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11. 发明申请

US20070120072A1 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US20070120072A1
公开(公告)日：2007-05-31
申请号：US11649199
申请日：2007-01-03
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G21G5/00 , G02B23/00 , G02B17/00 , G02B21/00 , G02B23/24
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译：提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

12. 发明授权

US06840640B2 Multi mirror system for an illumination system 失效
标题翻译：用于照明系统的多镜系统
公开(公告)号：US06840640B2
公开(公告)日：2005-01-11
申请号：US10060909
申请日：2002-01-30
申请人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
发明人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
IPC分类号： G02B13/18 , G02B13/24 , G02B17/00 , G02B17/06 , G02B19/00 , G02B27/00 , G02B27/09 , G03F7/20 , G03F7/22 , H01L21/027 , G02B5/10 , G21K5/00
CPC分类号： G02B27/0983 , G02B17/0621 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G02B27/0905 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70116 , G03F7/702 , G03F7/70233 , Y10S359/90
摘要： There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.
摘要翻译：为波长<= 193nm的照明系统提供了多镜系统。多镜系统包括（a）具有第一反射镜和第二反射镜的成像系统，（b）物体平面，（c）成像系统形成物体的图像的图像平面，（d）在图像平面中的弧形场，其中弧形场的中间的径向方向限定扫描方向。第一和第二反射镜被布置成使得弧形场的边缘锐度在扫描方向上小于5mm。从物体行进到图像平面的光线相对于反射镜的表面法线<= 30°或> = 60°的入射角撞击第一和第二反射镜的使用区域。

13. 发明申请

US20050002090A1 EUV illumination system having a folding geometry 审中-公开
标题翻译： EUV照明系统具有折叠几何形状
公开(公告)号：US20050002090A1
公开(公告)日：2005-01-06
申请号：US10876898
申请日：2004-06-25
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler
IPC分类号： G03F7/20 , G02B17/00
CPC分类号： B82Y10/00 , G03B27/54 , G03F7/70083 , G03F7/70166 , G03F7/702 , G03F7/70233 , G21K2201/061
摘要： There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.
摘要翻译：提供照明系统。照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

14. 发明授权

US06535274B2 Projection exposure device 有权
标题翻译：投影曝光装置
公开(公告)号：US06535274B2
公开(公告)日：2003-03-18
申请号：US09945363
申请日：2001-08-31
申请人： Martin Antoni
发明人： Martin Antoni
IPC分类号： G03B2754
CPC分类号： G03F7/70075 , G03F7/701 , G03F7/70191
摘要： A projection exposure device, in particular for micro-lithography, serves to produce an image of an object in an image plane positioned in an object plane. This happens with the aid of a light source emitting projection light and illumination optics positioned in the ray path between the light source and the object plane. In addition projection optics positioned in the ray path between the object plane and the image plane serve to guide the projection light. A filter (7) is positioned in a filter plane which lies in the vicinity of a pupil plane between the light source and the object plane. This has a moveable filter element (22′) which has at least in certain areas (24) for the projection light a transmission factor which is greater than zero and less than 100%. The moveable filter element (22′) is moveable in the filter plane and has a distribution of the transmission factor over the filter face, in such a way that the intensity distribution of the projection light perpendicular to the optical axis (14) in the ray path after the filter (7) changes with the movement of the filter element (22′). With such a filter (7) an illumination angle distribution can be adapted to a pre-set value (FIG. 5).
摘要翻译：特别是用于微光刻的投影曝光装置用于在位于物平面中的图像平面中产生物体的图像。借助于发射投影光的光源和位于光源和物平面之间的光线路径中的照明光学器件的发生。此外，位于物平面和图像平面之间的光线路径中的投影光学器件用于引导投影光。滤光器（7）位于位于光源和物平面之间的光瞳平面附近的滤光器平面中。这具有可移动的过滤元件（22'），其至少在某些区域（24）中用于投影光，该透射因子大于零且小于100％。可移动过滤器元件（22'）可在过滤器平面中移动并且具有透过因子在过滤器面上的分布，使得投影光在光线中垂直于光轴（14）的强度分布过滤器（7）随着过滤元件（22'）的移动而变化的路径。利用这种滤光器（7），照明角度分布可以适应于预定值（图5）。

