140 mm≦D≦200 mm, torque T transmitted to the anterior end side member is 650 Nm≦T≦1960 Nm, and the number of teeth N of the internal gear is less than 40 times the difference in the number of teeth between the internal gear and the external gear.
摘要翻译：减速装置包括第一减速机构和第二减速机构。第二减速机构包括曲轴，外齿轮和内齿轮。内齿轮和外齿轮中的一个被固定到工业机器人的机器人臂的基部侧构件，并且内齿轮和外齿轮中的另一个固定到机器人臂的前端侧构件工业机器人。内齿轮的内径D在D = 200mm处为140mm，传递到前端侧构件的扭矩T为650Nm @ T @ 1960Nm，内齿轮的齿数N小于40倍内齿轮与外齿轮之间的齿数差。

12. 发明申请

US20120061351A1 PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM FOR STORING PROGRAM FOR EXECUTING THE METHOD 有权
标题翻译：等离子体处理装置，等离子体处理方法和存储程序存储程序用于执行方法
公开(公告)号：US20120061351A1
公开(公告)日：2012-03-15
申请号：US13232207
申请日：2011-09-14
申请人： Mitsunori Ohata , Hidetoshi Kimura , Kiyoshi Maeda , Jun Hirose , Tsuyoshi Hida
发明人： Mitsunori Ohata , Hidetoshi Kimura , Kiyoshi Maeda , Jun Hirose , Tsuyoshi Hida
IPC分类号： C23F1/00 , C23C16/52 , C23C16/458 , C23C16/50 , C23F1/08 , C23C16/00
CPC分类号： H01J37/32642 , C23C16/52 , H01J37/32091 , H01L21/67069 , H01L21/68735
摘要： There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring.
摘要翻译：提供了一种等离子体处理装置，其包括：基座114，具有用于安装其上的基板的基板安装部，施加高频电力; 设置为围绕安装在基板安装部分上的基板的聚焦环210，包括具有高于基板的顶表面的顶表面的外环214和从外环向内延伸的内环212，所述内圈的至少一部分被定位在所述基板的周边的下方，所述外圈和所述内圈形成为单个构件; 定位在聚焦环和基座之间的电介质环220; 用于改变介电环的介电常数的介电常数变化装置250。

13. 外观设计

USD639218S1 Front side fairing for a motorcycle 有权
标题翻译：摩托车前侧整流罩
公开(公告)号：USD639218S1
公开(公告)日：2011-06-07
申请号：US29368854
申请日：2010-08-31
申请人： Kiyoshi Katagiri , Jun Hirose
设计人： Kiyoshi Katagiri , Jun Hirose

14. 外观设计

USD636708S1 Motorcycle or motorcycle replica 有权
标题翻译：摩托车或摩托车复制品
公开(公告)号：USD636708S1
公开(公告)日：2011-04-26
申请号：US29368853
申请日：2010-08-31
申请人： Kiyoshi Katagiri , Toshiaki Kishi , Jun Hirose
设计人： Kiyoshi Katagiri , Toshiaki Kishi , Jun Hirose

15. 发明申请

US20110000883A1 PLASMA PROCESSING APPARATUS, FOCUS RING, AND SUSCEPTOR 有权
标题翻译：等离子体加工设备，聚焦环和SUSCEPTOR
公开(公告)号：US20110000883A1
公开(公告)日：2011-01-06
申请号：US12850391
申请日：2010-08-04
申请人： Shosuke Endoh , Noriyuki Iwabuchi , Shigeaki Kato , Tomoya Okubo , Jun Hirose , Koichi Nagakura , Chishio Koshimizu , Kazuki Denpoh
发明人： Shosuke Endoh , Noriyuki Iwabuchi , Shigeaki Kato , Tomoya Okubo , Jun Hirose , Koichi Nagakura , Chishio Koshimizu , Kazuki Denpoh
IPC分类号： C23F1/00
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/32642 , H01L21/6831
摘要： A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.
摘要翻译：具有聚焦环的等离子体处理装置能够大大提高聚焦环的冷却效率，同时防止其成本增加。等离子体处理装置由具有静电卡盘和聚焦环的基座构成。将要进行等离子体处理的晶片W安装在静电卡盘上。聚焦环具有电介质材料部分和导电材料部分。介电材料部分形成与静电卡盘接触设置的接触部分。导电材料部分面对电介质材料部分的静电卡盘。

16. 发明授权

US07353841B2 Relative pressure control system and relative flow control system 有权
标题翻译：相对压力控制系统和相对流量控制系统
公开(公告)号：US07353841B2
公开(公告)日：2008-04-08
申请号：US11295649
申请日：2005-12-07
申请人： Tetsujiro Kono , Hiroki Doi , Minoru Ito , Hideki Nagaoka , Keiki Ito , Hiroki Endo , Tsuyoshi Shimazu , Jun Hirose , Osamu Katsumata , Kazuyuki Miura , Takashi Kitazawa
发明人： Tetsujiro Kono , Hiroki Doi , Minoru Ito , Hideki Nagaoka , Keiki Ito , Hiroki Endo , Tsuyoshi Shimazu , Jun Hirose , Osamu Katsumata , Kazuyuki Miura , Takashi Kitazawa
IPC分类号： G05D11/13 , G05D16/20
CPC分类号： G05D16/206 , Y10T137/0396 , Y10T137/7761 , Y10T137/87877
摘要： Provided is a relative pressure control system has a simple configuration, but enables accurate regulation of a division ratio of an operation gas, and concurrently makes it possible to securely drain the operation gas from an operation gas pipeline in case of emergency. The system includes a plurality of air operated valves of a normally open type that are connected to an operation gas pipeline supplied with an operation gas; pressure sensors that are series connected to the respective air operated valves and that detect output pressures of the respective air operated valves; a controller that controls operation pressures of the respective air operated valves in accordance with the pressures detected by the pressure sensors; and a hard interlock solenoid valve that correlates the plurality of air operated valves to one another so that at least one of the plurality of air operated valves is normally opened. In the configuration, an opening of a specified one of the plurality of air operated valves is regulated, the operation gas is output at a predetermined division ratio.
摘要翻译：提供一种相对压力控制系统具有简单的结构，但是能够精确地调节操作气体的分配比，并且在紧急情况下同时可以从操作气体管道可靠地排出操作气体。该系统包括多个常开型气动阀，其连接到供给操作气体的操作气体管道; 压力传感器串联连接到相应的气动阀并且检测各个气动阀的输出压力; 控制器，其根据压力传感器检测到的压力来控制各个气动阀的操作压力; 以及将所述多个气动阀彼此关联使得所述多个气动阀中的至少一个通常打开的硬联锁电磁阀。在这种构造中，调节多个气动阀中的指定的一个的开度，以预定的分配比率输出操作气体。

17. 发明授权

US07198448B2 Vacuum process system 有权
标题翻译：真空过程系统
公开(公告)号：US07198448B2
公开(公告)日：2007-04-03
申请号：US11332653
申请日：2006-01-13
申请人： Jun Ozawa , Jun Hirose , Masaki Narushima
发明人： Jun Ozawa , Jun Hirose , Masaki Narushima
IPC分类号： B65G49/07
CPC分类号： H01L21/67161 , H01L21/67167 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67745 , Y10S414/139
摘要： A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movable and transfers the object into/from the load port, the first transfer device being disposed within the internal space; and a process unit having one process chamber for subjecting the object to a predetermined process, and a vacuum transfer chamber connected to the process chamber, having an internal space set at a vacuum pressure level, and including a second transfer device for transferring the object into/from the process chamber, the second transfer device being disposed within the internal space. The process units are individually connected to the common transfer chamber such that the process units are substantially parallel to each other. The vacuum chamber of each process unit is connected to the common transfer chamber. Each process unit extends linearly in a direction substantially perpendicular to the common transfer chamber. The object is transferred into/from the vacuum transfer chamber by means of the first transfer device.
摘要翻译：真空处理系统包括：设置待处理对象的装载端口; 与负载端口相邻设置的公共传送室，具有设定在大气压力水平的内部空间，并且包括第一传送装置，该第一传送装置可移动并将物体传送到/从所述装载端口传送，所述第一传送装置设置在所述传送室内内部空间; 以及处理单元，其具有用于使物体经受预定处理的一个处理室和连接到处理室的真空传送室，其具有设置在真空压力水平的内部空间，并且包括用于将物体传送到 /从处理室，第二传送装置设置在内部空间内。处理单元分别连接到公共传送室，使得处理单元基本上彼此平行。每个处理单元的真空室连接到公共传送室。每个处理单元在基本上垂直于公共传送室的方向上线性地延伸。物体通过第一传送装置传送到/从真空传送室传送。