15. 发明申请

US20080297755A1 Focusing-device for the radiation from a light source 有权
标题翻译：用于来自光源的辐射的聚焦装置
公开(公告)号：US20080297755A1
公开(公告)日：2008-12-04
申请号：US12218400
申请日：2008-07-15
申请人： Martin Antoni , Frank Melzer , Andreas Seifert , Wolfgang Singer
发明人： Martin Antoni , Frank Melzer , Andreas Seifert , Wolfgang Singer
IPC分类号： G03B27/54
CPC分类号： G03F7/70058 , G02B5/10 , G02B17/02 , G02B27/0025 , G02B27/30
摘要： A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1′) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1′) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.
摘要翻译：用于来自光源（2）的辐射的聚焦装置设置有集中器反射镜（1,1'），其被布置在安装件（24）中，并以虚拟或实际的方式从光源收集光（2）在第二焦点（200）。收集镜（1,1'）经由轴承可移动地连接到支座（24），使得即使在温度变化的情况下，它的光学特性保持至少近似相同。

16. 发明申请

US20080130076A1 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US20080130076A1
公开(公告)日：2008-06-05
申请号：US12009984
申请日：2008-01-23
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G03B27/70 , G03B27/54
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.
摘要翻译：提供了一种用于微光刻的照明系统。该照明系统包括具有多个场光栅元件的光学元件，其中照射场的平面以及位于从光学元件到平面的光路中的掠入射镜之后的光学元件。照明系统在光路中，光学元件之后和平面之前没有其他掠入射镜。

17. 发明授权

US07186983B2 Illumination system particularly for microlithography 失效
公开(公告)号：US07186983B2
公开(公告)日：2007-03-06
申请号：US10919583
申请日：2004-08-17
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
IPC分类号： G02B27/14 , G02B5/30 , G02B17/00
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

18. 发明授权

US07142285B2 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US07142285B2
公开(公告)日：2006-11-28
申请号：US10381827
申请日：2001-09-28
申请人： Martin Antoni , Wolfgang Singer , Johannes Wangler
发明人： Martin Antoni , Wolfgang Singer , Johannes Wangler
IPC分类号： G03B27/54 , G03B27/42 , G21K5/04
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70075 , G03F7/70083 , G03F7/702
摘要： There is provided an illumination system for microlithography with wavelengths≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The first raster elements that are imaged into the image plane are illuminated almost completely.
摘要翻译：提供了一种用于微波光刻的照明系统，其波长<= 193nm。照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到图像平面中，产生至少部分地叠加在图像平面中的场上的多个图像。成像到图像平面中的第一个光栅元素几乎完全照亮。

19. 发明申请

US20060233300A9 ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY 有权
标题翻译：照明系统特别适用于微晶
公开(公告)号：US20060233300A9
公开(公告)日：2006-10-19
申请号：US10381827
申请日：2001-09-28
申请人： Martin Antoni , Wolfgang Singer , Johannes Wangler
发明人： Martin Antoni , Wolfgang Singer , Johannes Wangler
IPC分类号： G21K5/00
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70075 , G03F7/70083 , G03F7/702
摘要： The invention concerns an illumination system, particularly for mircolithography with wavelengths
摘要翻译：本发明涉及一种照明系统，特别是用于波长小于193nm的微光刻，包括：一次光源; 第一光学部件; 第二光学部件; 图像平面; 和退学生; 其中所述第一光学部件将所述初级光源转换成由所述出射光瞳中的所述第二光学部件成像的多个次级光源，其中所述第一光学部件包括具有多个第一光栅元件的第一光学元件，成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像，其中，图像进入图像平面的所述第一光栅元素几乎完全照亮。

20. 发明申请

US20050274897A1 Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination 有权
标题翻译：波长小于或等于193nm的照明系统，具有用于确定照明的传感器
公开(公告)号：US20050274897A1
公开(公告)日：2005-12-15
申请号：US11091238
申请日：2005-03-28
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Markus Weiss , Vadim Banine , Marcel Dierichs , Roel Moors , Karl Schuster , Axel Scholz , Philipp Bosselmann , Bernd Warm
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Markus Weiss , Vadim Banine , Marcel Dierichs , Roel Moors , Karl Schuster , Axel Scholz , Philipp Bosselmann , Bernd Warm
IPC分类号： G03F7/20 , G01J1/42
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70558
摘要： There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.
摘要翻译：提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及（b）位于或靠近平面的传感器，用于检测使用区域外的光。

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