18. 发明授权

US06846355B2 Road paving material and method 失效
标题翻译：道路铺路材料及方法
公开(公告)号：US06846355B2
公开(公告)日：2005-01-25
申请号：US10464131
申请日：2003-06-18
申请人： Kazuo Hokkirigawa , Noriyuki Yoshimura , Jun Hirose
发明人： Kazuo Hokkirigawa , Noriyuki Yoshimura , Jun Hirose
IPC分类号： C04B26/26 , C04B35/622 , C08L95/00 , E01C7/18 , E01C7/26 , C09D195/00
CPC分类号： E01C7/262 , C04B35/62204 , C04B35/62213 , C04B35/6262 , C04B2235/48 , C04B2235/5212 , C04B2235/526 , C04B2235/5264 , C04B2235/5427 , C04B2235/5463 , C04B2235/604 , C04B2235/656 , C04B2235/6562 , C04B2235/6565 , C04B2235/94 , C08L95/00 , E01C7/182 , C08L2666/74 , C08L2666/72
摘要： A road paving material includes an aggregate, asphalt, and fine ceramic particles selected from the group consisting of RBC particles, CRBC particles, and mixtures thereof.
摘要翻译：道路铺路材料包括选自由RBC颗粒，CRBC颗粒及其混合物组成的组的骨料，沥青和细陶瓷颗粒。

19. 发明授权

US06606912B2 Structure or construction for mounting a pressure detector 有权
标题翻译：用于安装压力检测器的结构或结构
公开(公告)号：US06606912B2
公开(公告)日：2003-08-19
申请号：US09825340
申请日：2001-04-04
申请人： Tadahiro Ohmi , Takashi Hirose , Eiji Ideta , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Kazuhiro Yoshikawa , Satoshi Kagatsume , Jun Hirose , Kazuo Fukasawa , Hiroshi Koizumi , Hideki Nagaoka
发明人： Tadahiro Ohmi , Takashi Hirose , Eiji Ideta , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Kazuhiro Yoshikawa , Satoshi Kagatsume , Jun Hirose , Kazuo Fukasawa , Hiroshi Koizumi , Hideki Nagaoka
IPC分类号： G01L700
CPC分类号： G01L19/0023 , G01L19/0645 , G01L19/145 , G01L19/147
摘要： A construction for mounting a pressure detector prevents the detector diaphragm from being strained by stress applied to the pressure detector as the detector is mounted in a fixture main body provided in a pipe line or the like, thereby keeping the output characteristics and temperature characteristics of the detector from greatly differing before and after the mounting. The pressure detector is constructed by combining and fastening together a diaphragm base having a diaphragm and a sensor base having a sensor element therein that is activated by displacement of the diaphragm base. The pressure detector, with a gasket placed thereunder, is disposed in a mounting hole of a fixture main body that is mounted in a pipe line. The pressure detector is air-tightly pressed and fastened by a presser member inserted from above in the mounting hole. The presser member is brought in contact with a block upper surface of the diaphragm base, and the gasket is also brought in contact with the block lower surface of the diaphragm base. A shallow groove is defined in the form of a ring on the lower surface of the block at a place inward of the portion contacting the metal gasket so that the shallow groove absorbs strain caused by the presser member.
摘要翻译：用于安装压力检测器的结构防止了检测器膜片被施加到压力检测器上的应力而被应变，因为检测器安装在设置在管线等中的夹具主体中，从而保持了输出特性和温度特性检测器在安装前后差异很大。压力检测器通过将具有隔膜的膜片基座和具有传感器元件的传感器基座组合并紧固在一起而构成，该传感器基座通过隔膜基座的位移而被激活。压力检测器，其上放置有垫圈，设置在安装在管道中的固定装置本体的安装孔中。压力检测器通过从安装孔中从上方插入的压紧构件气密地按压并紧固。压板构件与隔膜基座的块上表面接触，并且垫圈也与隔膜基座的块下表面接触。浅槽在块体的下表面上在与金属垫片接触的部分的内侧的位置处以环的形式限定，使得浅槽吸收由压紧构件引起的应变。

20. 外观设计

USD459254S1 Multi-chamber processing apparatus 失效
标题翻译：多室加工设备
公开(公告)号：USD459254S1
公开(公告)日：2002-06-25
申请号：US29131294
申请日：2000-10-19
申请人： Jun Hirose , Eiji Hirose , Jun Ozawa , Takaaki Hirooka
设计人： Jun Hirose , Eiji Hirose , Jun Ozawa , Takaaki Hirooka

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